JPWO2020131394A5 - - Google Patents
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- Publication number
- JPWO2020131394A5 JPWO2020131394A5 JP2021533308A JP2021533308A JPWO2020131394A5 JP WO2020131394 A5 JPWO2020131394 A5 JP WO2020131394A5 JP 2021533308 A JP2021533308 A JP 2021533308A JP 2021533308 A JP2021533308 A JP 2021533308A JP WO2020131394 A5 JPWO2020131394 A5 JP WO2020131394A5
- Authority
- JP
- Japan
- Prior art keywords
- ion beam
- fins
- angle
- substrate
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010884 ion-beam technique Methods 0.000 claims 23
- 238000000034 method Methods 0.000 claims 19
- 239000000758 substrate Substances 0.000 claims 10
- 239000013598 vector Substances 0.000 claims 4
- 238000005452 bending Methods 0.000 claims 2
- 230000001629 suppression Effects 0.000 claims 2
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201862780815P | 2018-12-17 | 2018-12-17 | |
US62/780,815 | 2018-12-17 | ||
PCT/US2019/064592 WO2020131394A1 (en) | 2018-12-17 | 2019-12-05 | Modulation of rolling k vectors of angled gratings |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2022512366A JP2022512366A (ja) | 2022-02-03 |
JPWO2020131394A5 true JPWO2020131394A5 (zh) | 2022-12-13 |
JP7494179B2 JP7494179B2 (ja) | 2024-06-03 |
Family
ID=71071213
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021533308A Active JP7494179B2 (ja) | 2018-12-17 | 2019-12-05 | 傾斜回折格子のローリングkベクトルの調整 |
JP2021533784A Active JP7417611B2 (ja) | 2018-12-17 | 2019-12-05 | 傾斜回折格子のローリングkベクトルの調整 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021533784A Active JP7417611B2 (ja) | 2018-12-17 | 2019-12-05 | 傾斜回折格子のローリングkベクトルの調整 |
Country Status (6)
Country | Link |
---|---|
US (4) | US11367589B2 (zh) |
EP (2) | EP3899607A4 (zh) |
JP (2) | JP7494179B2 (zh) |
KR (2) | KR20210094104A (zh) |
CN (2) | CN113167948A (zh) |
WO (2) | WO2020131394A1 (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20210094104A (ko) * | 2018-12-17 | 2021-07-28 | 어플라이드 머티어리얼스, 인코포레이티드 | 경사 격자들의 롤링 k 벡터들의 조절 |
CN112394436B (zh) * | 2020-11-25 | 2021-07-06 | 中国科学院上海光学精密机械研究所 | 1064纳米波段的非对称结构全介质反射式合束光栅 |
KR20240072283A (ko) * | 2021-10-15 | 2024-05-23 | 어플라이드 머티어리얼스, 인코포레이티드 | 도파관 디스플레이를 위한 다층 투과 구조들 |
US20230375774A1 (en) * | 2022-04-20 | 2023-11-23 | Applied Materials, Inc. | Method for roughness reduction in manufacturing optical device structures |
Family Cites Families (40)
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EP0007108B1 (en) * | 1978-07-18 | 1983-04-13 | Nippon Telegraph and Telephone Public Corporation | A method of manufacturing a diffraction grating structure |
US5116461A (en) | 1991-04-22 | 1992-05-26 | Motorola, Inc. | Method for fabricating an angled diffraction grating |
GB9515090D0 (en) * | 1995-07-21 | 1995-09-20 | Applied Materials Inc | An ion beam apparatus |
US6821457B1 (en) * | 1998-07-29 | 2004-11-23 | Science Applications International Corporation | Electrically switchable polymer-dispersed liquid crystal materials including switchable optical couplers and reconfigurable optical interconnects |
JP2000100758A (ja) | 1998-09-18 | 2000-04-07 | Canon Inc | ビーム描画装置及びパターン形成方法 |
EP1105908B1 (en) * | 1999-06-23 | 2005-03-02 | Applied Materials, Inc. | Ion beam generation apparatus |
JP2002150960A (ja) | 2000-11-14 | 2002-05-24 | New Japan Radio Co Ltd | イオンビーム発生装置 |
GB2386247B (en) | 2002-01-11 | 2005-09-07 | Applied Materials Inc | Ion beam generator |
US20030197133A1 (en) * | 2002-04-23 | 2003-10-23 | Turner Norman L. | Method and apparatus for scanning a workpiece in a vacuum chamber |
US7868305B2 (en) | 2005-03-16 | 2011-01-11 | Varian Semiconductor Equipment Associates, Inc. | Technique for ion beam angle spread control |
US7675047B2 (en) * | 2005-11-15 | 2010-03-09 | Varian Semiconductor Equipment Associates, Inc. | Technique for shaping a ribbon-shaped ion beam |
US8169703B1 (en) * | 2006-09-06 | 2012-05-01 | Lightsmyth Technologies Inc. | Monolithic arrays of diffraction gratings |
US7227160B1 (en) | 2006-09-13 | 2007-06-05 | Axcelis Technologies, Inc. | Systems and methods for beam angle adjustment in ion implanters |
US20100277803A1 (en) * | 2006-12-14 | 2010-11-04 | Nokia Corporation | Display Device Having Two Operating Modes |
CN100520703C (zh) * | 2007-09-18 | 2009-07-29 | 北大方正集团有限公司 | 一种光栅化处理的方法及装置 |
US7915597B2 (en) * | 2008-03-18 | 2011-03-29 | Axcelis Technologies, Inc. | Extraction electrode system for high current ion implanter |
