JPWO2020179744A1 - - Google Patents

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Publication number
JPWO2020179744A1
JPWO2020179744A1 JP2020515784A JP2020515784A JPWO2020179744A1 JP WO2020179744 A1 JPWO2020179744 A1 JP WO2020179744A1 JP 2020515784 A JP2020515784 A JP 2020515784A JP 2020515784 A JP2020515784 A JP 2020515784A JP WO2020179744 A1 JPWO2020179744 A1 JP WO2020179744A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2020515784A
Other versions
JP7405075B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2020179744A1 publication Critical patent/JPWO2020179744A1/ja
Application granted granted Critical
Publication of JP7405075B2 publication Critical patent/JP7405075B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C08F290/068—Polysiloxanes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Human Computer Interaction (AREA)
  • Materials For Photolithography (AREA)
JP2020515784A 2019-03-05 2020-03-02 ネガ型感光性樹脂組成物、それを用いた硬化膜の製造方法およびタッチパネル Active JP7405075B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019039268 2019-03-05
JP2019039268 2019-03-05
PCT/JP2020/008738 WO2020179744A1 (ja) 2019-03-05 2020-03-02 ネガ型感光性樹脂組成物、それを用いた硬化膜の製造方法およびタッチパネル

Publications (2)

Publication Number Publication Date
JPWO2020179744A1 true JPWO2020179744A1 (ja) 2020-09-10
JP7405075B2 JP7405075B2 (ja) 2023-12-26

Family

ID=72338710

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020515784A Active JP7405075B2 (ja) 2019-03-05 2020-03-02 ネガ型感光性樹脂組成物、それを用いた硬化膜の製造方法およびタッチパネル

Country Status (4)

Country Link
JP (1) JP7405075B2 (ja)
KR (1) KR20210135217A (ja)
CN (1) CN113474730A (ja)
WO (1) WO2020179744A1 (ja)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017003995A (ja) * 2015-06-15 2017-01-05 株式会社Ｄｎｐファインケミカル カラーフィルタ用色材分散液、カラーフィルタ用感光性着色樹脂組成物、カラーフィルタ、及び表示装置
JP2017219850A (ja) * 2014-03-17 2017-12-14 旭化成株式会社 感光性樹脂組成物
WO2018021184A1 (ja) * 2016-07-29 2018-02-01 富士フイルム株式会社 着色組成物、カラーフィルタ、パターン形成方法、固体撮像素子、および、画像表示装置
WO2018105532A1 (ja) * 2016-12-05 2018-06-14 旭化成株式会社 感光性樹脂組成物、感光性樹脂積層体、樹脂パターンの製造方法及び硬化膜パターン製造方法
JP2018146958A (ja) * 2017-03-02 2018-09-20 東レ株式会社 ネガ型感光性樹脂組成物およびそれを用いた硬化膜

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5117397B2 (ja) 2005-12-20 2013-01-16 チバ ホールディング インコーポレーテッド オキシムエステル光開始剤
MX351447B (es) 2011-05-25 2017-10-16 American Dye Source Inc Compuestos con grupos de éster oxima y/o acil.
TWI612101B (zh) 2013-05-15 2018-01-21 Ｒａｓａ工業股份有限公司 絕緣材料用組成物
KR102507584B1 (ko) 2015-12-25 2023-03-08 도레이 카부시키가이샤 감광성 수지 조성물, 경화막, 적층체, 터치패널용 부재 및 경화막의 제조 방법
WO2019031292A1 (ja) * 2017-08-10 2019-02-14 株式会社Ｄｎｐファインケミカル 感光性着色樹脂組成物及びその硬化物、カラーフィルタ、並びに表示装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017219850A (ja) * 2014-03-17 2017-12-14 旭化成株式会社 感光性樹脂組成物
JP2017003995A (ja) * 2015-06-15 2017-01-05 株式会社Ｄｎｐファインケミカル カラーフィルタ用色材分散液、カラーフィルタ用感光性着色樹脂組成物、カラーフィルタ、及び表示装置
WO2018021184A1 (ja) * 2016-07-29 2018-02-01 富士フイルム株式会社 着色組成物、カラーフィルタ、パターン形成方法、固体撮像素子、および、画像表示装置
WO2018105532A1 (ja) * 2016-12-05 2018-06-14 旭化成株式会社 感光性樹脂組成物、感光性樹脂積層体、樹脂パターンの製造方法及び硬化膜パターン製造方法
JP2018146958A (ja) * 2017-03-02 2018-09-20 東レ株式会社 ネガ型感光性樹脂組成物およびそれを用いた硬化膜

Also Published As

Publication number Publication date
CN113474730A (zh) 2021-10-01
JP7405075B2 (ja) 2023-12-26
TW202035471A (zh) 2020-10-01
KR20210135217A (ko) 2021-11-12
WO2020179744A1 (ja) 2020-09-10

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