JPWO2022190903A1 - - Google Patents
Info
- Publication number
- JPWO2022190903A1 JPWO2022190903A1 JP2023505286A JP2023505286A JPWO2022190903A1 JP WO2022190903 A1 JPWO2022190903 A1 JP WO2022190903A1 JP 2023505286 A JP2023505286 A JP 2023505286A JP 2023505286 A JP2023505286 A JP 2023505286A JP WO2022190903 A1 JPWO2022190903 A1 JP WO2022190903A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30604—Chemical etching
- H01L21/30608—Anisotropic liquid etching
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/321—After treatment
- H01L21/3213—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer
- H01L21/32133—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only
- H01L21/32134—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only by liquid etching only
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Detergent Compositions (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021039567 | 2021-03-11 | ||
| JP2021157994 | 2021-09-28 | ||
| PCT/JP2022/007928 WO2022190903A1 (ja) | 2021-03-11 | 2022-02-25 | 半導体処理用組成物、被処理物の処理方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2022190903A1 true JPWO2022190903A1 (ja) | 2022-09-15 |
Family
ID=83226782
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023505286A Pending JPWO2022190903A1 (ja) | 2021-03-11 | 2022-02-25 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20230420266A1 (ja) |
| JP (1) | JPWO2022190903A1 (ja) |
| KR (1) | KR20230141864A (ja) |
| TW (1) | TW202311516A (ja) |
| WO (1) | WO2022190903A1 (ja) |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5302551B2 (ja) * | 2008-02-28 | 2013-10-02 | 林純薬工業株式会社 | シリコン異方性エッチング液組成物 |
| JP2010174074A (ja) * | 2009-01-27 | 2010-08-12 | Sanyo Chem Ind Ltd | 銅配線半導体用洗浄剤 |
| JP2012238849A (ja) * | 2011-04-21 | 2012-12-06 | Rohm & Haas Electronic Materials Llc | 改良された多結晶テクスチャ化組成物および方法 |
| JP5439466B2 (ja) * | 2011-12-26 | 2014-03-12 | 富士フイルム株式会社 | シリコンエッチング方法、これに用いられるシリコンエッチング液、及びそのキット |
| CN118085973A (zh) | 2015-01-05 | 2024-05-28 | 恩特格里斯公司 | 化学机械抛光后调配物及其使用方法 |
| JP2018177975A (ja) * | 2017-04-13 | 2018-11-15 | Jsr株式会社 | 洗浄用組成物および処理方法 |
| US10934485B2 (en) * | 2017-08-25 | 2021-03-02 | Versum Materials Us, Llc | Etching solution for selectively removing silicon over silicon-germanium alloy from a silicon-germanium/ silicon stack during manufacture of a semiconductor device |
| US11180697B2 (en) * | 2018-11-19 | 2021-11-23 | Versum Materials Us, Llc | Etching solution having silicon oxide corrosion inhibitor and method of using the same |
| JP7340969B2 (ja) * | 2019-06-28 | 2023-09-08 | 東京応化工業株式会社 | シリコンエッチング液、シリコンエッチング方法、及びシリコンフィン構造体の製造方法 |
-
2022
- 2022-02-25 KR KR1020237030478A patent/KR20230141864A/ko unknown
- 2022-02-25 WO PCT/JP2022/007928 patent/WO2022190903A1/ja active Application Filing
- 2022-02-25 JP JP2023505286A patent/JPWO2022190903A1/ja active Pending
- 2022-03-07 TW TW111108249A patent/TW202311516A/zh unknown
-
2023
- 2023-09-08 US US18/463,754 patent/US20230420266A1/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| TW202311516A (zh) | 2023-03-16 |
| KR20230141864A (ko) | 2023-10-10 |
| US20230420266A1 (en) | 2023-12-28 |
| WO2022190903A1 (ja) | 2022-09-15 |