JPWO2022009658A1 - - Google Patents
Info
- Publication number
- JPWO2022009658A1 JPWO2022009658A1 JP2022534998A JP2022534998A JPWO2022009658A1 JP WO2022009658 A1 JPWO2022009658 A1 JP WO2022009658A1 JP 2022534998 A JP2022534998 A JP 2022534998A JP 2022534998 A JP2022534998 A JP 2022534998A JP WO2022009658 A1 JPWO2022009658 A1 JP WO2022009658A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/22—Esters containing halogen
- C08F20/24—Esters containing halogen containing perhaloalkyl radicals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/22—Esters containing halogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
- C08F220/303—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and one or more carboxylic moieties in the chain
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D127/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers
- C09D127/02—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment
- C09D127/12—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K19/00—Liquid crystal materials
- C09K19/04—Liquid crystal materials characterised by the chemical structure of the liquid crystal components, e.g. by a specific unit
- C09K19/38—Polymers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/13363—Birefringent elements, e.g. for optical compensation
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Nonlinear Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Mathematical Physics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polarising Elements (AREA)
- Surface Treatment Of Optical Elements (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020119176 | 2020-07-10 | ||
| JP2020119176 | 2020-07-10 | ||
| JP2021017705 | 2021-02-05 | ||
| JP2021017705 | 2021-02-05 | ||
| PCT/JP2021/023479 WO2022009658A1 (ja) | 2020-07-10 | 2021-06-21 | 含フッ素共重合体、組成物、光学フィルム、液晶フィルム、ハードコートフィルム、偏光板 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2022009658A1 true JPWO2022009658A1 (https=) | 2022-01-13 |
| JPWO2022009658A5 JPWO2022009658A5 (https=) | 2023-02-09 |
| JP7553564B2 JP7553564B2 (ja) | 2024-09-18 |
Family
ID=79552979
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022534998A Active JP7553564B2 (ja) | 2020-07-10 | 2021-06-21 | 含フッ素共重合体、組成物、光学フィルム、液晶フィルム、ハードコートフィルム、偏光板 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20230135489A1 (https=) |
| JP (1) | JP7553564B2 (https=) |
| CN (1) | CN116171288B (https=) |
| WO (1) | WO2022009658A1 (https=) |
Citations (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0551417A (ja) * | 1991-08-27 | 1993-03-02 | Kuraray Co Ltd | フツ素含有共重合体 |
| JP2000159840A (ja) * | 1998-11-26 | 2000-06-13 | Konica Corp | 反射防止剤、反射防止材、偏光板保護フィルム、及び偏光板 |
| JP2000290654A (ja) * | 1999-04-06 | 2000-10-17 | Nof Corp | 液晶複合表示素子及び製造方法 |
| JP2004536930A (ja) * | 2001-08-01 | 2004-12-09 | アベリー デニソン コーポレイション | 低い屈折率を有する光学的接着コーティング |
| JP2007017546A (ja) * | 2005-07-05 | 2007-01-25 | Fujifilm Holdings Corp | 光導波路および光ファイバ |
| JP2007272185A (ja) * | 2006-03-10 | 2007-10-18 | Fujifilm Corp | 組成物、位相差板、液晶表示装置、平均チルト角調整剤、平均チルト角の調整方法 |
| JP2011070162A (ja) * | 2009-08-28 | 2011-04-07 | Fujifilm Corp | 感活性光線性又は感放射線性樹脂組成物並びに該組成物を用いたレジスト膜及びパターン形成方法 |
| JP2011118335A (ja) * | 2009-03-31 | 2011-06-16 | Fujifilm Corp | 感活性光線性又は感放射線性樹脂組成物、並びに該組成物を用いたレジスト膜及びパターン形成方法 |
| JP2011226040A (ja) * | 2010-03-30 | 2011-11-10 | Daikin Ind Ltd | 含フッ素マレエートまたは含フッ素フマレートを含んでなる含フッ素共重合体および防汚加工剤 |
| JP4868780B2 (ja) * | 2005-07-05 | 2012-02-01 | 富士フイルム株式会社 | フッ素系共重合体、重合性組成物、硬化性樹脂組成物、反射防止フィルム、偏光板および画像表示装置 |
| JP2012131966A (ja) * | 2010-12-22 | 2012-07-12 | Sekisui Chem Co Ltd | 新規含フッ素重合体及びその製造方法、該重合体を含む樹脂組成物並びに光ファイバー |
