JP6521091B2 - Fluoropolyether group-containing polymer modified organosilicon compound, surface treating agent and article - Google Patents
Fluoropolyether group-containing polymer modified organosilicon compound, surface treating agent and article Download PDFInfo
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- JP6521091B2 JP6521091B2 JP2017548692A JP2017548692A JP6521091B2 JP 6521091 B2 JP6521091 B2 JP 6521091B2 JP 2017548692 A JP2017548692 A JP 2017548692A JP 2017548692 A JP2017548692 A JP 2017548692A JP 6521091 B2 JP6521091 B2 JP 6521091B2
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- 229920000642 polymer Polymers 0.000 title claims description 64
- 150000003961 organosilicon compounds Chemical class 0.000 title claims description 37
- 239000012756 surface treatment agent Substances 0.000 claims description 35
- 125000004432 carbon atom Chemical group C* 0.000 claims description 28
- 229910052731 fluorine Inorganic materials 0.000 claims description 20
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 19
- 239000011737 fluorine Substances 0.000 claims description 17
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 16
- 125000002947 alkylene group Chemical group 0.000 claims description 14
- 125000000217 alkyl group Chemical group 0.000 claims description 12
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 12
- 239000003795 chemical substances by application Substances 0.000 claims description 10
- 125000000732 arylene group Chemical group 0.000 claims description 6
- 150000003377 silicon compounds Chemical class 0.000 claims description 6
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 2
- 239000002904 solvent Substances 0.000 description 40
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 36
- 239000010410 layer Substances 0.000 description 28
- 229920005989 resin Polymers 0.000 description 28
- 239000011347 resin Substances 0.000 description 28
- -1 octamethylene group Chemical group 0.000 description 26
- 150000001875 compounds Chemical class 0.000 description 25
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 22
- 238000006243 chemical reaction Methods 0.000 description 20
- 230000015572 biosynthetic process Effects 0.000 description 19
- 150000001336 alkenes Chemical group 0.000 description 18
- 239000003921 oil Substances 0.000 description 17
- 238000003786 synthesis reaction Methods 0.000 description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 17
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- 238000005160 1H NMR spectroscopy Methods 0.000 description 13
- 239000002253 acid Substances 0.000 description 13
- 238000005299 abrasion Methods 0.000 description 12
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 11
- GETTZEONDQJALK-UHFFFAOYSA-N (trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC=C1 GETTZEONDQJALK-UHFFFAOYSA-N 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 9
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 9
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 9
- SJBBXFLOLUTGCW-UHFFFAOYSA-N 1,3-bis(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC(C(F)(F)F)=C1 SJBBXFLOLUTGCW-UHFFFAOYSA-N 0.000 description 8
- 239000003054 catalyst Substances 0.000 description 8
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- 239000005871 repellent Substances 0.000 description 8
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 8
- 229920002554 vinyl polymer Polymers 0.000 description 8
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- 238000010438 heat treatment Methods 0.000 description 6
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- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
- 238000000926 separation method Methods 0.000 description 6
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
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- 238000009835 boiling Methods 0.000 description 4
- IAQRGUVFOMOMEM-UHFFFAOYSA-N but-2-ene Chemical group CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 description 4
- 238000006356 dehydrogenation reaction Methods 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 4
- 239000004744 fabric Substances 0.000 description 4
- 150000002222 fluorine compounds Chemical class 0.000 description 4
