JPWO2022039027A1 - - Google Patents
Info
- Publication number
- JPWO2022039027A1 JPWO2022039027A1 JP2022543363A JP2022543363A JPWO2022039027A1 JP WO2022039027 A1 JPWO2022039027 A1 JP WO2022039027A1 JP 2022543363 A JP2022543363 A JP 2022543363A JP 2022543363 A JP2022543363 A JP 2022543363A JP WO2022039027 A1 JPWO2022039027 A1 JP WO2022039027A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polymerisation Methods In General (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020139312 | 2020-08-20 | ||
PCT/JP2021/028881 WO2022039027A1 (ja) | 2020-08-20 | 2021-08-04 | 感光性組成物、転写フィルム |
Publications (1)
Publication Number | Publication Date |
---|---|
JPWO2022039027A1 true JPWO2022039027A1 (ja) | 2022-02-24 |
Family
ID=80322646
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022543363A Abandoned JPWO2022039027A1 (ja) | 2020-08-20 | 2021-08-04 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPWO2022039027A1 (ja) |
WO (1) | WO2022039027A1 (ja) |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011002796A (ja) * | 2008-07-07 | 2011-01-06 | Fujifilm Corp | 紫外光レーザー用着色感光性樹脂組成物、紫外光レーザー露光によるパターン形成方法、その方法によりカラーフィルタを製造する方法、その製造方法により製造されたカラーフィルタ、および表示装置 |
WO2015072532A1 (ja) * | 2013-11-15 | 2015-05-21 | 富士フイルム株式会社 | 硬化性組成物、硬化膜の製造方法、硬化膜および表示装置 |
JP2016204584A (ja) * | 2015-04-28 | 2016-12-08 | 富士フイルム株式会社 | 硬化性組成物、硬化膜の製造方法、硬化膜、有機el表示装置、液晶表示装置、タッチパネル及びタッチパネル表示装置 |
JP2017156524A (ja) * | 2016-03-01 | 2017-09-07 | 株式会社Dnpファインケミカル | カラーフィルタ用感光性着色樹脂組成物、カラーフィルタ、表示装置 |
WO2018062105A1 (ja) * | 2016-09-30 | 2018-04-05 | 株式会社Dnpファインケミカル | カラーフィルタ用感光性着色樹脂組成物、カラーフィルタ、及び表示装置 |
JP2019174635A (ja) * | 2018-03-28 | 2019-10-10 | 株式会社Dnpファインケミカル | 感光性着色樹脂組成物、硬化物、カラーフィルタ、及び表示装置 |
WO2020004601A1 (ja) * | 2018-06-29 | 2020-01-02 | 株式会社Adeka | オキシムエステル化合物およびこれを含有する光重合開始剤 |
-
2021
- 2021-08-04 WO PCT/JP2021/028881 patent/WO2022039027A1/ja active Application Filing
- 2021-08-04 JP JP2022543363A patent/JPWO2022039027A1/ja not_active Abandoned
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011002796A (ja) * | 2008-07-07 | 2011-01-06 | Fujifilm Corp | 紫外光レーザー用着色感光性樹脂組成物、紫外光レーザー露光によるパターン形成方法、その方法によりカラーフィルタを製造する方法、その製造方法により製造されたカラーフィルタ、および表示装置 |
WO2015072532A1 (ja) * | 2013-11-15 | 2015-05-21 | 富士フイルム株式会社 | 硬化性組成物、硬化膜の製造方法、硬化膜および表示装置 |
JP2016204584A (ja) * | 2015-04-28 | 2016-12-08 | 富士フイルム株式会社 | 硬化性組成物、硬化膜の製造方法、硬化膜、有機el表示装置、液晶表示装置、タッチパネル及びタッチパネル表示装置 |
JP2017156524A (ja) * | 2016-03-01 | 2017-09-07 | 株式会社Dnpファインケミカル | カラーフィルタ用感光性着色樹脂組成物、カラーフィルタ、表示装置 |
WO2018062105A1 (ja) * | 2016-09-30 | 2018-04-05 | 株式会社Dnpファインケミカル | カラーフィルタ用感光性着色樹脂組成物、カラーフィルタ、及び表示装置 |
JP2019174635A (ja) * | 2018-03-28 | 2019-10-10 | 株式会社Dnpファインケミカル | 感光性着色樹脂組成物、硬化物、カラーフィルタ、及び表示装置 |
WO2020004601A1 (ja) * | 2018-06-29 | 2020-01-02 | 株式会社Adeka | オキシムエステル化合物およびこれを含有する光重合開始剤 |
Also Published As
Publication number | Publication date |
---|---|
WO2022039027A1 (ja) | 2022-02-24 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20230130 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20230905 |
|
A762 | Written abandonment of application |
Free format text: JAPANESE INTERMEDIATE CODE: A762 Effective date: 20230914 |