JPWO2017077834A1 - Fluoropolyether group-containing polymer-modified organosilicon compound, surface treatment agent and article - Google Patents

Fluoropolyether group-containing polymer-modified organosilicon compound, surface treatment agent and article Download PDF

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JPWO2017077834A1
JPWO2017077834A1 JP2017548692A JP2017548692A JPWO2017077834A1 JP WO2017077834 A1 JPWO2017077834 A1 JP WO2017077834A1 JP 2017548692 A JP2017548692 A JP 2017548692A JP 2017548692 A JP2017548692 A JP 2017548692A JP WO2017077834 A1 JPWO2017077834 A1 JP WO2017077834A1
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理佐 片山
理佐 片山
松田 高至
高至 松田
祐治 山根
祐治 山根
隆介 酒匂
隆介 酒匂
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Abstract

温和な条件下、短時間においても耐摩耗性に優れた撥水撥油層を形成できるフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物、及び該化合物を含む表面処理剤、並びに該処理剤で表面処理された物品を提供する。
下記一般式(1)

Figure 2017077834

[Rfはフルオロオキシアルキル基又はフルオロオキシアルキレン基含有ポリマー残基、Yは2価炭化水素基、Qは2価オルガノシロキサン残基、シルアルキレン基又はシルアリーレン基、Xは水素原子、アルキル基又はフェニル基、Zは水素原子、下式
−SiR3
(Rはアルキル基又はフェニル基。)
で表される基、又は下式
−W−Q’−X
(Wは単結合又は2価炭化水素基、Q’はシロキサン結合、シルアルキレン構造及びシルアリーレン構造から選ばれる構造を有する2価の基。)
で表される基、αは1又は2。]
で表されるフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物。Fluoropolyether group-containing polymer-modified organosilicon compound capable of forming a water- and oil-repellent layer with excellent abrasion resistance under mild conditions, a surface treatment agent containing the compound, and a surface treatment with the treatment agent Provide goods.
The following general formula (1)
Figure 2017077834

[Rf is a fluorooxyalkyl group- or fluorooxyalkylene group-containing polymer residue, Y is a divalent hydrocarbon group, Q is a divalent organosiloxane residue, silalkylene group or silarylene group, X is a hydrogen atom, alkyl group or A phenyl group, Z is a hydrogen atom, -SiR 3
(R is an alkyl group or a phenyl group.)
Or a group represented by the following formula: -WQ'-X
(W is a single bond or a divalent hydrocarbon group, Q ′ is a divalent group having a structure selected from a siloxane bond, a silalkylene structure and a silarylene structure.)
And α is 1 or 2. ]
A fluoropolyether group-containing polymer-modified organosilicon compound represented by:

Description

本発明は、フルオロポリエーテル基含有ポリマー変性有機ケイ素化合物、及び該有機ケイ素化合物を含む表面処理剤、並びに該表面処理剤で表面処理された物品に関する。   The present invention relates to a fluoropolyether group-containing polymer-modified organosilicon compound, a surface treatment agent containing the organosilicon compound, and an article surface-treated with the surface treatment agent.

近年、携帯電話のディスプレイをはじめ、画面のタッチパネル化が加速している。しかし、タッチパネルは画面がむき出しの状態であり、指や頬などが直接付着する機会が多く、皮脂等の汚れが付き易いことが問題となっている。そこで、外観や視認性をよくするためにディスプレイの表面に指紋を付きにくくする技術や、汚れを落とし易くする技術の要求が年々高まってきており、これらの要求に応えることのできる材料の開発が望まれている。特にタッチパネルディスプレイの表面は、指紋汚れが付着しやすいため、撥水撥油層を設けることが望まれている。しかし、従来の撥水撥油層は撥水撥油性が高く、汚れ拭き取り性に優れるが、使用中に防汚性能が劣化してしまうという問題点があった。また、塗工する方法によって、性能にばらつきが出たり、塗工する基材によって、密着性が劣ったりする場合があった。更に、これまでの表面処理剤は、ガラスに対して良好な表面特性を示すものは多くあったが、樹脂表面に対して、密着性や撥水撥油性、耐摩耗性等の表面特性を十分に示すものがなかった。   In recent years, the touch panel of the screen including the display of the mobile phone has been accelerated. However, the touch panel has a bare screen, and there are many occasions where fingers, cheeks and the like are directly attached, and it is a problem that dirt such as sebum is easily attached. Therefore, the demand for technology that makes it difficult to attach fingerprints to the surface of the display to improve the appearance and visibility, and technology that makes it easier to remove dirt is increasing year by year, and the development of materials that can meet these requirements has been developed. It is desired. In particular, since the surface of the touch panel display is likely to be contaminated with fingerprints, it is desired to provide a water / oil repellent layer. However, the conventional water / oil repellent layer has high water / oil repellency and excellent dirt wiping property, but has a problem that the antifouling performance deteriorates during use. In addition, performance may vary depending on the coating method, and adhesion may be inferior depending on the substrate to be coated. Furthermore, many of the surface treatment agents used so far show good surface properties for glass, but surface properties such as adhesion, water and oil repellency, and wear resistance are sufficient for the resin surface. There was nothing to show.

一般に、フルオロポリエーテル基含有化合物は、その表面自由エネルギーが非常に小さいために、撥水撥油性、耐薬品性、潤滑性、離型性、防汚性などを有する。その性質を利用して、工業的には紙・繊維などの撥水撥油防汚剤、磁気記録媒体の滑剤、精密機器の防油剤、離型剤、化粧料、保護膜など、幅広く利用されている。しかし、その性質は同時に他の基材に対する非粘着性、非密着性であることを意味しており、基材表面に塗布することはできても、その被膜を密着させることは困難であった。   In general, a fluoropolyether group-containing compound has very small surface free energy, and thus has water and oil repellency, chemical resistance, lubricity, mold release, antifouling properties, and the like. Utilizing its properties, it is widely used industrially for water and oil repellent and antifouling agents such as paper and fiber, lubricants for magnetic recording media, oil repellents for precision equipment, mold release agents, cosmetics, and protective films. ing. However, the property means that it is non-adhesive and non-adhesive to other substrates at the same time, and even if it can be applied to the surface of the substrate, it was difficult to make the film adhere to it. .

一方、ガラスや布などの基材表面と有機化合物とを結合させるものとして、シランカップリング剤が良く知られており、各種基材表面のコーティング剤として幅広く利用されている。シランカップリング剤は、1分子中に有機官能基と反応性シリル基(一般にはアルコキシシリル基等の加水分解性シリル基)を有する。加水分解性シリル基が、空気中の水分などによって自己縮合反応を起こして被膜を形成する。該被膜は、加水分解性シリル基がガラスや金属などの表面と化学的・物理的に結合することにより耐久性を有する強固な被膜となる。   On the other hand, silane coupling agents are well known as those for bonding a substrate surface such as glass or cloth and an organic compound, and are widely used as coating agents for various substrate surfaces. The silane coupling agent has an organic functional group and a reactive silyl group (generally a hydrolyzable silyl group such as an alkoxysilyl group) in one molecule. The hydrolyzable silyl group causes a self-condensation reaction with moisture in the air to form a film. The coating becomes a strong coating having durability by chemically and physically bonding the hydrolyzable silyl group to the surface of glass or metal.

そこで、フルオロポリエーテル基含有化合物に加水分解性シリル基を導入したフルオロポリエーテル基含有ポリマー変性シランを用いることによって、基材表面に密着し易く、かつ基材表面に、撥水撥油性、耐薬品性、潤滑性、離型性、防汚性等を有する被膜を形成しうる組成物が開示されている(特許文献1〜8:特開2003−238577号公報、特許第2860979号公報、特許第4672095号公報、特表2008−534696号公報、特表2008−537557号公報、特開2012−072272号公報、特開2012−157856号公報、特開2013−136833号公報)。   Therefore, by using a fluoropolyether group-containing polymer-modified silane in which a hydrolyzable silyl group is introduced into a fluoropolyether group-containing compound, it is easy to adhere to the substrate surface, and the substrate surface has water and oil repellency, resistance to water. A composition capable of forming a film having chemical properties, lubricity, releasability, antifouling properties and the like is disclosed (Patent Documents 1 to 8: JP 2003-238777 A, Patent 2860979, Patent No. 4672095, JP-T 2008-534696, JP-T 2008-537557, JP 2012-072722, JP 2012-157856, JP 2013-136833).

上記フルオロポリエーテル基含有ポリマー変性シランを含有する組成物で基材を表面処理する際、種々の塗工方法を用いて基材に対し被膜形成を行うが、塗工後、加水分解性シリル基を加水分解し、被膜を硬化する工程において、80℃や120℃などの高温条件や、加湿下の条件により加水分解反応が促進される。また、室温下でも空気中の水分と徐々に反応することで硬化被膜を形成できる。しかし、該硬化工程は高温加湿条件を必要とすることや、室温下で硬化する場合に時間がかかってしまうなど、製造上の律速(遅延要因)になり得る問題があった。更に、室温硬化などの温和な条件下にて短時間で硬化した被膜(撥水撥油層)は、耐摩耗性、使用中に防汚性能が劣化してしまうという問題点があった。   When the substrate is surface-treated with the composition containing the above-mentioned fluoropolyether group-containing polymer-modified silane, a film is formed on the substrate using various coating methods. In the step of hydrolyzing and curing the film, the hydrolysis reaction is promoted by high temperature conditions such as 80 ° C. and 120 ° C. and under humidification. Moreover, a cured film can be formed by reacting gradually with moisture in the air even at room temperature. However, the curing process has a problem that it may become a rate-limiting factor (delay factor) in manufacturing, such as requiring high-temperature humidification conditions and taking time when curing at room temperature. Furthermore, a film (water / oil repellent layer) cured in a short time under a mild condition such as room temperature curing has a problem that the anti-fouling performance deteriorates during wear resistance and use.

特許文献9(特開2008−144144号公報)では、コーティング組成物内に硬化触媒として含フッ素カルボン酸を添加して硬化を促進させることで温和な条件下、短時間で成膜を行っている。しかし、触媒量を低減すると耐摩耗性に劣り、触媒量を増加させると初期性能が低下する。また、極性基であるカルボキシル基が被膜最表面に出てしまう可能性も高く、その際は性能が低下してしまう。   In Patent Document 9 (Japanese Patent Application Laid-Open No. 2008-144144), film formation is performed in a short time under mild conditions by adding fluorine-containing carboxylic acid as a curing catalyst in the coating composition to promote curing. . However, if the amount of the catalyst is reduced, the wear resistance is inferior, and if the amount of the catalyst is increased, the initial performance is lowered. In addition, there is a high possibility that a carboxyl group which is a polar group appears on the outermost surface of the film, and in that case, the performance is lowered.

また、特許文献10(特開2004−145283号公報)では、フルオロポリアルキレンエーテル基含有シランが提案されている。該フルオロポリアルキレンエーテル基含有シランで処理したレンズは、撥油性、指紋拭き取り性に優れているが、耐摩耗性が十分ではない。   Patent Document 10 (Japanese Patent Application Laid-Open No. 2004-145283) proposes a fluoropolyalkylene ether group-containing silane. The lens treated with the fluoropolyalkylene ether group-containing silane is excellent in oil repellency and fingerprint wiping, but has insufficient wear resistance.

特開2003−238577号公報JP 2003-238777 A 特許第2860979号公報Japanese Patent No. 2860979 特許第4672095号公報Japanese Patent No. 4672095 特表2008−534696号公報Special table 2008-534696 gazette 特表2008−537557号公報JP 2008-537557 A 特開2012−072272号公報JP 2012-072272 A 特開2012−157856号公報JP 2012-157856 A 特開2013−136833号公報JP 2013-136833 A 特開2008−144144号公報JP 2008-144144 A 特開2004−145283号公報JP 2004-145283 A

本発明は、上記事情に鑑みなされたもので、特に樹脂表面において、室温などの温和な条件下、短時間においても耐摩耗性に優れた撥水撥油層を形成することができるフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物、及び該有機ケイ素化合物を含む表面処理剤、並びに該表面処理剤で表面処理された物品を提供することを目的とする。   The present invention has been made in view of the above circumstances, and particularly on the resin surface, a fluoropolyether group capable of forming a water- and oil-repellent layer having excellent wear resistance even in a short time under mild conditions such as room temperature. It is an object of the present invention to provide a containing polymer-modified organosilicon compound, a surface treatment agent containing the organosilicon compound, and an article surface-treated with the surface treatment agent.

本発明者らは、上記目的を解決すべく鋭意検討した結果、後述する一般式(1)で表されるフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物を用いた表面処理剤が、末端官能基を有さなくとも、室温などの温和な条件下、短時間でも耐摩耗性に優れた撥水撥油層を樹脂フィルムやプラスチックレンズなどの樹脂製品に対して形成し得ることを見出し、本発明をなすに至った。   As a result of intensive studies to solve the above-mentioned object, the present inventors have found that the surface treatment agent using the fluoropolyether group-containing polymer-modified organosilicon compound represented by the general formula (1) described below has a terminal functional group. Even if it does not exist, it has been found that a water- and oil-repellent layer excellent in abrasion resistance can be formed on a resin product such as a resin film or a plastic lens even under a mild condition such as room temperature. It came to.

