JPWO2024135628A5 - - Google Patents

Info

Publication number
JPWO2024135628A5
JPWO2024135628A5 JP2024566053A JP2024566053A JPWO2024135628A5 JP WO2024135628 A5 JPWO2024135628 A5 JP WO2024135628A5 JP 2024566053 A JP2024566053 A JP 2024566053A JP 2024566053 A JP2024566053 A JP 2024566053A JP WO2024135628 A5 JPWO2024135628 A5 JP WO2024135628A5
Authority
JP
Japan
Prior art keywords
low
organic solvent
ink
reflection layer
fine particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2024566053A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2024135628A1 (https=
Filing date
Publication date
Priority claimed from JP2022202075A external-priority patent/JP7298107B1/ja
Application filed filed Critical
Priority claimed from PCT/JP2023/045352 external-priority patent/WO2024135628A1/ja
Publication of JPWO2024135628A1 publication Critical patent/JPWO2024135628A1/ja
Publication of JPWO2024135628A5 publication Critical patent/JPWO2024135628A5/ja
Pending legal-status Critical Current

Links

JP2024566053A 2022-12-19 2023-12-18 Pending JPWO2024135628A1 (https=)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022202075A JP7298107B1 (ja) 2022-12-19 2022-12-19 低反射性積層体、及びその製造方法
JP2023082715 2023-05-19
PCT/JP2023/045352 WO2024135628A1 (ja) 2022-12-19 2023-12-18 低反射層形成用インキ、低反射性積層体及び低反射層形成方法

Publications (2)

Publication Number Publication Date
JPWO2024135628A1 JPWO2024135628A1 (https=) 2024-06-27
JPWO2024135628A5 true JPWO2024135628A5 (https=) 2026-02-20

Family

ID=91588879

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024566053A Pending JPWO2024135628A1 (https=) 2022-12-19 2023-12-18

Country Status (3)

Country Link
JP (1) JPWO2024135628A1 (https=)
CN (1) CN120344622A (https=)
WO (1) WO2024135628A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2026014453A1 (ja) * 2024-07-12 2026-01-15 キヤノン化成株式会社 水性内面反射防止塗料、内面反射防止塗膜、及びガラス光学素子

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10140043A (ja) * 1996-11-07 1998-05-26 Somar Corp 反射防止用塗料
US5998090A (en) * 1997-12-01 1999-12-07 Brewer Science, Inc. High optical density ultra thin organic black matrix system
CN109735165A (zh) * 2018-12-18 2019-05-10 广东高仕电研科技有限公司 一种热固化吸光油墨
JP7569155B2 (ja) * 2020-03-06 2024-10-17 株式会社きもと 低反射遮光層用樹脂組成物、並びに、これを用いた低反射遮光層及び低反射遮光層積層体

Similar Documents

Publication Publication Date Title
JP6131517B1 (ja) 艶消し被覆組成物、化粧材及びその製造方法
US10722917B2 (en) Multi-layer coating film with high infrared-light reflectivity and high visible-light transmissivity and forming method thereof
KR101766621B1 (ko) 유리 기재용 고품위·고정밀 스크린 인쇄 잉크 조성물, 상기 잉크 조성물을 스크린 인쇄한 인쇄물 및 상기 인쇄물의 제조방법
US11124658B2 (en) Infrared reflective coating composition
JP6504299B1 (ja) 黒色低反射膜、および積層体の製造方法
US9382428B2 (en) Liquid tint materials and films made therefrom
CN107250298A (zh) 喷墨记录用油墨套组
JPWO2024135628A5 (https=)
WO2024135628A1 (ja) 低反射層形成用インキ、低反射性積層体及び低反射層形成方法
CN105295757B (zh) 一种近红外吸收滤光膜及其制备方法
JP2016109943A (ja) 光学素子、遮光膜および遮光塗料
EP1336871A1 (en) Production process of a graded neutral density filter, diaphragm with graded neutral density filter and photographing apparatus comprising the diaphragm
TWI881198B (zh) 高分子分散劑及其製造方法、水性顏料分散液暨水性噴墨墨水
WO2009119611A1 (ja) 剥離フィルム及び積層体
JP2024167039A (ja) 低反射層形成用インキ、積層体及び低反射層形成方法
JP4698420B2 (ja) 近赤外線遮蔽用塗料、それから得られる近赤外線遮蔽積層体及びその製造方法
JP7298107B1 (ja) 低反射性積層体、及びその製造方法
CN108357177A (zh) 粒子增强型光致发光膜及其制备方法
JP7783224B2 (ja) 化粧材用インキ組成物および化粧材
JP2004168053A (ja) 積層フィルム
CN114466906A (zh) 非水性喷墨用油墨组合物
JP7466040B1 (ja) 光学積層体及びその製造方法
JP2021091107A (ja) 膜を有する物品、塗料、および物品の製造方法
JPS62101676A (ja) 半透明合成樹脂接着シ−ト
JP2025026375A (ja) 印刷インキ及び印刷物