JPWO2022070977A1 - - Google Patents
Info
- Publication number
- JPWO2022070977A1 JPWO2022070977A1 JP2022553829A JP2022553829A JPWO2022070977A1 JP WO2022070977 A1 JPWO2022070977 A1 JP WO2022070977A1 JP 2022553829 A JP2022553829 A JP 2022553829A JP 2022553829 A JP2022553829 A JP 2022553829A JP WO2022070977 A1 JPWO2022070977 A1 JP WO2022070977A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020163774 | 2020-09-29 | ||
PCT/JP2021/034241 WO2022070977A1 (ja) | 2020-09-29 | 2021-09-17 | 光硬化性着色樹脂組成物、硬化物、カラーフィルタ、表示装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPWO2022070977A1 true JPWO2022070977A1 (zh) | 2022-04-07 |
Family
ID=80951462
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022553829A Pending JPWO2022070977A1 (zh) | 2020-09-29 | 2021-09-17 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPWO2022070977A1 (zh) |
KR (1) | KR20230079024A (zh) |
CN (1) | CN116157738A (zh) |
TW (1) | TW202222991A (zh) |
WO (1) | WO2022070977A1 (zh) |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3867179B2 (ja) | 1997-11-18 | 2007-01-10 | Jsr株式会社 | カラーフィルタ用感放射線性組成物 |
JP5685803B2 (ja) * | 2008-07-24 | 2015-03-18 | Jsr株式会社 | 感放射線性樹脂組成物および液晶表示素子用スペーサーとその製造法 |
JP2010256891A (ja) | 2009-04-01 | 2010-11-11 | Toyo Ink Mfg Co Ltd | 感光性着色組成物およびカラーフィルタ |
JP5728103B1 (ja) | 2014-02-18 | 2015-06-03 | 日本発條株式会社 | リンクアーム部材 |
JP6385853B2 (ja) * | 2015-02-20 | 2018-09-05 | 富士フイルム株式会社 | 感光性組成物、硬化膜の製造方法、硬化膜、タッチパネル、タッチパネル表示装置、液晶表示装置、及び、有機el表示装置 |
JP2018205605A (ja) * | 2017-06-07 | 2018-12-27 | 三菱ケミカル株式会社 | 着色感光性樹脂組成物、硬化物、有機電界発光素子、画像表示装置及び照明 |
JP7249119B2 (ja) * | 2018-09-27 | 2023-03-30 | 東京応化工業株式会社 | 感光性樹脂組成物、パターニングされた硬化膜の製造方法及び硬化膜 |
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2021
- 2021-09-17 JP JP2022553829A patent/JPWO2022070977A1/ja active Pending
- 2021-09-17 CN CN202180054507.3A patent/CN116157738A/zh active Pending
- 2021-09-17 KR KR1020237007955A patent/KR20230079024A/ko unknown
- 2021-09-17 WO PCT/JP2021/034241 patent/WO2022070977A1/ja active Application Filing
- 2021-09-23 TW TW110135290A patent/TW202222991A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
KR20230079024A (ko) | 2023-06-05 |
TW202222991A (zh) | 2022-06-16 |
CN116157738A (zh) | 2023-05-23 |
WO2022070977A1 (ja) | 2022-04-07 |