JPWO2023047948A1 - - Google Patents

Info

Publication number
JPWO2023047948A1
JPWO2023047948A1 JP2022554259A JP2022554259A JPWO2023047948A1 JP WO2023047948 A1 JPWO2023047948 A1 JP WO2023047948A1 JP 2022554259 A JP2022554259 A JP 2022554259A JP 2022554259 A JP2022554259 A JP 2022554259A JP WO2023047948 A1 JPWO2023047948 A1 JP WO2023047948A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022554259A
Other languages
Japanese (ja)
Other versions
JPWO2023047948A5 (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2022179820A priority Critical patent/JP2023047351A/ja
Publication of JPWO2023047948A1 publication Critical patent/JPWO2023047948A1/ja
Publication of JPWO2023047948A5 publication Critical patent/JPWO2023047948A5/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Glass (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Physical Vapour Deposition (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
JP2022554259A 2021-09-24 2022-09-06 Pending JPWO2023047948A1 (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2022179820A JP2023047351A (ja) 2021-09-24 2022-11-09 光学製品及び光学製品の製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021155902 2021-09-24
PCT/JP2022/033453 WO2023047948A1 (ja) 2021-09-24 2022-09-06 光学製品及び光学製品の製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2022179820A Division JP2023047351A (ja) 2021-09-24 2022-11-09 光学製品及び光学製品の製造方法

Publications (2)

Publication Number Publication Date
JPWO2023047948A1 true JPWO2023047948A1 (enrdf_load_stackoverflow) 2023-03-30
JPWO2023047948A5 JPWO2023047948A5 (enrdf_load_stackoverflow) 2023-08-29

Family

ID=85720606

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2022554259A Pending JPWO2023047948A1 (enrdf_load_stackoverflow) 2021-09-24 2022-09-06
JP2022179820A Pending JP2023047351A (ja) 2021-09-24 2022-11-09 光学製品及び光学製品の製造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2022179820A Pending JP2023047351A (ja) 2021-09-24 2022-11-09 光学製品及び光学製品の製造方法

Country Status (3)

Country Link
JP (2) JPWO2023047948A1 (enrdf_load_stackoverflow)
TW (1) TW202323019A (enrdf_load_stackoverflow)
WO (1) WO2023047948A1 (enrdf_load_stackoverflow)

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009186670A (ja) * 2008-02-05 2009-08-20 Olympus Corp 反射防止膜
JP2012185495A (ja) * 2011-02-15 2012-09-27 Canon Inc 光学用部材、その製造方法及びそれを用いた光学系
JP2012198330A (ja) * 2011-03-18 2012-10-18 Fujifilm Corp 光学部材及びその製造方法
JP2014029476A (ja) * 2012-07-04 2014-02-13 Canon Inc 構造体、光学部材、反射防止膜、撥水性膜、質量分析用基板、位相板、構造体の製造方法、及び反射防止膜の製造方法
JP2014035475A (ja) * 2012-08-09 2014-02-24 Canon Inc 光学部材および光学部材の製造方法
WO2015011786A1 (ja) * 2013-07-23 2015-01-29 日立マクセル株式会社 ナノ粒子薄膜を有する光学部品、及びこれを用いた光学応用装置
JP2015059977A (ja) * 2013-09-17 2015-03-30 富士フイルム株式会社 透明微細凹凸構造体の製造方法
WO2016159290A1 (ja) * 2015-03-31 2016-10-06 富士フイルム株式会社 反射防止膜及びその製造方法
JP2019061137A (ja) * 2017-09-27 2019-04-18 キヤノン株式会社 光学素子、光学機器、光学素子の製造方法および塗料
WO2019225518A1 (ja) * 2018-05-22 2019-11-28 富士フイルム株式会社 凹凸構造付き基体の製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5027347B2 (ja) * 2010-04-28 2012-09-19 シャープ株式会社 型および型の製造方法
JP7532020B2 (ja) * 2018-09-28 2024-08-13 浜松ホトニクス株式会社 テラヘルツ波用光学素子及びその製造方法

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009186670A (ja) * 2008-02-05 2009-08-20 Olympus Corp 反射防止膜
JP2012185495A (ja) * 2011-02-15 2012-09-27 Canon Inc 光学用部材、その製造方法及びそれを用いた光学系
JP2012198330A (ja) * 2011-03-18 2012-10-18 Fujifilm Corp 光学部材及びその製造方法
JP2014029476A (ja) * 2012-07-04 2014-02-13 Canon Inc 構造体、光学部材、反射防止膜、撥水性膜、質量分析用基板、位相板、構造体の製造方法、及び反射防止膜の製造方法
JP2014035475A (ja) * 2012-08-09 2014-02-24 Canon Inc 光学部材および光学部材の製造方法
WO2015011786A1 (ja) * 2013-07-23 2015-01-29 日立マクセル株式会社 ナノ粒子薄膜を有する光学部品、及びこれを用いた光学応用装置
JP2015059977A (ja) * 2013-09-17 2015-03-30 富士フイルム株式会社 透明微細凹凸構造体の製造方法
WO2016159290A1 (ja) * 2015-03-31 2016-10-06 富士フイルム株式会社 反射防止膜及びその製造方法
JP2019061137A (ja) * 2017-09-27 2019-04-18 キヤノン株式会社 光学素子、光学機器、光学素子の製造方法および塗料
WO2019225518A1 (ja) * 2018-05-22 2019-11-28 富士フイルム株式会社 凹凸構造付き基体の製造方法

Also Published As

Publication number Publication date
JP2023047351A (ja) 2023-04-05
TW202323019A (zh) 2023-06-16
WO2023047948A1 (ja) 2023-03-30

Similar Documents

Publication Publication Date Title
BR112023005462A2 (enrdf_load_stackoverflow)
BR112023012656A2 (enrdf_load_stackoverflow)
BR112021014123A2 (enrdf_load_stackoverflow)
BR112023009656A2 (enrdf_load_stackoverflow)
BR112022009896A2 (enrdf_load_stackoverflow)
BR112023008622A2 (enrdf_load_stackoverflow)
BR112022024743A2 (enrdf_load_stackoverflow)
BR112022026905A2 (enrdf_load_stackoverflow)
BR112023011738A2 (enrdf_load_stackoverflow)
BR112023004146A2 (enrdf_load_stackoverflow)
BR112023006729A2 (enrdf_load_stackoverflow)
BR102021018859A2 (enrdf_load_stackoverflow)
BR102021015500A2 (enrdf_load_stackoverflow)
BR112021017747A2 (enrdf_load_stackoverflow)
BR102021007058A2 (enrdf_load_stackoverflow)
BR102020022030A2 (enrdf_load_stackoverflow)
BR112023016292A2 (enrdf_load_stackoverflow)
BR112023011539A2 (enrdf_load_stackoverflow)
BR112023011610A2 (enrdf_load_stackoverflow)
BR112023008976A2 (enrdf_load_stackoverflow)
BR102021020147A2 (enrdf_load_stackoverflow)
BR102021018926A2 (enrdf_load_stackoverflow)
BR102021018167A2 (enrdf_load_stackoverflow)
BR102021017576A2 (enrdf_load_stackoverflow)
BR102021016837A2 (enrdf_load_stackoverflow)

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20220909

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20220909

A871 Explanation of circumstances concerning accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A871

Effective date: 20220909

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20221011

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20221109

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20221129