CN117204124A - 等离子体处理装置 - Google Patents
等离子体处理装置 Download PDFInfo
- Publication number
- CN117204124A CN117204124A CN202180097632.2A CN202180097632A CN117204124A CN 117204124 A CN117204124 A CN 117204124A CN 202180097632 A CN202180097632 A CN 202180097632A CN 117204124 A CN117204124 A CN 117204124A
- Authority
- CN
- China
- Prior art keywords
- cathode electrode
- hollow cathode
- processing apparatus
- plasma processing
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000012545 processing Methods 0.000 title claims abstract description 49
- 238000001816 cooling Methods 0.000 claims description 38
- 239000004020 conductor Substances 0.000 claims description 3
- 238000012986 modification Methods 0.000 description 6
- 230000004048 modification Effects 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- 238000003780 insertion Methods 0.000 description 4
- 230000037431 insertion Effects 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 4
- 238000009832 plasma treatment Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 238000005057 refrigeration Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Vapour Deposition (AREA)
- Plasma Technology (AREA)
- Treatment Of Fiber Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2021/035547 WO2023053171A1 (ja) | 2021-09-28 | 2021-09-28 | プラズマ処理装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN117204124A true CN117204124A (zh) | 2023-12-08 |
Family
ID=85781464
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202180097632.2A Pending CN117204124A (zh) | 2021-09-28 | 2021-09-28 | 等离子体处理装置 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP7512567B2 (enrdf_load_stackoverflow) |
| CN (1) | CN117204124A (enrdf_load_stackoverflow) |
| TW (1) | TWI834148B (enrdf_load_stackoverflow) |
| WO (1) | WO2023053171A1 (enrdf_load_stackoverflow) |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4801839A (en) * | 1986-12-08 | 1989-01-31 | Applied Electron Corporation | Mounting of a cold cathode directly to a vacuum chamber wall |
| JPH0648826Y2 (ja) * | 1988-07-25 | 1994-12-12 | 三井東圧化学株式会社 | 着脱式の放電電極 |
| JP2705190B2 (ja) * | 1989-02-16 | 1998-01-26 | 富士通株式会社 | ドライエッチング装置 |
| JP2001135626A (ja) * | 1999-11-02 | 2001-05-18 | Hitachi Kokusai Electric Inc | プラズマｃｖｄ装置及びプラズマｃｖｄ膜形成方法 |
| JP2008028087A (ja) * | 2006-07-20 | 2008-02-07 | Nisshinbo Ind Inc | プラズマエッチング電極 |
| KR101046335B1 (ko) * | 2008-07-29 | 2011-07-05 | 피에스케이 주식회사 | 할로우 캐소드 플라즈마 발생방법 및 할로우 캐소드플라즈마를 이용한 대면적 기판 처리방법 |
| JP5227239B2 (ja) | 2009-04-13 | 2013-07-03 | 新明和工業株式会社 | ホローカソード型放電管 |
| JP5614180B2 (ja) * | 2010-09-01 | 2014-10-29 | 東レ株式会社 | プラズマｃｖｄ装置 |
| CA2867451C (en) * | 2013-10-28 | 2021-06-29 | Vapor Technologies, Inc. | Low pressure arc plasma immersion coating vapor deposition and ion treatment |
| JP6745643B2 (ja) * | 2016-05-17 | 2020-08-26 | 東京エレクトロン株式会社 | プラズマ処理装置およびプラズマ処理方法 |
-
2021
- 2021-09-28 CN CN202180097632.2A patent/CN117204124A/zh active Pending
- 2021-09-28 WO PCT/JP2021/035547 patent/WO2023053171A1/ja active Application Filing
- 2021-09-28 JP JP2023550761A patent/JP7512567B2/ja active Active
-
2022
- 2022-04-13 TW TW111114018A patent/TWI834148B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2023053171A1 (enrdf_load_stackoverflow) | 2023-04-06 |
| WO2023053171A1 (ja) | 2023-04-06 |
| TWI834148B (zh) | 2024-03-01 |
| JP7512567B2 (ja) | 2024-07-09 |
| TW202315464A (zh) | 2023-04-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |