JPWO2021039233A1 - - Google Patents

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Publication number
JPWO2021039233A1
JPWO2021039233A1 JP2021542645A JP2021542645A JPWO2021039233A1 JP WO2021039233 A1 JPWO2021039233 A1 JP WO2021039233A1 JP 2021542645 A JP2021542645 A JP 2021542645A JP 2021542645 A JP2021542645 A JP 2021542645A JP WO2021039233 A1 JPWO2021039233 A1 JP WO2021039233A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021542645A
Other versions
JPWO2021039233A5 (ja
JP7301277B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021039233A1 publication Critical patent/JPWO2021039233A1/ja
Publication of JPWO2021039233A5 publication Critical patent/JPWO2021039233A5/ja
Application granted granted Critical
Publication of JP7301277B2 publication Critical patent/JP7301277B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/04—Printing plates or foils; Materials therefor metallic
    • B41N1/06—Printing plates or foils; Materials therefor metallic for relief printing or intaglio printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M1/00—Inking and printing with a printer's forme
    • B41M1/02—Letterpress printing, e.g. book printing
    • B41M1/04—Flexographic printing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
JP2021542645A 2019-08-23 2020-07-27 フレキソ印刷版 Active JP7301277B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019152852 2019-08-23
JP2019152852 2019-08-23
PCT/JP2020/028710 WO2021039233A1 (ja) 2019-08-23 2020-07-27 フレキソ印刷版

Publications (3)

Publication Number Publication Date
JPWO2021039233A1 true JPWO2021039233A1 (ja) 2021-03-04
JPWO2021039233A5 JPWO2021039233A5 (ja) 2022-02-22
JP7301277B2 JP7301277B2 (ja) 2023-07-03

Family

ID=74684146

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021542645A Active JP7301277B2 (ja) 2019-08-23 2020-07-27 フレキソ印刷版

Country Status (5)

Country Link
US (1) US20220281257A1 (ja)
EP (1) EP4019268A4 (ja)
JP (1) JP7301277B2 (ja)
CN (1) CN114270260A (ja)
WO (1) WO2021039233A1 (ja)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003344990A (ja) * 2002-05-30 2003-12-03 Toray Ind Inc 印刷版の製版方法
JP2013117741A (ja) * 2011-09-09 2013-06-13 Toyobo Co Ltd 水現像性感光性樹脂積層体
JP2017003754A (ja) * 2015-06-10 2017-01-05 東洋紡株式会社 感光性樹脂版材
US20180203356A1 (en) * 2015-07-15 2018-07-19 Flint Group Germany Gmbh Laser-ablatable mask film
JP2018165772A (ja) * 2017-03-28 2018-10-25 東洋紡株式会社 Ｃｔｐフレキソ印刷原版
JP2018205542A (ja) * 2017-06-05 2018-12-27 旭化成株式会社 印刷版用感光性樹脂版の製造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS561606B2 (ja) 1974-06-14 1981-01-14
JPS51150416A (en) 1975-06-17 1976-12-24 Touwa Taipuraitaa Kk Japanese typewriter feeding device
JPS52131227A (en) 1976-04-28 1977-11-04 Nippon Furnace Kogyo Kk Combustion device
JPS53108628A (en) 1977-03-03 1978-09-21 Masateru Kataoka Elevationally movable working platform unit
JPH03197486A (ja) 1989-12-26 1991-08-28 Shin Etsu Chem Co Ltd アルコキシシリル基を有するオルガノシロキサンの製造方法
JP3453430B2 (ja) 1994-07-21 2003-10-06 東レ・ダウコーニング・シリコーン株式会社 ジフェニルシロキサン・ジメチルシロキサン共重合体の製造方法
JP3483025B2 (ja) * 1999-06-23 2004-01-06 東洋紡績株式会社 水現像型感光性フレキソ印刷版
DE10241851A1 (de) * 2002-09-09 2004-03-18 Basf Drucksysteme Gmbh Verfahren zur Herstellung von Flexodruckformen durch thermische Entwicklung
JP4460468B2 (ja) 2005-02-04 2010-05-12 信越化学工業株式会社 アミノ基含有オルガノポリシロキサンの製造方法
CN101416110A (zh) 2006-04-07 2009-04-22 旭化成化学株式会社 柔性印刷用感光性树脂组合物
JP4200510B1 (ja) 2008-06-11 2008-12-24 東洋紡績株式会社 感光性フレキソ印刷原版
JP6573511B2 (ja) 2015-09-11 2019-09-11 信越化学工業株式会社 片末端アミノシリコーンの製造方法
CN108700810A (zh) * 2016-03-29 2018-10-23 东洋纺株式会社 凸版轮转印刷用凸版印刷原版

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003344990A (ja) * 2002-05-30 2003-12-03 Toray Ind Inc 印刷版の製版方法
JP2013117741A (ja) * 2011-09-09 2013-06-13 Toyobo Co Ltd 水現像性感光性樹脂積層体
JP2017003754A (ja) * 2015-06-10 2017-01-05 東洋紡株式会社 感光性樹脂版材
US20180203356A1 (en) * 2015-07-15 2018-07-19 Flint Group Germany Gmbh Laser-ablatable mask film
JP2018165772A (ja) * 2017-03-28 2018-10-25 東洋紡株式会社 Ｃｔｐフレキソ印刷原版
JP2018205542A (ja) * 2017-06-05 2018-12-27 旭化成株式会社 印刷版用感光性樹脂版の製造方法

Also Published As

Publication number Publication date
EP4019268A4 (en) 2023-04-26
US20220281257A1 (en) 2022-09-08
JP7301277B2 (ja) 2023-07-03
CN114270260A (zh) 2022-04-01
EP4019268A1 (en) 2022-06-29
WO2021039233A1 (ja) 2021-03-04

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