JPWO2024038504A1 - - Google Patents

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Publication number
JPWO2024038504A1
JPWO2024038504A1 JP2024541314A JP2024541314A JPWO2024038504A1 JP WO2024038504 A1 JPWO2024038504 A1 JP WO2024038504A1 JP 2024541314 A JP2024541314 A JP 2024541314A JP 2024541314 A JP2024541314 A JP 2024541314A JP WO2024038504 A1 JPWO2024038504 A1 JP WO2024038504A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
JP2024541314A
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Japanese (ja)
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JPWO2024038504A5 (https=
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Publication of JPWO2024038504A1 publication Critical patent/JPWO2024038504A1/ja
Publication of JPWO2024038504A5 publication Critical patent/JPWO2024038504A5/ja
Ceased legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
JP2024541314A 2022-08-16 2022-08-16 Ceased JPWO2024038504A1 (https=)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2022/030967 WO2024038504A1 (ja) 2022-08-16 2022-08-16 炭化珪素半導体装置、電力変換装置および炭化珪素半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPWO2024038504A1 true JPWO2024038504A1 (https=) 2024-02-22
JPWO2024038504A5 JPWO2024038504A5 (https=) 2024-10-18

Family

ID=89941535

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024541314A Ceased JPWO2024038504A1 (https=) 2022-08-16 2022-08-16

Country Status (2)

Country Link
JP (1) JPWO2024038504A1 (https=)
WO (1) WO2024038504A1 (https=)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010109221A (ja) * 2008-10-31 2010-05-13 Rohm Co Ltd 半導体装置
JP2013089778A (ja) * 2011-10-18 2013-05-13 Toyota Motor Corp 半導体装置及びその製造方法
JP2016009712A (ja) * 2014-06-23 2016-01-18 住友電気工業株式会社 炭化珪素半導体装置
CN206657811U (zh) * 2017-04-06 2017-11-21 淄博汉林半导体有限公司 一种内建肖特基界面的垂直场效应二极管
CN109192779A (zh) * 2018-08-28 2019-01-11 电子科技大学 一种碳化硅mosfet器件及其制造方法
JP2019071313A (ja) * 2017-10-05 2019-05-09 国立研究開発法人産業技術総合研究所 半導体装置
JP2020087958A (ja) * 2018-11-15 2020-06-04 ルネサスエレクトロニクス株式会社 半導体装置
CN212542447U (zh) * 2020-07-24 2021-02-12 淄博汉林半导体有限公司 一种新型立体导电的肖特基二极管

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010109221A (ja) * 2008-10-31 2010-05-13 Rohm Co Ltd 半導体装置
JP2013089778A (ja) * 2011-10-18 2013-05-13 Toyota Motor Corp 半導体装置及びその製造方法
JP2016009712A (ja) * 2014-06-23 2016-01-18 住友電気工業株式会社 炭化珪素半導体装置
CN206657811U (zh) * 2017-04-06 2017-11-21 淄博汉林半导体有限公司 一种内建肖特基界面的垂直场效应二极管
JP2019071313A (ja) * 2017-10-05 2019-05-09 国立研究開発法人産業技術総合研究所 半導体装置
CN109192779A (zh) * 2018-08-28 2019-01-11 电子科技大学 一种碳化硅mosfet器件及其制造方法
JP2020087958A (ja) * 2018-11-15 2020-06-04 ルネサスエレクトロニクス株式会社 半導体装置
CN212542447U (zh) * 2020-07-24 2021-02-12 淄博汉林半导体有限公司 一种新型立体导电的肖特基二极管

Also Published As

Publication number Publication date
WO2024038504A1 (ja) 2024-02-22

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