JPWO2021112080A1 - - Google Patents
Info
- Publication number
- JPWO2021112080A1 JPWO2021112080A1 JP2021562655A JP2021562655A JPWO2021112080A1 JP WO2021112080 A1 JPWO2021112080 A1 JP WO2021112080A1 JP 2021562655 A JP2021562655 A JP 2021562655A JP 2021562655 A JP2021562655 A JP 2021562655A JP WO2021112080 A1 JPWO2021112080 A1 JP WO2021112080A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/2204—Specimen supports therefor; Sample conveying means therefore
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
- G01N2223/076—X-ray fluorescence
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/10—Different kinds of radiation or particles
- G01N2223/101—Different kinds of radiation or particles electromagnetic radiation
- G01N2223/1016—X-ray
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/20—Sources of radiation
- G01N2223/204—Sources of radiation source created from radiated target
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/30—Accessories, mechanical or electrical features
- G01N2223/302—Accessories, mechanical or electrical features comparative arrangements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/30—Accessories, mechanical or electrical features
- G01N2223/307—Accessories, mechanical or electrical features cuvettes-sample holders
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/60—Specific applications or type of materials
- G01N2223/611—Specific applications or type of materials patterned objects; electronic devices
- G01N2223/6116—Specific applications or type of materials patterned objects; electronic devices semiconductor wafer
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/60—Specific applications or type of materials
- G01N2223/637—Specific applications or type of materials liquid
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/60—Specific applications or type of materials
- G01N2223/652—Specific applications or type of materials impurities, foreign matter, trace amounts
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019218357 | 2019-12-02 | ||
| JP2019218357 | 2019-12-02 | ||
| PCT/JP2020/044668 WO2021112080A1 (ja) | 2019-12-02 | 2020-12-01 | 蛍光ｘ線分析装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2021112080A1 true JPWO2021112080A1 (https=) | 2021-06-10 |
| JP7386259B2 JP7386259B2 (ja) | 2023-11-24 |
Family
ID=76221607
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021562655A Active JP7386259B2 (ja) | 2019-12-02 | 2020-12-01 | 蛍光ｘ線分析装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20220404297A1 (https=) |
| EP (1) | EP4071465A1 (https=) |
| JP (1) | JP7386259B2 (https=) |
| KR (1) | KR20220104178A (https=) |
| CN (1) | CN114746744A (https=) |
| WO (1) | WO2021112080A1 (https=) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12480892B2 (en) | 2020-12-07 | 2025-11-25 | Sigray, Inc. | High throughput 3D x-ray imaging system using a transmission x-ray source |
| WO2023168204A1 (en) * | 2022-03-02 | 2023-09-07 | Sigray, Inc. | X-ray fluorescence system and x-ray source with electrically insulative target material |
| JP7716116B2 (ja) * | 2023-03-31 | 2025-07-31 | 株式会社リガク | 試料パウチセル及び蛍光ｘ線分析方法 |
| US12429437B2 (en) | 2023-11-07 | 2025-09-30 | Sigray, Inc. | System and method for x-ray absorption spectroscopy using spectral information from two orthogonal planes |
| US12429436B2 (en) | 2024-01-08 | 2025-09-30 | Sigray, Inc. | X-ray analysis system with focused x-ray beam and non-x-ray microscope |
| WO2025155719A1 (en) | 2024-01-18 | 2025-07-24 | Sigray, Inc. | Sequential array of x-ray imaging detectors |
