JPWO2024143204A1 - - Google Patents
Info
- Publication number
- JPWO2024143204A1 JPWO2024143204A1 JP2024567743A JP2024567743A JPWO2024143204A1 JP WO2024143204 A1 JPWO2024143204 A1 JP WO2024143204A1 JP 2024567743 A JP2024567743 A JP 2024567743A JP 2024567743 A JP2024567743 A JP 2024567743A JP WO2024143204 A1 JPWO2024143204 A1 JP WO2024143204A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C61/00—Compounds having carboxyl groups bound to carbon atoms of rings other than six-membered aromatic rings
- C07C61/16—Unsaturated compounds
- C07C61/22—Unsaturated compounds having a carboxyl group bound to a six-membered ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C61/00—Compounds having carboxyl groups bound to carbon atoms of rings other than six-membered aromatic rings
- C07C61/16—Unsaturated compounds
- C07C61/28—Unsaturated compounds polycyclic
- C07C61/29—Unsaturated compounds polycyclic having a carboxyl group bound to a condensed ring system
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F11/00—Compounds containing elements of Groups 6 or 16 of the Periodic Table
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/003—Compounds containing elements of Groups 4 or 14 of the Periodic Table without C-Metal linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/005—Compounds of elements of Group 5 of the Periodic Table without metal-carbon linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/94—Bismuth compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
- G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Materials For Photolithography (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022208687 | 2022-12-26 | ||
| JP2023169294 | 2023-09-29 | ||
| PCT/JP2023/046175 WO2024143204A1 (ja) | 2022-12-26 | 2023-12-22 | 金属化合物、感光性組成物、パターン形成方法、基板の製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2024143204A1 true JPWO2024143204A1 (https=) | 2024-07-04 |
Family
ID=91717619
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024567743A Pending JPWO2024143204A1 (https=) | 2022-12-26 | 2023-12-22 |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP4644397A1 (https=) |
| JP (1) | JPWO2024143204A1 (https=) |
| KR (1) | KR20250127158A (https=) |
| TW (1) | TW202436378A (https=) |
| WO (1) | WO2024143204A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2026005063A1 (ja) * | 2024-06-28 | 2026-01-02 | 三菱ケミカル株式会社 | 貧金属クラスター化合物、それを有する多量構造体、その製造方法、それを含む感光性組成物、この組成物を用いたパターン形成方法、基板及び基板の製造方法 |
| WO2026005065A1 (ja) * | 2024-06-28 | 2026-01-02 | 三菱ケミカル株式会社 | 化合物、その化合物の製造方法、その化合物を含む感光性組成物、その組成物を用いたパターン形成方法、基板及び基板の製造方法 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57185276A (en) * | 1981-05-11 | 1982-11-15 | Sankyo Co Ltd | Dihydro-dum-4 and dihydro-isodum-4 and their derivative |
| US6171757B1 (en) | 1999-07-12 | 2001-01-09 | International Business Machines Corporation | Organometallic polymers and use thereof |
| WO2007070092A2 (en) * | 2005-12-09 | 2007-06-21 | Pryog, Llc | Metal-containing compositions and method of making same |
| EP1975705B1 (en) | 2007-03-28 | 2016-04-27 | FUJIFILM Corporation | Positive resist composition and pattern-forming method |
| US9176377B2 (en) | 2010-06-01 | 2015-11-03 | Inpria Corporation | Patterned inorganic layers, radiation based patterning compositions and corresponding methods |
| JP5708521B2 (ja) | 2011-02-15 | 2015-04-30 | 信越化学工業株式会社 | レジスト材料及びこれを用いたパターン形成方法 |
| JP6196897B2 (ja) | 2013-12-05 | 2017-09-13 | 東京応化工業株式会社 | ネガ型レジスト組成物、レジストパターン形成方法及び錯体 |
| JP6389839B2 (ja) | 2016-03-23 | 2018-09-12 | 株式会社先端ナノプロセス基盤開発センター | 感光性組成物およびパターン形成方法 |
| JP7644923B2 (ja) | 2019-12-24 | 2025-03-13 | 国立研究開発法人産業技術総合研究所 | 有機修飾金属酸化物ナノ粒子、有機修飾金属酸化物ナノ粒子含有溶液、有機修飾金属酸化物ナノ粒子含有レジスト組成物及びレジストパターン形成方法 |
| US20240307560A1 (en) * | 2020-12-31 | 2024-09-19 | Da Zen Theranostics, Inc. | Heptamethine carbocyanine dye-dota conjugates complexed with lutetium-177, yttrium-90, or gallium-68, and their uses for image-guided radiotherapy |
| CN113321688B (zh) * | 2021-06-10 | 2022-03-29 | 大连理工大学 | 一种双功能催化剂及其在外环路反应工艺中制备环状碳酸酯、聚碳酸酯的方法 |
| JP7737106B2 (ja) | 2021-07-16 | 2025-09-10 | 三星電子株式会社 | イオン性塩および感放射線レジスト組成物 |
-
2023
- 2023-12-22 JP JP2024567743A patent/JPWO2024143204A1/ja active Pending
- 2023-12-22 WO PCT/JP2023/046175 patent/WO2024143204A1/ja not_active Ceased
- 2023-12-22 EP EP23911984.5A patent/EP4644397A1/en active Pending
- 2023-12-22 KR KR1020257025050A patent/KR20250127158A/ko active Pending
- 2023-12-26 TW TW112150762A patent/TW202436378A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| EP4644397A1 (en) | 2025-11-05 |
| KR20250127158A (ko) | 2025-08-26 |
| TW202436378A (zh) | 2024-09-16 |
| WO2024143204A1 (ja) | 2024-07-04 |
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