JPWO2022019046A1 - - Google Patents

Info

Publication number
JPWO2022019046A1
JPWO2022019046A1 JP2022538654A JP2022538654A JPWO2022019046A1 JP WO2022019046 A1 JPWO2022019046 A1 JP WO2022019046A1 JP 2022538654 A JP2022538654 A JP 2022538654A JP 2022538654 A JP2022538654 A JP 2022538654A JP WO2022019046 A1 JPWO2022019046 A1 JP WO2022019046A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022538654A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022019046A1 publication Critical patent/JPWO2022019046A1/ja
Priority to JP2026009778A priority Critical patent/JP2026063359A/ja
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Structural Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Architecture (AREA)
  • Materials For Photolithography (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
JP2022538654A 2020-07-20 2021-06-25 Pending JPWO2022019046A1 (https=)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2026009778A JP2026063359A (ja) 2020-07-20 2026-01-23 感光性エレメント

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020123768 2020-07-20
PCT/JP2021/024156 WO2022019046A1 (ja) 2020-07-20 2021-06-25 感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2026009778A Division JP2026063359A (ja) 2020-07-20 2026-01-23 感光性エレメント

Publications (1)

Publication Number Publication Date
JPWO2022019046A1 true JPWO2022019046A1 (https=) 2022-01-27

Family

ID=79729437

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2022538654A Pending JPWO2022019046A1 (https=) 2020-07-20 2021-06-25
JP2026009778A Pending JP2026063359A (ja) 2020-07-20 2026-01-23 感光性エレメント

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2026009778A Pending JP2026063359A (ja) 2020-07-20 2026-01-23 感光性エレメント

Country Status (5)

Country Link
JP (2) JPWO2022019046A1 (https=)
KR (1) KR102870994B1 (https=)
CN (1) CN115867864A (https=)
TW (1) TWI902842B (https=)
WO (1) WO2022019046A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025047730A1 (ja) * 2023-08-30 2025-03-06 富士フイルム株式会社 転写フィルム、パターン形成方法、積層体、半導体パッケージ

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017007001A1 (ja) * 2015-07-08 2017-01-12 日立化成株式会社 感光性エレメント、積層体、レジストパターンの形成方法及びプリント配線板の製造方法
WO2020054075A1 (ja) * 2018-09-14 2020-03-19 日立化成株式会社 転写型感光性フィルム、樹脂硬化膜の形成方法及び樹脂硬化膜付センサ基板の製造方法
WO2020105457A1 (ja) * 2018-11-20 2020-05-28 富士フイルム株式会社 転写材料、樹脂パターンの製造方法、回路配線の製造方法、及び、タッチパネルの製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019215848A1 (ja) 2018-05-09 2019-11-14 日立化成株式会社 感光性エレメント、バリア層形成用樹脂組成物、レジストパターンの形成方法及びプリント配線板の製造方法
JP2022120464A (ja) * 2021-02-05 2022-08-18 昭和電工マテリアルズ株式会社 メタルマスクの製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017007001A1 (ja) * 2015-07-08 2017-01-12 日立化成株式会社 感光性エレメント、積層体、レジストパターンの形成方法及びプリント配線板の製造方法
WO2020054075A1 (ja) * 2018-09-14 2020-03-19 日立化成株式会社 転写型感光性フィルム、樹脂硬化膜の形成方法及び樹脂硬化膜付センサ基板の製造方法
WO2020105457A1 (ja) * 2018-11-20 2020-05-28 富士フイルム株式会社 転写材料、樹脂パターンの製造方法、回路配線の製造方法、及び、タッチパネルの製造方法

Also Published As

Publication number Publication date
TWI902842B (zh) 2025-11-01
KR20230041976A (ko) 2023-03-27
KR102870994B1 (ko) 2025-10-16
JP2026063359A (ja) 2026-04-10
TW202206944A (zh) 2022-02-16
CN115867864A (zh) 2023-03-28
WO2022019046A1 (ja) 2022-01-27

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