JPWO2021124403A1 - 立方晶窒化硼素焼結体 - Google Patents
立方晶窒化硼素焼結体 Download PDFInfo
- Publication number
- JPWO2021124403A1 JPWO2021124403A1 JP2020540511A JP2020540511A JPWO2021124403A1 JP WO2021124403 A1 JPWO2021124403 A1 JP WO2021124403A1 JP 2020540511 A JP2020540511 A JP 2020540511A JP 2020540511 A JP2020540511 A JP 2020540511A JP WO2021124403 A1 JPWO2021124403 A1 JP WO2021124403A1
- Authority
- JP
- Japan
- Prior art keywords
- group
- boron nitride
- sintered body
- cubic boron
- powder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 title claims abstract description 122
- 229910052582 BN Inorganic materials 0.000 title claims abstract description 119
- 239000002245 particle Substances 0.000 claims abstract description 95
- 150000001875 compounds Chemical class 0.000 claims abstract description 73
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 56
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 30
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 30
- 229910017052 cobalt Inorganic materials 0.000 claims abstract description 30
- 239000010941 cobalt Substances 0.000 claims abstract description 30
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims abstract description 28
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 28
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 27
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 27
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 26
- 229910021480 group 4 element Inorganic materials 0.000 claims abstract description 26
- 229910021478 group 5 element Inorganic materials 0.000 claims abstract description 26
- 229910021476 group 6 element Inorganic materials 0.000 claims abstract description 26
- 239000010703 silicon Substances 0.000 claims abstract description 26
- 230000000737 periodic effect Effects 0.000 claims abstract description 25
- 239000006104 solid solution Substances 0.000 claims abstract description 23
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 22
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 20
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 18
- 239000000956 alloy Substances 0.000 claims abstract description 18
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 15
- 229910052796 boron Inorganic materials 0.000 claims abstract description 15
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 15
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 15
- 239000001301 oxygen Substances 0.000 claims abstract description 15
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims abstract description 13
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 10
- 229910052742 iron Inorganic materials 0.000 claims abstract description 5
- 239000011575 calcium Substances 0.000 claims description 19
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 17