US7767986B2 (en) | 2008-06-20 | 2010-08-03 | Varian Semiconductor Equipment Associates, Inc. | Method and apparatus for controlling beam current uniformity in an ion implanter |
JP6281969B2 (ja) * | 2009-06-16 | 2018-02-21 | コーニンクレッカ フィリップス エヌ ヴェKoninklijke Philips N.V. | 傾けられた格子及び傾けられた格子の製造方法 |
US8129695B2 (en) * | 2009-12-28 | 2012-03-06 | Varian Semiconductor Equipment Associates, Inc. | System and method for controlling deflection of a charged particle beam within a graded electrostatic lens |
US8373427B2 (en) * | 2010-02-10 | 2013-02-12 | Skyworks Solutions, Inc. | Electron radiation monitoring system to prevent gold spitting and resist cross-linking during evaporation |
US8519353B2 (en) * | 2010-12-29 | 2013-08-27 | Varian Semiconductor Equipment Associates, Inc. | Method and apparatus for controlling an asymmetric electrostatic lens about a central ray trajectory of an ion beam |
KR101864164B1 (ko) * | 2011-05-18 | 2018-06-04 | 삼성전자주식회사 | 노광 시스템과, 이 시스템으로 제조되는 포토마스크 및 웨이퍼 |
JP6271235B2 (ja) * | 2013-01-24 | 2018-01-31 | キヤノンアネルバ株式会社 | フィンfetの製造方法およびデバイスの製造方法 |
US9514916B2 (en) * | 2013-03-15 | 2016-12-06 | Varian Semiconductor Equipment Associates, Inc. | Wafer platen thermosyphon cooling system |
CN103226215A (zh) * | 2013-04-19 | 2013-07-31 | 中国科学院半导体研究所 | 具有宽度周期性渐变表面的全息光栅制备方法 |
JP6257411B2 (ja) * | 2014-03-27 | 2018-01-10 | 住友重機械イオンテクノロジー株式会社 | イオン注入装置、最終エネルギーフィルター、及びイオン注入方法 |
US20160033784A1 (en) | 2014-07-30 | 2016-02-04 | Tapani Levola | Optical Components |
US20160035539A1 (en) * | 2014-07-30 | 2016-02-04 | Lauri SAINIEMI | Microfabrication |
US10825652B2 (en) * | 2014-08-29 | 2020-11-03 | Lam Research Corporation | Ion beam etch without need for wafer tilt or rotation |
US10670862B2 (en) * | 2015-07-02 | 2020-06-02 | Microsoft Technology Licensing, Llc | Diffractive optical elements with asymmetric profiles |
US9697988B2 (en) * | 2015-10-14 | 2017-07-04 | Advanced Ion Beam Technology, Inc. | Ion implantation system and process |
CN105643084B (zh) * | 2016-01-13 | 2018-05-29 | 东莞市富佳机械设备有限公司 | 智能穿戴网膜焊接、熔接工艺 |
DE102016111998B4 (de) * | 2016-06-30 | 2024-01-18 | Infineon Technologies Ag | Ausbilden von Elektrodengräben unter Verwendung eines gerichteten Ionenstrahls und Halbleitervorrichtung mit Graben-Elektrodenstrukturen |
KR102673632B1 (ko) * | 2016-12-06 | 2024-06-13 | 삼성전자주식회사 | 이온 빔 추출을 위한 슬릿 구조체를 포함하는 이온 빔 장비, 및 이를 이용한 식각 방법 및 자기기억소자의 제조방법 |
WO2018183510A1 (en) * | 2017-03-28 | 2018-10-04 | The Charles Stark Draper Laboratory, Inc. | Light field generator devices with series output couplers |
US10074514B1 (en) * | 2017-09-08 | 2018-09-11 | Varian Semiconductor Equipment Associates, Inc. | Apparatus and method for improved ion beam current |
US10468224B2 (en) * | 2017-12-21 | 2019-11-05 | Varian Semiconductor Equipment Associates, Inc. | Apparatus and method for controlling ion beam properties using energy filter |
US10955606B2 (en) * | 2018-05-30 | 2021-03-23 | Applied Materials, Inc. | Method of imprinting tilt angle light gratings |
US10302826B1 (en) * | 2018-05-30 | 2019-05-28 | Applied Materials, Inc. | Controlling etch angles by substrate rotation in angled etch tools |
KR20210094104A (ko) * | 2018-12-17 | 2021-07-28 | 어플라이드 머티어리얼스, 인코포레이티드 | 경사 격자들의 롤링 k 벡터들의 조절 |
-
2019
- 2019-12-05 KR KR1020217022110A patent/KR20210094104A/ko active Search and Examination
- 2019-12-05 CN CN201980081505.6A patent/CN113167948A/zh active Pending
- 2019-12-05 JP JP2021533308A patent/JP7494179B2/ja active Active
- 2019-12-05 EP EP19899230.7A patent/EP3899607A4/en active Pending
- 2019-12-05 KR KR1020217022108A patent/KR20210094103A/ko not_active Application Discontinuation
- 2019-12-05 EP EP19900621.4A patent/EP3898068A4/en active Pending
- 2019-12-05 CN CN201980082330.0A patent/CN113195151B/zh active Active
- 2019-12-05 WO PCT/US2019/064592 patent/WO2020131394A1/en unknown
- 2019-12-05 WO PCT/US2019/064601 patent/WO2020131398A1/en unknown
- 2019-12-05 US US16/705,159 patent/US11367589B2/en active Active
- 2019-12-05 US US16/705,158 patent/US11456152B2/en active Active
- 2019-12-05 JP JP2021533784A patent/JP7417611B2/ja active Active
-
2020
- 2020-09-30 US US17/037,935 patent/US11670482B2/en active Active
-
2023
- 2023-04-25 US US18/139,184 patent/US20230260746A1/en active Pending
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