JPWO2020183550A1 - - Google Patents
Info
- Publication number
- JPWO2020183550A1 JPWO2020183550A1 JP2021504630A JP2021504630A JPWO2020183550A1 JP WO2020183550 A1 JPWO2020183550 A1 JP WO2020183550A1 JP 2021504630 A JP2021504630 A JP 2021504630A JP 2021504630 A JP2021504630 A JP 2021504630A JP WO2020183550 A1 JPWO2020183550 A1 JP WO2020183550A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
- H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
- H05G2/006—X-ray radiation generated from plasma being produced from a liquid or gas details of the ejection system, e.g. constructional details of the nozzle
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Atmospheric Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2019/009521 WO2020183550A1 (ja) | 2019-03-08 | 2019-03-08 | スズトラップ装置、極端紫外光生成装置、及び電子デバイスの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2020183550A1 true JPWO2020183550A1 (ja) | 2020-09-17 |
JP7340005B2 JP7340005B2 (ja) | 2023-09-06 |
Family
ID=72427331
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021504630A Active JP7340005B2 (ja) | 2019-03-08 | 2019-03-08 | スズトラップ装置、極端紫外光生成装置、及び電子デバイスの製造方法 |
Country Status (3)
Country | Link |
---|---|
US (1) | US11940736B2 (ja) |
JP (1) | JP7340005B2 (ja) |
WO (1) | WO2020183550A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11337292B1 (en) * | 2020-10-30 | 2022-05-17 | Gigaphoton Inc. | Tin trap device, extreme ultraviolet light generation apparatus, and electronic device manufacturing method |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008277481A (ja) * | 2007-04-27 | 2008-11-13 | Komatsu Ltd | 極端紫外光源装置 |
JP2010171405A (ja) * | 2008-12-26 | 2010-08-05 | Komatsu Ltd | 極端紫外光光源装置 |
JP2010212674A (ja) * | 2009-02-12 | 2010-09-24 | Komatsu Ltd | 極端紫外光光源装置 |
JP2012146613A (ja) * | 2010-03-29 | 2012-08-02 | Komatsu Ltd | チャンバ装置 |
JP2013004369A (ja) * | 2011-06-17 | 2013-01-07 | Gigaphoton Inc | 極端紫外光生成装置 |
JP2013506280A (ja) * | 2009-09-25 | 2013-02-21 | エーエスエムエル ネザーランズ ビー.ブイ. | 放射源コレクタ装置、リソグラフィ装置およびデバイス製造方法 |
JP2013131483A (ja) * | 2011-11-24 | 2013-07-04 | Gigaphoton Inc | Euv光生成装置、ターゲット回収装置、および、ターゲット回収方法 |
WO2017042915A1 (ja) * | 2015-09-09 | 2017-03-16 | ギガフォトン株式会社 | ターゲット収容装置 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4710463B2 (ja) | 2005-07-21 | 2011-06-29 | ウシオ電機株式会社 | 極端紫外光発生装置 |
JP5454881B2 (ja) * | 2008-08-29 | 2014-03-26 | ギガフォトン株式会社 | 極端紫外光源装置及び極端紫外光の発生方法 |
US8872142B2 (en) | 2010-03-18 | 2014-10-28 | Gigaphoton Inc. | Extreme ultraviolet light generation apparatus |
JP5705592B2 (ja) | 2010-03-18 | 2015-04-22 | ギガフォトン株式会社 | 極端紫外光生成装置 |
US8748853B2 (en) | 2011-03-24 | 2014-06-10 | Gigaphoton Inc. | Chamber apparatus |
US10162277B2 (en) | 2016-12-15 | 2018-12-25 | Taiwan Semiconductor Manufacturing Co., Ltd. | Extreme ultraviolet lithography system with debris trapper on exhaust line |
US11337292B1 (en) * | 2020-10-30 | 2022-05-17 | Gigaphoton Inc. | Tin trap device, extreme ultraviolet light generation apparatus, and electronic device manufacturing method |
-
2019
- 2019-03-08 JP JP2021504630A patent/JP7340005B2/ja active Active
- 2019-03-08 WO PCT/JP2019/009521 patent/WO2020183550A1/ja active Application Filing
-
2021
- 2021-08-10 US US17/398,054 patent/US11940736B2/en active Active
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008277481A (ja) * | 2007-04-27 | 2008-11-13 | Komatsu Ltd | 極端紫外光源装置 |
JP2010171405A (ja) * | 2008-12-26 | 2010-08-05 | Komatsu Ltd | 極端紫外光光源装置 |
JP2010212674A (ja) * | 2009-02-12 | 2010-09-24 | Komatsu Ltd | 極端紫外光光源装置 |
JP2013506280A (ja) * | 2009-09-25 | 2013-02-21 | エーエスエムエル ネザーランズ ビー.ブイ. | 放射源コレクタ装置、リソグラフィ装置およびデバイス製造方法 |
JP2012146613A (ja) * | 2010-03-29 | 2012-08-02 | Komatsu Ltd | チャンバ装置 |
JP2013004369A (ja) * | 2011-06-17 | 2013-01-07 | Gigaphoton Inc | 極端紫外光生成装置 |
JP2013131483A (ja) * | 2011-11-24 | 2013-07-04 | Gigaphoton Inc | Euv光生成装置、ターゲット回収装置、および、ターゲット回収方法 |
WO2017042915A1 (ja) * | 2015-09-09 | 2017-03-16 | ギガフォトン株式会社 | ターゲット収容装置 |
Also Published As
Publication number | Publication date |
---|---|
WO2020183550A1 (ja) | 2020-09-17 |
US20210364928A1 (en) | 2021-11-25 |
US11940736B2 (en) | 2024-03-26 |
JP7340005B2 (ja) | 2023-09-06 |
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