- 229910052791 calcium Inorganic materials 0.000 claims description 17
- 239000000126 substance Substances 0.000 abstract description 12
- 230000008707 rearrangement Effects 0.000 abstract 1
- 239000000843 powder Substances 0.000 description 157
- 239000002994 raw material Substances 0.000 description 64
- 239000011230 binding agent Substances 0.000 description 63
- 238000000034 method Methods 0.000 description 47
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 33
- 238000005520 cutting process Methods 0.000 description 30
- 238000005259 measurement Methods 0.000 description 21
- 229910000760 Hardened steel Inorganic materials 0.000 description 16
- 239000011651 chromium Substances 0.000 description 15
- 239000000463 material Substances 0.000 description 15
- 229910052751 metal Inorganic materials 0.000 description 15
- 239000002184 metal Substances 0.000 description 13
- 239000011812 mixed powder Substances 0.000 description 13
- 239000000203 mixture Substances 0.000 description 13
- 239000010936 titanium Substances 0.000 description 13
- 238000003754 machining Methods 0.000 description 12
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 11
- 229910052804 chromium Inorganic materials 0.000 description 10
- 229910052735 hafnium Inorganic materials 0.000 description 10
- 238000002156 mixing Methods 0.000 description 10
- 229910052750 molybdenum Inorganic materials 0.000 description 10
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 9
- 238000002441 X-ray diffraction Methods 0.000 description 9
- 239000012535 impurity Substances 0.000 description 9
- 239000011733 molybdenum Substances 0.000 description 9
- 238000010298 pulverizing process Methods 0.000 description 9
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 8
- 229910052715 tantalum Inorganic materials 0.000 description 8
- 229910052721 tungsten Inorganic materials 0.000 description 8
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 7
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 7
- 229910052719 titanium Inorganic materials 0.000 description 7
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 7
- 239000010937 tungsten Substances 0.000 description 7
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 6
- 238000004458 analytical method Methods 0.000 description 6
- 229910000765 intermetallic Inorganic materials 0.000 description 6
- 239000010955 niobium Substances 0.000 description 6
- 229910010413 TiO 2 Inorganic materials 0.000 description 5
- 239000003054 catalyst Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- -1 hafnium nitride Chemical class 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 238000000691 measurement method Methods 0.000 description 5
- 229910052758 niobium Inorganic materials 0.000 description 5
