JPWO2021251157A1 - - Google Patents

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Publication number
JPWO2021251157A1
JPWO2021251157A1 JP2022530126A JP2022530126A JPWO2021251157A1 JP WO2021251157 A1 JPWO2021251157 A1 JP WO2021251157A1 JP 2022530126 A JP2022530126 A JP 2022530126A JP 2022530126 A JP2022530126 A JP 2022530126A JP WO2021251157 A1 JPWO2021251157 A1 JP WO2021251157A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2022530126A
Other versions
JP7537494B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Publication of JPWO2021251157A1 publication Critical patent/JPWO2021251157A1/ja
Application granted granted Critical
Publication of JP7537494B2 publication Critical patent/JP7537494B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Plasma & Fusion (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2022530126A 2020-06-08 2021-05-27 ペリクルフレーム、ペリクル、ペリクル付露光原版、露光方法、半導体の製造方法及び液晶表示板の製造方法 Active JP7537494B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020099139 2020-06-08
JP2020099139 2020-06-08
PCT/JP2021/020161 WO2021251157A1 (ja) 2020-06-08 2021-05-27 ペリクルフレーム、ペリクル、ペリクル付露光原版、露光方法、半導体の製造方法及び液晶表示板の製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2024127953A Division JP2024150755A (ja) 2020-06-08 2024-08-02 ペリクルフレーム、ペリクル、ペリクル付露光原版、露光方法及び半導体の製造方法

Publications (2)

Publication Number Publication Date
JPWO2021251157A1 true JPWO2021251157A1 (ja) 2021-12-16
JP7537494B2 JP7537494B2 (ja) 2024-08-21

Family

ID=78845571

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022530126A Active JP7537494B2 (ja) 2020-06-08 2021-05-27 ペリクルフレーム、ペリクル、ペリクル付露光原版、露光方法、半導体の製造方法及び液晶表示板の製造方法

Country Status (7)

Country Link
US (1) US20230221634A1 (ja)
EP (1) EP4163720A4 (ja)
JP (1) JP7537494B2 (ja)
KR (1) KR20230019853A (ja)
CN (2) CN216118382U (ja)
TW (2) TWM618972U (ja)
WO (1) WO2021251157A1 (ja)

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004191986A (ja) * 2002-12-09 2004-07-08 Asml Holding Nv 多孔質フィルタ挿入体及び突出したボンディング面を備えたペリクルフレームのための方法及び装置
JP2004294786A (ja) * 2003-03-27 2004-10-21 Semiconductor Leading Edge Technologies Inc ペリクル
US20060246234A1 (en) * 2005-04-20 2006-11-02 Yazaki Corporation Photomask assembly incorporating a metal/scavenger pellicle frame
WO2008105531A1 (ja) * 2007-03-01 2008-09-04 Nikon Corporation ペリクルフレーム装置、マスク、露光方法及び露光装置並びにデバイスの製造方法
JP2010107986A (ja) * 2008-11-03 2010-05-13 Mst Technology Co Ltd リソグラフィ用ペリクル
JP2018200380A (ja) * 2017-05-26 2018-12-20 日本特殊陶業株式会社 ペリクル枠及びその製造方法
JP2019070745A (ja) * 2017-10-10 2019-05-09 信越化学工業株式会社 ペリクルフレーム及びペリクル
WO2019188445A1 (ja) * 2018-03-27 2019-10-03 三井化学株式会社 ペリクル用支持枠、ペリクル、及びその製造方法、並びにこれらを用いた露光原版、半導体装置の製造方法
JP2020042105A (ja) * 2018-09-07 2020-03-19 日本特殊陶業株式会社 ペリクル枠及びペリクル

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6837433B2 (ja) * 2014-11-17 2021-03-03 エーエスエムエル ネザーランズ ビー．ブイ． ペリクル取り付け装置及びペリクル取り付け方法
JP7357432B2 (ja) * 2017-10-10 2023-10-06 信越化学工業株式会社 Ｅｕｖ用ペリクルフレーム、ペリクル、ペリクル付露光原版、露光方法、及び半導体の製造方法

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004191986A (ja) * 2002-12-09 2004-07-08 Asml Holding Nv 多孔質フィルタ挿入体及び突出したボンディング面を備えたペリクルフレームのための方法及び装置
JP2004294786A (ja) * 2003-03-27 2004-10-21 Semiconductor Leading Edge Technologies Inc ペリクル
US20060246234A1 (en) * 2005-04-20 2006-11-02 Yazaki Corporation Photomask assembly incorporating a metal/scavenger pellicle frame
WO2008105531A1 (ja) * 2007-03-01 2008-09-04 Nikon Corporation ペリクルフレーム装置、マスク、露光方法及び露光装置並びにデバイスの製造方法
JP2010107986A (ja) * 2008-11-03 2010-05-13 Mst Technology Co Ltd リソグラフィ用ペリクル
JP2018200380A (ja) * 2017-05-26 2018-12-20 日本特殊陶業株式会社 ペリクル枠及びその製造方法
JP2019070745A (ja) * 2017-10-10 2019-05-09 信越化学工業株式会社 ペリクルフレーム及びペリクル
WO2019188445A1 (ja) * 2018-03-27 2019-10-03 三井化学株式会社 ペリクル用支持枠、ペリクル、及びその製造方法、並びにこれらを用いた露光原版、半導体装置の製造方法
JP2020042105A (ja) * 2018-09-07 2020-03-19 日本特殊陶業株式会社 ペリクル枠及びペリクル

Also Published As

Publication number Publication date
EP4163720A1 (en) 2023-04-12
TWM618972U (zh) 2021-11-01
US20230221634A1 (en) 2023-07-13
EP4163720A4 (en) 2024-08-14
WO2021251157A1 (ja) 2021-12-16
KR20230019853A (ko) 2023-02-09
CN216118382U (zh) 2022-03-22
TW202147018A (zh) 2021-12-16
CN115668055A (zh) 2023-01-31
JP7537494B2 (ja) 2024-08-21

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