JPWO2021053824A1 - - Google Patents

Info

Publication number
JPWO2021053824A1
JPWO2021053824A1 JP2021546164A JP2021546164A JPWO2021053824A1 JP WO2021053824 A1 JPWO2021053824 A1 JP WO2021053824A1 JP 2021546164 A JP2021546164 A JP 2021546164A JP 2021546164 A JP2021546164 A JP 2021546164A JP WO2021053824 A1 JPWO2021053824 A1 JP WO2021053824A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021546164A
Other versions
JP7285329B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021053824A1 publication Critical patent/JPWO2021053824A1/ja
Application granted granted Critical
Publication of JP7285329B2 publication Critical patent/JP7285329B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/05Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/22Optical, image processing or photographic arrangements associated with the tube
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/22Optical, image processing or photographic arrangements associated with the tube
    • H01J37/222Image processing arrangements associated with the tube
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/244Detectors; Associated components or circuits therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261Details
    • H01J37/265Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/22Treatment of data
    • H01J2237/221Image processing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244Detection characterized by the detecting means
    • H01J2237/2446Position sensitive detectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245Detection characterised by the variable being measured
    • H01J2237/24507Intensity, dose or other characteristics of particle beams or electromagnetic radiation
    • H01J2237/24514Beam diagnostics including control of the parameter or property diagnosed
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26Electron or ion microscopes
    • H01J2237/28Scanning microscopes
    • H01J2237/2803Scanning microscopes characterised by the imaging method
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26Electron or ion microscopes
    • H01J2237/282Determination of microscope properties
    • H01J2237/2826Calibration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2021546164A 2019-09-20 2019-09-20 荷電粒子線装置 Active JP7285329B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2019/037065 WO2021053824A1 (ja) 2019-09-20 2019-09-20 荷電粒子線装置

Publications (2)

Publication Number Publication Date
JPWO2021053824A1 true JPWO2021053824A1 (ja) 2021-03-25
JP7285329B2 JP7285329B2 (ja) 2023-06-01

Family

ID=74884452

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021546164A Active JP7285329B2 (ja) 2019-09-20 2019-09-20 荷電粒子線装置

Country Status (5)

Country Link
JP (1) JP7285329B2 (ja)
KR (1) KR20220011176A (ja)
DE (1) DE112019007521T5 (ja)
TW (1) TWI762962B (ja)
WO (1) WO2021053824A1 (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20230066086A1 (en) * 2021-08-25 2023-03-02 Kla Corporation High resolution, multi-electron beam apparatus
JPWO2023139668A1 (ja) * 2022-01-19 2023-07-27
WO2023237225A1 (en) * 2022-06-10 2023-12-14 Carl Zeiss Multisem Gmbh Multi-beam charged particle imaging system with improved imaging of secondary electron beamlets on a detector

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0344613A (ja) * 1989-07-13 1991-02-26 Anritsu Corp 顕微方法及び装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002310962A (ja) * 2001-04-19 2002-10-23 Hitachi Ltd 画像分類方法並びに観察方法及びその装置
JP2007139575A (ja) * 2005-11-18 2007-06-07 Hitachi High-Technologies Corp 測長校正用標準部材及びその作製方法及びこれを用いた校正方法及び装置
JP5164754B2 (ja) * 2008-09-08 2013-03-21 株式会社日立ハイテクノロジーズ 走査型荷電粒子顕微鏡装置及び走査型荷電粒子顕微鏡装置で取得した画像の処理方法
JP5572428B2 (ja) * 2010-03-15 2014-08-13 株式会社日立ハイテクノロジーズ 検査装置および検査方法
JP6162813B2 (ja) * 2013-10-03 2017-07-12 株式会社日立ハイテクノロジーズ 荷電粒子線装置及びその補正フィルタ設定方法
JP6642092B2 (ja) 2016-02-22 2020-02-05 株式会社ニューフレアテクノロジー 検査装置及び検査方法
JP6865465B2 (ja) * 2017-11-10 2021-04-28 株式会社日立ハイテク パターン計測装置および計測方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0344613A (ja) * 1989-07-13 1991-02-26 Anritsu Corp 顕微方法及び装置

Also Published As

Publication number Publication date
TWI762962B (zh) 2022-05-01
US20220328281A1 (en) 2022-10-13
JP7285329B2 (ja) 2023-06-01
KR20220011176A (ko) 2022-01-27
DE112019007521T5 (de) 2022-03-24
TW202113904A (zh) 2021-04-01
WO2021053824A1 (ja) 2021-03-25

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