JPWO2022039027A1 - - Google Patents

Info

Publication number
JPWO2022039027A1
JPWO2022039027A1 JP2022543363A JP2022543363A JPWO2022039027A1 JP WO2022039027 A1 JPWO2022039027 A1 JP WO2022039027A1 JP 2022543363 A JP2022543363 A JP 2022543363A JP 2022543363 A JP2022543363 A JP 2022543363A JP WO2022039027 A1 JPWO2022039027 A1 JP WO2022039027A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2022543363A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022039027A1 publication Critical patent/JPWO2022039027A1/ja
Abandoned legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
JP2022543363A 2020-08-20 2021-08-04 Abandoned JPWO2022039027A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020139312 2020-08-20
PCT/JP2021/028881 WO2022039027A1 (ja) 2020-08-20 2021-08-04 感光性組成物、転写フィルム

Publications (1)

Publication Number Publication Date
JPWO2022039027A1 true JPWO2022039027A1 (ja) 2022-02-24

Family

ID=80322646

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022543363A Abandoned JPWO2022039027A1 (ja) 2020-08-20 2021-08-04

Country Status (2)

Country Link
JP (1) JPWO2022039027A1 (ja)
WO (1) WO2022039027A1 (ja)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011002796A (ja) * 2008-07-07 2011-01-06 Fujifilm Corp 紫外光レーザー用着色感光性樹脂組成物、紫外光レーザー露光によるパターン形成方法、その方法によりカラーフィルタを製造する方法、その製造方法により製造されたカラーフィルタ、および表示装置
WO2015072532A1 (ja) * 2013-11-15 2015-05-21 富士フイルム株式会社 硬化性組成物、硬化膜の製造方法、硬化膜および表示装置
JP2016204584A (ja) * 2015-04-28 2016-12-08 富士フイルム株式会社 硬化性組成物、硬化膜の製造方法、硬化膜、有機el表示装置、液晶表示装置、タッチパネル及びタッチパネル表示装置
JP2017156524A (ja) * 2016-03-01 2017-09-07 株式会社Dnpファインケミカル カラーフィルタ用感光性着色樹脂組成物、カラーフィルタ、表示装置
WO2018062105A1 (ja) * 2016-09-30 2018-04-05 株式会社Dnpファインケミカル カラーフィルタ用感光性着色樹脂組成物、カラーフィルタ、及び表示装置
JP2019174635A (ja) * 2018-03-28 2019-10-10 株式会社Dnpファインケミカル 感光性着色樹脂組成物、硬化物、カラーフィルタ、及び表示装置
WO2020004601A1 (ja) * 2018-06-29 2020-01-02 株式会社Adeka オキシムエステル化合物およびこれを含有する光重合開始剤

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011002796A (ja) * 2008-07-07 2011-01-06 Fujifilm Corp 紫外光レーザー用着色感光性樹脂組成物、紫外光レーザー露光によるパターン形成方法、その方法によりカラーフィルタを製造する方法、その製造方法により製造されたカラーフィルタ、および表示装置
WO2015072532A1 (ja) * 2013-11-15 2015-05-21 富士フイルム株式会社 硬化性組成物、硬化膜の製造方法、硬化膜および表示装置
JP2016204584A (ja) * 2015-04-28 2016-12-08 富士フイルム株式会社 硬化性組成物、硬化膜の製造方法、硬化膜、有機el表示装置、液晶表示装置、タッチパネル及びタッチパネル表示装置
JP2017156524A (ja) * 2016-03-01 2017-09-07 株式会社Dnpファインケミカル カラーフィルタ用感光性着色樹脂組成物、カラーフィルタ、表示装置
WO2018062105A1 (ja) * 2016-09-30 2018-04-05 株式会社Dnpファインケミカル カラーフィルタ用感光性着色樹脂組成物、カラーフィルタ、及び表示装置
JP2019174635A (ja) * 2018-03-28 2019-10-10 株式会社Dnpファインケミカル 感光性着色樹脂組成物、硬化物、カラーフィルタ、及び表示装置
WO2020004601A1 (ja) * 2018-06-29 2020-01-02 株式会社Adeka オキシムエステル化合物およびこれを含有する光重合開始剤

Also Published As

Publication number Publication date
WO2022039027A1 (ja) 2022-02-24

Similar Documents

Publication Publication Date Title
BR112023012656A2 (ja)
BR102021007058A2 (ja)
BR102020022030A2 (ja)
BR112023011738A2 (ja)
BR112023016292A2 (ja)
JPWO2022138576A1 (ja)
BR112023011610A2 (ja)
BR112023011539A2 (ja)
BR112023008976A2 (ja)
BR112023009656A2 (ja)
BR112023006729A2 (ja)
BR102021015566A2 (ja)
BR102021015450A8 (ja)
JPWO2022039027A1 (ja)
BR102021015247A2 (ja)
BR102021014044A2 (ja)
BR102021013929A2 (ja)
BR102021012571A2 (ja)
BR102021012230A2 (ja)
BR102021012003A2 (ja)
BR102021012107A2 (ja)
BR102021010467A2 (ja)
BR102021009555A2 (ja)
BR102021009475A2 (ja)
BR102021007978A2 (ja)

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20230130

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20230905

A762 Written abandonment of application

Free format text: JAPANESE INTERMEDIATE CODE: A762

Effective date: 20230914