JPWO2023008054A1 - - Google Patents
Info
- Publication number
- JPWO2023008054A1 JPWO2023008054A1 JP2023538356A JP2023538356A JPWO2023008054A1 JP WO2023008054 A1 JPWO2023008054 A1 JP WO2023008054A1 JP 2023538356 A JP2023538356 A JP 2023538356A JP 2023538356 A JP2023538356 A JP 2023538356A JP WO2023008054 A1 JPWO2023008054 A1 JP WO2023008054A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/36—Carbides
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021125364 | 2021-07-30 | ||
PCT/JP2022/025747 WO2023008054A1 (ja) | 2021-07-30 | 2022-06-28 | 炭化珪素基板 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2023008054A1 true JPWO2023008054A1 (ja) | 2023-02-02 |
JPWO2023008054A5 JPWO2023008054A5 (ja) | 2024-04-22 |
Family
ID=85087897
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2023538356A Pending JPWO2023008054A1 (ja) | 2021-07-30 | 2022-06-28 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPWO2023008054A1 (ja) |
WO (1) | WO2023008054A1 (ja) |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103614779B (zh) * | 2013-11-28 | 2016-03-16 | 中国电子科技集团公司第五十五研究所 | 一种提高碳化硅外延片片内n型掺杂浓度均匀性的方法 |
JP2017055086A (ja) * | 2015-09-11 | 2017-03-16 | 昭和電工株式会社 | SiCエピタキシャルウェハの製造方法及びSiCエピタキシャルウェハの製造装置 |
JP6624868B2 (ja) * | 2015-09-29 | 2019-12-25 | 昭和電工株式会社 | p型低抵抗率炭化珪素単結晶基板 |
JP6678437B2 (ja) * | 2015-11-26 | 2020-04-08 | 昭和電工株式会社 | SiC単結晶インゴットの製造方法及びSiC単結晶インゴット並びにSiC単結晶ウェハ |
JP6852605B2 (ja) * | 2017-07-13 | 2021-03-31 | 日立金属株式会社 | 炭化ケイ素積層基板およびその製造方法 |
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2022
- 2022-06-28 JP JP2023538356A patent/JPWO2023008054A1/ja active Pending
- 2022-06-28 WO PCT/JP2022/025747 patent/WO2023008054A1/ja active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2023008054A1 (ja) | 2023-02-02 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20240118 |