従って、本発明は、下記フルオロポリエーテル基含有ポリマー変性有機ケイ素化合物、表面処理剤及び物品を提供する。
〔1〕
下記一般式(1)

Figure 2017077834
[式中、Rfは1価のフルオロオキシアルキル基又は2価のフルオロオキシアルキレン基含有ポリマー残基であり、Yは独立に2価の炭化水素基であり、Qは独立に2価の直鎖状もしくは環状オルガノシロキサン残基、シルアルキレン基又はシルアリーレン基であり、Xは独立に水素原子、炭素数1〜4のアルキル基又はフェニル基であり、Zは独立に水素原子、下記式
−SiR3
(式中、Rは独立に炭素数1〜4のアルキル基又はフェニル基である。)
で表される基、又は下記式
−W−Q’−X
(式中、Xは上記と同じであり、Wは単結合又は2価の炭化水素基であり、Q’はシロキサン結合、シルアルキレン構造及びシルアリーレン構造から選ばれる構造を有する2価の基である。)
で表される基であり、αは1又は2である。]
で表されるフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物。
〔2〕
前記式(1)において、αが1であり、Rf基が下記一般式(2)で表される基であることを特徴とする〔1〕記載のフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物。
Figure 2017077834
(式中、p、q、r、sはそれぞれ0〜200の整数で、p+q+r+s=3〜200であり、各繰り返し単位は直鎖状でも分岐状であってもよく、各繰り返し単位同士はランダムに結合されていてよく、dは1〜3の整数であり、該単位は直鎖状でも分岐状であってもよい。)
〔3〕
前記式(1)において、αが2であり、Rf基が下記一般式(3)で表される基であることを特徴とする〔1〕記載のフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物。
Figure 2017077834
(式中、p、q、r、sはそれぞれ0〜200の整数で、p+q+r+s=3〜200であり、各繰り返し単位は直鎖状でも分岐状であってもよく、各繰り返し単位同士はランダムに結合されていてよく、dは1〜3の整数であり、該単位は直鎖状でも分岐状であってもよい。)
〔4〕
前記式(1)において、Yが、炭素数3〜10のアルキレン基である〔1〕〜〔3〕のいずれかに記載のフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物。
〔5〕
前記式(1)において、Qが、下記式で示される基から選ばれる基である〔1〕〜〔4〕のいずれかに記載のフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物。
Figure 2017077834
(式中、Xは上記と同じであり、R1は独立に炭素数1〜4のアルキル基又はフェニル基であり、R2は炭素数1〜4のアルキレン基又は炭素数6〜12のアリーレン基である。gは1〜20の整数であり、jは1〜8の整数である。)
〔6〕
前記式(1)において、Zが、水素原子、及び下記に示す基より選ばれる基である〔1〕〜〔5〕のいずれかに記載のフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物。
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
(式中、g1は2〜20の整数であり、eは0〜3の整数である。)
〔7〕
上記式(1)で表されるフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物が、下記式のいずれかで表されるものである〔1〕〜〔6〕のいずれか1項に記載のフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物。
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
(式中、Zは上記と同じであり、p1は5〜100の整数、q1は5〜100の整数で、p1+q1は10〜105の整数である。g1は2〜20の整数であり、eは0〜3の整数である。)
〔8〕
〔1〕〜〔7〕のいずれかに記載のフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物を含む表面処理剤。
〔9〕
表面処理剤が、更に下記一般式(4)
Figure 2017077834
(式中、Aは末端が−CF3基である1価のフッ素含有基であり、Rf’は2価のフルオロオキシアルキレン基含有ポリマー残基である。)
で表されるフルオロポリエーテル基含有ポリマーを含有することを特徴とする〔8〕に記載の表面処理剤。
〔10〕
〔9〕記載の表面処理剤で表面処理された物品。Accordingly, the present invention provides the following fluoropolyether group-containing polymer-modified organosilicon compound, surface treatment agent and article.
[1]
The following general formula (1)
Figure 2017077834
[Wherein Rf is a monovalent fluorooxyalkyl group or divalent fluorooxyalkylene group-containing polymer residue, Y is independently a divalent hydrocarbon group, and Q is independently a divalent linear chain. Or a cyclic organosiloxane residue, a silalkylene group or a silarylene group, X is independently a hydrogen atom, an alkyl group having 1 to 4 carbon atoms or a phenyl group, Z is independently a hydrogen atom, Three
(In the formula, R is independently an alkyl group having 1 to 4 carbon atoms or a phenyl group.)
Or a group represented by the following formula -WQ'-X
Wherein X is the same as above, W is a single bond or a divalent hydrocarbon group, Q ′ is a divalent group having a structure selected from a siloxane bond, a silalkylene structure and a silarylene structure. is there.)
And α is 1 or 2. ]
A fluoropolyether group-containing polymer-modified organosilicon compound represented by:
[2]
In the formula (1), α is 1, and the Rf group is a group represented by the following general formula (2). The fluoropolyether group-containing polymer-modified organosilicon compound according to [1].
Figure 2017077834
(In the formula, p, q, r, and s are each an integer of 0 to 200, and p + q + r + s = 3 to 200, each repeating unit may be linear or branched, and each repeating unit is randomly selected. And d is an integer of 1 to 3, and the unit may be linear or branched.)
[3]
In the formula (1), α is 2, and the Rf group is a group represented by the following general formula (3). The fluoropolyether group-containing polymer-modified organosilicon compound according to [1].
Figure 2017077834
(In the formula, p, q, r, and s are each an integer of 0 to 200, and p + q + r + s = 3 to 200, each repeating unit may be linear or branched, and each repeating unit is randomly selected. And d is an integer of 1 to 3, and the unit may be linear or branched.)
[4]
The fluoropolyether group-containing polymer-modified organosilicon compound according to any one of [1] to [3], wherein in the formula (1), Y is an alkylene group having 3 to 10 carbon atoms.
[5]
In the formula (1), the fluoropolyether group-containing polymer-modified organosilicon compound according to any one of [1] to [4], wherein Q is a group selected from the groups represented by the following formulae.
Figure 2017077834
(In the formula, X is the same as above, R 1 is independently an alkyl group having 1 to 4 carbon atoms or a phenyl group, and R 2 is an alkylene group having 1 to 4 carbon atoms or an arylene having 6 to 12 carbon atoms. (G is an integer of 1 to 20, and j is an integer of 1 to 8.)
[6]
The fluoropolyether group-containing polymer-modified organosilicon compound according to any one of [1] to [5], wherein in the formula (1), Z is a hydrogen atom and a group selected from the following groups.
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
(In the formula, g1 is an integer of 2 to 20, and e is an integer of 0 to 3.)
[7]
The fluoropolyether according to any one of [1] to [6], wherein the fluoropolyether group-containing polymer-modified organosilicon compound represented by the formula (1) is represented by any of the following formulas: Ether group-containing polymer-modified organosilicon compound.
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
(In the formula, Z is the same as above, p1 is an integer of 5 to 100, q1 is an integer of 5 to 100, p1 + q1 is an integer of 10 to 105, g1 is an integer of 2 to 20, e Is an integer from 0 to 3.)
[8]
[1] A surface treatment agent comprising the fluoropolyether group-containing polymer-modified organosilicon compound according to any one of [1] to [7].
[9]
The surface treatment agent is further represented by the following general formula (4)
Figure 2017077834
(In the formula, A is a monovalent fluorine-containing group whose terminal is a —CF 3 group, and Rf ′ is a divalent fluorooxyalkylene group-containing polymer residue.)
The surface treatment agent according to [8], comprising a fluoropolyether group-containing polymer represented by the formula:
[10]
[9] An article surface-treated with the surface treatment agent according to [9].

本発明のフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物を含有する表面処理剤から形成される被膜は、撥水撥油性が高く、特に室温などの温和な条件下、短時間で形成される被膜は、耐摩耗性に優れる。本発明のフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物を含有する表面処理剤は、特に樹脂表面に対して特異的な密着性を有するので、該表面処理剤で処理することによって、樹脂フィルムやメガネレンズのような樹脂製品に優れた撥水撥油性、低動摩擦性、耐摩耗性を短時間で容易に付与することができる。   The film formed from the surface treatment agent containing the fluoropolyether group-containing polymer-modified organosilicon compound of the present invention has high water and oil repellency, and in particular, the film formed in a short time under mild conditions such as room temperature. Excellent wear resistance. Since the surface treatment agent containing the fluoropolyether group-containing polymer-modified organosilicon compound of the present invention has specific adhesion particularly to the resin surface, a resin film or glasses can be obtained by treating with the surface treatment agent. Excellent water and oil repellency, low dynamic friction and wear resistance can be easily imparted to resin products such as lenses in a short time.

本発明のフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物は、下記一般式(1)で表されるものである。

Figure 2017077834
[式中、Rfは1価のフルオロオキシアルキル基又は2価のフルオロオキシアルキレン基含有ポリマー残基であり、Yは独立に2価の炭化水素基であり、Qは独立に2価の直鎖状もしくは環状オルガノシロキサン残基、シルアルキレン基又はシルアリーレン基であり、Xは独立に水素原子、炭素数1〜4のアルキル基又はフェニル基であり、Zは独立に水素原子、下記式
−SiR3
(式中、Rは独立に炭素数1〜4のアルキル基又はフェニル基である。)
で表される基、又は下記式
−W−Q’−X
(式中、Xは上記と同じであり、Wは単結合又は2価の炭化水素基であり、Q’はシロキサン結合、シルアルキレン構造及びシルアリーレン構造から選ばれる構造を有する2価の基である。)
で表される基であり、αは1又は2である。]The fluoropolyether group-containing polymer-modified organosilicon compound of the present invention is represented by the following general formula (1).
Figure 2017077834
[Wherein Rf is a monovalent fluorooxyalkyl group or divalent fluorooxyalkylene group-containing polymer residue, Y is independently a divalent hydrocarbon group, and Q is independently a divalent linear chain. Or a cyclic organosiloxane residue, a silalkylene group or a silarylene group, X is independently a hydrogen atom, an alkyl group having 1 to 4 carbon atoms or a phenyl group, Z is independently a hydrogen atom, Three
(In the formula, R is independently an alkyl group having 1 to 4 carbon atoms or a phenyl group.)
Or a group represented by the following formula -WQ'-X
Wherein X is the same as above, W is a single bond or a divalent hydrocarbon group, Q ′ is a divalent group having a structure selected from a siloxane bond, a silalkylene structure and a silarylene structure. is there.)
And α is 1 or 2. ]

上記式(1)において、αが1の場合、Rfとしては、下記一般式(2)で表される1価のフルオロオキシアルキル基が好ましい。

Figure 2017077834
(式中、p、q、r、sはそれぞれ0〜200の整数で、p+q+r+s=3〜200であり、各繰り返し単位は直鎖状でも分岐状であってもよく、各繰り返し単位同士はランダムに結合されていてよく、dは1〜3の整数であり、該単位は直鎖状でも分岐状であってもよい。)In the above formula (1), when α is 1, Rf is preferably a monovalent fluorooxyalkyl group represented by the following general formula (2).
Figure 2017077834
(In the formula, p, q, r, and s are each an integer of 0 to 200, and p + q + r + s = 3 to 200, each repeating unit may be linear or branched, and each repeating unit is randomly selected. And d is an integer of 1 to 3, and the unit may be linear or branched.)

上記式(1)において、αが2の場合、Rfとしては、下記一般式(3)で表される2価のフルオロオキシアルキレン基が好ましい。

Figure 2017077834
(式中、p、q、r、sはそれぞれ0〜200の整数で、p+q+r+s=3〜200であり、各繰り返し単位は直鎖状でも分岐状であってもよく、各繰り返し単位同士はランダムに結合されていてよく、dは1〜3の整数であり、該単位は直鎖状でも分岐状であってもよい。)In the above formula (1), when α is 2, Rf is preferably a divalent fluorooxyalkylene group represented by the following general formula (3).
Figure 2017077834
(In the formula, p, q, r, and s are each an integer of 0 to 200, and p + q + r + s = 3 to 200, each repeating unit may be linear or branched, and each repeating unit is randomly selected. And d is an integer of 1 to 3, and the unit may be linear or branched.)

上記式(2)、(3)において、p、q、r、sはそれぞれ0〜200の整数、好ましくはpは5〜100の整数、qは5〜100の整数、rは0〜100の整数、sは0〜100の整数であり、p+q+r+s=3〜200、好ましくは10〜100であり、各繰り返し単位は直鎖状でも分岐状であってもよく、各繰り返し単位同士はランダムに結合されていてよい。より好ましくはp+qは10〜105、特に15〜60の整数であり、r=s=0である。p+q+r+sが上記上限値より小さければ密着性や被膜形成性が良好であり、上記下限値より大きければフルオロポリエーテル基の特徴を十分に発揮することができるので好ましい。
上記式(2)、(3)において、dは1〜3の整数であり、好ましくは1又は2であり、該単位は直鎖状でも分岐状であってもよい。
In the above formulas (2) and (3), p, q, r, and s are each an integer of 0 to 200, preferably p is an integer of 5 to 100, q is an integer of 5 to 100, and r is 0 to 100. Integer, s is an integer of 0 to 100, p + q + r + s = 3 to 200, preferably 10 to 100, each repeating unit may be linear or branched, and each repeating unit is randomly bonded May have been. More preferably, p + q is an integer of 10 to 105, particularly 15 to 60, and r = s = 0. If p + q + r + s is smaller than the above upper limit value, the adhesion and film forming properties are good, and if p + q + r + s is larger than the lower limit value, it is preferable because the characteristics of the fluoropolyether group can be sufficiently exhibited.
In the above formulas (2) and (3), d is an integer of 1 to 3, preferably 1 or 2, and the unit may be linear or branched.

