JPWO2022168372A1 - - Google Patents
Info
- Publication number
- JPWO2022168372A1 JPWO2022168372A1 JP2022579333A JP2022579333A JPWO2022168372A1 JP WO2022168372 A1 JPWO2022168372 A1 JP WO2022168372A1 JP 2022579333 A JP2022579333 A JP 2022579333A JP 2022579333 A JP2022579333 A JP 2022579333A JP WO2022168372 A1 JPWO2022168372 A1 JP WO2022168372A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/36—Carbides
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021017823 | 2021-02-05 | ||
PCT/JP2021/037793 WO2022168372A1 (ja) | 2021-02-05 | 2021-10-12 | 希土類含有SiC基板及びそれを用いたSiC複合基板 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2022168372A1 true JPWO2022168372A1 (ja) | 2022-08-11 |
JPWO2022168372A5 JPWO2022168372A5 (ja) | 2023-04-26 |
Family
ID=82741001
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022579333A Pending JPWO2022168372A1 (ja) | 2021-02-05 | 2021-10-12 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPWO2022168372A1 (ja) |
WO (1) | WO2022168372A1 (ja) |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11268995A (ja) * | 1998-03-20 | 1999-10-05 | Denso Corp | 炭化珪素単結晶の製造方法 |
JP2004323293A (ja) * | 2003-04-24 | 2004-11-18 | Toyota Motor Corp | SiC単結晶の製造方法 |
JP5218348B2 (ja) * | 2009-09-03 | 2013-06-26 | 新日鐵住金株式会社 | 炭化珪素単結晶の製造方法 |
JP7282214B2 (ja) * | 2020-01-24 | 2023-05-26 | 日本碍子株式会社 | 希土類含有SiC基板及びSiCエピタキシャル層の製法 |
WO2021149598A1 (ja) * | 2020-01-24 | 2021-07-29 | 日本碍子株式会社 | 二軸配向SiC複合基板及び半導体デバイス用複合基板 |
CN111270304A (zh) * | 2020-03-27 | 2020-06-12 | 江苏超芯星半导体有限公司 | 一种制备4h碳化硅单晶的方法 |
-
2021
- 2021-10-12 WO PCT/JP2021/037793 patent/WO2022168372A1/ja active Application Filing
- 2021-10-12 JP JP2022579333A patent/JPWO2022168372A1/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
WO2022168372A1 (ja) | 2022-08-11 |
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