JPWO2024053679A5 - - Google Patents
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- JPWO2024053679A5 JPWO2024053679A5 JP2024545692A JP2024545692A JPWO2024053679A5 JP WO2024053679 A5 JPWO2024053679 A5 JP WO2024053679A5 JP 2024545692 A JP2024545692 A JP 2024545692A JP 2024545692 A JP2024545692 A JP 2024545692A JP WO2024053679 A5 JPWO2024053679 A5 JP WO2024053679A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- ceramic structure
- crystal grains
- structure according
- void
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022143863 | 2022-09-09 | ||
| PCT/JP2023/032556 WO2024053679A1 (ja) | 2022-09-09 | 2023-09-06 | セラミック構造体 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2024053679A1 JPWO2024053679A1 (https=) | 2024-03-14 |
| JPWO2024053679A5 true JPWO2024053679A5 (https=) | 2025-05-15 |
Family
ID=90191301
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024545692A Pending JPWO2024053679A1 (https=) | 2022-09-09 | 2023-09-06 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20260035308A1 (https=) |
| EP (1) | EP4585580A1 (https=) |
| JP (1) | JPWO2024053679A1 (https=) |
| CN (1) | CN119731136A (https=) |
| TW (1) | TWI868908B (https=) |
| WO (1) | WO2024053679A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2025192615A1 (ja) * | 2024-03-13 | 2025-09-18 | 京セラ株式会社 | セラミック構造体 |
| WO2025192616A1 (ja) * | 2024-03-13 | 2025-09-18 | 京セラ株式会社 | セラミック構造体 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6340314A (ja) | 1986-08-05 | 1988-02-20 | Hiroshima Univ | 触媒ｃｖｄ法による薄膜の製造法とその装置 |
| JP3220315B2 (ja) | 1993-12-22 | 2001-10-22 | 京セラ株式会社 | 被覆部材 |
| US6762496B2 (en) * | 2000-11-30 | 2004-07-13 | Tokuyama Corporation | Substrate and production method therefor |
| JP2007112633A (ja) * | 2005-10-17 | 2007-05-10 | Toshiba Corp | 窒化物半導体ウェーハ及び窒化物半導体素子 |
| JP2012237024A (ja) * | 2011-05-10 | 2012-12-06 | Shin-Etsu Chemical Co Ltd | 窒化アルミニウム膜及びそれを被覆した部材 |
| JP6499917B2 (ja) * | 2015-05-18 | 2019-04-10 | 株式会社トクヤマ | Ｉｉｉ族窒化物単結晶の製造方法 |
| WO2019189378A1 (ja) * | 2018-03-27 | 2019-10-03 | 日本碍子株式会社 | 窒化アルミニウム板 |
| JP7189715B2 (ja) | 2018-09-27 | 2022-12-14 | 京セラ株式会社 | 静電チャック |
-
2023
- 2023-09-06 CN CN202380063674.3A patent/CN119731136A/zh active Pending
- 2023-09-06 WO PCT/JP2023/032556 patent/WO2024053679A1/ja not_active Ceased
- 2023-09-06 US US19/109,373 patent/US20260035308A1/en active Pending
- 2023-09-06 EP EP23863217.8A patent/EP4585580A1/en active Pending
- 2023-09-06 JP JP2024545692A patent/JPWO2024053679A1/ja active Pending
- 2023-09-07 TW TW112134098A patent/TWI868908B/zh active
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