JPWO2022131002A1 - - Google Patents

Info

Publication number
JPWO2022131002A1
JPWO2022131002A1 JP2022569850A JP2022569850A JPWO2022131002A1 JP WO2022131002 A1 JPWO2022131002 A1 JP WO2022131002A1 JP 2022569850 A JP2022569850 A JP 2022569850A JP 2022569850 A JP2022569850 A JP 2022569850A JP WO2022131002 A1 JPWO2022131002 A1 JP WO2022131002A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022569850A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022131002A1 publication Critical patent/JPWO2022131002A1/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP2022569850A 2020-12-16 2021-12-02 Pending JPWO2022131002A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020208380 2020-12-16
PCT/JP2021/044246 WO2022131002A1 (ja) 2020-12-16 2021-12-02 半導体基板の製造方法、組成物及びレジスト下層膜

Publications (1)

Publication Number Publication Date
JPWO2022131002A1 true JPWO2022131002A1 (ja) 2022-06-23

Family

ID=82057549

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022569850A Pending JPWO2022131002A1 (ja) 2020-12-16 2021-12-02

Country Status (3)

Country Link
JP (1) JPWO2022131002A1 (ja)
TW (1) TW202229214A (ja)
WO (1) WO2022131002A1 (ja)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02160752A (ja) * 1988-12-15 1990-06-20 Agency Of Ind Science & Technol ブタジイン系イミド
JP4280617B2 (ja) * 2003-12-11 2009-06-17 キヤノン株式会社 有機発光素子

Also Published As

Publication number Publication date
WO2022131002A1 (ja) 2022-06-23
TW202229214A (zh) 2022-08-01

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Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20240430