JPWO2023053171A1 - - Google Patents

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Publication number
JPWO2023053171A1
JPWO2023053171A1 JP2023550761A JP2023550761A JPWO2023053171A1 JP WO2023053171 A1 JPWO2023053171 A1 JP WO2023053171A1 JP 2023550761 A JP2023550761 A JP 2023550761A JP 2023550761 A JP2023550761 A JP 2023550761A JP WO2023053171 A1 JPWO2023053171 A1 JP WO2023053171A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2023550761A
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Japanese (ja)
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JP7512567B2 (ja
JPWO2023053171A5 (enrdf_load_stackoverflow
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Publication of JPWO2023053171A1 publication Critical patent/JPWO2023053171A1/ja
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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Treatment Of Fiber Materials (AREA)
JP2023550761A 2021-09-28 2021-09-28 プラズマ処理装置 Active JP7512567B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2021/035547 WO2023053171A1 (ja) 2021-09-28 2021-09-28 プラズマ処理装置

Publications (3)

Publication Number Publication Date
JPWO2023053171A1 true JPWO2023053171A1 (enrdf_load_stackoverflow) 2023-04-06
JPWO2023053171A5 JPWO2023053171A5 (enrdf_load_stackoverflow) 2023-12-15
JP7512567B2 JP7512567B2 (ja) 2024-07-09

Family

ID=85781464

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023550761A Active JP7512567B2 (ja) 2021-09-28 2021-09-28 プラズマ処理装置

Country Status (4)

Country Link
JP (1) JP7512567B2 (enrdf_load_stackoverflow)
CN (1) CN117204124A (enrdf_load_stackoverflow)
TW (1) TWI834148B (enrdf_load_stackoverflow)
WO (1) WO2023053171A1 (enrdf_load_stackoverflow)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4801839A (en) * 1986-12-08 1989-01-31 Applied Electron Corporation Mounting of a cold cathode directly to a vacuum chamber wall
JPH0220325U (enrdf_load_stackoverflow) * 1988-07-25 1990-02-09
JP2008028087A (ja) * 2006-07-20 2008-02-07 Nisshinbo Ind Inc プラズマエッチング電極
JP2010248548A (ja) * 2009-04-13 2010-11-04 Shinmaywa Industries Ltd ホローカソード型放電管
JP2012054377A (ja) * 2010-09-01 2012-03-15 Toray Ind Inc プラズマｃｖｄ装置
JP2015086471A (ja) * 2013-10-28 2015-05-07 ベイパー テクノロジーズ、インコーポレイテッド 低圧アーク・プラズマ浸漬被膜気相堆積及びイオン処理

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2705190B2 (ja) * 1989-02-16 1998-01-26 富士通株式会社 ドライエッチング装置
JP2001135626A (ja) * 1999-11-02 2001-05-18 Hitachi Kokusai Electric Inc プラズマｃｖｄ装置及びプラズマｃｖｄ膜形成方法
KR101046335B1 (ko) * 2008-07-29 2011-07-05 피에스케이 주식회사 할로우 캐소드 플라즈마 발생방법 및 할로우 캐소드플라즈마를 이용한 대면적 기판 처리방법
JP6745643B2 (ja) * 2016-05-17 2020-08-26 東京エレクトロン株式会社 プラズマ処理装置およびプラズマ処理方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4801839A (en) * 1986-12-08 1989-01-31 Applied Electron Corporation Mounting of a cold cathode directly to a vacuum chamber wall
JPH0220325U (enrdf_load_stackoverflow) * 1988-07-25 1990-02-09
JP2008028087A (ja) * 2006-07-20 2008-02-07 Nisshinbo Ind Inc プラズマエッチング電極
JP2010248548A (ja) * 2009-04-13 2010-11-04 Shinmaywa Industries Ltd ホローカソード型放電管
JP2012054377A (ja) * 2010-09-01 2012-03-15 Toray Ind Inc プラズマｃｖｄ装置
JP2015086471A (ja) * 2013-10-28 2015-05-07 ベイパー テクノロジーズ、インコーポレイテッド 低圧アーク・プラズマ浸漬被膜気相堆積及びイオン処理

Also Published As

Publication number Publication date
CN117204124A (zh) 2023-12-08
WO2023053171A1 (ja) 2023-04-06
TWI834148B (zh) 2024-03-01
JP7512567B2 (ja) 2024-07-09
TW202315464A (zh) 2023-04-01

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