JPWO2024014152A1 - - Google Patents
Info
- Publication number
- JPWO2024014152A1 JPWO2024014152A1 JP2024533553A JP2024533553A JPWO2024014152A1 JP WO2024014152 A1 JPWO2024014152 A1 JP WO2024014152A1 JP 2024533553 A JP2024533553 A JP 2024533553A JP 2024533553 A JP2024533553 A JP 2024533553A JP WO2024014152 A1 JPWO2024014152 A1 JP WO2024014152A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022111456 | 2022-07-11 | ||
| PCT/JP2023/020177 WO2024014152A1 (ja) | 2022-07-11 | 2023-05-30 | パターン基材の製造方法、硬化性組成物、及び部品の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2024014152A1 true JPWO2024014152A1 (https=) | 2024-01-18 |
| JPWO2024014152A5 JPWO2024014152A5 (https=) | 2025-03-24 |
Family
ID=89536602
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024533553A Pending JPWO2024014152A1 (https=) | 2022-07-11 | 2023-05-30 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2024014152A1 (https=) |
| TW (1) | TW202414117A (https=) |
| WO (1) | WO2024014152A1 (https=) |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007200422A (ja) * | 2006-01-25 | 2007-08-09 | Toshiba Corp | パタンド磁気記録媒体の製造方法 |
| JP2008221491A (ja) * | 2007-03-09 | 2008-09-25 | Dainippon Printing Co Ltd | ナノインプリント用モールドおよびその製造方法 |
| JP5393282B2 (ja) * | 2009-06-17 | 2014-01-22 | 東京応化工業株式会社 | ナノインプリント用組成物およびパターン形成方法 |
| JP5798466B2 (ja) * | 2010-12-27 | 2015-10-21 | Hoya株式会社 | レジスト現像剤、レジストパターンの形成方法及びモールドの製造方法 |
| JP6124459B2 (ja) * | 2011-08-04 | 2017-05-10 | Hoya株式会社 | レジスト現像液 |
| JP5846974B2 (ja) * | 2012-03-13 | 2016-01-20 | 富士フイルム株式会社 | 光インプリント用硬化性組成物、パターン形成方法およびパターン |
| JP2020111769A (ja) * | 2019-01-09 | 2020-07-27 | ウシオ電機株式会社 | 金属膜作成方法及びナノインプリンティング材 |
-
2023
- 2023-05-30 JP JP2024533553A patent/JPWO2024014152A1/ja active Pending
- 2023-05-30 WO PCT/JP2023/020177 patent/WO2024014152A1/ja not_active Ceased
- 2023-07-06 TW TW112125225A patent/TW202414117A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| TW202414117A (zh) | 2024-04-01 |
| WO2024014152A1 (ja) | 2024-01-18 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20241106 |