JPWO2021039430A1 - - Google Patents

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Publication number
JPWO2021039430A1
JPWO2021039430A1 JP2021542740A JP2021542740A JPWO2021039430A1 JP WO2021039430 A1 JPWO2021039430 A1 JP WO2021039430A1 JP 2021542740 A JP2021542740 A JP 2021542740A JP 2021542740 A JP2021542740 A JP 2021542740A JP WO2021039430 A1 JPWO2021039430 A1 JP WO2021039430A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021542740A
Other versions
JP7335963B2 (ja
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Publication of JPWO2021039430A1 publication Critical patent/JPWO2021039430A1/ja
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Publication of JP7335963B2 publication Critical patent/JP7335963B2/ja
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Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
JP2021542740A 2019-08-29 2020-08-13 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法、及び電子デバイスの製造方法 Active JP7335963B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019157442 2019-08-29
JP2019157442 2019-08-29
PCT/JP2020/030820 WO2021039430A1 (ja) 2019-08-29 2020-08-13 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法、及び電子デバイスの製造方法

Publications (2)

Publication Number Publication Date
JPWO2021039430A1 true JPWO2021039430A1 (ja) 2021-03-04
JP7335963B2 JP7335963B2 (ja) 2023-08-30

Family

ID=74684826

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021542740A Active JP7335963B2 (ja) 2019-08-29 2020-08-13 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法、及び電子デバイスの製造方法

Country Status (3)

Country Link
JP (1) JP7335963B2 (ja)
TW (1) TW202115495A (ja)
WO (1) WO2021039430A1 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022123314A1 (en) * 2020-12-11 2022-06-16 Tmem16A Limited Benzimidazole derivatives for treating respiratory disease
WO2023157801A1 (ja) * 2022-02-16 2023-08-24 Jsr株式会社 感光性樹脂組成物、レジストパターン膜の製造方法、およびメッキ造形物の製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019074731A (ja) * 2017-10-16 2019-05-16 信越化学工業株式会社 レジスト材料及びパターン形成方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008129389A (ja) * 2006-11-22 2008-06-05 Shin Etsu Chem Co Ltd ポジ型レジスト材料及びパターン形成方法
JP5690703B2 (ja) * 2010-11-30 2015-03-25 富士フイルム株式会社 ネガ型パターン形成方法及びレジストパターン
CN103454857B (zh) * 2012-05-31 2020-01-03 住友化学株式会社 光致抗蚀剂组合物

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019074731A (ja) * 2017-10-16 2019-05-16 信越化学工業株式会社 レジスト材料及びパターン形成方法

Also Published As

Publication number Publication date
TW202115495A (zh) 2021-04-16
JP7335963B2 (ja) 2023-08-30
WO2021039430A1 (ja) 2021-03-04

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