- 239000012299 nitrogen atmosphere Substances 0.000 description 5
- 229910052720 vanadium Inorganic materials 0.000 description 5
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 5
- ZVWKZXLXHLZXLS-UHFFFAOYSA-N zirconium nitride Chemical compound [Zr]#N ZVWKZXLXHLZXLS-UHFFFAOYSA-N 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 238000000227 grinding Methods 0.000 description 4
- 229910017604 nitric acid Inorganic materials 0.000 description 4
- 150000004767 nitrides Chemical class 0.000 description 4
- 238000005245 sintering Methods 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000009616 inductively coupled plasma Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 230000005469 synchrotron radiation Effects 0.000 description 3
- NMJKIRUDPFBRHW-UHFFFAOYSA-N titanium Chemical compound [Ti].[Ti] NMJKIRUDPFBRHW-UHFFFAOYSA-N 0.000 description 3
- INZDTEICWPZYJM-UHFFFAOYSA-N 1-(chloromethyl)-4-[4-(chloromethyl)phenyl]benzene Chemical compound C1=CC(CCl)=CC=C1C1=CC=C(CCl)C=C1 INZDTEICWPZYJM-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 229910026551 ZrC Inorganic materials 0.000 description 2
- OTCHGXYCWNXDOA-UHFFFAOYSA-N [C].[Zr] Chemical compound [C].[Zr] OTCHGXYCWNXDOA-UHFFFAOYSA-N 0.000 description 2
- SKKMWRVAJNPLFY-UHFFFAOYSA-N azanylidynevanadium Chemical compound [V]#N SKKMWRVAJNPLFY-UHFFFAOYSA-N 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 239000002775 capsule Substances 0.000 description 2
- 239000000571 coke Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- WHJFNYXPKGDKBB-UHFFFAOYSA-N hafnium;methane Chemical compound C.[Hf] WHJFNYXPKGDKBB-UHFFFAOYSA-N 0.000 description 2
- 229960002050 hydrofluoric acid Drugs 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 239000011572 manganese Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- UNASZPQZIFZUSI-UHFFFAOYSA-N methylidyneniobium Chemical compound [Nb]#C UNASZPQZIFZUSI-UHFFFAOYSA-N 0.000 description 2
- NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical compound [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 description 2
- 229910000480 nickel oxide Inorganic materials 0.000 description 2
- 238000001878 scanning electron micrograph Methods 0.000 description 2
- 238000000550 scanning electron microscopy energy dispersive X-ray spectroscopy Methods 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 230000002194 synthesizing effect Effects 0.000 description 2
- 229910003468 tantalcarbide Inorganic materials 0.000 description 2
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 2
- PMTRSEDNJGMXLN-UHFFFAOYSA-N titanium zirconium Chemical compound [Ti].[Zr] PMTRSEDNJGMXLN-UHFFFAOYSA-N 0.000 description 2
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 1
- 229910020639 Co-Al Inorganic materials 0.000 description 1
