JPWO2023209815A1 - - Google Patents

Info

Publication number
JPWO2023209815A1
JPWO2023209815A1 JP2023542692A JP2023542692A JPWO2023209815A1 JP WO2023209815 A1 JPWO2023209815 A1 JP WO2023209815A1 JP 2023542692 A JP2023542692 A JP 2023542692A JP 2023542692 A JP2023542692 A JP 2023542692A JP WO2023209815 A1 JPWO2023209815 A1 JP WO2023209815A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023542692A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2023209815A1 publication Critical patent/JPWO2023209815A1/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Chemical Vapour Deposition (AREA)
JP2023542692A 2022-04-26 2022-04-26 Pending JPWO2023209815A1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2022/018929 WO2023209815A1 (ja) 2022-04-26 2022-04-26 基板処理装置及び基板処理方法

Publications (1)

Publication Number Publication Date
JPWO2023209815A1 true JPWO2023209815A1 (ja) 2023-11-02

Family

ID=88518232

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023542692A Pending JPWO2023209815A1 (ja) 2022-04-26 2022-04-26

Country Status (3)

Country Link
JP (1) JPWO2023209815A1 (ja)
CN (1) CN117321733A (ja)
WO (1) WO2023209815A1 (ja)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4467266B2 (ja) * 2003-08-13 2010-05-26 大日本スクリーン製造株式会社 基板加熱装置および基板加熱方法
JP4199213B2 (ja) * 2005-04-26 2008-12-17 株式会社東芝 基板処理方法
JP2008186934A (ja) * 2007-01-29 2008-08-14 Dainippon Screen Mfg Co Ltd 熱処理装置および熱処理方法
JP7208813B2 (ja) * 2019-02-08 2023-01-19 東京エレクトロン株式会社 基板処理装置及び基板処理方法
JP7413164B2 (ja) * 2020-06-26 2024-01-15 東京エレクトロン株式会社 熱処理ユニット、基板処理装置、熱処理方法、及び記憶媒体

Also Published As

Publication number Publication date
WO2023209815A1 (ja) 2023-11-02
CN117321733A (zh) 2023-12-29

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