CN117642442A - 树脂组合物、固化物、层叠体、固化物的制造方法、层叠体的制造方法、半导体器件的制造方法及半导体器件 - Google Patents

树脂组合物、固化物、层叠体、固化物的制造方法、层叠体的制造方法、半导体器件的制造方法及半导体器件 Download PDF

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Publication number
CN117642442A
CN117642442A CN202280050004.3A CN202280050004A CN117642442A CN 117642442 A CN117642442 A CN 117642442A CN 202280050004 A CN202280050004 A CN 202280050004A CN 117642442 A CN117642442 A CN 117642442A
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浅川大辅
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Fujifilm Corp
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Fujifilm Corp
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/18—Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Laminated Bodies (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
CN202280050004.3A 2021-07-16 2022-06-27 树脂组合物、固化物、层叠体、固化物的制造方法、层叠体的制造方法、半导体器件的制造方法及半导体器件 Pending CN117642442A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021117753 2021-07-16
JP2021-117753 2021-07-16
PCT/JP2022/025432 WO2023286571A1 (ja) 2021-07-16 2022-06-27 樹脂組成物、硬化物、積層体、硬化物の製造方法、積層体の製造方法、半導体デバイスの製造方法、及び、半導体デバイス

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CN117642442A true CN117642442A (zh) 2024-03-01

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JP (1) JPWO2023286571A1 (https=)
CN (1) CN117642442A (https=)
TW (1) TW202309117A (https=)
WO (1) WO2023286571A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN120025574A (zh) * 2025-04-22 2025-05-23 东华大学 一种热致产碱剂催化制备聚酰亚胺双向牵伸薄膜的方法

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002265531A (ja) * 2001-03-13 2002-09-18 Kunihiro Ichimura 塩基増殖性不飽和化合物、塩基増殖性樹脂及び該樹脂を含む組成物
JP2010254982A (ja) * 2009-03-31 2010-11-11 Dainippon Printing Co Ltd 塩基発生剤、樹脂組成物、当該樹脂組成物からなるパターン形成用材料、当該樹脂組成物を用いたパターン形成方法並びに物品
CN103797418A (zh) * 2011-06-24 2014-05-14 东京应化工业株式会社 一种负型感光性树脂组合物、图案形成方法、固化膜、绝缘膜、滤色器及显示装置
WO2020066871A1 (ja) * 2018-09-26 2020-04-02 富士フイルム株式会社 硬化性組成物、硬化膜、パターンの形成方法、光学フィルタおよび光センサ
CN111919172A (zh) * 2018-03-29 2020-11-10 富士胶片株式会社 感光性树脂组合物、固化膜、层叠体及它们的制造方法、半导体器件及在它们中使用的热产碱剂
WO2021002383A1 (ja) * 2019-07-01 2021-01-07 富士フイルム株式会社 硬化性樹脂組成物、硬化性樹脂組成物の製造方法、硬化膜、積層体、硬化膜の製造方法、及び、半導体デバイス
CN112513219A (zh) * 2018-09-10 2021-03-16 富士胶片株式会社 感光性树脂组合物、固化膜、层叠体、固化膜的制造方法及半导体器件
CN112752798A (zh) * 2018-09-27 2021-05-04 富士胶片株式会社 树脂组合物、固化膜、层叠体、固化膜的制造方法及半导体器件

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002265531A (ja) * 2001-03-13 2002-09-18 Kunihiro Ichimura 塩基増殖性不飽和化合物、塩基増殖性樹脂及び該樹脂を含む組成物
JP2010254982A (ja) * 2009-03-31 2010-11-11 Dainippon Printing Co Ltd 塩基発生剤、樹脂組成物、当該樹脂組成物からなるパターン形成用材料、当該樹脂組成物を用いたパターン形成方法並びに物品
CN103797418A (zh) * 2011-06-24 2014-05-14 东京应化工业株式会社 一种负型感光性树脂组合物、图案形成方法、固化膜、绝缘膜、滤色器及显示装置
CN111919172A (zh) * 2018-03-29 2020-11-10 富士胶片株式会社 感光性树脂组合物、固化膜、层叠体及它们的制造方法、半导体器件及在它们中使用的热产碱剂
CN112513219A (zh) * 2018-09-10 2021-03-16 富士胶片株式会社 感光性树脂组合物、固化膜、层叠体、固化膜的制造方法及半导体器件
WO2020066871A1 (ja) * 2018-09-26 2020-04-02 富士フイルム株式会社 硬化性組成物、硬化膜、パターンの形成方法、光学フィルタおよび光センサ
CN112752798A (zh) * 2018-09-27 2021-05-04 富士胶片株式会社 树脂组合物、固化膜、层叠体、固化膜的制造方法及半导体器件
WO2021002383A1 (ja) * 2019-07-01 2021-01-07 富士フイルム株式会社 硬化性樹脂組成物、硬化性樹脂組成物の製造方法、硬化膜、積層体、硬化膜の製造方法、及び、半導体デバイス

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN120025574A (zh) * 2025-04-22 2025-05-23 东华大学 一种热致产碱剂催化制备聚酰亚胺双向牵伸薄膜的方法

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