JPWO2021200357A1 - - Google Patents

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Publication number
JPWO2021200357A1
JPWO2021200357A1 JP2021516844A JP2021516844A JPWO2021200357A1 JP WO2021200357 A1 JPWO2021200357 A1 JP WO2021200357A1 JP 2021516844 A JP2021516844 A JP 2021516844A JP 2021516844 A JP2021516844 A JP 2021516844A JP WO2021200357 A1 JPWO2021200357 A1 JP WO2021200357A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021516844A
Other languages
Japanese (ja)
Other versions
JP7115635B2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021200357A1 publication Critical patent/JPWO2021200357A1/ja
Application granted granted Critical
Publication of JP7115635B2 publication Critical patent/JP7115635B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00—Compositions of unspecified macromolecular compounds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/1336—Illuminating devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/06—Silver salts
JP2021516844A 2020-03-30 2021-03-23 Resin composition, light-shielding film, and substrate with partition Active JP7115635B2 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020061244 2020-03-30
JP2020061244 2020-03-30
PCT/JP2021/011831 WO2021200357A1 (en) 2020-03-30 2021-03-23 Resin composition, light-shielding film, and substrate with partition wall

Publications (2)

Publication Number Publication Date
JPWO2021200357A1 true JPWO2021200357A1 (en) 2021-10-07
JP7115635B2 JP7115635B2 (en) 2022-08-09

Family

ID=77929869

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021516844A Active JP7115635B2 (en) 2020-03-30 2021-03-23 Resin composition, light-shielding film, and substrate with partition

Country Status (5)

Country Link
JP (1) JP7115635B2 (en)
KR (1) KR20220161259A (en)
CN (1) CN115427514B (en)
TW (1) TW202138459A (en)
WO (1) WO2021200357A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023157713A1 (en) * 2022-02-16 2023-08-24 東レ株式会社 Resin composition, light-blocking film, method for producing light-blocking film, substrate having partitioning wall attached thereto, and display device

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001166419A (en) * 1999-12-06 2001-06-22 Konica Corp Heat developable photosensitive material and image forming method for same
JP2008516039A (en) * 2004-10-08 2008-05-15 キネテイツク・リミテツド Active filler particles in ink
US20160332145A1 (en) * 2015-05-11 2016-11-17 Eastman Kodak Company Metal catalytic compositions and articles therefrom
WO2020008969A1 (en) * 2018-07-05 2020-01-09 東レ株式会社 Resin composition, light-blocking film, method for producing light-blocking film, and substrate having partitioning wall attached thereto

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5393638A (en) * 1990-06-12 1995-02-28 Canon Kabushiki Kaisha Image forming method
JP2000131683A (en) 1998-10-29 2000-05-12 Hitachi Ltd Color display device
JP4352509B2 (en) 1999-06-07 2009-10-28 東レ株式会社 Photosensitive paste and display member manufacturing method
JP4401196B2 (en) * 2003-03-10 2010-01-20 富士フイルム株式会社 Dye-containing curable composition, color filter and method for producing the same
JP4197177B2 (en) 2005-03-18 2008-12-17 東京応化工業株式会社 Photo-curable resin composition for forming black matrix, photosensitive film using the same, method for forming black matrix, black matrix and plasma display panel having the black matrix
JP2008051934A (en) * 2006-08-23 2008-03-06 Fujifilm Corp Photosensitive composition and photosensitive transfer material using the same, light-shielding film for display device and method for producing the same, substrate with the light-shielding film, and the display device
JP2009244383A (en) 2008-03-28 2009-10-22 Fujifilm Corp Liquid crystal display device
KR101972723B1 (en) * 2015-09-30 2019-04-25 도레이 카부시키가이샤 Negative-type colored photosensitive resin composition, cured film, element and display device
KR102247840B1 (en) * 2016-03-18 2021-05-03 제이에스알 가부시끼가이샤 Substrate for display device, manufacturing method of the substrate for display device, and display device
US10889755B2 (en) * 2016-11-22 2021-01-12 Samsung Electronics Co., Ltd. Photosensitive resin composition, complex, laminated structure and display device, and electronic device including the same

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001166419A (en) * 1999-12-06 2001-06-22 Konica Corp Heat developable photosensitive material and image forming method for same
JP2008516039A (en) * 2004-10-08 2008-05-15 キネテイツク・リミテツド Active filler particles in ink
US20160332145A1 (en) * 2015-05-11 2016-11-17 Eastman Kodak Company Metal catalytic compositions and articles therefrom
WO2020008969A1 (en) * 2018-07-05 2020-01-09 東レ株式会社 Resin composition, light-blocking film, method for producing light-blocking film, and substrate having partitioning wall attached thereto

Also Published As

Publication number Publication date
CN115427514A (en) 2022-12-02
KR20220161259A (en) 2022-12-06
CN115427514B (en) 2024-01-02
TW202138459A (en) 2021-10-16
WO2021200357A1 (en) 2021-10-07
JP7115635B2 (en) 2022-08-09

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