- 229910020675 Co—Al Inorganic materials 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910003564 SiAlON Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910004688 Ti-V Inorganic materials 0.000 description 1
- 229910010038 TiAl Inorganic materials 0.000 description 1
- 229910010037 TiAlN Inorganic materials 0.000 description 1
- 229910010169 TiCr Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 229910011214 Ti—Mo Inorganic materials 0.000 description 1
- 229910010968 Ti—V Inorganic materials 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- KREHIIWCKNFTNC-UHFFFAOYSA-N [Cr].[Ti].[Ti] Chemical compound [Cr].[Ti].[Ti] KREHIIWCKNFTNC-UHFFFAOYSA-N 0.000 description 1
- QAKIDWGXFZCSRP-UHFFFAOYSA-N [Ti].[Mo].[Ti] Chemical compound [Ti].[Mo].[Ti] QAKIDWGXFZCSRP-UHFFFAOYSA-N 0.000 description 1
- YSTWCCHWWMEAKP-UHFFFAOYSA-N [Ti].[V].[Ti] Chemical compound [Ti].[V].[Ti] YSTWCCHWWMEAKP-UHFFFAOYSA-N 0.000 description 1
- GGPQWIMALBOMEF-UHFFFAOYSA-N [Ti].[Zr].[Ti] Chemical compound [Ti].[Zr].[Ti] GGPQWIMALBOMEF-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- HKBLLJHFVVWMTK-UHFFFAOYSA-N alumane;titanium Chemical compound [AlH3].[Ti].[Ti] HKBLLJHFVVWMTK-UHFFFAOYSA-N 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- CXOWYMLTGOFURZ-UHFFFAOYSA-N azanylidynechromium Chemical compound [Cr]#N CXOWYMLTGOFURZ-UHFFFAOYSA-N 0.000 description 1
- GPBUGPUPKAGMDK-UHFFFAOYSA-N azanylidynemolybdenum Chemical compound [Mo]#N GPBUGPUPKAGMDK-UHFFFAOYSA-N 0.000 description 1
- IVHJCRXBQPGLOV-UHFFFAOYSA-N azanylidynetungsten Chemical compound [W]#N IVHJCRXBQPGLOV-UHFFFAOYSA-N 0.000 description 1
- 238000000498 ball milling Methods 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- HGHPQUIZVKPZEU-UHFFFAOYSA-N boranylidynezirconium Chemical compound [B].[Zr] HGHPQUIZVKPZEU-UHFFFAOYSA-N 0.000 description 1
- UFGZSIPAQKLCGR-UHFFFAOYSA-N chromium carbide Chemical compound [Cr]#C[Cr]C#[Cr] UFGZSIPAQKLCGR-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 description 1
- GNTDGMZSJNCJKK-UHFFFAOYSA-N divanadium pentaoxide Chemical compound O=[V](=O)O[V](=O)=O GNTDGMZSJNCJKK-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 238000004993 emission spectroscopy Methods 0.000 description 1
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(iv) oxide Chemical compound O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 238000010191 image analysis Methods 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- CNEOGBIICRAWOH-UHFFFAOYSA-N methane;molybdenum Chemical compound C.[Mo] CNEOGBIICRAWOH-UHFFFAOYSA-N 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- JKQOBWVOAYFWKG-UHFFFAOYSA-N molybdenum trioxide Chemical compound O=[Mo](=O)=O JKQOBWVOAYFWKG-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 238000001004 secondary ion mass spectrometry Methods 0.000 description 1
