JPWO2021193198A1 - - Google Patents

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Publication number
JPWO2021193198A1
JPWO2021193198A1 JP2022509952A JP2022509952A JPWO2021193198A1 JP WO2021193198 A1 JPWO2021193198 A1 JP WO2021193198A1 JP 2022509952 A JP2022509952 A JP 2022509952A JP 2022509952 A JP2022509952 A JP 2022509952A JP WO2021193198 A1 JPWO2021193198 A1 JP WO2021193198A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2022509952A
Other languages
Japanese (ja)
Other versions
JP7393525B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021193198A1 publication Critical patent/JPWO2021193198A1/ja
Priority to JP2023199000A priority Critical patent/JP2024020516A/ja
Application granted granted Critical
Publication of JP7393525B2 publication Critical patent/JP7393525B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/10Investigating individual particles
    • G01N15/14Optical investigation techniques, e.g. flow cytometry
    • G01N15/1434Optical arrangements
    • G01N15/1436Optical arrangements the optical arrangement forming an integrated apparatus with the sample container, e.g. a flow cell
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/10Investigating individual particles
    • G01N15/14Optical investigation techniques, e.g. flow cytometry
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01Arrangements or apparatus for facilitating the optical investigation
    • G01N21/03Cuvette constructions
    • G01N21/05Flow-through cuvettes
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47Scattering, i.e. diffuse reflection
    • G01N21/49Scattering, i.e. diffuse reflection within a body or fluid
    • G01N21/53Scattering, i.e. diffuse reflection within a body or fluid within a flowing fluid, e.g. smoke
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/85Investigating moving fluids or granular solids
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/6715Apparatus for applying a liquid, a resin, an ink or the like
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67253Process monitoring, e.g. flow or thickness monitoring

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Immunology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP2022509952A 2020-03-27 2021-03-15 異物検出装置、基板処理装置、及び異物検出装置の動作確認方法 Active JP7393525B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2023199000A JP2024020516A (ja) 2020-03-27 2023-11-24 異物検出装置、基板処理装置、及び異物検出方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020058776 2020-03-27
JP2020058776 2020-03-27
PCT/JP2021/010383 WO2021193198A1 (ja) 2020-03-27 2021-03-15 異物検出装置、基板処理装置、及び異物検出装置の動作確認方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2023199000A Division JP2024020516A (ja) 2020-03-27 2023-11-24 異物検出装置、基板処理装置、及び異物検出方法

Publications (2)

Publication Number Publication Date
JPWO2021193198A1 true JPWO2021193198A1 (zh) 2021-09-30
JP7393525B2 JP7393525B2 (ja) 2023-12-06

Family

ID=77892096

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2022509952A Active JP7393525B2 (ja) 2020-03-27 2021-03-15 異物検出装置、基板処理装置、及び異物検出装置の動作確認方法
JP2023199000A Pending JP2024020516A (ja) 2020-03-27 2023-11-24 異物検出装置、基板処理装置、及び異物検出方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2023199000A Pending JP2024020516A (ja) 2020-03-27 2023-11-24 異物検出装置、基板処理装置、及び異物検出方法

Country Status (5)

Country Link
JP (2) JP7393525B2 (zh)
KR (1) KR20220159403A (zh)
CN (1) CN115335686A (zh)
TW (1) TW202208823A (zh)
WO (1) WO2021193198A1 (zh)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01321324A (ja) * 1988-06-24 1989-12-27 Shimadzu Corp 複数試料の測定が可能な分光光度計
JPH10177940A (ja) * 1996-12-17 1998-06-30 Sony Corp 薬液供給装置
US20180128733A1 (en) * 2016-11-07 2018-05-10 Applied Materials, Inc. Methods and apparatus for detection and analysis of nanoparticles from semiconductor chamber parts
WO2018135487A1 (ja) * 2017-01-20 2018-07-26 東京エレクトロン株式会社 異物検出装置、異物検出方法及び記憶媒体
JP2018121075A (ja) * 2018-04-06 2018-08-02 東京エレクトロン株式会社 基板処理装置及び基板処理方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3151036B2 (ja) 1992-02-06 2001-04-03 ミクニキカイ株式会社 サブミクロン粒子の検出方法および装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01321324A (ja) * 1988-06-24 1989-12-27 Shimadzu Corp 複数試料の測定が可能な分光光度計
JPH10177940A (ja) * 1996-12-17 1998-06-30 Sony Corp 薬液供給装置
US20180128733A1 (en) * 2016-11-07 2018-05-10 Applied Materials, Inc. Methods and apparatus for detection and analysis of nanoparticles from semiconductor chamber parts
WO2018135487A1 (ja) * 2017-01-20 2018-07-26 東京エレクトロン株式会社 異物検出装置、異物検出方法及び記憶媒体
JP2018121075A (ja) * 2018-04-06 2018-08-02 東京エレクトロン株式会社 基板処理装置及び基板処理方法

Also Published As

Publication number Publication date
JP7393525B2 (ja) 2023-12-06
JP2024020516A (ja) 2024-02-14
KR20220159403A (ko) 2022-12-02
WO2021193198A1 (ja) 2021-09-30
TW202208823A (zh) 2022-03-01
CN115335686A (zh) 2022-11-11

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