JPWO2024029363A1 - - Google Patents

Info

Publication number
JPWO2024029363A1
JPWO2024029363A1 JP2024538929A JP2024538929A JPWO2024029363A1 JP WO2024029363 A1 JPWO2024029363 A1 JP WO2024029363A1 JP 2024538929 A JP2024538929 A JP 2024538929A JP 2024538929 A JP2024538929 A JP 2024538929A JP WO2024029363 A1 JPWO2024029363 A1 JP WO2024029363A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2024538929A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2024029363A1 publication Critical patent/JPWO2024029363A1/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D9/00—Electrolytic coating other than with metals
    • C25D9/04—Electrolytic coating other than with metals with inorganic materials
    • C25D9/08—Electrolytic coating other than with metals with inorganic materials by cathodic processes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D9/00—Electrolytic coating other than with metals
    • C25D9/04—Electrolytic coating other than with metals with inorganic materials
    • C25D9/08—Electrolytic coating other than with metals with inorganic materials by cathodic processes
    • C25D9/10—Electrolytic coating other than with metals with inorganic materials by cathodic processes on iron or steel

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Mechanical Engineering (AREA)
  • Cell Electrode Carriers And Collectors (AREA)
  • Laminated Bodies (AREA)
  • Carbon And Carbon Compounds (AREA)
JP2024538929A 2022-08-05 2023-07-20 Pending JPWO2024029363A1 (enrdf_load_html_response)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022125323 2022-08-05
PCT/JP2023/026615 WO2024029363A1 (ja) 2022-08-05 2023-07-20 被覆基材

Publications (1)

Publication Number Publication Date
JPWO2024029363A1 true JPWO2024029363A1 (enrdf_load_html_response) 2024-02-08

Family

ID=89848926

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024538929A Pending JPWO2024029363A1 (enrdf_load_html_response) 2022-08-05 2023-07-20

Country Status (6)

Country Link
EP (1) EP4567162A1 (enrdf_load_html_response)
JP (1) JPWO2024029363A1 (enrdf_load_html_response)
KR (1) KR20250004329A (enrdf_load_html_response)
CN (1) CN119301313A (enrdf_load_html_response)
TW (1) TW202417242A (enrdf_load_html_response)
WO (1) WO2024029363A1 (enrdf_load_html_response)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0248103A (ja) * 1989-06-20 1990-02-16 Sumitomo Electric Ind Ltd 被覆超硬合金工具及びその製造法
JPH11264066A (ja) * 1998-03-16 1999-09-28 Hitachi Tool Eng Ltd 被覆硬質工具
JP2000117509A (ja) * 1998-10-14 2000-04-25 Mitsubishi Materials Corp 耐摩耗性の優れた表面被覆超硬合金製スローアウエイ切削チップ
JP2010105979A (ja) * 2008-10-31 2010-05-13 General Electric Co <Ge> 金属酸化物コーティング
JP2012233223A (ja) * 2011-04-28 2012-11-29 Waseda Univ 電気めっき組成物、および、電気めっき液
US20140178659A1 (en) * 2012-12-26 2014-06-26 Shanghua Wu Al2o3 or al2o3-contained multilayer coatings for silicon nitride cutting tools by physical vapor deposition and methods of making the same
JP2020006487A (ja) * 2018-07-10 2020-01-16 三菱マテリアル株式会社 硬質被覆層が優れた耐チッピング性を発揮する表面切削工具

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3865442B2 (ja) 1995-11-22 2007-01-10 のぞみフォトニクス株式会社 多層酸化物薄膜素子及びその製造方法
JP2009147192A (ja) 2007-12-17 2009-07-02 Fujifilm Corp 結晶性無機膜とその製造方法、半導体装置
JP2011032521A (ja) 2009-07-31 2011-02-17 Mitsubishi Materials Corp Ｃｓｄ溶液及び該溶液を用いたｃｉｓ系膜形成方法
JP6213173B2 (ja) 2013-11-14 2017-10-18 東ソー株式会社 チタン酸化物膜の製造方法及びチタン酸化物膜

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0248103A (ja) * 1989-06-20 1990-02-16 Sumitomo Electric Ind Ltd 被覆超硬合金工具及びその製造法
JPH11264066A (ja) * 1998-03-16 1999-09-28 Hitachi Tool Eng Ltd 被覆硬質工具
JP2000117509A (ja) * 1998-10-14 2000-04-25 Mitsubishi Materials Corp 耐摩耗性の優れた表面被覆超硬合金製スローアウエイ切削チップ
JP2010105979A (ja) * 2008-10-31 2010-05-13 General Electric Co <Ge> 金属酸化物コーティング
JP2012233223A (ja) * 2011-04-28 2012-11-29 Waseda Univ 電気めっき組成物、および、電気めっき液
US20140178659A1 (en) * 2012-12-26 2014-06-26 Shanghua Wu Al2o3 or al2o3-contained multilayer coatings for silicon nitride cutting tools by physical vapor deposition and methods of making the same
JP2020006487A (ja) * 2018-07-10 2020-01-16 三菱マテリアル株式会社 硬質被覆層が優れた耐チッピング性を発揮する表面切削工具

Also Published As

Publication number Publication date
KR20250004329A (ko) 2025-01-07
CN119301313A (zh) 2025-01-10
TW202417242A (zh) 2024-05-01
WO2024029363A1 (ja) 2024-02-08
EP4567162A1 (en) 2025-06-11

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