Rfとして、上記式(2)又は(3)で表される主鎖構造を有することによって、動摩擦係数の低い被膜を形成することができる。
また、主鎖にフルオロポリエーテル構造を有し、分子鎖の片末端にシロキサン結合、シルフェニレン結合又はシルアルキレン結合を含有する直鎖状ポリマー(αが1で、Rfが式(2)で表される1価のフルオロオキシアルキル基)は、両末端にシロキサン結合、シルフェニレン結合又はシルアルキレン結合を含有する直鎖状ポリマー(αが2で、Rfが式(3)で表される2価のフルオロオキシアルキレン基)と比較して、得られる被膜に優れた耐摩耗性を付与することができる。
By having the main chain structure represented by the above formula (2) or (3) as Rf, a film having a low dynamic friction coefficient can be formed.
Also, a linear polymer having a fluoropolyether structure in the main chain and containing a siloxane bond, a silphenylene bond or a silalkylene bond at one end of the molecular chain (α is 1, Rf is represented by the formula (2) The monovalent fluorooxyalkyl group) is a linear polymer containing a siloxane bond, a silphenylene bond or a silalkylene bond at both ends (α is 2 and Rf is represented by the formula (3)). Compared with the fluorooxyalkylene group), it is possible to impart excellent abrasion resistance to the resulting film.

Rfとして、具体的には、下記のものを例示することができる。

Figure 2017077834
(式中、p’、q’、r’、s’はそれぞれ1以上の整数であり、その上限は上記p、q、r、sの上限と同じである。uは1〜24、vは1〜24で、u+v=rを満足する数である。各繰り返し単位はランダムに結合されていてよい。)Specific examples of Rf include the following.
Figure 2017077834
(Wherein, p ′, q ′, r ′ and s ′ are each an integer of 1 or more, and the upper limit thereof is the same as the upper limit of the above p, q, r and s. U is 1 to 24, and v is 1 to 24, and u + v = r. Each repeating unit may be bonded at random.)

上記式(1)において、Yは独立に2価の炭化水素基であり、炭素数3〜10、特に炭素数3〜8のプロピレン基(トリメチレン基、メチルエチレン基)、ブチレン基(テトラメチレン基、メチルプロピレン基)、ヘキサメチレン基、オクタメチレン基等のアルキレン基であることが好ましく、特に好ましくはトリメチレン基である。   In the above formula (1), Y is independently a divalent hydrocarbon group, and is a propylene group (trimethylene group or methylethylene group) having 3 to 10 carbon atoms, particularly 3 to 8 carbon atoms, butylene group (tetramethylene group). , A methylpropylene group), a hexamethylene group, an octamethylene group and the like are preferable, and a trimethylene group is particularly preferable.

上記式(1)において、Xは独立に水素原子、炭素数1〜4のメチル基、エチル基、プロピル基、ブチル基等のアルキル基又はフェニル基であり、水素原子、メチル基が好ましい。   In the above formula (1), X is independently a hydrogen atom, an alkyl group such as a methyl group having 1 to 4 carbon atoms, an ethyl group, a propyl group, or a butyl group, or a phenyl group, preferably a hydrogen atom or a methyl group.

上記式(1)において、Qは、独立に2価の直鎖状もしくは環状オルガノシロキサン残基、シルアルキレン基又はシルアリーレン基であり、下記式で示される基から選ばれる基であることが好ましい。

Figure 2017077834
(式中、Xは上記と同じであり、R1は独立に炭素数1〜4のメチル基、エチル基、プロピル基、ブチル基等のアルキル基又はフェニル基であり、R2は炭素数1〜4のメチレン基、エチレン基、プロピレン基、ブチレン基等のアルキレン基又は炭素数6〜12のフェニレン基等のアリーレン基である。gは1〜20、好ましくは1〜10の整数であり、jは1〜8、好ましくは1〜3の整数である。)In the above formula (1), Q is independently a divalent linear or cyclic organosiloxane residue, a silalkylene group or a silarylene group, and is preferably a group selected from the groups represented by the following formulae. .
Figure 2017077834
(Wherein X is the same as above, R 1 is independently an alkyl group such as a methyl group having 1 to 4 carbon atoms, an ethyl group, a propyl group, or a butyl group, or a phenyl group, and R 2 is 1 carbon atom) An alkylene group such as a methylene group of -4, an ethylene group, a propylene group, a butylene group, or an arylene group such as a phenylene group having 6 to 12 carbon atoms, g is an integer of 1-20, preferably 1-10, j is an integer of 1-8, preferably 1-3.

Qの具体例としては、例えば、下記の基が挙げられる。

Figure 2017077834
(式中、g1は2〜20、好ましくは2〜10の整数である。)Specific examples of Q include the following groups.
Figure 2017077834
(In the formula, g1 is an integer of 2 to 20, preferably 2 to 10.)

上記式(1)において、Zは独立に水素原子、下記式
−SiR3
(式中、Rは独立に炭素数1〜4のアルキル基又はフェニル基である。)
で表される基、又は下記式
−W−Q’−X
(式中、Xは上記と同じであり、Wは単結合又は2価の炭化水素基であり、Q’はシロキサン結合、シルアルキレン構造及びシルアリーレン構造から選ばれる構造を有する2価の基である。)
で表される基である。
In the above formula (1), Z is independently a hydrogen atom, the following formula —SiR 3
(In the formula, R is independently an alkyl group having 1 to 4 carbon atoms or a phenyl group.)
Or a group represented by the following formula -WQ'-X
Wherein X is the same as above, W is a single bond or a divalent hydrocarbon group, Q ′ is a divalent group having a structure selected from a siloxane bond, a silalkylene structure and a silarylene structure. is there.)
It is group represented by these.

−SiR3において、Rは炭素数1〜4のメチル基、エチル基、プロピル基、ブチル基等のアルキル基、又はフェニル基であり、中でもメチル基、エチル基が好適である。In —SiR 3 , R is an alkyl group such as a methyl group having 1 to 4 carbon atoms, an ethyl group, a propyl group, or a butyl group, or a phenyl group. Among them, a methyl group or an ethyl group is preferable.

また、−W−Q’−Xにおいて、Wは単結合又は2価の炭化水素基であり、2価の炭化水素基としては、炭素数2〜10、特に炭素数2〜8のエチレン基、プロピレン基(トリメチレン基、メチルエチレン基)、ブチレン基(テトラメチレン基、メチルプロピレン基)、ヘキサメチレン基、オクタメチレン基等のアルキレン基が挙げられ、Wとしては、単結合又はトリメチレン基であることが好ましい。
Xは上記と同じであり、水素原子、メチル基が好ましい。
In -WQ'-X, W is a single bond or a divalent hydrocarbon group, and the divalent hydrocarbon group includes an ethylene group having 2 to 10 carbon atoms, particularly 2 to 8 carbon atoms, Alkylene groups such as propylene group (trimethylene group, methylethylene group), butylene group (tetramethylene group, methylpropylene group), hexamethylene group, octamethylene group and the like can be mentioned, and W is a single bond or trimethylene group. Is preferred.
X is the same as described above, and is preferably a hydrogen atom or a methyl group.

また、Q’はシロキサン結合、シルアルキレン構造及びシルアリーレン構造から選ばれる構造を有する2価の基であり、上記Qにおいて例示した2価の直鎖状もしくは環状オルガノシロキサン残基、シルアルキレン構造、シルアリーレン構造を有するものが好ましい。
Q’の具体例としては、例えば、下記の基が挙げられる。

Figure 2017077834
(式中、g1は上記と同じである。)Q ′ is a divalent group having a structure selected from a siloxane bond, a silalkylene structure and a silarylene structure, and the divalent linear or cyclic organosiloxane residue exemplified in Q above, a silalkylene structure, Those having a silarylene structure are preferred.
Specific examples of Q ′ include the following groups.
Figure 2017077834
(Wherein g1 is the same as above)

Zとして、具体的には、水素原子、及び下記に示すものを例示することができる。

Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
(式中、g1は上記と同じであり、eは0〜3の整数である。)Specific examples of Z include a hydrogen atom and those shown below.
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
(In the formula, g1 is the same as above, and e is an integer of 0 to 3.)

上記式(1)で表されるフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物としては、下記式で表されるものが例示できる。なお、各式において、フルオロオキシアルキル基又はフルオロオキシアルキレン基を構成する各繰り返し単位の繰り返し数(又は重合度)は、上記式(2)、(3)を満足する任意の数をとり得るものである。

Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
(式中、Z、g1、eは上記と同じであり、p1は5〜100の整数、q1は5〜100の整数で、p1+q1は10〜105の整数である。)Examples of the fluoropolyether group-containing polymer-modified organosilicon compound represented by the above formula (1) include those represented by the following formula. In each formula, the number of repeating units (or the degree of polymerization) constituting the fluorooxyalkyl group or fluorooxyalkylene group can take any number satisfying the above formulas (2) and (3). It is.
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
(In the formula, Z, g1, and e are the same as above, p1 is an integer of 5 to 100, q1 is an integer of 5 to 100, and p1 + q1 is an integer of 10 to 105.)

上記式(1)で表されるフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物の調製方法としては、例えば、下記のような方法が挙げられる。   Examples of the method for preparing the fluoropolyether group-containing polymer-modified organosilicon compound represented by the above formula (1) include the following methods.

まず、分子鎖末端に酸フロライド基、酸ハライド基、酸無水物基、エステル基、カルボン酸基、アミド基などの反応性基を有するフルオロポリエーテル基含有ポリマーと、求核剤と、溶剤として例えば1,3−ビス(トリフルオロメチル)ベンゼン、テトラヒドロフランを混合して、0〜80℃、好ましくは50〜70℃、より好ましくは約60℃で、1〜6時間、好ましくは3〜5時間、より好ましくは約4時間熟成する。   First, a fluoropolyether group-containing polymer having a reactive group such as an acid fluoride group, an acid halide group, an acid anhydride group, an ester group, a carboxylic acid group, an amide group at the molecular chain end, a nucleophile, and a solvent For example, 1,3-bis (trifluoromethyl) benzene and tetrahydrofuran are mixed, and 0 to 80 ° C., preferably 50 to 70 ° C., more preferably about 60 ° C., 1 to 6 hours, preferably 3 to 5 hours. More preferably, it is aged for about 4 hours.

ここで、分子鎖末端に反応性基を有するフルオロポリエーテル基含有ポリマーとして、具体的には、下記に示すものが挙げられる。

Figure 2017077834
(式中、Rf、αは上記と同じである。)Here, specific examples of the fluoropolyether group-containing polymer having a reactive group at the molecular chain terminal include the following.
Figure 2017077834
(In the formula, Rf and α are the same as above.)

また、求核剤としては、アリルマグネシウムハライド、3−ブテニルマグネシウムハライド、4−ペンテニルマグネシウムハライド、5−ヘキセニルマグネシウムハライドなどを用いることができる。また、対応するリチウム試薬を用いることも可能である。
求核剤の使用量は、上記分子鎖末端に反応性基を有するフルオロポリエーテル基含有ポリマーの反応性基1当量に対して、2〜5当量、より好ましくは2.5〜3.5当量、更に好ましくは約3当量用いることができる。
Moreover, as a nucleophile, allyl magnesium halide, 3-butenyl magnesium halide, 4-pentenyl magnesium halide, 5-hexenyl magnesium halide, etc. can be used. It is also possible to use a corresponding lithium reagent.
The amount of the nucleophile used is 2 to 5 equivalents, more preferably 2.5 to 3.5 equivalents, relative to 1 equivalent of the reactive group of the fluoropolyether group-containing polymer having a reactive group at the molecular chain end. More preferably, about 3 equivalents can be used.

続いて、反応を停止し、分液操作により水層とフッ素溶剤層を分離する。得られたフッ素溶剤層を更に有機溶剤で洗浄し、溶剤を留去することで、下記式(a)で表される分子鎖末端に水酸基及びオレフィン部位を有するフルオロポリエーテル基含有ポリマーが得られる。

Figure 2017077834
(式中、Rf、αは上記と同じである。Uは2価の炭化水素基である。)Subsequently, the reaction is stopped, and the aqueous layer and the fluorine solvent layer are separated by a liquid separation operation. The obtained fluoro solvent layer is further washed with an organic solvent, and the solvent is distilled off to obtain a fluoropolyether group-containing polymer having a hydroxyl group and an olefin moiety at the molecular chain terminal represented by the following formula (a). .
Figure 2017077834
(In the formula, Rf and α are the same as above. U is a divalent hydrocarbon group.)

上記式(a)において、Uは2価の炭化水素基であり、具体的には、メチレン基、エチレン基、プロピレン基(トリメチレン基、メチルエチレン基)、ブチレン基(テトラメチレン基、メチルプロピレン基)、ヘキサメチレン基、オクタメチレン基等の炭素数1〜8のアルキレン基、フェニレン基等の炭素数6〜8のアリーレン基を含むアルキレン基(例えば、炭素数7〜8のアルキレン・アリーレン基等)などが挙げられる。Uとして、好ましくは炭素数1〜4の直鎖アルキレン基である。   In the above formula (a), U is a divalent hydrocarbon group, specifically, a methylene group, an ethylene group, a propylene group (trimethylene group, methylethylene group), a butylene group (tetramethylene group, methylpropylene group). ), An alkylene group having 1 to 8 carbon atoms such as a hexamethylene group and an octamethylene group, and an alkylene group containing an arylene group having 6 to 8 carbon atoms such as a phenylene group (for example, an alkylene / arylene group having 7 to 8 carbon atoms) ) And the like. U is preferably a linear alkylene group having 1 to 4 carbon atoms.

次に、必要により、上記で得られた式(a)で表される分子鎖末端に水酸基及びオレフィン部位を有するフルオロポリエーテル基含有ポリマーの水酸基の水素原子を他の基に置換する。   Next, if necessary, the hydrogen atom of the hydroxyl group of the fluoropolyether group-containing polymer having a hydroxyl group and an olefin moiety at the end of the molecular chain represented by the formula (a) obtained above is substituted with another group.

