JPWO2021029396A1 - - Google Patents

Info

Publication number
JPWO2021029396A1
JPWO2021029396A1 JP2021539292A JP2021539292A JPWO2021029396A1 JP WO2021029396 A1 JPWO2021029396 A1 JP WO2021029396A1 JP 2021539292 A JP2021539292 A JP 2021539292A JP 2021539292 A JP2021539292 A JP 2021539292A JP WO2021029396 A1 JPWO2021029396 A1 JP WO2021029396A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2021539292A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021029396A1 publication Critical patent/JPWO2021029396A1/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/22—Esters containing halogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2021539292A 2019-08-09 2020-08-07 Pending JPWO2021029396A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019147836 2019-08-09
PCT/JP2020/030502 WO2021029396A1 (ja) 2019-08-09 2020-08-07 化合物、（共）重合体、組成物、及びパターン形成方法

Publications (1)

Publication Number Publication Date
JPWO2021029396A1 true JPWO2021029396A1 (zh) 2021-02-18

Family

ID=74569688

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021539292A Pending JPWO2021029396A1 (zh) 2019-08-09 2020-08-07

Country Status (3)

Country Link
JP (1) JPWO2021029396A1 (zh)
TW (1) TW202112734A (zh)
WO (1) WO2021029396A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021230300A1 (ja) * 2020-05-15 2021-11-18 三菱瓦斯化学株式会社 化合物、（共）重合体、組成物、レジストパターン形成方法、並びに化合物及び（共）重合体の製造方法
JP2021188041A (ja) 2020-06-01 2021-12-13 住友化学株式会社 化合物、樹脂、レジスト組成物及びレジストパターンの製造方法
CN114213246B (zh) * 2021-12-29 2023-11-14 徐州博康信息化学品有限公司 一种光刻胶树脂单体的制备方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63132233A (ja) * 1986-11-25 1988-06-04 Mitsubishi Electric Corp フオトレジスト組成物
JP2007010794A (ja) * 2005-06-28 2007-01-18 Hitachi Chem Co Ltd 感光性樹脂組成物及び感光性エレメント
JP4983605B2 (ja) * 2005-12-05 2012-07-25 ダイキン工業株式会社 α，β−不飽和エステル基を含有する含フッ素ノルボルネン誘導体または含フッ素ノルボルナン誘導体を含む硬化性含フッ素ポリマー組成物
JP2013251315A (ja) * 2012-05-30 2013-12-12 Hitachi Ltd ナノインプリント用レジスト組成物
WO2017110342A1 (ja) * 2015-12-24 2017-06-29 コニカミノルタ株式会社 偏光板保護フィルム、その製造方法及び偏光板
US10781315B2 (en) * 2016-12-01 2020-09-22 Lawrence Livermore National Security, Llc Optically clear photo-polymerization resists for additive manufacturing of radiopaque parts
JP7070122B2 (ja) * 2017-12-22 2022-05-18 Dic株式会社 重合性化合物及びそれを含有する液晶組成物
US20210331994A1 (en) * 2018-08-24 2021-10-28 Mitsubishi Gas Chemical Company, Inc. Compound, composition containing the same, method for forming resist pattern and method for forming insulating film

Also Published As

Publication number Publication date
TW202112734A (zh) 2021-04-01
WO2021029396A1 (ja) 2021-02-18

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Legal Events

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A621 Written request for application examination

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Effective date: 20230613