JPWO2020138864A5 - - Google Patents
Download PDFInfo
- Publication number
- JPWO2020138864A5 JPWO2020138864A5 JP2021536704A JP2021536704A JPWO2020138864A5 JP WO2020138864 A5 JPWO2020138864 A5 JP WO2020138864A5 JP 2021536704 A JP2021536704 A JP 2021536704A JP 2021536704 A JP2021536704 A JP 2021536704A JP WO2020138864 A5 JPWO2020138864 A5 JP WO2020138864A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- emitter
- window
- forming layer
- mirror
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005468 ion implantation Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
Description
各エミッタは、図1、図2a及び図2bを参照して説明したように、下部ミラー25、活性層27、開口形成層29、および上部ミラー31を含む。また、開口形成層29は、酸化層29xとウィンドウ層29wを含み、電流の流れは、ウィンドウ層29wに限定される。各エミッタの基本構造は、イオン注入による絶縁領域37を除けば、前述のエミッタ150と同一である。 Each emitter includes a bottom mirror 25, an active layer 27 , an aperture forming layer 29, and a top mirror 31 as described with reference to Figures 1, 2a and 2b. Also, the opening forming layer 29 includes an oxide layer 29x and a window layer 29w, and current flow is limited to the window layer 29w. The basic structure of each emitter is the same as the emitter 150 described above, except for the isolation region 37 by ion implantation.
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201862784616P | 2018-12-24 | 2018-12-24 | |
US62/784,616 | 2018-12-24 | ||
US16/720,634 US11404848B2 (en) | 2018-12-24 | 2019-12-19 | Vertical-cavity surface-emitting laser |
US16/720,634 | 2019-12-19 | ||
PCT/KR2019/018212 WO2020138864A1 (en) | 2018-12-24 | 2019-12-20 | Vertical-cavity surface-emitting laser |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2022514968A JP2022514968A (en) | 2022-02-16 |
JPWO2020138864A5 true JPWO2020138864A5 (en) | 2022-12-23 |
Family
ID=71098967
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021536704A Pending JP2022514968A (en) | 2018-12-24 | 2019-12-20 | Vertical cavity type surface emitting laser |
Country Status (6)
Country | Link |
---|---|
US (3) | US11404848B2 (en) |
EP (1) | EP3905459A4 (en) |
JP (1) | JP2022514968A (en) |
KR (1) | KR20210096073A (en) |
CN (2) | CN113228434A (en) |
WO (1) | WO2020138864A1 (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11404848B2 (en) * | 2018-12-24 | 2022-08-02 | Seoul Viosys Co., Ltd. | Vertical-cavity surface-emitting laser |
US11581705B2 (en) * | 2019-04-08 | 2023-02-14 | Lumentum Operations Llc | Vertical-cavity surface-emitting laser with dense epi-side contacts |
JP2021153136A (en) * | 2020-03-24 | 2021-09-30 | 富士フイルムビジネスイノベーション株式会社 | Light emitting component |
US11831129B2 (en) * | 2020-12-23 | 2023-11-28 | Lumentum Operations Llc | Vertical cavity surface emitting laser design with shorter oxidation length and/or larger number of trenches |
CN113285353A (en) * | 2021-07-23 | 2021-08-20 | 华芯半导体研究院(北京)有限公司 | Method for reducing VIA windowing etching damage and VCSEL chip |
US20230032341A1 (en) * | 2021-07-27 | 2023-02-02 | Fujifilm Business Innovation Corp. | Light-emitting element array, optical device, optical measurement device, and method for manufacturing light-emitting element array |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5729566A (en) * | 1996-06-07 | 1998-03-17 | Picolight Incorporated | Light emitting device having an electrical contact through a layer containing oxidized material |
US6658040B1 (en) | 2000-07-28 | 2003-12-02 | Agilent Technologies, Inc. | High speed VCSEL |
US6990135B2 (en) * | 2002-10-28 | 2006-01-24 | Finisar Corporation | Distributed bragg reflector for optoelectronic device |
US7085301B2 (en) * | 2002-07-12 | 2006-08-01 | The Board Of Trustees Of The University Of Illinois | Photonic crystal single transverse mode defect structure for vertical cavity surface emitting laser |
US6813293B2 (en) * | 2002-11-21 | 2004-11-02 | Finisar Corporation | Long wavelength VCSEL with tunnel junction, and implant |
US7433381B2 (en) * | 2003-06-25 | 2008-10-07 | Finisar Corporation | InP based long wavelength VCSEL |
CN1315234C (en) * | 2004-02-17 | 2007-05-09 | 长春理工大学 | Method for etching ring distributing holes on vertical cavity emission semiconductor laser |
