JPWO2023190785A5 - - Google Patents
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- Publication number
- JPWO2023190785A5 JPWO2023190785A5 JP2024512743A JP2024512743A JPWO2023190785A5 JP WO2023190785 A5 JPWO2023190785 A5 JP WO2023190785A5 JP 2024512743 A JP2024512743 A JP 2024512743A JP 2024512743 A JP2024512743 A JP 2024512743A JP WO2023190785 A5 JPWO2023190785 A5 JP WO2023190785A5
- Authority
- JP
- Japan
- Prior art keywords
- flow path
- thermocouple
- structure according
- path structure
- metal wiring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022054387 | 2022-03-29 | ||
| JP2022054387 | 2022-03-29 | ||
| PCT/JP2023/013013 WO2023190785A1 (ja) | 2022-03-29 | 2023-03-29 | 流路構造体および半導体製造装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2023190785A1 JPWO2023190785A1 (https=) | 2023-10-05 |
| JPWO2023190785A5 true JPWO2023190785A5 (https=) | 2024-12-03 |
| JP7764582B2 JP7764582B2 (ja) | 2025-11-05 |
Family
ID=88202641
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024512743A Active JP7764582B2 (ja) | 2022-03-29 | 2023-03-29 | 流路構造体および半導体製造装置 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20250146884A1 (https=) |
| JP (1) | JP7764582B2 (https=) |
| KR (1) | KR20240141336A (https=) |
| WO (1) | WO2023190785A1 (https=) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4260404B2 (ja) * | 2001-02-09 | 2009-04-30 | 東京エレクトロン株式会社 | 成膜装置 |
| JP6500841B2 (ja) * | 2016-05-25 | 2019-04-17 | 株式会社デンソー | 熱流測定装置 |
| TWI815813B (zh) * | 2017-08-04 | 2023-09-21 | 荷蘭商Asm智慧財產控股公司 | 用於分配反應腔內氣體的噴頭總成 |
| JP7278035B2 (ja) * | 2018-06-20 | 2023-05-19 | 新光電気工業株式会社 | 静電チャック、基板固定装置 |
| JP7458808B2 (ja) | 2020-02-07 | 2024-04-01 | 東京エレクトロン株式会社 | プロセス推定システム、プロセスデータ推定方法及びプログラム |
| JP2021176192A (ja) * | 2020-04-22 | 2021-11-04 | 京セラ株式会社 | 流路構造体および半導体製造装置 |
-
2023
- 2023-03-29 KR KR1020247030514A patent/KR20240141336A/ko active Pending
- 2023-03-29 US US18/850,358 patent/US20250146884A1/en active Pending
- 2023-03-29 JP JP2024512743A patent/JP7764582B2/ja active Active
- 2023-03-29 WO PCT/JP2023/013013 patent/WO2023190785A1/ja not_active Ceased
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