JPWO2023286571A1 - - Google Patents
Info
- Publication number
- JPWO2023286571A1 JPWO2023286571A1 JP2023535210A JP2023535210A JPWO2023286571A1 JP WO2023286571 A1 JPWO2023286571 A1 JP WO2023286571A1 JP 2023535210 A JP2023535210 A JP 2023535210A JP 2023535210 A JP2023535210 A JP 2023535210A JP WO2023286571 A1 JPWO2023286571 A1 JP WO2023286571A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/18—Layered products comprising a layer of synthetic resin characterised by the use of special additives
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Laminated Bodies (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021117753 | 2021-07-16 | ||
| PCT/JP2022/025432 WO2023286571A1 (ja) | 2021-07-16 | 2022-06-27 | 樹脂組成物、硬化物、積層体、硬化物の製造方法、積層体の製造方法、半導体デバイスの製造方法、及び、半導体デバイス |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023286571A1 true JPWO2023286571A1 (https=) | 2023-01-19 |
| JPWO2023286571A5 JPWO2023286571A5 (https=) | 2024-04-11 |
Family
ID=84920034
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023535210A Pending JPWO2023286571A1 (https=) | 2021-07-16 | 2022-06-27 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPWO2023286571A1 (https=) |
| CN (1) | CN117642442A (https=) |
| TW (1) | TW202309117A (https=) |
| WO (1) | WO2023286571A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN120025574B (zh) * | 2025-04-22 | 2025-08-08 | 东华大学 | 一种热致产碱剂催化制备聚酰亚胺双向牵伸薄膜的方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002265531A (ja) * | 2001-03-13 | 2002-09-18 | Kunihiro Ichimura | 塩基増殖性不飽和化合物、塩基増殖性樹脂及び該樹脂を含む組成物 |
| JP2010254982A (ja) * | 2009-03-31 | 2010-11-11 | Dainippon Printing Co Ltd | 塩基発生剤、樹脂組成物、当該樹脂組成物からなるパターン形成用材料、当該樹脂組成物を用いたパターン形成方法並びに物品 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012176694A1 (ja) * | 2011-06-24 | 2012-12-27 | 東京応化工業株式会社 | ネガ型感光性樹脂組成物、パターン形成方法、硬化膜、絶縁膜、カラーフィルタ、及び表示装置 |
| TWI808143B (zh) * | 2018-03-29 | 2023-07-11 | 日商富士軟片股份有限公司 | 感光性樹脂組成物、硬化膜、積層體及它們的製造方法、半導體器件及用於該等之熱鹼產生劑 |
| JP7042353B2 (ja) * | 2018-09-10 | 2022-03-25 | 富士フイルム株式会社 | 感光性樹脂組成物、硬化膜、積層体、硬化膜の製造方法、および半導体デバイス |
| KR102527570B1 (ko) * | 2018-09-26 | 2023-05-02 | 후지필름 가부시키가이샤 | 경화성 조성물, 경화막, 패턴의 형성 방법, 광학 필터 및 광센서 |
| JP7237978B2 (ja) * | 2018-09-27 | 2023-03-13 | 富士フイルム株式会社 | 樹脂組成物、硬化膜、積層体、硬化膜の製造方法、および半導体デバイス |
| TWI851752B (zh) * | 2019-07-01 | 2024-08-11 | 日商富士軟片股份有限公司 | 硬化性樹脂組成物、硬化性樹脂組成物的製造方法、硬化膜、積層體、硬化膜的製造方法及半導體器件 |
-
2022
- 2022-06-27 JP JP2023535210A patent/JPWO2023286571A1/ja active Pending
- 2022-06-27 CN CN202280050004.3A patent/CN117642442A/zh active Pending
- 2022-06-27 WO PCT/JP2022/025432 patent/WO2023286571A1/ja not_active Ceased
- 2022-06-30 TW TW111124594A patent/TW202309117A/zh unknown
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002265531A (ja) * | 2001-03-13 | 2002-09-18 | Kunihiro Ichimura | 塩基増殖性不飽和化合物、塩基増殖性樹脂及び該樹脂を含む組成物 |
| JP2010254982A (ja) * | 2009-03-31 | 2010-11-11 | Dainippon Printing Co Ltd | 塩基発生剤、樹脂組成物、当該樹脂組成物からなるパターン形成用材料、当該樹脂組成物を用いたパターン形成方法並びに物品 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN117642442A (zh) | 2024-03-01 |
| WO2023286571A1 (ja) | 2023-01-19 |
| TW202309117A (zh) | 2023-03-01 |
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