JP2006278662A (en) * | 2005-03-29 | 2006-10-12 | Nec Corp | Optical source for optical communication |
JP2008283028A (en) | 2007-05-11 | 2008-11-20 | Fuji Xerox Co Ltd | Surface light emission type semiconductor laser, manufacturing method of the same, module, light source device, information processing apparatus, optical transmission apparatus, optical space transmission apparatus, and optical space transmission system |
JP5381180B2 (en) * | 2009-03-10 | 2014-01-08 | 富士ゼロックス株式会社 | Surface-emitting semiconductor laser, surface-emitting semiconductor laser device, optical transmitter, and information processing apparatus |
CN101510666A (en) * | 2009-04-07 | 2009-08-19 | 中国科学院长春光学精密机械与物理研究所 | Method for etching non-closed annular groove of preparation of vertical cavity surface emission semiconductor laser |
US10749312B2 (en) * | 2015-05-28 | 2020-08-18 | Vixar, Inc. | VCSELs and VCSEL arrays designed for improved performance as illumination sources and sensors |
US9742153B1 (en) | 2016-02-23 | 2017-08-22 | Lumentum Operations Llc | Compact emitter design for a vertical-cavity surface-emitting laser |
US9917419B2 (en) * | 2016-06-26 | 2018-03-13 | Vi Systems Gmbh | Low capacitance optoelectronic device |
US9929536B1 (en) * | 2017-06-15 | 2018-03-27 | Truelight Corporation | Structure of VCSEL and method for manufacturing the same |
US10666020B2 (en) * | 2017-09-20 | 2020-05-26 | Lumentum Operations Llc | Reconfigurable emitter array |
US11404848B2 (en) * | 2018-12-24 | 2022-08-02 | Seoul Viosys Co., Ltd. | Vertical-cavity surface-emitting laser |
-
2019
- 2019-12-19 US US16/720,634 patent/US11404848B2/en active Active
- 2019-12-20 JP JP2021536704A patent/JP2022514968A/en active Pending
- 2019-12-20 KR KR1020217012302A patent/KR20210096073A/en not_active Application Discontinuation
- 2019-12-20 CN CN201980083318.1A patent/CN113228434A/en active Pending
- 2019-12-20 WO PCT/KR2019/018212 patent/WO2020138864A1/en unknown
- 2019-12-20 EP EP19904878.6A patent/EP3905459A4/en active Pending
- 2019-12-20 CN CN201922310494.4U patent/CN211182797U/en active Active
-
2022
- 2022-07-31 US US17/878,032 patent/US11764545B2/en active Active
-
2023
- 2023-07-24 US US18/225,648 patent/US20230369826A1/en active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPWO2020138864A5 (en) | ||
JP2004538648A5 (en) | ||
JPS583278A (en) | Extremely small region pnp lateral transistor and method of producing same | |
JPH04359477A (en) | Process obtaining n channel single polysilicon level eprom cell and cell obtained by said process | |
JPS63188964U (en) | ||
CN105576016B (en) | Gate structure, its production method and flush memory device | |
WO2020114073A1 (en) | Insulated gate bipolar transistor and preparation method therefor, and electrical device | |
JPH0479424U (en) | ||
CN108122989B (en) | A method of promoting MOS device grid-control ability | |
FR992318A (en) | Method for manufacturing and assembling demountable constructions with a wooden structure, buildings obtained by said method | |
JPS58147167A (en) | High mobility complementary semiconductor device | |
CN111403476B (en) | Trench gate MOS power device and gate manufacturing method thereof | |
CN108054091A (en) | A kind of method for promoting MOS device grid-control ability | |
CN107275333A (en) | DMOS devices and manufacture method in SONOS non-volatility memorizer techniques | |
JPS607776A (en) | Thin film transistor | |
JPS5884467A (en) | Thin-film diode array | |
KR20230051785A (en) | Low-moisture puff pastry dough using ethyl alcohol and manufacturing method thereof | |
JPS61201475A (en) | Manufacture of junction type field-effect transistor | |
JPH0448470U (en) | ||
JPS61240682A (en) | Manufacture of semiconductor device | |
JPS629676A (en) | Manufacture of semiconductor device | |
JPS55141737A (en) | Manufacture of semiconductor | |
JPS59197150A (en) | Manufacture of semiconductor device | |
JPH0410434A (en) | Manufacture of semiconductor device | |
JPH0390460U (en) |