| WO2025174966A1 (en) | 2024-02-15 | 2025-08-21 | Sigray, Inc. | System and method for generating a focused x‑ray beam |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06249804A (ja) * | 1993-03-01 | 1994-09-09 | Seiko Instr Inc | 蛍光ｘ線分析装置 |
| JPH0755731A (ja) * | 1993-08-13 | 1995-03-03 | Sumitomo Electric Ind Ltd | 全反射蛍光ｘ線分析の測定方法及びその装置 |
| JP2006038822A (ja) * | 2004-07-26 | 2006-02-09 | Tadashi Uko | 蛍光ｘ線分析装置 |
| JP2008039772A (ja) * | 2006-07-14 | 2008-02-21 | Japan Science & Technology Agency | Ｘ線分析装置及びｘ線分析方法 |
| JP2009022615A (ja) * | 2007-07-23 | 2009-02-05 | Takeo Katsuta | カップ容器 |
| JP2011107005A (ja) * | 2009-11-19 | 2011-06-02 | Seiko Instruments Inc | 蛍光ｘ線検査装置及び蛍光ｘ線検査方法 |
| JP2013108759A (ja) * | 2011-11-17 | 2013-06-06 | Fuji Electric Co Ltd | 半導体ウェハプロセス用ふっ酸溶液の不純物分析方法および該ふっ酸溶液の交換時期の管理方法 |
| JP2017083346A (ja) * | 2015-10-29 | 2017-05-18 | 株式会社堀場製作所 | 液体試料分析装置 |
| WO2020008727A1 (ja) * | 2018-07-04 | 2020-01-09 | 株式会社リガク | 蛍光ｘ線分析装置 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IL120429A (en) * | 1997-03-12 | 2000-09-28 | Jordan Valley Applied Radiation Ltd | X-ray fluorescence analyzer |
| JP4838821B2 (ja) * | 2008-03-18 | 2011-12-14 | 株式会社リガク | 蛍光ｘ線分析用試料保持具ならびにそれを用いる蛍光ｘ線分析方法および装置 |
| US8008087B1 (en) | 2010-03-25 | 2011-08-30 | Eci Technology, Inc. | Analysis of silicon concentration in phosphoric acid etchant solutions |
| JP6994755B2 (ja) * | 2017-09-06 | 2022-01-14 | 株式会社日立ハイテクサイエンス | 蛍光ｘ線分析装置及び蛍光ｘ線分析方法 |
-
2020
- 2020-12-01 KR KR1020227018222A patent/KR20220104178A/ko active Pending
- 2020-12-01 CN CN202080082985.0A patent/CN114746744A/zh active Pending
- 2020-12-01 US US17/780,218 patent/US20220404297A1/en not_active Abandoned
- 2020-12-01 JP JP2021562655A patent/JP7386259B2/ja active Active
- 2020-12-01 WO PCT/JP2020/044668 patent/WO2021112080A1/ja not_active Ceased
- 2020-12-01 EP EP20897252.1A patent/EP4071465A1/en not_active Withdrawn
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06249804A (ja) * | 1993-03-01 | 1994-09-09 | Seiko Instr Inc | 蛍光ｘ線分析装置 |
| JPH0755731A (ja) * | 1993-08-13 | 1995-03-03 | Sumitomo Electric Ind Ltd | 全反射蛍光ｘ線分析の測定方法及びその装置 |
| JP2006038822A (ja) * | 2004-07-26 | 2006-02-09 | Tadashi Uko | 蛍光ｘ線分析装置 |
| JP2008039772A (ja) * | 2006-07-14 | 2008-02-21 | Japan Science & Technology Agency | Ｘ線分析装置及びｘ線分析方法 |
| JP2009022615A (ja) * | 2007-07-23 | 2009-02-05 | Takeo Katsuta | カップ容器 |
| JP2011107005A (ja) * | 2009-11-19 | 2011-06-02 | Seiko Instruments Inc | 蛍光ｘ線検査装置及び蛍光ｘ線検査方法 |
| JP2013108759A (ja) * | 2011-11-17 | 2013-06-06 | Fuji Electric Co Ltd | 半導体ウェハプロセス用ふっ酸溶液の不純物分析方法および該ふっ酸溶液の交換時期の管理方法 |
| JP2017083346A (ja) * | 2015-10-29 | 2017-05-18 | 株式会社堀場製作所 | 液体試料分析装置 |
| WO2020008727A1 (ja) * | 2018-07-04 | 2020-01-09 | 株式会社リガク | 蛍光ｘ線分析装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN114746744A (zh) | 2022-07-12 |
| JP7386259B2 (ja) | 2023-11-24 |
| EP4071465A1 (en) | 2022-10-12 |
| US20220404297A1 (en) | 2022-12-22 |
| WO2021112080A1 (ja) | 2021-06-10 |
| KR20220104178A (ko) | 2022-07-26 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20221226 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20230831 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20231011 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20231018 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20231102 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20231113 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 7386259 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |