JPWO2023026724A1 - - Google Patents
Info
- Publication number
- JPWO2023026724A1 JPWO2023026724A1 JP2022544692A JP2022544692A JPWO2023026724A1 JP WO2023026724 A1 JPWO2023026724 A1 JP WO2023026724A1 JP 2022544692 A JP2022544692 A JP 2022544692A JP 2022544692 A JP2022544692 A JP 2022544692A JP WO2023026724 A1 JPWO2023026724 A1 JP WO2023026724A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
- G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021136046 | 2021-08-24 | ||
| PCT/JP2022/028164 WO2023026724A1 (ja) | 2021-08-24 | 2022-07-20 | 感光性樹脂印刷版原版 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023026724A1 true JPWO2023026724A1 (https=) | 2023-03-02 |
| JPWO2023026724A5 JPWO2023026724A5 (https=) | 2025-04-24 |
Family
ID=85323002
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022544692A Pending JPWO2023026724A1 (https=) | 2021-08-24 | 2022-07-20 |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP4394511A4 (https=) |
| JP (1) | JPWO2023026724A1 (https=) |
| CN (1) | CN117716294A (https=) |
| WO (1) | WO2023026724A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2025204111A1 (ja) * | 2024-03-28 | 2025-10-02 | 東洋紡エムシー株式会社 | 感光性印刷原版および感光性凸版印刷版の製造方法 |
| JP7713181B1 (ja) * | 2024-03-28 | 2025-07-25 | 東洋紡エムシー株式会社 | 感光性印刷原版および感光性凸版印刷版の製造方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015176066A (ja) * | 2014-03-17 | 2015-10-05 | 東レ株式会社 | 感光性樹脂印刷版原版 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003035954A (ja) * | 2001-07-23 | 2003-02-07 | Toyobo Co Ltd | 感光性印刷用原版 |
| JP5334996B2 (ja) * | 2008-12-18 | 2013-11-06 | 旭化成イーマテリアルズ株式会社 | アブレーション層、感光性樹脂構成体、当該感光性樹脂構成体を用いた凸版印刷版の製造方法 |
| JP5691274B2 (ja) * | 2010-07-16 | 2015-04-01 | 東レ株式会社 | 感光性樹脂印刷版原版 |
| JP2014119594A (ja) * | 2012-12-17 | 2014-06-30 | Jsr Corp | 赤外線アブレーション層を有するフレキソ印刷版用感光性樹脂積層体 |
| JP6274327B2 (ja) | 2015-09-03 | 2018-02-07 | 東レ株式会社 | 感光性樹脂印刷版原版および印刷版の製造方法 |
| JP6768217B2 (ja) | 2015-09-28 | 2020-10-14 | 東洋紡株式会社 | 感光性凸版印刷原版 |
| EP4019254A4 (en) * | 2019-08-23 | 2023-04-19 | Toyobo Co., Ltd. | ORIGINAL FLEXOGRAPHIC PRINTING PLATE |
-
2022
- 2022-07-20 EP EP22861015.0A patent/EP4394511A4/en active Pending
- 2022-07-20 JP JP2022544692A patent/JPWO2023026724A1/ja active Pending
- 2022-07-20 WO PCT/JP2022/028164 patent/WO2023026724A1/ja not_active Ceased
- 2022-07-20 CN CN202280051379.1A patent/CN117716294A/zh active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015176066A (ja) * | 2014-03-17 | 2015-10-05 | 東レ株式会社 | 感光性樹脂印刷版原版 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN117716294A (zh) | 2024-03-15 |
| EP4394511A1 (en) | 2024-07-03 |
| WO2023026724A1 (ja) | 2023-03-02 |
| EP4394511A4 (en) | 2025-11-12 |
Similar Documents
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