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000011863 silicon-based powder Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- CGZLUZNJEQKHBX-UHFFFAOYSA-N titanium tungsten Chemical compound [Ti][Ti][W] CGZLUZNJEQKHBX-UHFFFAOYSA-N 0.000 description 1
- NGTRBIBDROJPHU-UHFFFAOYSA-N titanium tungsten Chemical compound [Ti][Ti][W][Ti] NGTRBIBDROJPHU-UHFFFAOYSA-N 0.000 description 1
- GFNGCDBZVSLSFT-UHFFFAOYSA-N titanium vanadium Chemical compound [Ti].[V] GFNGCDBZVSLSFT-UHFFFAOYSA-N 0.000 description 1
- 229910003470 tongbaite Inorganic materials 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten trioxide Chemical compound O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/58—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
- C04B35/583—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on boron nitride
- C04B35/5831—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on boron nitride based on cubic boron nitrides or Wurtzitic boron nitrides, including crystal structure transformation of powder
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/12—Both compacting and sintering
- B22F3/14—Both compacting and sintering simultaneously
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
- B23B27/148—Composition of the cutting inserts
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
- B23B27/18—Cutting tools of which the bits or tips or cutting inserts are of special material with cutting bits or tips or cutting inserts rigidly mounted, e.g. by brazing
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Abstract
Description
前記結合相は、
・周期律表の第4族元素、第5族元素、第6族元素、アルミニウム、珪素、コバルト及びニッケルからなる群より選ばれる単体、合金、金属間化合物からなる群より選ばれる少なくとも1種を含み、又は、
・周期律表の第4族元素、第5族元素、第6族元素、アルミニウム、珪素、コバルト及びニッケルからなる群より選ばれる少なくとも1種の元素と、窒素、炭素、硼素及び酸素からなる群より選ばれる少なくとも1種の元素とからなる化合物、及び、前記化合物由来の固溶体からなる群より選ばれる少なくとも1種とを含み、又は、
・周期律表の第4族元素、第5族元素、第6族元素、アルミニウム、珪素、コバルト及びニッケルからなる群より選ばれる単体、合金、金属間化合物からなる群より選ばれる少なくとも1種、並びに、周期律表の第4族元素、第5族元素、第6族元素、アルミニウム、珪素、コバルト及びニッケルからなる群より選ばれる少なくとも1種の元素と、窒素、炭素、硼素及び酸素からなる群より選ばれる少なくとも1種の元素とからなる化合物、及び、前記化合物由来の固溶体からなる群より選ばれる少なくとも1種を含み、
前記立方晶窒化硼素粒子の転位密度は、3×1017/m2以上1×1020/m2以下である、立方晶窒化硼素焼結体である。
近年、コスト低減の観点から、焼入鋼の断続加工において長い工具寿命を有することのできる立方晶窒化硼素焼結体が望まれている。
本開示の立方晶窒化硼素焼結体は、工具材料として用いた場合に、焼入鋼の断続加工においても、工具の長寿命化を可能とすることができる。
最初に本開示の実施態様を列記して説明する。
前記結合相は、
・周期律表の第4族元素、第5族元素、第6族元素、アルミニウム、珪素、コバルト及びニッケルからなる群より選ばれる単体、合金、金属間化合物からなる群より選ばれる少なくとも1種を含み、又は、
・周期律表の第4族元素、第5族元素、第6族元素、アルミニウム、珪素、コバルト及びニッケルからなる群より選ばれる少なくとも1種の元素と、窒素、炭素、硼素及び酸素からなる群より選ばれる少なくとも1種の元素とからなる化合物、及び、前記化合物由来の固溶体からなる群より選ばれる少なくとも1種とを含み、又は、
・周期律表の第4族元素、第5族元素、第6族元素、アルミニウム、珪素、コバルト及びニッケルからなる群より選ばれる単体、合金、金属間化合物からなる群より選ばれる少なくとも1種、並びに、周期律表の第4族元素、第5族元素、第6族元素、アルミニウム、珪素、コバルト及びニッケルからなる群より選ばれる少なくとも1種の元素と、窒素、炭素、硼素及び酸素からなる群より選ばれる少なくとも1種の元素とからなる化合物、及び、前記化合物由来の固溶体からなる群より選ばれる少なくとも1種を含み、
前記立方晶窒化硼素粒子の転位密度は、3×1017/m2以上1×1020/m2以下である、立方晶窒化硼素焼結体である。
