JPWO2022138151A1 - - Google Patents

Info

Publication number
JPWO2022138151A1
JPWO2022138151A1 JP2022572096A JP2022572096A JPWO2022138151A1 JP WO2022138151 A1 JPWO2022138151 A1 JP WO2022138151A1 JP 2022572096 A JP2022572096 A JP 2022572096A JP 2022572096 A JP2022572096 A JP 2022572096A JP WO2022138151 A1 JPWO2022138151 A1 JP WO2022138151A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2022572096A
Other languages
Japanese (ja)
Other versions
JPWO2022138151A5 (enExample
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022138151A1 publication Critical patent/JPWO2022138151A1/ja
Publication of JPWO2022138151A5 publication Critical patent/JPWO2022138151A5/ja
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/18—After-treatment, e.g. pore-sealing
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/18—After-treatment, e.g. pore-sealing
    • C25D11/20—Electrolytic after-treatment
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/18—After-treatment, e.g. pore-sealing
    • C25D11/24—Chemical after-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
  • Manufacture Of Motors, Generators (AREA)
  • Manufacturing Of Electrical Connectors (AREA)
JP2022572096A 2020-12-23 2021-12-08 Abandoned JPWO2022138151A1 (enExample)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020213613 2020-12-23
PCT/JP2021/045023 WO2022138151A1 (ja) 2020-12-23 2021-12-08 金属充填微細構造体及び金属充填微細構造体の製造方法

Publications (2)

Publication Number Publication Date
JPWO2022138151A1 true JPWO2022138151A1 (enExample) 2022-06-30
JPWO2022138151A5 JPWO2022138151A5 (enExample) 2023-09-12

Family

ID=82159620

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022572096A Abandoned JPWO2022138151A1 (enExample) 2020-12-23 2021-12-08

Country Status (4)

Country Link
JP (1) JPWO2022138151A1 (enExample)
CN (1) CN116670337A (enExample)
TW (1) TW202235689A (enExample)
WO (1) WO2022138151A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114207793B (zh) * 2019-08-16 2025-08-05 富士胶片株式会社 结构体的制造方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002004083A (ja) * 2000-04-18 2002-01-09 Shinko Electric Ind Co Ltd ヴィアフィリング方法
JP2008021739A (ja) * 2006-07-11 2008-01-31 Shinko Electric Ind Co Ltd 基板の製造方法
JP2008214679A (ja) * 2007-03-01 2008-09-18 Shinko Electric Ind Co Ltd スルーホールの充填方法
JP2012124253A (ja) * 2010-12-07 2012-06-28 Canon Inc 貫通電極基板及びその製造方法
JP2016072449A (ja) * 2014-09-30 2016-05-09 大日本印刷株式会社 導電材充填貫通電極基板及びその製造方法
JP2019147988A (ja) * 2018-02-27 2019-09-05 富士フイルム株式会社 金属膜、構造体、複合材料、金属膜の製造方法、構造体の製造方法、および複合材料の製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002004083A (ja) * 2000-04-18 2002-01-09 Shinko Electric Ind Co Ltd ヴィアフィリング方法
JP2008021739A (ja) * 2006-07-11 2008-01-31 Shinko Electric Ind Co Ltd 基板の製造方法
JP2008214679A (ja) * 2007-03-01 2008-09-18 Shinko Electric Ind Co Ltd スルーホールの充填方法
JP2012124253A (ja) * 2010-12-07 2012-06-28 Canon Inc 貫通電極基板及びその製造方法
JP2016072449A (ja) * 2014-09-30 2016-05-09 大日本印刷株式会社 導電材充填貫通電極基板及びその製造方法
JP2019147988A (ja) * 2018-02-27 2019-09-05 富士フイルム株式会社 金属膜、構造体、複合材料、金属膜の製造方法、構造体の製造方法、および複合材料の製造方法

Also Published As

Publication number Publication date
CN116670337A (zh) 2023-08-29
TW202235689A (zh) 2022-09-16
WO2022138151A1 (ja) 2022-06-30

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Legal Events

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