JPWO2023032193A1 - - Google Patents

Info

Publication number
JPWO2023032193A1
JPWO2023032193A1 JP2023544969A JP2023544969A JPWO2023032193A1 JP WO2023032193 A1 JPWO2023032193 A1 JP WO2023032193A1 JP 2023544969 A JP2023544969 A JP 2023544969A JP 2023544969 A JP2023544969 A JP 2023544969A JP WO2023032193 A1 JPWO2023032193 A1 JP WO2023032193A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023544969A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2023032193A1 publication Critical patent/JPWO2023032193A1/ja
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/40Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
    • G11C11/401Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells
    • G11C11/4063Auxiliary circuits, e.g. for addressing, decoding, driving, writing, sensing or timing
    • G11C11/407Auxiliary circuits, e.g. for addressing, decoding, driving, writing, sensing or timing for memory cells of the field-effect type
    • G11C11/409Read-write [R-W] circuits 
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/7841Field effect transistors with field effect produced by an insulated gate with floating body, e.g. programmable transistors
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/39Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using thyristors or the avalanche or negative resistance type, e.g. PNPN, SCR, SCS, UJT
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L24/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B12/00Dynamic random access memory [DRAM] devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B12/00Dynamic random access memory [DRAM] devices
    • H10B12/30DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
    • H10B12/33DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells the capacitor extending under the transistor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L28/00Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
    • H01L28/40Capacitors
    • H01L28/60Electrodes
    • H01L28/82Electrodes with an enlarged surface, e.g. formed by texturisation
    • H01L28/90Electrodes with an enlarged surface, e.g. formed by texturisation having vertical extensions
JP2023544969A 2021-09-06 2021-09-06 Pending JPWO2023032193A1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2021/032628 WO2023032193A1 (ja) 2021-09-06 2021-09-06 半導体素子を用いたメモリ装置

Publications (1)

Publication Number Publication Date
JPWO2023032193A1 true JPWO2023032193A1 (ja) 2023-03-09

Family

ID=85385253

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023544969A Pending JPWO2023032193A1 (ja) 2021-09-06 2021-09-06

Country Status (6)

Country Link
US (1) US11798616B2 (ja)
JP (1) JPWO2023032193A1 (ja)
KR (1) KR20240049600A (ja)
CN (1) CN117918063A (ja)
TW (1) TWI824701B (ja)
WO (1) WO2023032193A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20220392900A1 (en) * 2021-03-29 2022-12-08 Unisantis Electronics Singapore Pte. Ltd. Memory device using semiconductor element and method for manufacturing the same

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4064607B2 (ja) 2000-09-08 2008-03-19 株式会社東芝 半導体メモリ装置
US7969808B2 (en) * 2007-07-20 2011-06-28 Samsung Electronics Co., Ltd. Memory cell structures, memory arrays, memory devices, memory controllers, and memory systems, and methods of manufacturing and operating the same
JP2009212279A (ja) * 2008-03-04 2009-09-17 Sony Corp 半導体装置
US8213226B2 (en) * 2008-12-05 2012-07-03 Micron Technology, Inc. Vertical transistor memory cell and array
CN107845649A (zh) * 2016-09-20 2018-03-27 松下知识产权经营株式会社 摄像装置及其制造方法
JP2019161042A (ja) * 2018-03-14 2019-09-19 東芝メモリ株式会社 半導体装置
JP2020035913A (ja) * 2018-08-30 2020-03-05 キオクシア株式会社 半導体記憶装置
JP7369471B2 (ja) * 2019-07-11 2023-10-26 ユニサンティス エレクトロニクス シンガポール プライベート リミテッド 柱状半導体装置と、その製造方法

Also Published As

Publication number Publication date
US11798616B2 (en) 2023-10-24
WO2023032193A1 (ja) 2023-03-09
TWI824701B (zh) 2023-12-01
CN117918063A (zh) 2024-04-23
TW202327048A (zh) 2023-07-01
KR20240049600A (ko) 2024-04-16
US20230077140A1 (en) 2023-03-09

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Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20230412