JPWO2022255402A5 - - Google Patents
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- Publication number
- JPWO2022255402A5 JPWO2022255402A5 JP2023525887A JP2023525887A JPWO2022255402A5 JP WO2022255402 A5 JPWO2022255402 A5 JP WO2022255402A5 JP 2023525887 A JP2023525887 A JP 2023525887A JP 2023525887 A JP2023525887 A JP 2023525887A JP WO2022255402 A5 JPWO2022255402 A5 JP WO2022255402A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- substituent
- formula
- independently
- aromatic hydrocarbon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 125000001424 substituent group Chemical group 0.000 claims 30
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims 24
- 125000004432 carbon atom Chemical group C* 0.000 claims 19
- 150000001491 aromatic compounds Chemical class 0.000 claims 13
- 238000000034 method Methods 0.000 claims 13
- 239000000203 mixture Substances 0.000 claims 12
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 11
- 239000010410 layer Substances 0.000 claims 11
- 239000012044 organic layer Substances 0.000 claims 9
- 125000005843 halogen group Chemical group 0.000 claims 8
- 239000000463 material Substances 0.000 claims 7
- 125000002252 acyl group Chemical group 0.000 claims 6
- 125000003342 alkenyl group Chemical group 0.000 claims 6
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims 6
- 125000000217 alkyl group Chemical group 0.000 claims 6
- 125000003710 aryl alkyl group Chemical group 0.000 claims 6
- 125000004104 aryloxy group Chemical group 0.000 claims 6
- 125000001188 haloalkyl group Chemical group 0.000 claims 6
- 238000004519 manufacturing process Methods 0.000 claims 6
- 125000004469 siloxy group Chemical group [SiH3]O* 0.000 claims 6
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims 6
- 239000010408 film Substances 0.000 claims 5
- 125000006615 aromatic heterocyclic group Chemical group 0.000 claims 4
- 229910052799 carbon Inorganic materials 0.000 claims 4
- 150000001875 compounds Chemical class 0.000 claims 4
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 4
- 125000003545 alkoxy group Chemical group 0.000 claims 3
- 125000004414 alkyl thio group Chemical group 0.000 claims 3
- 125000000304 alkynyl group Chemical group 0.000 claims 3
- 125000005110 aryl thio group Chemical group 0.000 claims 3
- 239000002904 solvent Substances 0.000 claims 3
- 125000001989 1,3-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([H])C([*:2])=C1[H] 0.000 claims 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 2
- 125000004429 atom Chemical group 0.000 claims 2
- 150000001721 carbon Chemical group 0.000 claims 2
- 229910052805 deuterium Inorganic materials 0.000 claims 2
- 125000004431 deuterium atom Chemical group 0.000 claims 2
- 229910052739 hydrogen Inorganic materials 0.000 claims 2
- 239000001257 hydrogen Substances 0.000 claims 2
- 125000003158 alcohol group Chemical group 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- 239000011254 layer-forming composition Substances 0.000 claims 1
- 239000003960 organic solvent Substances 0.000 claims 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 1
- 239000010409 thin film Substances 0.000 claims 1
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021094593 | 2021-06-04 | ||
JP2021148727 | 2021-09-13 | ||
PCT/JP2022/022279 WO2022255402A1 (ja) | 2021-06-04 | 2022-06-01 | 芳香族化合物及び有機電界発光素子 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2022255402A1 JPWO2022255402A1 (zh) | 2022-12-08 |
JPWO2022255402A5 true JPWO2022255402A5 (zh) | 2024-03-06 |
Family
ID=84323461
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2023525887A Pending JPWO2022255402A1 (zh) | 2021-06-04 | 2022-06-01 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPWO2022255402A1 (zh) |
KR (1) | KR20240016268A (zh) |
TW (1) | TW202313532A (zh) |
WO (1) | WO2022255402A1 (zh) |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007043357A1 (ja) * | 2005-10-07 | 2007-04-19 | Mitsubishi Chemical Corporation | 炭化水素化合物、電荷輸送材料、電荷輸送材料組成物および有機電界発光素子 |
JP5872944B2 (ja) * | 2011-03-31 | 2016-03-01 | ユー・ディー・シー アイルランド リミテッド | 電荷輸送材料、有機電界発光素子及び該素子を用いたことを特徴とする発光装置、表示装置または照明装置 |
KR102395933B1 (ko) * | 2014-05-07 | 2022-05-11 | 롬엔드하스전자재료코리아유한회사 | 복수종의 호스트 재료와 이를 포함하는 유기 전계 발광 소자 |
JP2018009078A (ja) * | 2016-07-12 | 2018-01-18 | 三星電子株式会社Samsung Electronics Co.,Ltd. | 有機発光素子用インキ組成物、並びにこれを用いた有機発光素子およびその製造方法 |
KR101997999B1 (ko) * | 2017-09-13 | 2019-07-08 | 단국대학교 산학협력단 | 결정화 방지 첨가제를 포함하는 유기 발광 소자 |
KR102516193B1 (ko) * | 2019-09-17 | 2023-03-29 | 삼성에스디아이 주식회사 | 하드마스크 조성물, 하드마스크 층 및 패턴 형성 방법 |
KR102455023B1 (ko) * | 2019-12-16 | 2022-10-13 | 삼성에스디아이 주식회사 | 화합물, 화합물의 합성 방법, 하드마스크 조성물 및 패턴 형성 방법 |
-
2022
- 2022-06-01 KR KR1020237040880A patent/KR20240016268A/ko unknown
- 2022-06-01 WO PCT/JP2022/022279 patent/WO2022255402A1/ja active Application Filing
- 2022-06-01 JP JP2023525887A patent/JPWO2022255402A1/ja active Pending
- 2022-06-02 TW TW111120563A patent/TW202313532A/zh unknown
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