JPWO2022230161A1 - - Google Patents

Info

Publication number
JPWO2022230161A1
JPWO2022230161A1 JP2023516989A JP2023516989A JPWO2022230161A1 JP WO2022230161 A1 JPWO2022230161 A1 JP WO2022230161A1 JP 2023516989 A JP2023516989 A JP 2023516989A JP 2023516989 A JP2023516989 A JP 2023516989A JP WO2022230161 A1 JPWO2022230161 A1 JP WO2022230161A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023516989A
Other languages
Japanese (ja)
Other versions
JPWO2022230161A5 (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022230161A1 publication Critical patent/JPWO2022230161A1/ja
Publication of JPWO2022230161A5 publication Critical patent/JPWO2022230161A5/ja
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/14—Structure thereof only for on-demand ink jet heads
JP2023516989A 2021-04-30 2021-04-30 Pending JPWO2022230161A1 (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2021/017151 WO2022230161A1 (ja) 2021-04-30 2021-04-30 インクジェットヘッド及びインクジェット記録方法

Publications (2)

Publication Number Publication Date
JPWO2022230161A1 true JPWO2022230161A1 (enrdf_load_stackoverflow) 2022-11-03
JPWO2022230161A5 JPWO2022230161A5 (enrdf_load_stackoverflow) 2024-02-05

Family

ID=83848151

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023516989A Pending JPWO2022230161A1 (enrdf_load_stackoverflow) 2021-04-30 2021-04-30

Country Status (2)

Country Link
JP (1) JPWO2022230161A1 (enrdf_load_stackoverflow)
WO (1) WO2022230161A1 (enrdf_load_stackoverflow)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004351923A (ja) * 2003-05-07 2004-12-16 Seiko Epson Corp 撥液膜被覆部材、液体噴出装置の構成部材、液体噴出ヘッドのノズルプレート、液体噴出ヘッドおよび液体噴出装置
JP2007253485A (ja) * 2006-03-23 2007-10-04 Seiko Epson Corp 撥液膜被覆部材、液体噴出装置の構成部材、液体噴出ヘッドのノズルプレート、液体噴出ヘッドおよび液体噴出装置
JP2009066798A (ja) * 2007-09-11 2009-04-02 Sharp Corp 撥液層の形成方法及びノズルプレートの製造方法
JP2011073284A (ja) * 2009-09-30 2011-04-14 Fujifilm Corp 有機膜の形成方法、有機膜、ノズルプレート、およびインクジェット記録装置
JP2012213873A (ja) * 2011-03-31 2012-11-08 Fujifilm Corp 撥水膜の形成方法、ノズルプレート、インクジェットヘッド、および、インクジェット記録装置
JP2015193964A (ja) * 2014-03-18 2015-11-05 セイコーエプソン株式会社 インクジェット抜蝕方法およびインクジェット捺染システム
US20160203973A1 (en) * 2014-12-22 2016-07-14 Stmicroelectronics S.R.L. Method for the surface treatment of a semiconductor substrate

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004351923A (ja) * 2003-05-07 2004-12-16 Seiko Epson Corp 撥液膜被覆部材、液体噴出装置の構成部材、液体噴出ヘッドのノズルプレート、液体噴出ヘッドおよび液体噴出装置
JP2007253485A (ja) * 2006-03-23 2007-10-04 Seiko Epson Corp 撥液膜被覆部材、液体噴出装置の構成部材、液体噴出ヘッドのノズルプレート、液体噴出ヘッドおよび液体噴出装置
JP2009066798A (ja) * 2007-09-11 2009-04-02 Sharp Corp 撥液層の形成方法及びノズルプレートの製造方法
JP2011073284A (ja) * 2009-09-30 2011-04-14 Fujifilm Corp 有機膜の形成方法、有機膜、ノズルプレート、およびインクジェット記録装置
JP2012213873A (ja) * 2011-03-31 2012-11-08 Fujifilm Corp 撥水膜の形成方法、ノズルプレート、インクジェットヘッド、および、インクジェット記録装置
JP2015193964A (ja) * 2014-03-18 2015-11-05 セイコーエプソン株式会社 インクジェット抜蝕方法およびインクジェット捺染システム
US20160203973A1 (en) * 2014-12-22 2016-07-14 Stmicroelectronics S.R.L. Method for the surface treatment of a semiconductor substrate

Also Published As

Publication number Publication date
WO2022230161A1 (ja) 2022-11-03

Similar Documents

Publication Publication Date Title
BR112023005462A2 (enrdf_load_stackoverflow)
BR112023012656A2 (enrdf_load_stackoverflow)
BR112021014123A2 (enrdf_load_stackoverflow)
BR112023009656A2 (enrdf_load_stackoverflow)
BR112022009896A2 (enrdf_load_stackoverflow)
BR112023008622A2 (enrdf_load_stackoverflow)
BR112022024743A2 (enrdf_load_stackoverflow)
BR112022026905A2 (enrdf_load_stackoverflow)
BR112023011738A2 (enrdf_load_stackoverflow)
BR112023004146A2 (enrdf_load_stackoverflow)
BR112023006729A2 (enrdf_load_stackoverflow)
BR102021018859A2 (enrdf_load_stackoverflow)
BR102021015500A2 (enrdf_load_stackoverflow)
BR112021017747A2 (enrdf_load_stackoverflow)
BR102021007058A2 (enrdf_load_stackoverflow)
BR102020022030A2 (enrdf_load_stackoverflow)
BR112023016292A2 (enrdf_load_stackoverflow)
BR112023011539A2 (enrdf_load_stackoverflow)
BR112023011610A2 (enrdf_load_stackoverflow)
BR112023008976A2 (enrdf_load_stackoverflow)
BR102021020147A2 (enrdf_load_stackoverflow)
BR102021018926A2 (enrdf_load_stackoverflow)
BR102021018167A2 (enrdf_load_stackoverflow)
BR102021017576A2 (enrdf_load_stackoverflow)
BR102021016837A2 (enrdf_load_stackoverflow)

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20231108

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20231108

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20250114

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20250217

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20250415

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20250609

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20250729