JPWO2021062040A5 - - Google Patents
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- Publication number
- JPWO2021062040A5 JPWO2021062040A5 JP2022518934A JP2022518934A JPWO2021062040A5 JP WO2021062040 A5 JPWO2021062040 A5 JP WO2021062040A5 JP 2022518934 A JP2022518934 A JP 2022518934A JP 2022518934 A JP2022518934 A JP 2022518934A JP WO2021062040 A5 JPWO2021062040 A5 JP WO2021062040A5
- Authority
- JP
- Japan
- Prior art keywords
- few
- wafer
- defect
- lithographic
- defects
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000007547 defect Effects 0.000 claims 34
- 238000000034 method Methods 0.000 claims 12
- 238000001459 lithography Methods 0.000 claims 11
- 238000007670 refining Methods 0.000 claims 11
- 230000003287 optical effect Effects 0.000 claims 6
- 230000006870 function Effects 0.000 claims 3
- 238000005516 engineering process Methods 0.000 claims 2
- 238000000342 Monte Carlo simulation Methods 0.000 claims 1
- 238000012937 correction Methods 0.000 claims 1
- 230000010363 phase shift Effects 0.000 claims 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201962905771P | 2019-09-25 | 2019-09-25 | |
| US62/905,771 | 2019-09-25 | ||
| US201962907901P | 2019-09-30 | 2019-09-30 | |
| US62/907,901 | 2019-09-30 | ||
| PCT/US2020/052560 WO2021062040A1 (en) | 2019-09-25 | 2020-09-24 | Lithography improvement based on defect probability distributions and critical dimension variations |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2022549469A JP2022549469A (ja) | 2022-11-25 |
| JPWO2021062040A5 true JPWO2021062040A5 (ko) | 2023-08-07 |
| JP7443501B2 JP7443501B2 (ja) | 2024-03-05 |
Family
ID=74881903
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022518934A Active JP7443501B2 (ja) | 2019-09-25 | 2020-09-24 | 欠陥確率分布および限界寸法変動に基づくリソグラフィ改良 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US11314171B2 (ko) |
| JP (1) | JP7443501B2 (ko) |
| KR (1) | KR20220065769A (ko) |
| CN (1) | CN114514473A (ko) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW202211075A (zh) * | 2020-06-05 | 2022-03-16 | 美商新思科技股份有限公司 | 校正在精簡模型中的隨機訊號 |
| CN115167019A (zh) * | 2022-07-15 | 2022-10-11 | 苏州华星光电技术有限公司 | 曝光缺陷感知装置、显示终端及曝光缺陷感知方法 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3330648B2 (ja) * | 1992-10-06 | 2002-09-30 | 富士通株式会社 | 光源形状の最適化方法 |
| JP4700672B2 (ja) | 2006-11-08 | 2011-06-15 | エーエスエムエル マスクツールズ ビー．ブイ． | ライン幅粗さおよびレジストパターン不良を予測する方法、プログラム、および装置、ならびにそのリソグラフィシミュレーションプロセスでの使用 |
| NL2003699A (en) * | 2008-12-18 | 2010-06-21 | Brion Tech Inc | Method and system for lithography process-window-maximixing optical proximity correction. |
| NL2009982A (en) * | 2012-01-10 | 2013-07-15 | Asml Netherlands Bv | Source mask optimization to reduce stochastic effects. |
| EP3105637A1 (en) * | 2014-02-11 | 2016-12-21 | ASML Netherlands B.V. | Model for calculating a stochastic variation in an arbitrary pattern |
| CN109891319B (zh) | 2016-10-24 | 2023-11-10 | Asml荷兰有限公司 | 用于优化图案化装置图案的方法 |
| US10474042B2 (en) * | 2017-03-22 | 2019-11-12 | Kla-Tencor Corporation | Stochastically-aware metrology and fabrication |
| WO2020094389A1 (en) | 2018-11-08 | 2020-05-14 | Asml Netherlands B.V. | Failure model for predicting failure due to resist layer |
-
2020
- 2020-09-24 KR KR1020227008413A patent/KR20220065769A/ko unknown
- 2020-09-24 JP JP2022518934A patent/JP7443501B2/ja active Active
- 2020-09-24 CN CN202080066477.3A patent/CN114514473A/zh active Pending
- 2020-09-25 US US17/032,417 patent/US11314171B2/en active Active
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