JPWO2023032923A1 - - Google Patents

Info

Publication number
JPWO2023032923A1
JPWO2023032923A1 JP2023545564A JP2023545564A JPWO2023032923A1 JP WO2023032923 A1 JPWO2023032923 A1 JP WO2023032923A1 JP 2023545564 A JP2023545564 A JP 2023545564A JP 2023545564 A JP2023545564 A JP 2023545564A JP WO2023032923 A1 JPWO2023032923 A1 JP WO2023032923A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023545564A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2023032923A1 publication Critical patent/JPWO2023032923A1/ja
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/075Silicon-containing compounds
    • G03F7/0755Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/12Mountings, e.g. non-detachable insulating substrates
    • H01L23/14Mountings, e.g. non-detachable insulating substrates characterised by the material or its electrical properties
    • H01L23/145Organic substrates, e.g. plastic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/562Protection against mechanical damage
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/35Mechanical effects
    • H01L2924/351Thermal stress
    • H01L2924/3511Warping

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Silicon Polymers (AREA)
  • Materials Engineering (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Laminated Bodies (AREA)
JP2023545564A 2021-09-06 2022-08-29 Pending JPWO2023032923A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021144611 2021-09-06
PCT/JP2022/032438 WO2023032923A1 (ja) 2021-09-06 2022-08-29 半導体用の膜を形成するための組成物、積層体及び基板積層体

Publications (1)

Publication Number Publication Date
JPWO2023032923A1 true JPWO2023032923A1 (ja) 2023-03-09

Family

ID=85412775

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023545564A Pending JPWO2023032923A1 (ja) 2021-09-06 2022-08-29

Country Status (6)

Country Link
EP (1) EP4391024A1 (ja)
JP (1) JPWO2023032923A1 (ja)
KR (1) KR20240050367A (ja)
CN (1) CN117941037A (ja)
TW (1) TW202323491A (ja)
WO (1) WO2023032923A1 (ja)

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4933120B1 (ja) 1968-06-21 1974-09-04
JPH04132258A (ja) 1990-09-25 1992-05-06 Nec Corp 半導体基板の接続体およびその接続方法
EP0534304A1 (de) 1991-09-21 1993-03-31 Hoechst Aktiengesellschaft Cycloalkylierte Polyethyleniminderivate und ihre Verwendung als Hypolipidämika
JPH0940931A (ja) * 1995-08-02 1997-02-10 Hitachi Chem Co Ltd 耐熱性接着剤及び半導体装置
JP5201048B2 (ja) 2009-03-25 2013-06-05 富士通株式会社 半導体装置とその製造方法
JP4699565B2 (ja) 2009-05-29 2011-06-15 三井化学株式会社 半導体用シール組成物、半導体装置および半導体装置の製造方法
JP2012123958A (ja) 2010-12-07 2012-06-28 Panasonic Corp 導光板及び照明装置
JP2012216836A (ja) * 2011-03-31 2012-11-08 Mitsubishi Chemicals Corp 三次元集積回路積層体
JP2016047895A (ja) 2014-08-28 2016-04-07 株式会社ダイセル 半導体用接着剤組成物
US10759964B2 (en) * 2015-11-16 2020-09-01 Mitsui Chemicals, Inc. Semiconductor film composition, method of manufacturing semiconductor film composition, method of manufacturing semiconductor member, method of manufacturing semiconductor processing material, and semiconductor device
JP7351637B2 (ja) * 2018-05-29 2023-09-27 旭化成株式会社 樹脂組成物、及び硬化膜の製造方法
JP7162679B2 (ja) * 2018-10-26 2022-10-28 三井化学株式会社 基板積層体の製造方法及び積層体
JP2020095111A (ja) * 2018-12-11 2020-06-18 日立化成株式会社 感光性樹脂組成物、並びにこれを用いた半導体用配線層及び半導体基板

Also Published As

Publication number Publication date
CN117941037A (zh) 2024-04-26
EP4391024A1 (en) 2024-06-26
WO2023032923A1 (ja) 2023-03-09
KR20240050367A (ko) 2024-04-18
TW202323491A (zh) 2023-06-16

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Legal Events

Date Code Title Description
A621 Written request for application examination

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Effective date: 20240105