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 4
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 4
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 4
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- 229920005992 thermoplastic resin Polymers 0.000 description 4
- DFUYAWQUODQGFF-UHFFFAOYSA-N 1-ethoxy-1,1,2,2,3,3,4,4,4-nonafluorobutane Chemical compound CCOC(F)(F)C(F)(F)C(F)(F)C(F)(F)F DFUYAWQUODQGFF-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
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- 229910018540 Si C Inorganic materials 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 3
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- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
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- WADSJYLPJPTMLN-UHFFFAOYSA-N 3-(cycloundecen-1-yl)-1,2-diazacycloundec-2-ene Chemical compound C1CCCCCCCCC=C1C1=NNCCCCCCCC1 WADSJYLPJPTMLN-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 229910001508 alkali metal halide Inorganic materials 0.000 description 2
- 150000008045 alkali metal halides Chemical class 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- DCFKHNIGBAHNSS-UHFFFAOYSA-N chloro(triethyl)silane Chemical compound CC[Si](Cl)(CC)CC DCFKHNIGBAHNSS-UHFFFAOYSA-N 0.000 description 2
- KQIADDMXRMTWHZ-UHFFFAOYSA-N chloro-tri(propan-2-yl)silane Chemical compound CC(C)[Si](Cl)(C(C)C)C(C)C KQIADDMXRMTWHZ-UHFFFAOYSA-N 0.000 description 2
- 229940125773 compound 10 Drugs 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- ZLVXBBHTMQJRSX-VMGNSXQWSA-N jdtic Chemical compound C1([C@]2(C)CCN(C[C@@H]2C)C[C@H](C(C)C)NC(=O)[C@@H]2NCC3=CC(O)=CC=C3C2)=CC=CC(O)=C1 ZLVXBBHTMQJRSX-VMGNSXQWSA-N 0.000 description 2
- 125000005647 linker group Chemical group 0.000 description 2
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- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000000199 molecular distillation Methods 0.000 description 2
- FYJQJMIEZVMYSD-UHFFFAOYSA-N perfluoro-2-butyltetrahydrofuran Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C1(F)OC(F)(F)C(F)(F)C1(F)F FYJQJMIEZVMYSD-UHFFFAOYSA-N 0.000 description 2
- RVZRBWKZFJCCIB-UHFFFAOYSA-N perfluorotributylamine Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)N(C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F RVZRBWKZFJCCIB-UHFFFAOYSA-N 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
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- 239000002344 surface layer Substances 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- AQRLNPVMDITEJU-UHFFFAOYSA-N triethylsilane Chemical compound CC[SiH](CC)CC AQRLNPVMDITEJU-UHFFFAOYSA-N 0.000 description 2
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- GHYOCDFICYLMRF-UTIIJYGPSA-N (2S,3R)-N-[(2S)-3-(cyclopenten-1-yl)-1-[(2R)-2-methyloxiran-2-yl]-1-oxopropan-2-yl]-3-hydroxy-3-(4-methoxyphenyl)-2-[[(2S)-2-[(2-morpholin-4-ylacetyl)amino]propanoyl]amino]propanamide Chemical compound C1(=CCCC1)C[C@@H](C(=O)[C@@]1(OC1)C)NC([C@H]([C@@H](C1=CC=C(C=C1)OC)O)NC([C@H](C)NC(CN1CCOCC1)=O)=O)=O GHYOCDFICYLMRF-UTIIJYGPSA-N 0.000 description 1
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- UVNPEUJXKZFWSJ-LMTQTHQJSA-N (R)-N-[(4S)-8-[6-amino-5-[(3,3-difluoro-2-oxo-1H-pyrrolo[2,3-b]pyridin-4-yl)sulfanyl]pyrazin-2-yl]-2-oxa-8-azaspiro[4.5]decan-4-yl]-2-methylpropane-2-sulfinamide Chemical compound CC(C)(C)[S@@](=O)N[C@@H]1COCC11CCN(CC1)c1cnc(Sc2ccnc3NC(=O)C(F)(F)c23)c(N)n1 UVNPEUJXKZFWSJ-LMTQTHQJSA-N 0.000 description 1
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- 229910052749 magnesium Inorganic materials 0.000 description 1
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- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- LGUZHRODIJCVOC-UHFFFAOYSA-N perfluoroheptane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F LGUZHRODIJCVOC-UHFFFAOYSA-N 0.000 description 1
- YVBBRRALBYAZBM-UHFFFAOYSA-N perfluorooctane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F YVBBRRALBYAZBM-UHFFFAOYSA-N 0.000 description 1
- AQZYBQIAUSKCCS-UHFFFAOYSA-N perfluorotripentylamine Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)N(C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F AQZYBQIAUSKCCS-UHFFFAOYSA-N 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920001690 polydopamine Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 210000002374 sebum Anatomy 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 125000005401 siloxanyl group Chemical group 0.000 description 1