本発明者らは、まず、従来の立方晶窒化硼素焼結体を用いた工具を焼入鋼の断続加工に用いた場合、工具寿命が低下する原因について検討した。その結果、立方晶窒化硼素焼結体の強度が不足しているため、特に工具を焼入鋼の断続加工に用いた場合、強度不足による亀裂の発生により、工具寿命の低下につながっていることを新たに見出した。
本開示の一実施形態に係る立方晶窒化硼素焼結体は、30体積%以上80体積%以下の立方晶窒化硼素粒子と、20体積%以上70体積%以下の結合相と、を備える立方晶窒化硼素焼結体であって、
前記結合相は、
・周期律表の第4族元素、第5族元素、第6族元素、アルミニウム、珪素、コバルト及びニッケルからなる群より選ばれる単体、合金、金属間化合物からなる群より選ばれる少なくとも1種を含み、又は、
・周期律表の第4族元素、第5族元素、第6族元素、アルミニウム、珪素、コバルト及びニッケルからなる群より選ばれる少なくとも1種の元素と、窒素、炭素、硼素及び酸素からなる群より選ばれる少なくとも1種の元素とからなる化合物、及び、前記化合物由来の固溶体からなる群より選ばれる少なくとも1種とを含み、又は、
・周期律表の第4族元素、第5族元素、第6族元素、アルミニウム、珪素、コバルト及びニッケルからなる群より選ばれる単体、合金、金属間化合物からなる群より選ばれる少なくとも1種、並びに、周期律表の第4族元素、第5族元素、第6族元素、アルミニウム、珪素、コバルト及びニッケルからなる群より選ばれる少なくとも1種の元素と、窒素、炭素、硼素及び酸素からなる群より選ばれる少なくとも1種の元素とからなる化合物、及び、前記化合物由来の固溶体からなる群より選ばれる少なくとも1種を含み、
該立方晶窒化硼素粒子の転位密度は、3×1017/m2以上1×1020/m2以下である、立方晶窒化硼素焼結体である。
・周期律表の第4族元素、第5族元素、第6族元素、アルミニウム、珪素、コバルト及びニッケルからなる群より選ばれる単体、合金、金属間化合物からなる群より選ばれる少なくとも1種を含み、又は、
・周期律表の第4族元素、第5族元素、第6族元素、アルミニウム、珪素、コバルト及びニッケルからなる群より選ばれる少なくとも1種の元素と、窒素、炭素、硼素及び酸素からなる群より選ばれる少なくとも1種の元素とからなる化合物、及び、該化合物由来の固溶体からなる群より選ばれる少なくとも1種とを含み、又は、
・周期律表の第4族元素、第5族元素、第6族元素、アルミニウム、珪素、コバルト及びニッケルからなる群より選ばれる単体、合金、金属間化合物からなる群より選ばれる少なくとも1種、並びに、周期律表の第4族元素、第5族元素、第6族元素、アルミニウム、珪素、コバルト及びニッケルからなる群より選ばれる少なくとも1種の元素と、窒素、炭素、硼素及び酸素からなる群より選ばれる少なくとも1種の元素とからなる化合物、及び、該化合物由来の固溶体からなる群より選ばれる少なくとも1種を含む。
本開示の立方晶窒化硼素焼結体は、30体積%以上80体積%以下の立方晶窒化硼素粒子と、20体積%以上70体積%以下の結合相と、を備える。なお、cBN焼結体は、原材料、製造条件等に起因する不可避不純物を含み得る。
本開示の立方晶窒化硼素焼結体は、本開示の効果を示す範囲において不可避不純物を含んでいても構わない。不可避不純物としては、例えば、水素、酸素、炭素、アルカリ金属元素(リチウム(Li)、ナトリウム(Na)、カリウム(K)等)及びアルカリ土類金属元素(カルシウム(Ca)、マグネシウム(Mg)等)等の金属元素を挙げることができる。立方晶窒化硼素焼結体が不可避不純物を含む場合は、不可避不純物の含有量は0.1質量%以下であることが好ましい。不可避不純物の含有量は、二次イオン質量分析(SIMS)により測定することができる。
(転位密度)
本開示の立方晶窒化硼素焼結体に含まれる立方晶窒化硼素粒子の転位密度は、3×1017/m2以上1×1020/m2以下である。該立方晶窒化硼素粒子では、転位同士が3次元的に接触しているため、全方向に対する強度が向上し、耐欠損性が向上すると推察される。また、転位密度が1×1020/m2以下であると、粒子内の欠陥に由来する欠損が生じにくく、工具寿命が長くなる。
X線源:放射光
装置条件:検出器MYTHEN
エネルギー:18keV(波長:0.6888Å)
カメラ長:573mm
測定ピーク:立方晶窒化硼素の(111)、(200)、(220)、(311)、(400)、(531)の6本。ただし、集合組織、配向によりプロファイルの取得が困難な場合は、その面指数のピークを除く。
上記式(I)におけるCは、下記式(II)で表される。
上記式(II)において、らせん転位と刃状転位におけるそれぞれのコントラストファクターCh00およびコントラストファクターに関する係数qは、計算コードANIZCを用い、すべり系が<110>{111}、弾性スティフネスC11が8.44GPa、C12が1.9GPa、C44が4.83GPaとして求める。コントラストファクターCh00は、らせん転位0.203であり、刃状転位0.212である。コントラストファクターに関する係数qは、らせん転位1.65であり、刃状転位0.58である。なお、らせん転位比率は0.5、刃状転位比率は0.5に固定する。
(上記式(III)において、Reは転位の有効半径を示す。)
上記式(III)の関係と、Warren−Averbachの式より、下記式(IV)の様に表すことができ、修正Warren−Averbach法として、転位密度ρ及び結晶子サイズを求めることができる。
修正Williamson−Hall法及び修正Warren−Averbach法の詳細は、“T.Ungar and A.Borbely,“The effect of dislocation contrast on x−ray line broadening:A new approach to line profile analysis”Appl.Phys.Lett.,vol.69,no.21,p.3173,1996.”及び“T.Ungar,S.Ott,P.Sanders,A.Borbely,J.Weertman,“Dislocations,grain size and planar faults in nanostructured copper determined by high resolution X−ray diffraction and a new procedure of peak profile analysis”Acta Mater.,vol.46,no.10,pp.3693−3699,1998.”に記載されている。