| WO2016009648A1 (ja) * | 2014-07-18 | 2016-01-21 | 富士フイルム株式会社 | 重合体、組成物、光学フィルムおよび液晶表示装置 |
| CN106589236A (zh) * | 2016-12-12 | 2017-04-26 | 衢州学院 | 一种含氟织物整理剂的制备方法 |
| JP2018005215A (ja) * | 2016-06-27 | 2018-01-11 | 富士フイルム株式会社 | 機能性膜、偏光板、及び表示装置 |
| WO2018062077A1 (ja) * | 2016-09-30 | 2018-04-05 | 富士フイルム株式会社 | 高分子化合物 |
| WO2018216806A1 (ja) * | 2017-05-26 | 2018-11-29 | 富士フイルム株式会社 | 重合性液晶組成物、光学異方性層、光学積層体、光学積層体の製造方法および画像表示装置 |
| WO2019009255A1 (ja) * | 2017-07-03 | 2019-01-10 | 富士フイルム株式会社 | 液晶フィルム、光学積層体、円偏光板、有機エレクトロルミネッセンス表示装置 |
| WO2019026522A1 (ja) * | 2017-07-31 | 2019-02-07 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法 |
| KR20190074619A (ko) * | 2017-12-20 | 2019-06-28 | 니카코리아 (주) | 방오 가공제 조성물 및 이를 이용한 섬유제품 |
| JP7402332B2 (ja) * | 2020-06-05 | 2023-12-20 | 富士フイルム株式会社 | 光吸収異方性膜、積層体および画像表示装置 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4941821B2 (ja) * | 2006-11-02 | 2012-05-30 | Dic株式会社 | 含フッ素ウレタン(メタ)アクリレート及び界面活性剤 |
-
2021
- 2021-06-21 CN CN202180048131.5A patent/CN116171288B/zh active Active
- 2021-06-21 JP JP2022534998A patent/JP7553564B2/ja active Active
- 2021-06-21 WO PCT/JP2021/023479 patent/WO2022009658A1/ja not_active Ceased
-
2022
- 2022-12-14 US US18/065,866 patent/US20230135489A1/en active Pending
Patent Citations (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0551417A (ja) * | 1991-08-27 | 1993-03-02 | Kuraray Co Ltd | フツ素含有共重合体 |
| JP2000159840A (ja) * | 1998-11-26 | 2000-06-13 | Konica Corp | 反射防止剤、反射防止材、偏光板保護フィルム、及び偏光板 |
| JP2000290654A (ja) * | 1999-04-06 | 2000-10-17 | Nof Corp | 液晶複合表示素子及び製造方法 |
| JP2004536930A (ja) * | 2001-08-01 | 2004-12-09 | アベリー デニソン コーポレイション | 低い屈折率を有する光学的接着コーティング |
| JP2007017546A (ja) * | 2005-07-05 | 2007-01-25 | Fujifilm Holdings Corp | 光導波路および光ファイバ |
| JP4868780B2 (ja) * | 2005-07-05 | 2012-02-01 | 富士フイルム株式会社 | フッ素系共重合体、重合性組成物、硬化性樹脂組成物、反射防止フィルム、偏光板および画像表示装置 |
| JP2007272185A (ja) * | 2006-03-10 | 2007-10-18 | Fujifilm Corp | 組成物、位相差板、液晶表示装置、平均チルト角調整剤、平均チルト角の調整方法 |
| JP2011118335A (ja) * | 2009-03-31 | 2011-06-16 | Fujifilm Corp | 感活性光線性又は感放射線性樹脂組成物、並びに該組成物を用いたレジスト膜及びパターン形成方法 |
| JP2011070162A (ja) * | 2009-08-28 | 2011-04-07 | Fujifilm Corp | 感活性光線性又は感放射線性樹脂組成物並びに該組成物を用いたレジスト膜及びパターン形成方法 |
| JP2011226040A (ja) * | 2010-03-30 | 2011-11-10 | Daikin Ind Ltd | 含フッ素マレエートまたは含フッ素フマレートを含んでなる含フッ素共重合体および防汚加工剤 |
| JP2012131966A (ja) * | 2010-12-22 | 2012-07-12 | Sekisui Chem Co Ltd | 新規含フッ素重合体及びその製造方法、該重合体を含む樹脂組成物並びに光ファイバー |
| WO2016009648A1 (ja) * | 2014-07-18 | 2016-01-21 | 富士フイルム株式会社 | 重合体、組成物、光学フィルムおよび液晶表示装置 |
| JP2018005215A (ja) * | 2016-06-27 | 2018-01-11 | 富士フイルム株式会社 | 機能性膜、偏光板、及び表示装置 |
| WO2018062077A1 (ja) * | 2016-09-30 | 2018-04-05 | 富士フイルム株式会社 | 高分子化合物 |
| CN106589236A (zh) * | 2016-12-12 | 2017-04-26 | 衢州学院 | 一种含氟织物整理剂的制备方法 |
| WO2018216806A1 (ja) * | 2017-05-26 | 2018-11-29 | 富士フイルム株式会社 | 重合性液晶組成物、光学異方性層、光学積層体、光学積層体の製造方法および画像表示装置 |
| WO2019009255A1 (ja) * | 2017-07-03 | 2019-01-10 | 富士フイルム株式会社 | 液晶フィルム、光学積層体、円偏光板、有機エレクトロルミネッセンス表示装置 |
| WO2019026522A1 (ja) * | 2017-07-31 | 2019-02-07 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法 |
| KR20190074619A (ko) * | 2017-12-20 | 2019-06-28 | 니카코리아 (주) | 방오 가공제 조성물 및 이를 이용한 섬유제품 |
| JP7402332B2 (ja) * | 2020-06-05 | 2023-12-20 | 富士フイルム株式会社 | 光吸収異方性膜、積層体および画像表示装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2022009658A1 (ja) | 2022-01-13 |
| CN116171288B (zh) | 2024-11-26 |
| JP7553564B2 (ja) | 2024-09-18 |
| US20230135489A1 (en) | 2023-05-04 |
| CN116171288A (zh) | 2023-05-26 |
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