JPWO2022092320A1 - - Google Patents

Info

Publication number
JPWO2022092320A1
JPWO2022092320A1 JP2022559455A JP2022559455A JPWO2022092320A1 JP WO2022092320 A1 JPWO2022092320 A1 JP WO2022092320A1 JP 2022559455 A JP2022559455 A JP 2022559455A JP 2022559455 A JP2022559455 A JP 2022559455A JP WO2022092320 A1 JPWO2022092320 A1 JP WO2022092320A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2022559455A
Other versions
JP7559829B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022092320A1 publication Critical patent/JPWO2022092320A1/ja
Priority to JP2024090159A priority Critical patent/JP2024113029A/ja
Application granted granted Critical
Publication of JP7559829B2 publication Critical patent/JP7559829B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/12—Scanning systems using multifaceted mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/12—Scanning systems using multifaceted mirrors
    • G02B26/124—Details of the optical system between the light source and the polygonal mirror
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/12—Scanning systems using multifaceted mirrors
    • G02B26/127—Adaptive control of the scanning light beam, e.g. using the feedback from one or more detectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Liquid Crystal (AREA)
  • Mechanical Optical Scanning Systems (AREA)
JP2022559455A 2020-11-02 2021-11-02 パターン露光装置 Active JP7559829B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2024090159A JP2024113029A (ja) 2020-11-02 2024-06-03 パターン露光装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020183561 2020-11-02
JP2020183561 2020-11-02
PCT/JP2021/040344 WO2022092320A1 (ja) 2020-11-02 2021-11-02 パターン露光装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2024090159A Division JP2024113029A (ja) 2020-11-02 2024-06-03 パターン露光装置

Publications (2)

Publication Number Publication Date
JPWO2022092320A1 true JPWO2022092320A1 (ja) 2022-05-05
JP7559829B2 JP7559829B2 (ja) 2024-10-02

Family

ID=81382705

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2022559455A Active JP7559829B2 (ja) 2020-11-02 2021-11-02 パターン露光装置
JP2024090159A Pending JP2024113029A (ja) 2020-11-02 2024-06-03 パターン露光装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2024090159A Pending JP2024113029A (ja) 2020-11-02 2024-06-03 パターン露光装置

Country Status (5)

Country Link
JP (2) JP7559829B2 (ja)
KR (1) KR20230088826A (ja)
CN (1) CN116507960A (ja)
TW (2) TWI790178B (ja)
WO (1) WO2022092320A1 (ja)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8531751B2 (en) * 2011-08-19 2013-09-10 Orbotech Ltd. System and method for direct imaging
JP6651768B2 (ja) * 2015-09-28 2020-02-19 株式会社ニコン パターン描画装置
KR102379193B1 (ko) * 2016-05-19 2022-03-28 가부시키가이샤 니콘 기판 지지 장치, 노광 장치, 및 패터닝 장치
TWI736621B (zh) * 2016-10-04 2021-08-21 日商尼康股份有限公司 圖案描繪裝置及圖案描繪方法
JP7070542B2 (ja) * 2017-03-10 2022-05-18 株式会社ニコン パターン描画装置、及びパターン露光装置
KR102567116B1 (ko) * 2017-09-08 2023-08-16 가부시키가이샤 니콘 패턴 묘화 장치
JP7070581B2 (ja) * 2017-09-26 2022-05-18 株式会社ニコン パターン描画装置
JP7111108B2 (ja) * 2017-10-25 2022-08-02 株式会社ニコン パターン描画装置

Also Published As

Publication number Publication date
TWI790178B (zh) 2023-01-11
JP2024113029A (ja) 2024-08-21
KR20230088826A (ko) 2023-06-20
WO2022092320A1 (ja) 2022-05-05
TWI777841B (zh) 2022-09-11
CN116507960A (zh) 2023-07-28
JP7559829B2 (ja) 2024-10-02
TW202244637A (zh) 2022-11-16
TW202223549A (zh) 2022-06-16

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