水酸基の水素原子を−SiR3で示されるシリル基に置換する方法としては、例えば、式(a)で表される分子鎖末端に水酸基及びオレフィン部位を有するフルオロポリエーテル基含有ポリマーとシリル化剤とを、アミン類やアルカリ金属系塩基などの塩基の存在下、必要によりフッ素系溶剤、有機溶剤などの溶剤を用い、0〜80℃、好ましくは40〜60℃、より好ましくは約50℃の温度で、1〜24時間、好ましくは2〜10時間、より好ましくは約3時間熟成する。
また、別法として、式(a)で表される分子鎖末端に水酸基及びオレフィン部位を有するフルオロポリエーテル基含有ポリマーとヒドロシランとを、白金族金属系触媒やホウ素触媒などの脱水素触媒の存在下、フッ素系溶剤、有機溶剤などの溶剤を用いて0〜60℃、好ましくは15〜35℃、より好ましくは約25℃の温度で、10分〜24時間、好ましくは30分〜2時間、より好ましくは約1時間脱水素反応を行う。
Examples of a method for substituting a hydrogen atom of a hydroxyl group with a silyl group represented by -SiR 3 include, for example, a fluoropolyether group-containing polymer having a hydroxyl group and an olefin moiety at the molecular chain end represented by the formula (a) and a silylating agent. And in the presence of a base such as amines or alkali metal bases, if necessary, using a solvent such as a fluorine-based solvent or an organic solvent, 0 to 80 ° C., preferably 40 to 60 ° C., more preferably about 50 ° C. Aging is carried out at a temperature for 1 to 24 hours, preferably 2 to 10 hours, more preferably about 3 hours.
As another method, the presence of a dehydrogenation catalyst such as a platinum group metal catalyst or a boron catalyst may be prepared by combining a fluoropolyether group-containing polymer having a hydroxyl group and an olefin moiety at the molecular chain end represented by formula (a) with hydrosilane. Below, using a solvent such as a fluorine-based solvent or an organic solvent, the temperature is 0 to 60 ° C., preferably 15 to 35 ° C., more preferably about 25 ° C., 10 minutes to 24 hours, preferably 30 minutes to 2 hours, More preferably, the dehydrogenation reaction is performed for about 1 hour.

ここで、シリル化剤としては、例えば、シリルハライドやシリルトリフラートなどを用いることができ、具体的には、トリメチルシリルクロリド、トリエチルシリルクロリド、tert−ブチルジメチルクロリド、トリイソプロピルシリルクロリド、トリフェニルシリルクロリド、トリメチルシリルブロミド、トリメチルシリルトリフラート、トリエチルシリルトリフラート、tert−ブチルジメチルトリフラート、トリイソプロピルシリルトリフラートなどが挙げられ、また、塩基を使用しない場合、ヘキサメチルジシラザン、トリメチルシリルジメチルアミン、トリメチルシリルジエチルアミン、トリメチルシリルイミダゾールを用いてもよく、この使用量は、式(a)で表される分子鎖末端に水酸基及びオレフィン部位を有するフルオロポリエーテル基含有ポリマーの水酸基1当量に対して、1〜10当量、より好ましくは1〜4当量、更に好ましくは約2当量用いることができる。
また、ヒドロシランとしては、トリメチルシラン、トリエチルシラン、tert−ブチルジメチルシラン、トリイソプロピルシラン、トリフェニルシランなどが挙げられ、この使用量は、式(a)で表される分子鎖末端に水酸基及びオレフィン部位を有するフルオロポリエーテル基含有ポリマーの水酸基1当量に対して、1〜5当量、より好ましくは1.5〜3当量、更に好ましくは約2当量用いることができる。
Here, as the silylating agent, for example, silyl halide, silyl triflate and the like can be used, and specifically, trimethylsilyl chloride, triethylsilyl chloride, tert-butyldimethyl chloride, triisopropylsilyl chloride, triphenylsilyl chloride. , Trimethylsilyl bromide, trimethylsilyl triflate, triethylsilyl triflate, tert-butyldimethyl triflate, triisopropylsilyl triflate The amount used may be a full amount having a hydroxyl group and an olefin moiety at the molecular chain end represented by the formula (a). On 1 equivalent of hydroxyl group of the Roporieteru group-containing polymer, 1 to 10 equivalents, more preferably 1-4 equivalents, it can be used more preferably about 2 equivalents.
Examples of the hydrosilane include trimethylsilane, triethylsilane, tert-butyldimethylsilane, triisopropylsilane, triphenylsilane, and the like. The amount used is a hydroxyl group and an olefin at the molecular chain end represented by the formula (a). 1 to 5 equivalents, more preferably 1.5 to 3 equivalents, and still more preferably about 2 equivalents can be used per 1 equivalent of hydroxyl group of the fluoropolyether group-containing polymer having a moiety.

続いて、反応を停止し、分液操作により水層とフッ素溶剤層を分離する。得られたフッ素溶剤層を更に有機溶剤で洗浄し、溶剤を留去することで、下記式(b)で表される分子鎖末端にシリル基及びオレフィン部位を有するフルオロオキシアルキル基含有ポリマーが得られる。

Figure 2017077834
(式中、Rf、R、U、αは上記と同じである。)Subsequently, the reaction is stopped, and the aqueous layer and the fluorine solvent layer are separated by a liquid separation operation. The obtained fluorine solvent layer is further washed with an organic solvent, and the solvent is distilled off to obtain a fluorooxyalkyl group-containing polymer having a silyl group and an olefin moiety at the molecular chain end represented by the following formula (b). It is done.
Figure 2017077834
(In the formula, Rf, R, U and α are the same as above.)

また、水酸基の水素原子を−W−Q’−Xで示される基に置換する方法としては、例えば、式(a)で表される分子鎖末端に水酸基及びオレフィン部位を有するフルオロポリエーテル基含有ポリマーとSiH基を有する有機ケイ素化合物とを、ホウ素触媒などの脱水素触媒の存在下、フッ素系溶剤、有機溶剤などの溶剤を用いて0〜60℃、好ましくは15〜35℃、より好ましくは約25℃の温度で、10分〜24時間、好ましくは30分〜2時間、より好ましくは約1時間脱水素反応を行う。   Moreover, as a method of substituting the hydrogen atom of the hydroxyl group with a group represented by -WQ'-X, for example, containing a fluoropolyether group having a hydroxyl group and an olefin moiety at the molecular chain end represented by the formula (a) A polymer and an organosilicon compound having a SiH group are mixed at 0 to 60 ° C., preferably 15 to 35 ° C., more preferably using a solvent such as a fluorine-based solvent or an organic solvent in the presence of a dehydrogenation catalyst such as a boron catalyst. The dehydrogenation reaction is performed at a temperature of about 25 ° C. for 10 minutes to 24 hours, preferably 30 minutes to 2 hours, more preferably about 1 hour.

ここで、SiH基を有する有機ケイ素化合物としては、例えば下記に示すものが例示できる。

Figure 2017077834
(式中、g、eは上記と同じであり、cは1〜4の整数である。)Here, as an organosilicon compound having a SiH group, for example, those shown below can be exemplified.
Figure 2017077834
(In the formula, g and e are the same as above, and c is an integer of 1 to 4.)

この使用量は、式(a)で表される分子鎖末端に水酸基及びオレフィン部位を有するフルオロポリエーテル基含有ポリマーの水酸基1当量に対して、1〜10当量、より好ましくは1.2〜5当量用いることができる。   The amount used is 1 to 10 equivalents, more preferably 1.2 to 5 with respect to 1 equivalent of a hydroxyl group of a fluoropolyether group-containing polymer having a hydroxyl group and an olefin moiety at the molecular chain end represented by the formula (a). An equivalent amount can be used.

続いて、反応を停止し、分液操作により水層とフッ素溶剤層を分離する。得られたフッ素溶剤層を更に有機溶剤で洗浄し、溶剤を留去することで、下記式(c)で表される、分子鎖末端にオレフィン部位を有し、水酸基の部分が有機ケイ素化合物基に置換されたフルオロオキシアルキル基含有ポリマーが得られる。

Figure 2017077834
(式中、Rf、Q’、X、U、αは上記と同じであり、W’は単結合である。)Subsequently, the reaction is stopped, and the aqueous layer and the fluorine solvent layer are separated by a liquid separation operation. The obtained fluorine solvent layer is further washed with an organic solvent, and the solvent is distilled off, thereby having an olefin moiety at the molecular chain terminal represented by the following formula (c), wherein the hydroxyl group is an organosilicon compound group. A fluorooxyalkyl group-containing polymer substituted with is obtained.
Figure 2017077834
(In the formula, Rf, Q ′, X, U and α are the same as above, and W ′ is a single bond.)

更に、水酸基の水素原子を−W−Q’−Xで示される基に置換する方法の別法として、まず、水酸基の水素原子を末端不飽和基に置換し、その後、該末端不飽和基(オレフィン部位)を他のオレフィン部位と共にSiH基を有する有機ケイ素化合物と反応させる方法が挙げられる。
水酸基の水素原子を末端不飽和基に置換する方法としては、例えば、式(a)で表される分子鎖末端に水酸基及びオレフィン部位を有するフルオロポリエーテル基含有ポリマーとオレフィン導入剤とを、アミン類やアルカリ金属系塩基などの塩基の存在下、必要によりテトラブチルアンモニウムハライド、アルカリ金属系ハライドなどの反応性を向上させる添加剤や、フッ素系溶剤、有機溶剤などの溶剤を用い、0〜90℃、好ましくは60〜80℃、より好ましくは約70℃の温度で、1〜25時間、好ましくは3〜10時間、より好ましくは約6時間熟成する。
Further, as another method of substituting the hydrogen atom of the hydroxyl group with a group represented by -WQ'-X, first, the hydrogen atom of the hydroxyl group is substituted with a terminal unsaturated group, and then the terminal unsaturated group ( Examples thereof include a method of reacting an olefin moiety) with an organosilicon compound having a SiH group together with other olefin moieties.
Examples of a method for substituting a hydrogen atom of a hydroxyl group with a terminal unsaturated group include, for example, a fluoropolyether group-containing polymer having a hydroxyl group and an olefin moiety at the molecular chain end represented by the formula (a), and an olefin introducing agent. In the presence of bases such as alkenyls and alkali metal bases, additives such as tetrabutylammonium halide and alkali metal halides as necessary, and solvents such as fluorine-based solvents and organic solvents are used as necessary. C., preferably 60 to 80.degree. C., more preferably about 70.degree. C., for 1 to 25 hours, preferably 3 to 10 hours, more preferably about 6 hours.

ここで、オレフィン導入剤としては、例えば、アリルハライドなどを用いることができ、具体的には、アリルクロリド、アリルブロミド、アリルヨージド、4−クロロ−1−ブテン、4−ブロモ−1−ブテン、4−ヨード−1−ブテン、5−クロロ−1−ペンテン、5−ブロモ−1−ペンテン、5−ヨード−1−ペンテンなどが挙げられ、この使用量は、式(a)で表される分子鎖末端に水酸基及びオレフィン部位を有するフルオロポリエーテル基含有ポリマーの水酸基1当量に対して、1〜10当量、より好ましくは2.5〜6当量、更に好ましくは約5当量用いることができる。   Here, as the olefin introducing agent, for example, allyl halide can be used. Specifically, allyl chloride, allyl bromide, allyl iodide, 4-chloro-1-butene, 4-bromo-1-butene, 4 -Iodo-1-butene, 5-chloro-1-pentene, 5-bromo-1-pentene, 5-iodo-1-pentene and the like, and the amount used is a molecular chain represented by the formula (a) It can be used in an amount of 1 to 10 equivalents, more preferably 2.5 to 6 equivalents, and even more preferably about 5 equivalents with respect to 1 equivalent of the hydroxyl group of the fluoropolyether group-containing polymer having a hydroxyl group and an olefin moiety at the terminal.

続いて、反応を停止し、分液操作により水層とフッ素溶剤層を分離する。得られたフッ素溶剤層を更に有機溶剤で洗浄し、溶剤を留去することで、下記式(d)で表される分子鎖末端にオレフィン部位を有するフルオロオキシアルキル基含有ポリマーが得られる。

Figure 2017077834
(式中、Rf、U、αは上記と同じである。Vは単結合又は2価の炭化水素基である。)Subsequently, the reaction is stopped, and the aqueous layer and the fluorine solvent layer are separated by a liquid separation operation. The obtained fluorine solvent layer is further washed with an organic solvent, and the solvent is distilled off to obtain a fluorooxyalkyl group-containing polymer having an olefin moiety at the molecular chain end represented by the following formula (d).
Figure 2017077834
(In the formula, Rf, U, and α are the same as above. V is a single bond or a divalent hydrocarbon group.)

上記式(d)において、Vは単結合、又は2価の炭化水素基であり、2価の炭化水素基として、具体的には、メチレン基、エチレン基、プロピレン基(トリメチレン基、メチルエチレン基)、ブチレン基(テトラメチレン基、メチルプロピレン基)、ヘキサメチレン基、オクタメチレン基等の炭素数1〜8のアルキレン基、フェニレン基等の炭素数6〜8のアリーレン基を含むアルキレン基(例えば、炭素数7〜8のアルキレン・アリーレン基等)などが挙げられる。Vとして、好ましくはメチレン基である。   In the above formula (d), V is a single bond or a divalent hydrocarbon group. Specific examples of the divalent hydrocarbon group include a methylene group, an ethylene group, and a propylene group (trimethylene group, methylethylene group). ), Butylene groups (tetramethylene group, methylpropylene group), alkylene groups having 1 to 8 carbon atoms such as hexamethylene groups and octamethylene groups, and alkylene groups having 6 to 8 carbon atoms arylene groups such as phenylene groups (for example, And an alkylene / arylene group having 7 to 8 carbon atoms). V is preferably a methylene group.

