JPWO2021045136A1 - - Google Patents

Info

Publication number
JPWO2021045136A1
JPWO2021045136A1 JP2021544017A JP2021544017A JPWO2021045136A1 JP WO2021045136 A1 JPWO2021045136 A1 JP WO2021045136A1 JP 2021544017 A JP2021544017 A JP 2021544017A JP 2021544017 A JP2021544017 A JP 2021544017A JP WO2021045136 A1 JPWO2021045136 A1 JP WO2021045136A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021544017A
Other languages
Japanese (ja)
Other versions
JP7510945B2 (ja
JPWO2021045136A5 (https=
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021045136A1 publication Critical patent/JPWO2021045136A1/ja
Publication of JPWO2021045136A5 publication Critical patent/JPWO2021045136A5/ja
Application granted granted Critical
Publication of JP7510945B2 publication Critical patent/JP7510945B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F230/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
    • C08F230/04Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
    • C08F230/08Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L43/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing boron, silicon, phosphorus, selenium, tellurium or a metal; Compositions of derivatives of such polymers
    • C08L43/04Homopolymers or copolymers of monomers containing silicon
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D143/00Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing boron, silicon, phosphorus, selenium, tellurium, or a metal; Coating compositions based on derivatives of such polymers
    • C09D143/04Homopolymers or copolymers of monomers containing silicon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Paints Or Removers (AREA)
JP2021544017A 2019-09-06 2020-09-03 水溶性(メタ)アクリル系樹脂およびその利用 Active JP7510945B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019163334 2019-09-06
JP2019163334 2019-09-06
PCT/JP2020/033363 WO2021045136A1 (ja) 2019-09-06 2020-09-03 水溶性(メタ)アクリル系樹脂およびその利用

Publications (3)

Publication Number Publication Date
JPWO2021045136A1 true JPWO2021045136A1 (https=) 2021-03-11
JPWO2021045136A5 JPWO2021045136A5 (https=) 2023-06-15
JP7510945B2 JP7510945B2 (ja) 2024-07-04

Family

ID=74853219

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021544017A Active JP7510945B2 (ja) 2019-09-06 2020-09-03 水溶性(メタ)アクリル系樹脂およびその利用

Country Status (2)

Country Link
JP (1) JP7510945B2 (https=)
WO (1) WO2021045136A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2024044176A (ja) * 2022-09-20 2024-04-02 株式会社カネカ 水系コーティング組成物、およびコーティング層の製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6153311A (ja) * 1984-08-22 1986-03-17 Kyowa Gas Chem Ind Co Ltd 親水性共重合体の製造方法
WO2014168122A1 (ja) * 2013-04-12 2014-10-16 三井化学株式会社 共重合体及びそれからなる親水性材料
WO2016017619A1 (ja) * 2014-07-31 2016-02-04 三井化学株式会社 スルホン酸系共重合体とアミノ樹脂からなる親水性材料
WO2018038271A1 (ja) * 2016-08-26 2018-03-01 三井化学株式会社 反射防止性積層体

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59128889A (ja) * 1983-01-12 1984-07-25 Sanyo Electric Co Ltd カラ−バ−スト插入回路
JP4151086B2 (ja) * 1997-07-28 2008-09-17 日油株式会社 高分子被膜を有するガラス製品
JP2009280770A (ja) * 2008-05-26 2009-12-03 Asahi Kasei Chemicals Corp 有機・無機複合組成物、これを用いた有機無機複合体、及び機能性複合体
CN103289010B (zh) * 2013-05-23 2015-06-03 陕西科技大学 核壳型纳米SiO2/含氟聚丙烯酸酯无皂乳液的制备方法
CN107236092B (zh) * 2017-07-20 2019-07-16 中海石油(中国)有限公司 一种含有硅酸盐结构单体及其制备方法与应用

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6153311A (ja) * 1984-08-22 1986-03-17 Kyowa Gas Chem Ind Co Ltd 親水性共重合体の製造方法
WO2014168122A1 (ja) * 2013-04-12 2014-10-16 三井化学株式会社 共重合体及びそれからなる親水性材料
WO2016017619A1 (ja) * 2014-07-31 2016-02-04 三井化学株式会社 スルホン酸系共重合体とアミノ樹脂からなる親水性材料
WO2018038271A1 (ja) * 2016-08-26 2018-03-01 三井化学株式会社 反射防止性積層体

Also Published As

Publication number Publication date
JP7510945B2 (ja) 2024-07-04
WO2021045136A1 (ja) 2021-03-11

Similar Documents

Publication Publication Date Title
BR112021018450A2 (https=)
BR112021017637A2 (https=)
BR112021017892A2 (https=)
BR112021017782A2 (https=)
BR112021016821A2 (https=)
BR112021017939A2 (https=)
BR112021017738A2 (https=)
BR112021016996A2 (https=)
BR112019016141A2 (https=)
BR112021017728A2 (https=)
BR112021018452A2 (https=)
BR112021017703A2 (https=)
BR112021018102A2 (https=)
BR112019016142A2 (https=)
BR112021017732A2 (https=)
BR112021018168A2 (https=)
BR112021018093A2 (https=)
BR112021017173A2 (https=)
BR112021017083A2 (https=)
BR112021018250A2 (https=)
BR112021018584A2 (https=)
BR112021018484A2 (https=)
BR112021017949A2 (https=)
BR112021018084A2 (https=)
JPWO2021045136A1 (https=)

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20230607

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20230607

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20240305

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20240326

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20240611

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20240624