JPWO2023286586A1 - - Google Patents
Info
- Publication number
- JPWO2023286586A1 JPWO2023286586A1 JP2023535214A JP2023535214A JPWO2023286586A1 JP WO2023286586 A1 JPWO2023286586 A1 JP WO2023286586A1 JP 2023535214 A JP2023535214 A JP 2023535214A JP 2023535214 A JP2023535214 A JP 2023535214A JP WO2023286586 A1 JPWO2023286586 A1 JP WO2023286586A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021115277 | 2021-07-12 | ||
| PCT/JP2022/025662 WO2023286586A1 (ja) | 2021-07-12 | 2022-06-28 | パターン形成方法、電子デバイスの製造方法、感活性光線性又は感放射線性樹脂組成物、レジスト膜 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023286586A1 true JPWO2023286586A1 (https=) | 2023-01-19 |
| JPWO2023286586A5 JPWO2023286586A5 (https=) | 2024-04-09 |
Family
ID=84919989
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023535214A Pending JPWO2023286586A1 (https=) | 2021-07-12 | 2022-06-28 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2023286586A1 (https=) |
| TW (1) | TW202307568A (https=) |
| WO (1) | WO2023286586A1 (https=) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0973173A (ja) * | 1995-06-28 | 1997-03-18 | Fujitsu Ltd | レジスト材料及びレジストパターンの形成方法 |
| JP2011008237A (ja) * | 2009-05-26 | 2011-01-13 | Shin-Etsu Chemical Co Ltd | レジスト材料及びパターン形成方法 |
| JP2012128009A (ja) * | 2010-12-13 | 2012-07-05 | Jsr Corp | 感放射線性樹脂組成物及びレジストパターン形成方法 |
| JP2019139233A (ja) * | 2018-02-14 | 2019-08-22 | 住友化学株式会社 | 化合物、レジスト組成物及びレジストパターンの製造方法 |
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2022
- 2022-06-28 JP JP2023535214A patent/JPWO2023286586A1/ja active Pending
- 2022-06-28 WO PCT/JP2022/025662 patent/WO2023286586A1/ja not_active Ceased
- 2022-07-06 TW TW111125323A patent/TW202307568A/zh unknown
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0973173A (ja) * | 1995-06-28 | 1997-03-18 | Fujitsu Ltd | レジスト材料及びレジストパターンの形成方法 |
| JP2011008237A (ja) * | 2009-05-26 | 2011-01-13 | Shin-Etsu Chemical Co Ltd | レジスト材料及びパターン形成方法 |
| JP2012128009A (ja) * | 2010-12-13 | 2012-07-05 | Jsr Corp | 感放射線性樹脂組成物及びレジストパターン形成方法 |
| JP2019139233A (ja) * | 2018-02-14 | 2019-08-22 | 住友化学株式会社 | 化合物、レジスト組成物及びレジストパターンの製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2023286586A1 (ja) | 2023-01-19 |
| TW202307568A (zh) | 2023-02-16 |
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