次いで、上記で得られた式(a)〜(d)で表される分子鎖末端にオレフィン部位を有するフルオロポリエーテル基含有ポリマーのいずれかと、分子中にSiH基を有する有機ケイ素化合物とをヒドロシリル化反応触媒、例えば塩化白金酸/ビニルシロキサン錯体のトルエン溶液存在下、40〜120℃、好ましくは60〜100℃、より好ましくは約80℃の温度で、1〜72時間、好ましくは20〜36時間、より好ましくは約24時間熟成させる。   Next, hydrosilylating one of the fluoropolyether group-containing polymer having an olefin moiety at the end of the molecular chain represented by the formulas (a) to (d) obtained above and an organosilicon compound having a SiH group in the molecule. In the presence of a chloroplatinic acid / vinylsiloxane complex toluene solution at a temperature of 40 to 120 ° C., preferably 60 to 100 ° C., more preferably about 80 ° C. for 1 to 72 hours, preferably 20 to 36. Aging is carried out for a time, more preferably about 24 hours.

ここで、分子中にSiH基を有する有機ケイ素化合物としては、下記式で表される化合物が好ましい。

Figure 2017077834
(式中、R1、R2、X、g、jは上記と同じであり、iは1〜6、好ましくは1〜4の整数で、i+jは3〜10、好ましくは3〜5の整数である。)Here, the organosilicon compound having a SiH group in the molecule is preferably a compound represented by the following formula.
Figure 2017077834
Wherein R 1 , R 2 , X, g and j are the same as above, i is an integer of 1 to 6, preferably 1 to 4, and i + j is an integer of 3 to 10, preferably 3 to 5. .)

このような分子中にSiH基を有する有機ケイ素化合物としては、例えば、下記に示すものなどが挙げられる。

Figure 2017077834
Figure 2017077834
(式中、g、g1、eは上記と同じである。)Examples of such organosilicon compounds having a SiH group in the molecule include those shown below.
Figure 2017077834
Figure 2017077834
(Wherein g, g1, and e are the same as above)

分子中にSiH基を有する有機ケイ素化合物の使用量は、上記式(a)〜(d)で表される分子鎖末端にオレフィン部位を有するフルオロポリエーテル基含有ポリマーの末端不飽和基1当量に対して、5〜20当量、より好ましくは7.5〜12.5当量、更に好ましくは約10当量用いることができる。   The amount of the organosilicon compound having a SiH group in the molecule is 1 equivalent of the terminal unsaturated group of the fluoropolyether group-containing polymer having an olefin moiety at the molecular chain end represented by the above formulas (a) to (d). On the other hand, 5 to 20 equivalents, more preferably 7.5 to 12.5 equivalents, and still more preferably about 10 equivalents can be used.

その後、溶剤及び未反応物を減圧留去することで、上記式(1)で表されるフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物を得ることができる。なお、上述した反応は、単独で行うことも、連続的に行うことも可能である。   Then, the fluoropolyether group-containing polymer-modified organosilicon compound represented by the above formula (1) can be obtained by distilling off the solvent and unreacted substances under reduced pressure. In addition, the reaction mentioned above can be performed independently or continuously.

本発明の表面処理剤は、上記式(1)で表されるフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物を含有する。   The surface treating agent of the present invention contains a fluoropolyether group-containing polymer-modified organosilicon compound represented by the above formula (1).

本発明の表面処理剤には、更に下記一般式(4)

Figure 2017077834
(式中、Aはフッ素原子又は末端が−CF3基である1価のフッ素含有基であり、Rf’は2価のフルオロオキシアルキレン基含有ポリマー残基である。)
で表されるフルオロポリエーテル基含有ポリマー(以下、無官能性ポリマーと称す)を含有してもよい。The surface treatment agent of the present invention further includes the following general formula (4).
Figure 2017077834
(In the formula, A is a fluorine atom or a monovalent fluorine-containing group whose terminal is a —CF 3 group, and Rf ′ is a divalent fluorooxyalkylene group-containing polymer residue.)
The polymer may contain a fluoropolyether group-containing polymer (hereinafter referred to as a non-functional polymer).

上記式(4)において、Aはフッ素原子又は末端が−CF3基である1価のフッ素含有基であり、好ましくはフッ素原子、炭素数1〜6の直鎖状パーフルオロアルキル基であり、中でも−F基、−CF3基、−CF2CF3基、−CF2CF2CF3基が好ましい。
また、Rf’は2価のフルオロオキシアルキレン基含有ポリマー残基であり、Rf’としては下記に示すものが好ましい。

Figure 2017077834
(式中、p2は5〜200、好ましくは10〜100の整数、q2は5〜200、好ましくは10〜100の整数、r1は10〜200、好ましくは20〜100の整数、t1は5〜200、好ましくは10〜100の整数、t2は10〜200、好ましくは20〜100の整数で、t1+p2は10〜205、好ましくは20〜110の整数、q2+p2は10〜205、好ましくは20〜110の整数である。)In the above formula (4), A is a fluorine atom or a monovalent fluorine-containing group whose terminal is a —CF 3 group, preferably a fluorine atom, a linear perfluoroalkyl group having 1 to 6 carbon atoms, Among them, -F group, -CF 3 group, -CF 2 CF 3 group, and -CF 2 CF 2 CF 3 group are preferable.
Rf ′ is a divalent fluorooxyalkylene group-containing polymer residue, and Rf ′ is preferably the following.
Figure 2017077834
(In the formula, p2 is an integer of 5 to 200, preferably 10 to 100, q2 is an integer of 5 to 200, preferably 10 to 100, r1 is an integer of 10 to 200, preferably 20 to 100, and t1 is 5 to 5. 200, preferably an integer of 10 to 100, t2 is an integer of 10 to 200, preferably 20 to 100, t1 + p2 is an integer of 10 to 205, preferably 20 to 110, q2 + p2 is 10 to 205, preferably 20 to 110 Is an integer.)

式(4)で表される無官能性ポリマーとしては、下記のものが挙げられる。

Figure 2017077834
(式中、p2、q2、r1、t1、t2は上記と同じである。)Examples of the non-functional polymer represented by the formula (4) include the following.
Figure 2017077834
(Wherein p2, q2, r1, t1, and t2 are the same as described above.)

式(4)で表される無官能性ポリマーを配合する場合の使用量は特に限定されないが、式(1)で表されるフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物の質量に対して0.1〜60質量%、特に10〜40質量%の範囲が好ましく、多すぎると、密着性の問題が生じる場合がある。   Although the usage-amount in the case of mix | blending the nonfunctional polymer represented by Formula (4) is not specifically limited, It is 0.00 with respect to the mass of the fluoro polyether group containing polymer modified organosilicon compound represented by Formula (1). The range of 1-60 mass%, especially 10-40 mass% is preferable, and when too large, the problem of adhesiveness may arise.

該表面処理剤は、適当な溶剤を含んでよい。このような溶剤としては、フッ素変性脂肪族炭化水素系溶剤(パーフルオロヘプタン、パーフルオロオクタンなど)、フッ素変性芳香族炭化水素系溶剤(m−キシレンヘキサフルオライド(1,3−ビス(トリフルオロメチル)ベンゼン)、ベンゾトリフルオライドなど)、フッ素変性エーテル系溶剤(メチルパーフルオロブチルエーテル、エチルパーフルオロブチルエーテル、パーフルオロ(2−ブチルテトラヒドロフラン)など)、フッ素変性アルキルアミン系溶剤(パーフルオロトリブチルアミン、パーフルオロトリペンチルアミンなど)、炭化水素系溶剤(石油ベンジン、ミネラルスピリッツ、トルエン、キシレンなど)、ケトン系溶剤(アセトン、メチルエチルケトン、メチルイソブチルケトンなど)を例示することができる。これらの中では、溶解性、濡れ性などの点で、フッ素変性された溶剤が望ましく、特には、m−キシレンヘキサフルオライド、パーフルオロ(2−ブチルテトラヒドロフラン)、パーフルオロトリブチルアミン、エチルパーフルオロブチルエーテルが好ましい。
上記溶剤はその2種以上を混合してもよいが、フルオロポリエーテル基含有ポリマー変性有機ケイ素化合物を均一に溶解させることが好ましい。なお、溶剤に溶解させるフルオロオキシアルキレン基含有ポリマーの最適濃度は、処理方法により異なるが、表面処理剤中0.01〜40質量%、特に0.05〜25質量%であることが好ましい。
The surface treatment agent may contain a suitable solvent. Examples of such solvents include fluorine-modified aliphatic hydrocarbon solvents (perfluoroheptane, perfluorooctane, etc.), fluorine-modified aromatic hydrocarbon solvents (m-xylene hexafluoride (1,3-bis (trifluoro) Methyl) benzene), benzotrifluoride, etc.), fluorine-modified ether solvents (methyl perfluorobutyl ether, ethyl perfluorobutyl ether, perfluoro (2-butyltetrahydrofuran), etc.), fluorine-modified alkylamine solvents (perfluorotributylamine, Examples thereof include perfluorotripentylamine), hydrocarbon solvents (petroleum benzine, mineral spirits, toluene, xylene, etc.), and ketone solvents (acetone, methyl ethyl ketone, methyl isobutyl ketone, etc.). Of these, fluorine-modified solvents are desirable in terms of solubility and wettability, and in particular, m-xylene hexafluoride, perfluoro (2-butyltetrahydrofuran), perfluorotributylamine, ethyl perfluoro Butyl ether is preferred.
Two or more of these solvents may be mixed, but it is preferable to uniformly dissolve the fluoropolyether group-containing polymer-modified organosilicon compound. In addition, although the optimal density | concentration of the fluorooxyalkylene group containing polymer dissolved in a solvent changes with processing methods, it is preferable that it is 0.01-40 mass% in a surface treating agent, especially 0.05-25 mass%.

本発明の表面処理剤は、樹脂フィルムやメガネレンズのような樹脂製品に表面処理する。ここで、樹脂製品としては、熱可塑性樹脂からなるものが好ましく、具体的には、ハードコート処理された熱可塑性樹脂フィルム(ハードコートフィルム)、鉛筆硬度4H以上でありハードコートを施されていない熱可塑性樹脂フィルム(高硬度樹脂フィルム)又は反射防止層を備えた熱可塑性樹脂フィルム(反射防止フィルム)などが好ましく用いられる。
また、本発明においては、上記樹脂製品を予めSiO2処理したものを用いることが好ましい。ここで、SiO2処理は、スパッタ法によりSiO2処理されたものが、上記樹脂製品と処理剤との密着性を向上させるという点から好ましい。
The surface treatment agent of the present invention is used to treat a resin product such as a resin film or a spectacle lens. Here, as a resin product, what consists of a thermoplastic resin is preferable, and specifically, the thermoplastic resin film (hard coat film) by which the hard coat process was carried out, it is more than pencil hardness 4H, and the hard coat is not given. A thermoplastic resin film (high hardness resin film) or a thermoplastic resin film (antireflection film) provided with an antireflection layer is preferably used.
In the present invention, it is preferable to use the above resin product that has been treated with SiO 2 in advance. Here, SiO 2 process, those SiO 2 treated by sputtering is preferred from the viewpoint of improving the adhesion between the resin product and process agent.

本発明の表面処理剤は、刷毛塗り、ディッピング、スプレー、蒸着処理など公知の方法で基材上に施与することができる。蒸着処理時の加熱方法は、抵抗加熱方式でも、電子ビーム加熱方式のどちらでもよく、特に限定されるものではない。また、後処理条件は、後処理方法によって異なるが、例えば、蒸着処理やスプレー塗工で施与した場合は、基材としてSiO2処理された樹脂フィルムを使用した場合、室温(25℃)から200℃の範囲で5分〜24時間、特に10分〜12時間とすることができ、加湿下で後処理してもよい。特に本発明においては、室温であっても10分〜24時間、特に30分〜12時間で十分である。また、被膜の膜厚は、基材の種類により適宜選定されるが、通常0.1〜100nm、特に1〜25nmである。The surface treatment agent of the present invention can be applied onto a substrate by a known method such as brushing, dipping, spraying, or vapor deposition. The heating method during the vapor deposition process may be either a resistance heating method or an electron beam heating method, and is not particularly limited. Further, the post-treatment conditions vary depending on the post-treatment method. For example, when applied by vapor deposition or spray coating, when a resin film treated with SiO 2 is used as a base material, from room temperature (25 ° C.) It can be 5 minutes to 24 hours, particularly 10 minutes to 12 hours in the range of 200 ° C., and may be post-treated under humidification. In particular, in the present invention, even at room temperature, 10 minutes to 24 hours, particularly 30 minutes to 12 hours are sufficient. The thickness of the coating is appropriately selected depending on the type of substrate, but is usually 0.1 to 100 nm, particularly 1 to 25 nm.

本発明の上記表面処理剤で処理される樹脂製品としては、カーナビゲーション、携帯電話、デジタルカメラ、デジタルビデオカメラ、PDA、ポータブルオーディオプレーヤー、カーオーディオ、ゲーム機器、メガネレンズ、カメラレンズ、レンズフィルター、サングラス、胃カメラ等の医療用器機、複写機、PC、液晶ディスプレイ、有機ELディスプレイ、プラズマディスプレイ、タッチパネルディスプレイ、保護フィルム、ハードコートフィルム、高硬度樹脂、反射防止フィルム、ウェアラブル端末などの製品の部品や一部として使用される、光学物品、タッチパネル、反射防止フィルム、石英基板などが好ましい。   Examples of the resin product treated with the surface treatment agent of the present invention include car navigation, mobile phone, digital camera, digital video camera, PDA, portable audio player, car audio, game device, glasses lens, camera lens, lens filter, Sunglasses, medical equipment such as stomach cameras, copiers, PCs, liquid crystal displays, organic EL displays, plasma displays, touch panel displays, protective films, hard coat films, high-hardness resins, antireflection films, wearable devices, etc. In addition, an optical article, a touch panel, an antireflection film, a quartz substrate, and the like used as a part are preferable.

