JPWO2018059612A5 - - Google Patents

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JPWO2018059612A5
JPWO2018059612A5 JP2019505236A JP2019505236A JPWO2018059612A5 JP WO2018059612 A5 JPWO2018059612 A5 JP WO2018059612A5 JP 2019505236 A JP2019505236 A JP 2019505236A JP 2019505236 A JP2019505236 A JP 2019505236A JP WO2018059612 A5 JPWO2018059612 A5 JP WO2018059612A5
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Japan
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treated
electrode
electrode structure
construct
electric field
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JP2019505236A
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JP2019530948A (en
JP7074351B2 (en
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Priority claimed from DE102016118569.8A external-priority patent/DE102016118569A1/en
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このような観点からして、平面状の電極と、アース電極としての処理されるべき表面との間で、理想的には均等な定義されたプラズマをもたらす、ほぼ均一な電界推移が生じるように電極が構成されている電極構造が好ましい。 From this point of view, a nearly uniform electric field transition occurs between the planar electrode and the surface to be treated as the ground electrode, resulting in an ideally even defined plasma. An electrode structure in which the electrodes are configured is preferable.

上述した種類の-特に柔軟な-電極構造を載せることで、比較的広い面をも処理するという需要がますます高まっている。しかし処理面が増えるにつれて、誘電体の当接面と処理されるべき表面との間で均等なプラズマを形成するために通常の技術で必要となる電界強さを構成するのが難しくなる。したがって本発明の課題は、一方ではできる限り均等なプラズマが効率的な仕方で形成され、他方では、少ないエネルギー消費量によって比較的広い面でも相応に大型の電極構造で処理することができるように、上述した種類の電極構造を構成することにある。 There is an increasing demand to treat relatively large surfaces by mounting the above-mentioned types of-especially flexible-electrode structures. However, as the number of treated surfaces increases, it becomes more difficult to construct the electric field strength required by conventional techniques to form a uniform plasma between the contact surface of the dielectric and the surface to be treated. Therefore, the subject of the present invention is that, on the one hand, as uniform plasma as possible can be formed in an efficient manner, and on the other hand, a relatively large surface can be treated with a correspondingly large electrode structure with a small amount of energy consumption. The purpose is to construct the above-mentioned type of electrode structure.

JP2019505236A 2016-09-30 2017-07-21 Dielectric barrier Electrode structure for forming plasma discharge Active JP7074351B2 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102016118569.8 2016-09-30
DE102016118569.8A DE102016118569A1 (en) 2016-09-30 2016-09-30 Electrode arrangement for forming a dielectrically impeded plasma discharge
PCT/DE2017/100612 WO2018059612A1 (en) 2016-09-30 2017-07-21 Electrode arrangement for forming a dielectric barrier plasma discharge

Publications (3)

Publication Number Publication Date
JP2019530948A JP2019530948A (en) 2019-10-24
JPWO2018059612A5 true JPWO2018059612A5 (en) 2022-02-16
JP7074351B2 JP7074351B2 (en) 2022-05-24

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ID=59655806

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JP2019505236A Active JP7074351B2 (en) 2016-09-30 2017-07-21 Dielectric barrier Electrode structure for forming plasma discharge

Country Status (14)

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US (1) US11785700B2 (en)
EP (2) EP3448130B1 (en)
JP (1) JP7074351B2 (en)
KR (1) KR102460970B1 (en)
CN (1) CN109792832A (en)
BR (1) BR112019001274B1 (en)
DE (1) DE102016118569A1 (en)
DK (1) DK3448130T3 (en)
ES (2) ES2710316T3 (en)
MX (1) MX2019000934A (en)
PL (1) PL3448130T3 (en)
RU (1) RU2737280C2 (en)
TR (1) TR201901068T4 (en)
WO (1) WO2018059612A1 (en)

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