本開示の立方晶窒化硼素焼結体に含まれる立方晶窒化硼素粒子は、カルシウムを0.2質量%以下含むことが好ましい。cBN粒子がカルシウムを含むと、cBN粒子中の原子空孔が低減され、cBN粒子自体の常温及び高温時の強度及び靱性が向上し、立方晶窒化硼素焼結体を用いた工具の寿命が更に向上する。
立方晶窒化硼素焼結体サンプルを密閉容器内で弗硝酸(弗酸:硝酸=5:5(体積比))に48時間浸漬する。これにより、結合相は全て弗硝酸に溶解し、cBN粒子のみが残る。該cBN粒子に対して高周波誘導プラズマ発光分析(ICP)(測定装置:サーモフィッシャーiCAP6500)を行い、cBN粒子のカルシウム含有量を定量測定する。
本開示の立方晶窒化硼素焼結体に含まれる立方晶窒化硼素粒子の円相当径のメジアン径d50(以下、「メジアン径d50」とも記す。)は、1nm以上10000nm以下が好ましく、10nm以上8000nm以下がより好ましい。これによると、立方晶窒化硼素焼結体を用いた工具は、長い工具寿命を有することができる。
結合相は、難焼結性材料であるcBN粒子を工業レベルの圧力温度で焼結可能とする役割を果たす。また、鉄との反応性がcBNより低いため、高硬度焼入鋼の切削において、化学的摩耗及び熱的摩耗を抑制する働きを付加する。また、cBN焼結体が結合相を含有すると、高硬度焼入鋼の高能率加工における耐摩耗性が向上する。
・周期律表の第4族元素、第5族元素、第6族元素、アルミニウム、珪素、コバルト及びニッケルからなる群(以下、「群A」とも記す。)より選ばれる単体、合金、金属間化合物からなる群より選ばれる少なくとも1種を含み、又は、
・周期律表の第4族元素、第5族元素、第6族元素、アルミニウム、珪素、コバルト及びニッケルからなる群(群A)より選ばれる少なくとも1種の元素と、窒素、炭素、硼素及び酸素からなる群(以下、「群B」とも記す。)より選ばれる少なくとも1種の元素とからなる化合物、及び、前記化合物由来の固溶体からなる群より選ばれる少なくとも1種とを含み、又は、
・周期律表の第4族元素、第5族元素、第6族元素、アルミニウム、珪素、コバルト及びニッケルからなる群(群A)より選ばれる単体、合金、金属間化合物からなる群より選ばれる少なくとも1種、並びに、周期律表の第4族元素、第5族元素、第6族元素、アルミニウム、珪素、コバルト及びニッケルからなる群(群A)より選ばれる少なくとも1種の元素と、窒素、炭素、硼素及び酸素からなる群(群B)より選ばれる少なくとも1種の元素とからなる化合物、及び、前記化合物由来の固溶体からなる群より選ばれる少なくとも1種を含む。すなわち、結合相は、下記の(a)〜(f)のいずれかの形態とすることができる。
(b)群Aの単体、合金、金属間化合物の少なくとも1種を含む。
結合相中の結合相化合物及び結合相化合物由来の固溶体の合計含有量の下限は、50体積%が好ましく、60体積%がより好ましく、70体積%が更に好ましい。結合相中の結合相化合物及び結合相化合物由来の固溶体の合計含有量の上限は、80体積%が好ましく、90体積%がより好ましく、100体積%が最も好ましい。結合相中の結合相化合物及び結合相化合物由来の固溶体の合計含有量は50体積%以上80体積%以下が好ましく、60体積%以上90体積%以下がより好ましく、70体積%以上100体積%以下が更に好ましい。
本開示の立方晶窒化硼素焼結体は、切削工具、耐摩工具、研削工具などに用いることが好適である。
本開示の立方晶窒化硼素焼結体は、例えば下記の方法で作製することができる。
cBN粉末とは、cBN焼結体に含まれるcBN粒子の原料粉末である。cBN粉末は、特に限定されず、公知のcBN粉末を用いることができる。中でも、cBN粉末は、六方晶窒化硼素粉末を、触媒であるLiCaBN2の存在下で立方晶窒化硼素の熱力学的安定領域内で保持して、立方晶窒化硼素粉末に変換させて得られたものであることが好ましい。
結合材原料粉末とは、cBN焼結体に含まれる結合相の原料粉末である。結合材原料粉末は、例えば、次のようにして調製することができる。76重量%のTiの窒化物、18重量%のAlを混合し、真空中で1200℃、30分熱処理をして、WC、Co及びAlを含む化合物を得る。該化合物を粉砕し、結合材原料粉末を作製する。
上記で準備したcBN粉末と結合材原料粉末とを、エタノールやアセトン等を溶媒に用いた湿式ボールミル混合を用いて混合し、混合粉末を作製する。溶媒は、混合後に自然乾燥により除去される。その後、熱処理を行うことにより、混合粉末の表面に吸着した水分などの不純物を揮発させ、混合粉末の表面を清浄化する。
上記の混合粉末をWC−6%Coの超硬合金製円盤とCo(コバルト)箔とに接した状態で、Ta(タンタル)製の容器に充填して真空シールする。真空シールされた混合粉末を、ベルト型超高圧高温発生装置を用いて、3〜9GPa、1100〜1900℃の条件下で5〜30分間保持して焼結させる。これにより、本開示の立方晶窒化硼素焼結体が作製される。
まず、立方晶窒化硼素粉末を下記の手順で準備した。
TiN粉末及びAl粉末を質量比85:15で混合し、真空中で1200℃、30分熱処理をしたのち、湿式のボールミルで混合及び粉砕して結合材原料粉末を得た。
cBN粉末に対する加圧処理条件を表1の「加圧処理」の「圧力(GPa)」及び「(時間)」欄に記載した条件に変更した以外は、試料1と同様の方法でcBN焼結体を作製した。
cBN粉末を合成する際に、5GPa、1450℃の条件下での保持時間を表1の「cBN粉末合成」の「触媒、保持時間」欄に記載した保持時間に変更した以外は、試料6と同様の方法でcBN焼結体を作製した。
結合材原料粉末を変更した以外は、試料5と同様の方法でcBN焼結体を作製した。結合材原料粉末は下記の手順で準備した。
結合材原料粉末を変更した以外は、試料5と同様の方法でcBN焼結体を作製した。結合材原料粉末は下記の手順で準備した。
結合材原料粉末を変更した以外は、試料5と同様の方法でcBN焼結体を作製した。結合材原料粉末は下記の手順で準備した。
結合材原料粉末を変更した以外は、試料5と同様の方法でcBN焼結体を作製した。結合材原料粉末は下記の手順で準備した。
結合材原料粉末を変更した以外は、試料5と同様の方法でcBN焼結体を作製した。結合材原料粉末は下記の手順で準備した。
結合材原料粉末を変更した以外は、試料5と同様の方法でcBN焼結体を作製した。結合材原料粉末は下記の手順で準備した。