本発明の樹脂製品に表面処理する表面処理剤は、前記物品に室温などの温和な条件下、短時間であっても被膜を形成することができ、該被膜は優れた撥水撥油性や耐久性を示すため、特にメガネレンズ、タッチパネルディスプレイ、ハードコートフィルム、高硬度樹脂、反射防止フィルム、ウェアラブル端末などの撥水撥油層として有用である。ここで、高硬度樹脂とは、例えば、ガラス代替フィルムとしてPRされている、新日鐵化学社製 商品名シルプラスや、グンゼ社製 商品名HDフィルム等の鉛筆硬度4H以上の樹脂を成形した製品を指し、特には該樹脂を成形した樹脂フィルムを指すが、特に上記の製品に制限されるものではない。   The surface treatment agent for surface-treating the resin product of the present invention can form a film on the article under a mild condition such as room temperature even for a short time, and the film has excellent water and oil repellency and durability. Therefore, it is particularly useful as a water / oil repellent layer for eyeglass lenses, touch panel displays, hard coat films, high-hardness resins, antireflection films, wearable terminals and the like. Here, the high-hardness resin is, for example, a product obtained by molding a resin having a pencil hardness of 4H or higher, such as a product name Sylplus manufactured by Nippon Steel Chemical Co., Ltd. and a product name HD film manufactured by Gunze Co., which is promoted as a glass substitute film. In particular, it refers to a resin film obtained by molding the resin, but is not particularly limited to the above products.

以下、合成例、実施例及び比較例を示し、本発明をより詳細に説明するが、本発明は下記実施例によって限定されるものではない。
実施例及び比較例は、下記合成例により得られる化合物を使用した。
EXAMPLES Hereinafter, although a synthesis example, an Example, and a comparative example are shown and this invention is demonstrated in detail, this invention is not limited by the following Example.
In Examples and Comparative Examples, compounds obtained by the following synthesis examples were used.

[合成例1]化合物1の合成
反応容器に、テトラヒドロフラン150g、1,3−ビス(トリフルオロメチル)ベンゼン300gを混合し、0.7Mのアリルマグネシウムブロミド160mlを滴下した。続いて、下記式(A)

Figure 2017077834
で表される化合物300g(4.8×10-2mol)をゆっくりと滴下した後、60℃で4時間加熱した。加熱終了後、室温まで冷却し、1.2M塩酸水溶液300g中へ溶液を滴下し、反応を停止させた。分液操作により、下層であるフッ素化合物層を回収後、アセトンで洗浄した。洗浄後の下層であるフッ素化合物層を再び回収し、減圧下、残存溶剤を留去することで、下記式(B)で表されるフルオロポリエーテル基含有ポリマー292gを得た。
Figure 2017077834
Synthesis Example 1 Synthesis of Compound 1 In a reaction vessel, 150 g of tetrahydrofuran and 300 g of 1,3-bis (trifluoromethyl) benzene were mixed, and 160 ml of 0.7 M allylmagnesium bromide was added dropwise. Subsequently, the following formula (A)
Figure 2017077834
After slowly dropping 300 g (4.8 × 10 −2 mol) of the compound represented by the formula, it was heated at 60 ° C. for 4 hours. After completion of the heating, the mixture was cooled to room temperature, and the solution was dropped into 300 g of 1.2 M hydrochloric acid aqueous solution to stop the reaction. The lower fluorine compound layer was recovered by a liquid separation operation and then washed with acetone. The fluorine compound layer, which is the lower layer after washing, was collected again, and the remaining solvent was distilled off under reduced pressure to obtain 292 g of a fluoropolyether group-containing polymer represented by the following formula (B).
Figure 2017077834

反応容器に、下記式(B)

Figure 2017077834
で表される化合物80g(1.0×10-2mol)を入れ、1,3−ビス(トリフルオロメチル)ベンゼン80gに溶解させ、塩化白金酸/ビニルシロキサン錯体のトルエン溶液8.0×10-2g(Pt単体として2.1×10-6molを含有)と、1,4−ビス(ジメチルシリル)ベンゼン37g(1.9×10-1mol)を混合して、80℃で7時間熟成し、溶剤及び未反応物を減圧留去することで、下記式(C)で表されるフルオロポリエーテル基含有ポリマー(化合物1)70gを得た。
Figure 2017077834
1H−NMR
δ0−0.2(−Si(C 32)24H
δ0.4−0.6(−CH2CH2 2−Si)4H
δ1.3−1.6(−CH2 2CH2−Si)4H
δ1.6−1.9(−C 2CH 2 CH2−Si)4H
δ3.6−4.2(−Si)2H
δ6.6−7.1(−C6 4)8HIn the reaction vessel, the following formula (B)
Figure 2017077834
80 g (1.0 × 10 −2 mol) of the compound represented by formula (1) is added, dissolved in 80 g of 1,3-bis (trifluoromethyl) benzene, and a toluene solution of chloroplatinic acid / vinylsiloxane complex 8.0 × 10 -2 g (containing 2.1 × 10 −6 mol as a simple substance of Pt) and 37 g of 1,4-bis (dimethylsilyl) benzene (1.9 × 10 −1 mol) are mixed at 7 ° C. at 7 ° C. After aging for a while, the solvent and unreacted substances were distilled off under reduced pressure to obtain 70 g of a fluoropolyether group-containing polymer (compound 1) represented by the following formula (C).
Figure 2017077834
1 H-NMR
δ0-0.2 (-Si (C H 3 ) 2 ) 24H
δ0.4-0.6 (-CH 2 CH 2 C H 2 -Si) 4H
δ1.3-1.6 (-CH 2 C H 2 CH 2 -Si) 4H
δ1.6-1.9 (—C H 2 CH 2 CH 2 —Si) 4H
δ3.6-4.2 (-Si H) 2H
δ6.6-7.1 (-C 6 H 4) 8H

[合成例2]化合物2の合成
反応容器に、1,3−ビス(トリフルオロメチル)ベンゼン100g、DBU(ジアザビシクロウンデセン)8.2g(5.4×10-2mol)、下記式(B)

Figure 2017077834
で表される化合物100g(2.7×10-2mol)を混合した後、トリメチルクロロシラン5.8g(5.4×10-2mol)を滴下した。続いて、50℃で3時間加熱した。加熱終了後、室温まで冷却し、塩酸水溶液を滴下した。分液操作により、下層であるフッ素化合物層を回収後、メタノールで洗浄した。洗浄後の下層であるフッ素化合物層を再び回収し、減圧下、残存溶剤を留去することで、下記式(D)で表されるフルオロポリエーテル基含有ポリマー90gを得た。
Figure 2017077834
1H−NMR
δ0−0.2(−OSi(C 33)9H
δ2.4−2.6(−C 2CH=CH2)4H
δ5.0−5.2(−CH2CH=C 2)4H
δ5.7−5.9(−CH2=CH2)2H[Synthesis Example 2] Synthesis of Compound 2 In a reaction vessel, 100 g of 1,3-bis (trifluoromethyl) benzene, 8.2 g (5.4 × 10 −2 mol) of DBU (diazabicycloundecene), the following formula (B)
Figure 2017077834
After mixing 100 g (2.7 × 10 −2 mol) of the compound represented by formula (5), 5.8 g (5.4 × 10 −2 mol) of trimethylchlorosilane was added dropwise. Then, it heated at 50 degreeC for 3 hours. After completion of heating, the mixture was cooled to room temperature, and an aqueous hydrochloric acid solution was added dropwise. After the separation of the fluorine compound layer as the lower layer by a liquid separation operation, the layer was washed with methanol. The fluorine compound layer which is the lower layer after washing was recovered again, and the residual solvent was distilled off under reduced pressure to obtain 90 g of a fluoropolyether group-containing polymer represented by the following formula (D).
Figure 2017077834
1 H-NMR
δ0-0.2 (-OSi (C H 3 ) 3 ) 9H
δ 2.4-2.6 (—C H 2 CH═CH 2 ) 4H
δ 5.0-5.2 (—CH 2 CH═C H 2 ) 4H
δ5.7-5.9 (-CH 2 C H = CH 2) 2H

反応容器に、下記式(D)

Figure 2017077834
で表される化合物50g(1.4×10-2mol)を入れ、1,3−ビス(トリフルオロメチル)ベンゼン50gに溶解させ、塩化白金酸/ビニルシロキサン錯体のトルエン溶液1.5×10-1g(Pt単体として4.0×10-6molを含有)と、1,3,5,7−テトラメチルシクロテトラシロキサン33g(1.3×10-1mol)を混合して、80℃で19時間熟成し、溶剤及び未反応物を減圧留去することで、下記式(E)で表されるフルオロポリエーテル基含有ポリマー(化合物2)56gを得た。
Figure 2017077834
1H−NMR
δ0−0.2(−OSi−C 3、−OSi(C 33)36H
δ0.5−0.8(−CH2CH2 2−Si)4H
δ1.3−2.2(−C 2 2CH2−Si)8H
δ4.3−5.2(−Si)6HIn the reaction vessel, the following formula (D)
Figure 2017077834
Compound represented by putting 50g (1.4 × 10 -2 mol) in 1,3-bis dissolved in (trifluoromethyl) benzene 50 g, toluene solution 1.5 × 10 chloroplatinic acid / vinylsiloxane complex -1 g (containing 4.0 × 10 −6 mol as a simple substance of Pt) and 33 g of 1,3,5,7-tetramethylcyclotetrasiloxane (1.3 × 10 −1 mol) Aging was carried out at 19 ° C. for 19 hours, and the solvent and unreacted substances were distilled off under reduced pressure to obtain 56 g of a fluoropolyether group-containing polymer (compound 2) represented by the following formula (E).
Figure 2017077834
1 H-NMR
δ0-0.2 (-OSi-C H 3 , -OSi (C H 3 ) 3 ) 36H
δ0.5-0.8 (-CH 2 CH 2 C H 2 -Si) 4H
δ1.3-2.2 (—C H 2 C H 2 CH 2 —Si) 8H
δ4.3-5.2 (-Si H) 6H

[合成例3]化合物3の合成
反応容器に、下記式(B)

Figure 2017077834
で表される化合物150g(4.0×10-2mol)を入れ、1,3−ビス(トリフルオロメチル)ベンゼン150gに溶解させ、塩化白金酸/ビニルシロキサン錯体のトルエン溶液8.0×10-2g(Pt単体として4.0×10-6molを含有)と、1,1,3,3,5,5−ヘキサメチルトリシロキサン83g(4.0×10-1mol)を混合して、80℃で24時間熟成し、溶剤及び未反応物を減圧留去することで、下記式(F)で表されるフルオロポリエーテル基含有ポリマー(化合物3)150gを得た。
Figure 2017077834
1H−NMR
δ0−0.2(−OSi(C 32)36H
δ0.3−0.6(−CH2CH2 2−Si)4H
δ1.3−1.8(−C 2CH2CH2−Si,−CH2 2CH2−Si)8H
δ3.3−3.6(−SiH)2HSynthesis Example 3 Synthesis of Compound 3 In a reaction vessel, the following formula (B)
Figure 2017077834
150 g (4.0 × 10 −2 mol) of the compound represented by the formula (1) is added, dissolved in 150 g of 1,3-bis (trifluoromethyl) benzene, and a toluene solution of chloroplatinic acid / vinylsiloxane complex 8.0 × 10 -2 g (containing 4.0 × 10 −6 mol as a simple substance of Pt) and 83 g of 1,1,3,3,5,5-hexamethyltrisiloxane (4.0 × 10 −1 mol) The mixture was aged at 80 ° C. for 24 hours, and the solvent and unreacted substances were distilled off under reduced pressure to obtain 150 g of a fluoropolyether group-containing polymer (compound 3) represented by the following formula (F).
Figure 2017077834
1 H-NMR
δ0-0.2 (-OSi (C H 3 ) 2 ) 36H
δ0.3-0.6 (-CH 2 CH 2 C H 2 -Si) 4H
δ1.3-1.8 (-C H 2 CH 2 CH 2 -Si, -CH 2 C H 2 CH 2 -Si) 8H
δ 3.3-3.6 (—SiH) 2 H

[合成例4]化合物4の合成
反応容器に、下記式(B)

Figure 2017077834
で表される化合物50g(1.4×10-2mol)を入れ、1,3−ビス(トリフルオロメチル)ベンゼン50gに溶解させ、塩化白金酸/ビニルシロキサン錯体のトルエン溶液8.0×10-2g(Pt単体として1.3×10-6molを含有)と、1,1,3,3,5,5,7,7−オクタメチルテトラシロキサン40g(1.4×10-1mol)を混合して、80℃で4時間熟成し、溶剤及び未反応物を減圧留去することで、下記式(G)で表されるフルオロポリエーテル基含有ポリマー(化合物4)41gを得た。
Figure 2017077834
1H−NMR
δ0−0.2(−OSi(C 32)48H
δ0.3−0.6(−CH2CH2 2−Si)4H
δ1.3−1.8(−C 2CH2CH2−Si,−CH2 2CH2−Si)8H
δ3.3−3.6(−SiH)2HSynthesis Example 4 Synthesis of Compound 4 In a reaction vessel, the following formula (B)
Figure 2017077834
Compound represented by putting 50g (1.4 × 10 -2 mol) in 1,3-bis dissolved in (trifluoromethyl) benzene 50 g, toluene solution 8.0 × 10 chloroplatinic acid / vinylsiloxane complex -2 g (containing 1.3 × 10 −6 mol as Pt alone) and 40 g (1.4 × 10 −1 mol) of 1,1,3,3,5,5,7,7-octamethyltetrasiloxane ) And aged at 80 ° C. for 4 hours, and the solvent and unreacted substances were distilled off under reduced pressure to obtain 41 g of a fluoropolyether group-containing polymer (compound 4) represented by the following formula (G). .
Figure 2017077834
1 H-NMR
δ0-0.2 (-OSi (C H 3 ) 2 ) 48H
δ0.3-0.6 (-CH 2 CH 2 C H 2 -Si) 4H
δ1.3-1.8 (-C H 2 CH 2 CH 2 -Si, -CH 2 C H 2 CH 2 -Si) 8H
δ 3.3-3.6 (—SiH) 2 H

[合成例5]化合物5の合成
反応容器に、下記式(B)

Figure 2017077834
で表される化合物20g(0.5×10-2mol)を入れ、1,3−ビス(トリフルオロメチル)ベンゼン20gに溶解させ、塩化白金酸/ビニルシロキサン錯体のトルエン溶液2.0×10-2g(Pt単体として0.5×10-6molを含有)と、下記式(H)
Figure 2017077834
で示されるデカシロキサン40g(0.5×10-1mol)を混合して、80℃で7時間熟成し、溶剤及び未反応物を減圧留去することで、下記式(I)で表されるフルオロポリエーテル基含有ポリマー(化合物5)10gを得た。
Figure 2017077834
1H−NMR
δ0−0.2(−OSi(C 32)120H
δ0.3−0.8(−CH2CH2 2−Si)4H
δ1.3−1.8(−C 2CH2CH2−Si,−CH2 2CH2−Si)8H
δ4.7−5.0(−SiH)2HSynthesis Example 5 Synthesis of Compound 5 In a reaction vessel, the following formula (B)
Figure 2017077834
20 g (0.5 × 10 −2 mol) of the compound represented by formula (1) is added, dissolved in 20 g of 1,3-bis (trifluoromethyl) benzene, and a chloroplatinic acid / vinylsiloxane complex toluene solution 2.0 × 10 -2 g (containing 0.5 × 10 −6 mol as a simple substance of Pt) and the following formula (H)
Figure 2017077834
Is mixed with 40 g (0.5 × 10 −1 mol) of decasiloxane and aged at 80 ° C. for 7 hours, and the solvent and unreacted substances are distilled off under reduced pressure, which is represented by the following formula (I). 10 g of a fluoropolyether group-containing polymer (Compound 5) was obtained.
Figure 2017077834
1 H-NMR
δ0-0.2 (-OSi (C H 3 ) 2 ) 120H
δ0.3-0.8 (-CH 2 CH 2 C H 2 -Si) 4H
δ1.3-1.8 (-C H 2 CH 2 CH 2 -Si, -CH 2 C H 2 CH 2 -Si) 8H
δ4.7-5.0 (-SiH) 2H

[合成例6]化合物6の合成
反応容器に、下記式(B)

Figure 2017077834
で表される化合物50g(1.3×10-2mol)を入れ、1,3−ビス(トリフルオロメチル)ベンゼン50gに溶解させ、塩化白金酸/ビニルシロキサン錯体のトルエン溶液5.0×10-2g(Pt単体として1.4×10-6molを含有)と、ペンタメチルジシロキサン20g(1.4×10-1mol)を混合して、80℃で8時間熟成し、溶剤及び未反応物を減圧留去することで、下記式(J)で表されるフルオロポリエーテル基含有ポリマー(化合物6)54gを得た。
Figure 2017077834
1H−NMR
δ0−0.2(−Si−C 3)30H
δ0.2−0.4(−CH2CH2 2−Si)4H
δ1.0−1.6(−C 2CH2CH2−Si,−CH2 2CH2−Si)8HSynthesis Example 6 Synthesis of Compound 6 In a reaction vessel, the following formula (B)
Figure 2017077834
Compound represented by putting 50g (1.3 × 10 -2 mol) in 1,3-bis dissolved in (trifluoromethyl) benzene 50 g, toluene solution of chloroplatinic acid / vinyl siloxane complex 5.0 × 10 -2 g (containing 1.4 × 10 −6 mol as a simple substance of Pt) and 20 g (1.4 × 10 −1 mol) of pentamethyldisiloxane are mixed and aged at 80 ° C. for 8 hours. Unreacted substances were distilled off under reduced pressure to obtain 54 g of a fluoropolyether group-containing polymer (compound 6) represented by the following formula (J).
Figure 2017077834
1 H-NMR
δ0-0.2 (-Si-C H 3 ) 30H
δ0.2-0.4 (-CH 2 CH 2 C H 2 -Si) 4H
δ1.0-1.6 (-C H 2 CH 2 CH 2 -Si, -CH 2 C H 2 CH 2 -Si) 8H

[合成例7]化合物7の合成
反応容器に、下記式(B)

Figure 2017077834
で表される化合物50g(1.3×10-2mol)を入れ、1,3−ビス(トリフルオロメチル)ベンゼン50gに溶解させ、塩化白金酸/ビニルシロキサン錯体のトルエン溶液1.0×10-1g(Pt単体として2.8×10-6molを含有)と、1−ブタン−デカメチルペンタシロキサン13g(3.2×10-2mol)を混合して、80℃で20時間熟成し、溶剤及び未反応物を減圧留去することで、下記式(K)で表されるフルオロポリエーテル基含有ポリマー(化合物7)54gを得た。
Figure 2017077834
1H−NMR
δ0−0.2(−Si−C 3)60H
δ0.3−0.6(−CH2CH2 2−Si)8H
δ0.6−0.8(−CH2CH2CH2−C 3)6H
δ1.1−1.3(−CH2 2 2−C 3)8H
δ1.4−1.8(−C 2 2CH2−Si)8HSynthesis Example 7 Synthesis of Compound 7 In a reaction vessel, the following formula (B)
Figure 2017077834
Compound represented by putting 50g (1.3 × 10 -2 mol) in 1,3-bis dissolved in (trifluoromethyl) benzene 50 g, toluene solution 1.0 × 10 chloroplatinic acid / vinylsiloxane complex -1 g (containing 2.8 × 10 −6 mol of Pt alone) and 13 g of 1-butane-decamethylpentasiloxane (3.2 × 10 −2 mol), and aged at 80 ° C. for 20 hours Then, 54 g of a fluoropolyether group-containing polymer (compound 7) represented by the following formula (K) was obtained by distilling off the solvent and unreacted substances under reduced pressure.
Figure 2017077834
1 H-NMR
δ0-0.2 (-Si-C H 3 ) 60H
δ0.3-0.6 (-CH 2 CH 2 C H 2 -Si) 8H
δ0.6-0.8 (-CH 2 CH 2 CH 2 -C H 3) 6H
δ1.1-1.3 (-CH 2 C H 2 C H 2 -C H 3) 8H
δ1.4-1.8 (—C H 2 C H 2 CH 2 —Si) 8H

[合成例8]化合物8の合成
反応容器に、下記式(B)

Figure 2017077834
で表される化合物25g(0.7×10-2mol)を入れ、1,3−ビス(トリフルオロメチル)ベンゼン25gに溶解させ、塩化白金酸/ビニルシロキサン錯体のトルエン溶液2.5×10-2g(Pt単体として0.7×10-6molを含有)と、ビス(ジメチルシリル)メタン8.9g(0.7×10-1mol)を混合して、80℃で24時間熟成し、溶剤及び未反応物を減圧留去することで、下記式(L)で表されるフルオロポリエーテル基含有ポリマー(化合物8)10gを得た。
Figure 2017077834
1H−NMR
δ0−0.4(−OSi(C 32,−Si−C 2−Si)28H
δ0.4−0.8(−CH2CH2 2−Si)4H
δ1.2−2.0(−C 2 2CH2−Si)8H
δ3.8−4.2(−SiH)2H[Synthesis Example 8] Synthesis of Compound 8 In a reaction vessel, the following formula (B)
Figure 2017077834
25 g (0.7 × 10 −2 mol) of the compound represented by formula (1) is added, dissolved in 25 g of 1,3-bis (trifluoromethyl) benzene, and a toluene solution of chloroplatinic acid / vinylsiloxane complex 2.5 × 10 -2 g (containing 0.7 × 10 −6 mol as a simple substance of Pt) and 8.9 g (0.7 × 10 −1 mol) of bis (dimethylsilyl) methane are mixed and aged at 80 ° C. for 24 hours. Then, 10 g of a fluoropolyether group-containing polymer (compound 8) represented by the following formula (L) was obtained by distilling off the solvent and unreacted substances under reduced pressure.
Figure 2017077834
1 H-NMR
δ0-0.4 (-OSi (C H 3 ) 2 , -Si-C H 2 -Si) 28H
δ0.4-0.8 (-CH 2 CH 2 C H 2 -Si) 4H
δ 1.2-2.0 (—C H 2 C H 2 CH 2 —Si) 8H
δ3.8-4.2 (-SiH) 2H

[合成例9]化合物9の合成
反応容器に、下記式(M)

Figure 2017077834
で表される化合物200g(2.6×10-2mol)、1,3−ビス(トリフルオロメチル)ベンゼン200g、1,1,3,3,5,5−ヘキサメチルトリシロキサン108g(5.2×10-3mol)、及び塩化白金酸/ビニルシロキサン錯体のトルエン溶液6.0×10-1g(Pt単体として1.6×10-5molを含有)を混合し、80℃で40時間熟成させた。その後、溶剤及び未反応物を減圧留去した。続いて、分子蒸留装置により残存する低沸点成分、高沸点成分を取り除いたところ、液状の生成物(化合物9)200gを得た。Synthesis Example 9 Synthesis of Compound 9 In a reaction vessel, the following formula (M)
Figure 2017077834
200 g (2.6 × 10 −2 mol) of the compound represented by the formula, 200 g of 1,3-bis (trifluoromethyl) benzene, 108 g of 1,1,3,3,5,5-hexamethyltrisiloxane (5. 2 × 10 −3 mol) and 6.0 × 10 −1 g of a chloroplatinic acid / vinylsiloxane complex toluene solution (containing 1.6 × 10 −5 mol as a simple substance of Pt) and mixed at 40 ° C. at 40 ° C. Aged for hours. Thereafter, the solvent and unreacted substances were distilled off under reduced pressure. Subsequently, when the remaining low-boiling components and high-boiling components were removed by a molecular distillation apparatus, 200 g of a liquid product (Compound 9) was obtained.

得られた化合物9は、1H−NMRにより下記式(N)で示される構造であることが確認された。

Figure 2017077834
1H−NMR
δ0−0.4(−OSi(C 32)72H
δ0.4−0.8(−CH2CH2 2−Si)8H
δ1.2−2.0(−C 2 2CH2−Si)16H
δ3.8−4.2(−SiH)4HThe obtained compound 9 was confirmed by 1 H-NMR to have a structure represented by the following formula (N).
Figure 2017077834
1 H-NMR
δ0-0.4 (-OSi (C H 3 ) 2 ) 72H
δ0.4-0.8 (-CH 2 CH 2 C H 2 -Si) 8H
δ1.2-2.0 (-C H 2 C H 2 CH 2 -Si) 16H
δ3.8-4.2 (-SiH) 4H

[合成例10]化合物10(比較品)の合成
反応容器に、下記式(B)

Figure 2017077834
で表される化合物200g(2.6×10-2mol)、1,3−ビス(トリフルオロメチル)ベンゼン200g、トリメトキシシラン12.7g(1.1×10-1mol)、及び塩化白金酸/ビニルシロキサン錯体のトルエン溶液6.0×10-1g(Pt単体として1.6×10-5molを含有)を混合し、80℃で40時間熟成させた。その後、溶剤及び未反応物を減圧留去した。続いて、分子蒸留装置により残存する低沸点成分、高沸点成分を取り除いたところ、液状の生成物(化合物10)201gを得た。Synthesis Example 10 Synthesis of Compound 10 (Comparative Product) In a reaction vessel, the following formula (B)
Figure 2017077834
200 g (2.6 × 10 −2 mol), 1,3-bis (trifluoromethyl) benzene 200 g, trimethoxysilane 12.7 g (1.1 × 10 −1 mol), and platinum chloride A toluene solution of acid / vinylsiloxane complex 6.0 × 10 −1 g (containing 1.6 × 10 −5 mol as a simple substance of Pt) was mixed and aged at 80 ° C. for 40 hours. Thereafter, the solvent and unreacted substances were distilled off under reduced pressure. Then, when the low boiling component and the high boiling component which remain | survive with a molecular distillation apparatus were removed, 201 g of liquid products (compound 10) were obtained.

得られた化合物10は、1H−NMRにより下記式(O)で示される構造であることが確認された。

Figure 2017077834
1H−NMR
δ0.2−2.2(−C 2 2 2 −)12H
δ3.0−3.5(−Si(OC 3 3)18HThe obtained compound 10 was confirmed by 1 H-NMR to have a structure represented by the following formula (O).
Figure 2017077834
1 H-NMR
δ0.2-2.2 (-C H 2 C H 2 C H 2 -) 12H
δ3.0-3.5 (-Si (OC H 3) 3) 18H

更に、比較例には、以下の化合物を使用した。
[化合物11]

Figure 2017077834

Furthermore, the following compounds were used for the comparative example.
[Compound 11]
Figure 2017077834

[化合物12]

Figure 2017077834
[Compound 12]
Figure 2017077834

[実施例1〜9、比較例1〜3]
表面処理剤の調製及び被膜の形成
上記化合物1〜12を、濃度20質量%になるようにNovec 7200(3M社製、エチルパーフルオロブチルエーテル)に溶解させて表面処理剤を調製した。表面処理剤調製後、樹脂フィルム(タイゴールド社製)をプラズマ処理(Ar:10cc、O2:80cc、出力:250W、時間:30秒)で洗浄し、その上に上記表面処理剤10mgを真空蒸着し(処理条件は、圧力:2.0×10-2Pa、加熱温度:700℃)、25℃、湿度50%RHの雰囲気下で24時間後に膜厚15nmの被膜を形成した。なお、樹脂フィルムはポリエチレンテレフタレート製で、フィルム表面にアクリルハードコート処理を施した後、最表面にSiO2を100nmの厚さでスパッタ処理したものを用いた。
化合物1〜9を用いて形成された被膜を実施例1〜9、化合物10〜12を用いて形成された被膜を比較例1〜3とした。
[Examples 1-9, Comparative Examples 1-3]
Preparation of surface treatment agent and formation of coating film The above-mentioned compounds 1 to 12 were dissolved in Novec 7200 (3M, ethyl perfluorobutyl ether) to a concentration of 20% by mass to prepare a surface treatment agent. After the preparation of the surface treatment agent, the resin film (manufactured by Tygold) is washed by plasma treatment (Ar: 10 cc, O 2 : 80 cc, output: 250 W, time: 30 seconds), and 10 mg of the surface treatment agent is vacuumed thereon. Vapor deposition was performed (processing conditions were pressure: 2.0 × 10 −2 Pa, heating temperature: 700 ° C.), and a film having a thickness of 15 nm was formed after 24 hours in an atmosphere of 25 ° C. and humidity 50% RH. The resin film was made of polyethylene terephthalate, and the surface of the film was subjected to an acrylic hard coat treatment, and then the outermost surface was subjected to sputtering treatment with SiO 2 with a thickness of 100 nm.
Films formed using Compounds 1 to 9 were Examples 1 to 9, and films formed using Compounds 10 to 12 were Comparative Examples 1 to 3.

実施例1〜9及び比較例1〜3の被膜を下記の方法により評価した。いずれの試験も、25℃、湿度50%RHで実施した。   The coating films of Examples 1 to 9 and Comparative Examples 1 to 3 were evaluated by the following methods. All tests were performed at 25 ° C. and humidity 50% RH.

[耐摩耗性の評価]
得られた被膜において、布(ベンコット)に対する耐摩耗性を、トライボギアTYPE:30S(新東科学社製)を用いて測定した。
下記の条件により、水接触角が100°未満になった時点で試験終了とした。水接触角100°以上を保つ摩耗回数により耐摩耗性の評価とした。
接触面積:10mm×30mm
荷重:1.5kg
耐布摩耗性
布:BEMCOT M−3II(旭化成社製)
移動距離(片道)20mm
移動速度1,800mm/分
荷重:0.5kg/cm2
また、水接触角は、接触角計DropMaster(協和界面科学社製)を用いて、被膜の水(液滴:2μl)に対する接触角を測定した。なお、水接触角は、2μlの液滴をサンプル表面に着滴させた後、1秒後に測定した。
[Evaluation of wear resistance]
In the obtained coating, the abrasion resistance with respect to the cloth (Bencot) was measured using Tribogear TYPE: 30S (manufactured by Shinto Kagaku Co.).
The test was terminated when the water contact angle was less than 100 ° under the following conditions. The abrasion resistance was evaluated based on the number of wears that maintained a water contact angle of 100 ° or more.
Contact area: 10mm x 30mm
Load: 1.5kg
Cloth wear resistance Cloth: BEMCOT M-3II (Asahi Kasei Co., Ltd.)
Travel distance (one way) 20mm
Movement speed 1,800 mm / min Load: 0.5 kg / cm 2
Moreover, the contact angle with respect to the water (droplet: 2 microliters) of a film was measured for the water contact angle using the contact angle meter DropMaster (made by Kyowa Interface Science Co., Ltd.). The water contact angle was measured 1 second after a 2 μl droplet was deposited on the sample surface.

Figure 2017077834
Figure 2017077834

上記表1によれば、比較例1、2及び3では、表面処理剤を基材表面に蒸着塗工し、後処理後に耐摩耗試験を行うと、耐摩耗回数は0回であり、摩耗耐久性は示さなかった。これに対し、実施例1〜9では、表面処理剤を基材表面に蒸着塗工し、後処理後に耐摩耗試験を行うと、優れた耐摩耗性を発現した。実施例1〜9は、シロキサン結合、シルフェニレン構造、あるいはシルアルキレン構造を分子鎖末端(分子の連結基部分)に有するため、特にこれら連結基部分のSiCH3部分が基材表面のSiO2層のSiO2由来のOH基部分と分子間力によって相互作用して、表面処理剤中のポリマーが配向しやすくなることから、末端基に加水分解性基を有さなくても、比較例の表面処理剤と比べ、基材への密着性が向上しているものと思われる。According to Table 1 above, in Comparative Examples 1, 2, and 3, when the surface treatment agent was vapor-deposited on the substrate surface and the wear resistance test was performed after the post-treatment, the number of wear resistance was 0, and the wear durability No sex was shown. On the other hand, in Examples 1 to 9, when the surface treatment agent was vapor-deposited on the surface of the base material and subjected to an abrasion resistance test after the post-treatment, excellent abrasion resistance was expressed. Examples 1 to 9 have a siloxane bond, a silphenylene structure, or a silalkylene structure at the end of the molecular chain (the linking group portion of the molecule), so that the SiCH 3 portion of the linking group portion is the SiO 2 layer on the substrate surface. Since the polymer in the surface treating agent interacts with the OH group part derived from SiO 2 by the intermolecular force, the surface of the comparative example does not have a hydrolyzable group at the end group. It seems that the adhesion to the substrate is improved compared to the treatment agent.

本発明のフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物を含む表面処理剤により防汚性の表面層を形成した樹脂は、優れた摩耗耐久性を示すことができる。本発明の表面処理剤により防汚性の表面層を形成した樹脂は、特に、メガネレンズ、サングラス、タッチパネルディスプレイ、反射防止フィルム等の表面の防汚処理が必要な用途に好適に使用できる。   The resin in which the antifouling surface layer is formed by the surface treatment agent containing the fluoropolyether group-containing polymer-modified organosilicon compound of the present invention can exhibit excellent wear durability. The resin in which the antifouling surface layer is formed by the surface treatment agent of the present invention can be suitably used particularly for applications requiring antifouling treatment on the surface, such as eyeglass lenses, sunglasses, touch panel displays, and antireflection films.

本発明のフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物を含有する表面処理剤により表面処理された物品は、優れた摩耗耐久性を示す。本発明の表面処理剤により表面処理された樹脂製品は、特に、タッチパネルディスプレイ、反射防止フィルム、メガネレンズなど油脂の付着が想定される樹脂製品として有効である。   The article surface-treated with the surface treatment agent containing the fluoropolyether group-containing polymer-modified organosilicon compound of the present invention exhibits excellent wear durability. The resin product surface-treated with the surface treatment agent of the present invention is particularly effective as a resin product that is assumed to be attached with oils and fats, such as a touch panel display, an antireflection film, and a spectacle lens.

Claims (10)

下記一般式(1)
Figure 2017077834
[式中、Rfは1価のフルオロオキシアルキル基又は2価のフルオロオキシアルキレン基含有ポリマー残基であり、Yは独立に2価の炭化水素基であり、Qは独立に2価の直鎖状もしくは環状オルガノシロキサン残基、シルアルキレン基又はシルアリーレン基であり、Xは独立に水素原子、炭素数1〜4のアルキル基又はフェニル基であり、Zは独立に水素原子、下記式
−SiR3
(式中、Rは独立に炭素数1〜4のアルキル基又はフェニル基である。)
で表される基、又は下記式
−W−Q’−X
(式中、Xは上記と同じであり、Wは単結合又は2価の炭化水素基であり、Q’はシロキサン結合、シルアルキレン構造及びシルアリーレン構造から選ばれる構造を有する2価の基である。)
で表される基であり、αは1又は2である。]
で表されるフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物。
The following general formula (1)
Figure 2017077834
[Wherein Rf is a monovalent fluorooxyalkyl group or divalent fluorooxyalkylene group-containing polymer residue, Y is independently a divalent hydrocarbon group, and Q is independently a divalent linear chain. Or a cyclic organosiloxane residue, a silalkylene group or a silarylene group, X is independently a hydrogen atom, an alkyl group having 1 to 4 carbon atoms or a phenyl group, Z is independently a hydrogen atom, Three
(In the formula, R is independently an alkyl group having 1 to 4 carbon atoms or a phenyl group.)
Or a group represented by the following formula -WQ'-X
Wherein X is the same as above, W is a single bond or a divalent hydrocarbon group, Q ′ is a divalent group having a structure selected from a siloxane bond, a silalkylene structure and a silarylene structure. is there.)
And α is 1 or 2. ]
A fluoropolyether group-containing polymer-modified organosilicon compound represented by:
前記式(1)において、αが1であり、Rf基が下記一般式(2)で表される基であることを特徴とする請求項1記載のフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物。
Figure 2017077834
(式中、p、q、r、sはそれぞれ0〜200の整数で、p+q+r+s=3〜200であり、各繰り返し単位は直鎖状でも分岐状であってもよく、各繰り返し単位同士はランダムに結合されていてよく、dは1〜3の整数であり、該単位は直鎖状でも分岐状であってもよい。)
2. The fluoropolyether group-containing polymer-modified organosilicon compound according to claim 1, wherein in the formula (1), α is 1 and the Rf group is a group represented by the following general formula (2).
Figure 2017077834
(In the formula, p, q, r, and s are each an integer of 0 to 200, and p + q + r + s = 3 to 200, each repeating unit may be linear or branched, and each repeating unit is randomly selected. And d is an integer of 1 to 3, and the unit may be linear or branched.)
前記式(1)において、αが2であり、Rf基が下記一般式(3)で表される基であることを特徴とする請求項1記載のフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物。
Figure 2017077834
(式中、p、q、r、sはそれぞれ0〜200の整数で、p+q+r+s=3〜200であり、各繰り返し単位は直鎖状でも分岐状であってもよく、各繰り返し単位同士はランダムに結合されていてよく、dは1〜3の整数であり、該単位は直鎖状でも分岐状であってもよい。)
2. The fluoropolyether group-containing polymer-modified organosilicon compound according to claim 1, wherein in the formula (1), α is 2 and the Rf group is a group represented by the following general formula (3).
Figure 2017077834
(In the formula, p, q, r, and s are each an integer of 0 to 200, and p + q + r + s = 3 to 200, each repeating unit may be linear or branched, and each repeating unit is randomly selected. And d is an integer of 1 to 3, and the unit may be linear or branched.)
前記式(1)において、Yが、炭素数3〜10のアルキレン基である請求項1〜3のいずれか1項に記載のフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物。   In the said Formula (1), Y is a C3-C10 alkylene group, The fluoro polyether group containing polymer modified organosilicon compound of any one of Claims 1-3. 前記式(1)において、Qが、下記式で示される基から選ばれる基である請求項1〜4のいずれか1項に記載のフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物。
Figure 2017077834
(式中、Xは上記と同じであり、R1は独立に炭素数1〜4のアルキル基又はフェニル基であり、R2は炭素数1〜4のアルキレン基又は炭素数6〜12のアリーレン基である。gは1〜20の整数であり、jは1〜8の整数である。)
The fluoropolyether group-containing polymer-modified organosilicon compound according to any one of claims 1 to 4, wherein in the formula (1), Q is a group selected from the groups represented by the following formulae.
Figure 2017077834
(In the formula, X is the same as above, R 1 is independently an alkyl group having 1 to 4 carbon atoms or a phenyl group, and R 2 is an alkylene group having 1 to 4 carbon atoms or an arylene having 6 to 12 carbon atoms. (G is an integer of 1 to 20, and j is an integer of 1 to 8.)
前記式(1)において、Zが、水素原子、及び下記に示す基より選ばれる基である請求項1〜5のいずれか1項に記載のフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物。
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
(式中、g1は2〜20の整数であり、eは0〜3の整数である。)
The fluoropolyether group-containing polymer-modified organosilicon compound according to any one of claims 1 to 5, wherein, in the formula (1), Z is a group selected from a hydrogen atom and a group shown below.
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
(In the formula, g1 is an integer of 2 to 20, and e is an integer of 0 to 3.)
上記式(1)で表されるフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物が、下記式のいずれかで表されるものである請求項1〜6のいずれか1項に記載のフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物。
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
(式中、Zは上記と同じであり、p1は5〜100の整数、q1は5〜100の整数で、p1+q1は10〜105の整数である。g1は2〜20の整数であり、eは0〜3の整数である。)
The fluoropolyether group according to any one of claims 1 to 6, wherein the fluoropolyether group-containing polymer-modified organosilicon compound represented by the formula (1) is represented by any one of the following formulas: Containing polymer-modified organosilicon compound.
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
Figure 2017077834
(In the formula, Z is the same as above, p1 is an integer of 5 to 100, q1 is an integer of 5 to 100, p1 + q1 is an integer of 10 to 105, g1 is an integer of 2 to 20, e Is an integer from 0 to 3.)
請求項1〜7のいずれか1項に記載のフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物を含む表面処理剤。   A surface treatment agent comprising the fluoropolyether group-containing polymer-modified organosilicon compound according to any one of claims 1 to 7. 表面処理剤が、更に下記一般式(4)
Figure 2017077834
(式中、Aは末端が−CF3基である1価のフッ素含有基であり、Rf’は2価のフルオロオキシアルキレン基含有ポリマー残基である。)
で表されるフルオロポリエーテル基含有ポリマーを含有することを特徴とする請求項8に記載の表面処理剤。
The surface treatment agent is further represented by the following general formula (4)
Figure 2017077834
(In the formula, A is a monovalent fluorine-containing group whose terminal is a —CF 3 group, and Rf ′ is a divalent fluorooxyalkylene group-containing polymer residue.)
The surface treating agent according to claim 8, comprising a fluoropolyether group-containing polymer represented by the formula:
請求項9記載の表面処理剤で表面処理された物品。   An article surface-treated with the surface treating agent according to claim 9.
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