JPWO2020241174A1 - - Google Patents

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Publication number
JPWO2020241174A1
JPWO2020241174A1 JP2021522738A JP2021522738A JPWO2020241174A1 JP WO2020241174 A1 JPWO2020241174 A1 JP WO2020241174A1 JP 2021522738 A JP2021522738 A JP 2021522738A JP 2021522738 A JP2021522738 A JP 2021522738A JP WO2020241174 A1 JPWO2020241174 A1 JP WO2020241174A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021522738A
Other versions
JP7338683B2 (ja
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Filing date
Publication date
Application filed filed Critical
Publication of JPWO2020241174A1 publication Critical patent/JPWO2020241174A1/ja
Priority to JP2023070702A priority Critical patent/JP2023089278A/ja
Application granted granted Critical
Publication of JP7338683B2 publication Critical patent/JP7338683B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/004—Details
    • H01G9/04—Electrodes or formation of dielectric layers thereon
    • H01G9/042—Electrodes or formation of dielectric layers thereon characterised by the material
    • H01G9/045—Electrodes or formation of dielectric layers thereon characterised by the material based on aluminium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/12—Anodising more than once, e.g. in different baths
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/16—Pretreatment, e.g. desmutting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/004—Details
    • H01G9/04—Electrodes or formation of dielectric layers thereon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/004—Details
    • H01G9/04—Electrodes or formation of dielectric layers thereon
    • H01G9/048—Electrodes or formation of dielectric layers thereon characterised by their structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/004—Details
    • H01G9/04—Electrodes or formation of dielectric layers thereon
    • H01G9/048—Electrodes or formation of dielectric layers thereon characterised by their structure
    • H01G9/052—Sintered electrodes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10—Energy storage using batteries

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Laminated Bodies (AREA)
JP2021522738A 2019-05-24 2020-04-30 アルミニウム化成箔の製造方法 Active JP7338683B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2023070702A JP2023089278A (ja) 2019-05-24 2023-04-24 アルミニウム化成箔の製造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019097832 2019-05-24
JP2019097832 2019-05-24
PCT/JP2020/018247 WO2020241174A1 (ja) 2019-05-24 2020-04-30 アルミニウム化成箔、アルミニウム電解コンデンサ用電極、およびアルミニウム化成箔の製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2023070702A Division JP2023089278A (ja) 2019-05-24 2023-04-24 アルミニウム化成箔の製造方法

Publications (2)

Publication Number Publication Date
JPWO2020241174A1 true JPWO2020241174A1 (ja) 2020-12-03
JP7338683B2 JP7338683B2 (ja) 2023-09-05

Family

ID=73552599

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2021522738A Active JP7338683B2 (ja) 2019-05-24 2020-04-30 アルミニウム化成箔の製造方法
JP2023070702A Pending JP2023089278A (ja) 2019-05-24 2023-04-24 アルミニウム化成箔の製造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2023070702A Pending JP2023089278A (ja) 2019-05-24 2023-04-24 アルミニウム化成箔の製造方法

Country Status (4)

Country Link
JP (2) JP7338683B2 (ja)
CN (2) CN116913694A (ja)
TW (1) TWI840553B (ja)
WO (1) WO2020241174A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113470976B (zh) * 2021-05-07 2022-06-17 乳源县立东电子科技有限公司 一种改善低压阳极箔脆性的方法及制得的低压阳极箔

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005175330A (ja) * 2003-12-15 2005-06-30 Nichicon Corp アルミニウム電解コンデンサ用陽極箔の製造方法
JP2013153024A (ja) * 2012-01-24 2013-08-08 Nichicon Corp 電解コンデンサおよびその製造方法
JP2014135481A (ja) * 2012-12-11 2014-07-24 Nippon Chemicon Corp コンデンサ
JP2017224843A (ja) * 2016-03-31 2017-12-21 日本ケミコン株式会社 電極箔、巻回形コンデンサ、電極箔の製造方法、及び巻回形コンデンサの製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6001977B2 (ja) * 2012-09-25 2016-10-05 日本軽金属株式会社 多孔性アルミニウム体、アルミニウム電解コンデンサ、および多孔性アルミニウム体の製造方法
JP6355920B2 (ja) * 2013-12-27 2018-07-11 東洋アルミニウム株式会社 アルミニウム電解コンデンサ用電極箔及びその製造方法
CN109036852B (zh) * 2018-08-13 2020-09-18 浙江华义瑞东新材料有限公司 一种三维多孔铝电极箔及其制备方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005175330A (ja) * 2003-12-15 2005-06-30 Nichicon Corp アルミニウム電解コンデンサ用陽極箔の製造方法
JP2013153024A (ja) * 2012-01-24 2013-08-08 Nichicon Corp 電解コンデンサおよびその製造方法
JP2014135481A (ja) * 2012-12-11 2014-07-24 Nippon Chemicon Corp コンデンサ
JP2017224843A (ja) * 2016-03-31 2017-12-21 日本ケミコン株式会社 電極箔、巻回形コンデンサ、電極箔の製造方法、及び巻回形コンデンサの製造方法

Also Published As

Publication number Publication date
JP2023089278A (ja) 2023-06-27
CN113874971A (zh) 2021-12-31
TW202113163A (zh) 2021-04-01
WO2020241174A1 (ja) 2020-12-03
TWI840553B (zh) 2024-05-01
JP7338683B2 (ja) 2023-09-05
CN116913694A (zh) 2023-10-20
CN113874971B (zh) 2024-02-20

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