結合材原料粉末を変更した以外は、試料5と同様の方法でcBN焼結体を作製した。結合材原料粉末は下記の手順で準備した。
結合材原料粉末を変更した以外は、試料5と同様の方法でcBN焼結体を作製した。結合材原料粉末は下記の手順で準備した。
結合材原料粉末を変更した以外は、試料5と同様の方法でcBN焼結体を作製した。結合材原料粉末は下記の手順で準備した。
結合材原料粉末を変更した以外は、試料5と同様の方法でcBN焼結体を作製した。結合材原料粉末は下記の手順で準備した。
結合材原料粉末を変更した以外は、試料5と同様の方法でcBN焼結体を作製した。結合材原料粉末は下記の手順で準備した。
結合材原料粉末を変更した以外は、試料5と同様の方法でcBN焼結体を作製した。結合材原料粉末は下記の手順で準備した。
結合材原料粉末を変更した以外は、試料5と同様の方法でcBN焼結体を作製した。結合材原料粉末は下記の手順で準備した。
結合材原料粉末を変更した以外は、試料5と同様の方法でcBN焼結体を作製した。結合材原料粉末は下記の手順で準備した。
結合材原料粉末を変更した以外は、試料5と同様の方法でcBN焼結体を作製した。結合材原料粉末は下記の手順で準備した。
結合材原料粉末を変更した以外は、試料5と同様の方法でcBN焼結体を作製した。結合材原料粉末は下記の手順で準備した。
混合粉末を作製する際のcBN粉末と結合材原料粉末との混合比率を、cBN焼結体中のcBN粒子の体積割合が表2及び表3の「cBN焼結体」の「cBN粒子」欄に記載される体積割合となるように調整した以外は、試料5と同様の方法でcBN焼結体を作製した。
cBN粉末に対して加圧処理を行わなかった以外は、試料6と同様の方法でcBN焼結体を作製した。
cBN粉末を作製する際に、触媒としてLiBN2を用い、5GPa、1450℃の条件下での保持時間を表3に記載した時間に変更した以外は、試料5と同様の方法でcBN焼結体を作製した。
cBN粉末合成後にボールミル粉砕に代えてアトライタ(使用機器:日本コークス工業社製「アトライタ」(商標)MS01SC型)粉砕(超硬合金製ボール)を10時間実施し、加圧処理を実施しなかった以外は、試料6と同様の方法でcBN焼結体を作製した。
cBN粉末合成後に加圧処理を行わず、混合粉末の焼結時に、0.2GPa/minの昇圧速度で7GPaまで昇圧し、7GPaかつ1700℃の条件下で5分間保持して焼結させた以外は、試料6と同様の方法でcBN焼結体を作製した。
(試料40)
cBN粉末を合成する際に、5GPa、1450℃の条件下での保持時間を1分に変更し、かつ、得られたcBN粉末に対して粉砕及び、加圧処理を実施しなかったこと以外は試料6と同様の方法でcBN焼結体を作製した。
(cBN焼結体の組成)
cBN焼結体におけるcBN粒子と結合相との体積比を測定した。具体的な測定方法は、上記の発明を実施するための形態に記載された方法と同一であるため、その説明は繰り返さない。各試料において、cBN焼結体におけるcBN粒子の体積比率は、表1〜表3の「cBN焼結体」の「cBN粒子(体積%)」欄に示される体積比率であり、結合相の体積比率は、表1〜表3の「cBN焼結体」の「結合相(体積%)」欄に示される通りであることが確認された。
cBN焼結体における結合相の組成をXRDにより特定した。結果を表1〜表3の「結合相」の「組成」の欄に示す。
cBN焼結体におけるcBN粒子の転位密度を測定した。具体的な測定方法は、上記の発明を実施するための形態に記載された方法と同一であるため、その説明は繰り返さない。結果を表1〜表3の「転位密度」欄に示す。
cBN焼結体におけるcBN粒子のカルシウム含有量をICP分析により測定した。具体的な測定方法は、上記の発明を実施するための形態に記載された方法と同一であるため、その説明は繰り返さない。結果を表1〜表3の「cBN粒子Ca含有量」欄に示す。
作製された各試料のcBN焼結体を用いて切削工具(基材形状:CNGA120408、刃先処理T01215)を作製した。これを用いて、以下の切削条件下で切削試験を実施した。下記の切削条件は、焼入鋼の断続加工に該当する。
送り速度:0.1mm/rev.
切込み:0.2mm
クーラント:DRY
切削方法:強断続切削
旋盤:LB400(オークマ株式会社製)
被削材:被削材:SCM415、HRC58−62、φ100mm×L300mmで長手方向にU形状の溝が4本付けられた形状
評価方法:1km毎に刃先を観察し、刃先のチッピング量を測定した。チッピング量が100μm以上となる時点の切削距離を測定し、この切削距離を切削工具の寿命とした。その結果を表1〜表3の「工具寿命」欄に示す。
試料1〜試料32及び試料37〜試料40のcBN焼結体は実施例に該当する。
Claims (6)
- 30体積%以上80体積%以下の立方晶窒化硼素粒子と、20体積%以上70体積%以下の結合相と、を備える立方晶窒化硼素焼結体であって、
前記結合相は、
・周期律表の第4族元素、第5族元素、第6族元素、アルミニウム、珪素、鉄、コバルト及びニッケルからなる群より選ばれる1種以上の元素からなる単体、合金、金属間化合物、又は、
・周期律表の第4族元素、第5族元素、第6族元素、アルミニウム、珪素、鉄、コバルト及びニッケルからなる群より選ばれる少なくとも1種の元素と、窒素、炭素、硼素及び酸素からなる群より選ばれる少なくとも1種の元素とからなる化合物、及び、前記化合物由来の固溶体からなる群より選ばれる少なくとも1種を含み、
前記立方晶窒化硼素粒子の転位密度は、3×1017/m2以上1×1020/m2以下である、立方晶窒化硼素焼結体である、立方晶窒化硼素焼結体。 - 前記立方晶窒化硼素粒子の転位密度は、5×1017/m2以上9.5×1019/m2以下である、請求項1に記載の立方晶窒化硼素焼結体。
- 前記立方晶窒化硼素粒子は、カルシウムを0.2質量%以下含む、請求項1又は請求項2に記載の立方晶窒化硼素焼結体。
- 前記立方晶窒化硼素粒子は、カルシウムを0.17質量%以下含む、請求項3に記載の立方晶窒化硼素焼結体。
- 前記立方晶窒化硼素粒子は、カルシウムを0.15質量%以下含む、請求項4に記載の立方晶窒化硼素焼結体。
- 前記立方晶窒化硼素焼結体は、前記立方晶窒化硼素粒子を40体積%以上75体積%以下含む、請求項1から請求項5のいずれか1項に記載の立方晶窒化硼素焼結体。
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