- BABPEPRNSRIYFA-UHFFFAOYSA-N silyl trifluoromethanesulfonate Chemical compound FC(F)(F)S(=O)(=O)O[SiH3] BABPEPRNSRIYFA-UHFFFAOYSA-N 0.000 description 1
- 235000015096 spirit Nutrition 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 210000002784 stomach Anatomy 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- ILMRJRBKQSSXGY-UHFFFAOYSA-N tert-butyl(dimethyl)silicon Chemical compound C[Si](C)C(C)(C)C ILMRJRBKQSSXGY-UHFFFAOYSA-N 0.000 description 1
- ZGYICYBLPGRURT-UHFFFAOYSA-N tri(propan-2-yl)silicon Chemical compound CC(C)[Si](C(C)C)C(C)C ZGYICYBLPGRURT-UHFFFAOYSA-N 0.000 description 1
- LHJCZOXMCGQVDQ-UHFFFAOYSA-N tri(propan-2-yl)silyl trifluoromethanesulfonate Chemical compound CC(C)[Si](C(C)C)(C(C)C)OS(=O)(=O)C(F)(F)F LHJCZOXMCGQVDQ-UHFFFAOYSA-N 0.000 description 1
- STMPXDBGVJZCEX-UHFFFAOYSA-N triethylsilyl trifluoromethanesulfonate Chemical compound CC[Si](CC)(CC)OS(=O)(=O)C(F)(F)F STMPXDBGVJZCEX-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- PQDJYEQOELDLCP-UHFFFAOYSA-N trimethylsilane Chemical compound C[SiH](C)C PQDJYEQOELDLCP-UHFFFAOYSA-N 0.000 description 1
- FTVLMFQEYACZNP-UHFFFAOYSA-N trimethylsilyl trifluoromethanesulfonate Chemical compound C[Si](C)(C)OS(=O)(=O)C(F)(F)F FTVLMFQEYACZNP-UHFFFAOYSA-N 0.000 description 1
- AKQNYQDSIDKVJZ-UHFFFAOYSA-N triphenylsilane Chemical compound C1=CC=CC=C1[SiH](C=1C=CC=CC=1)C1=CC=CC=C1 AKQNYQDSIDKVJZ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/42—Block-or graft-polymers containing polysiloxane sequences
- C08G77/46—Block-or graft-polymers containing polysiloxane sequences containing polyether sequences
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/32—Polymers modified by chemical after-treatment
- C08G65/321—Polymers modified by chemical after-treatment with inorganic compounds
- C08G65/323—Polymers modified by chemical after-treatment with inorganic compounds containing halogens
- C08G65/3233—Molecular halogen
- C08G65/3236—Fluorine
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/32—Polymers modified by chemical after-treatment
- C08G65/329—Polymers modified by chemical after-treatment with organic compounds
- C08G65/336—Polymers modified by chemical after-treatment with organic compounds containing silicon
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/10—Block- or graft-copolymers containing polysiloxane sequences
- C08L83/12—Block- or graft-copolymers containing polysiloxane sequences containing polyether sequences
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/10—Block or graft copolymers containing polysiloxane sequences
- C09D183/12—Block or graft copolymers containing polysiloxane sequences containing polyether sequences
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/18—Materials not provided for elsewhere for application to surfaces to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces
Description
本発明は、フルオロポリエーテル基含有ポリマー変性有機ケイ素化合物、及び該有機ケイ素化合物を含む表面処理剤、並びに該表面処理剤で表面処理された物品に関する。 The present invention relates to a fluoropolyether group-containing polymer-modified organosilicon compound, a surface treatment agent containing the organosilicon compound, and an article surface-treated with the surface treatment agent.
近年、携帯電話のディスプレイをはじめ、画面のタッチパネル化が加速している。しかし、タッチパネルは画面がむき出しの状態であり、指や頬などが直接付着する機会が多く、皮脂等の汚れが付き易いことが問題となっている。そこで、外観や視認性をよくするためにディスプレイの表面に指紋を付きにくくする技術や、汚れを落とし易くする技術の要求が年々高まってきており、これらの要求に応えることのできる材料の開発が望まれている。特にタッチパネルディスプレイの表面は、指紋汚れが付着しやすいため、撥水撥油層を設けることが望まれている。しかし、従来の撥水撥油層は撥水撥油性が高く、汚れ拭き取り性に優れるが、使用中に防汚性能が劣化してしまうという問題点があった。また、塗工する方法によって、性能にばらつきが出たり、塗工する基材によって、密着性が劣ったりする場合があった。更に、これまでの表面処理剤は、ガラスに対して良好な表面特性を示すものは多くあったが、樹脂表面に対して、密着性や撥水撥油性、耐摩耗性等の表面特性を十分に示すものがなかった。 In recent years, the use of touch panels on screens, including displays of mobile phones, has been accelerating. However, the touch panel is in a state where the screen is exposed, and there are many opportunities for direct adhesion of fingers and cheeks, and it is a problem that dirt such as sebum is easily attached. Therefore, there is an increasing demand for technology to make it difficult to attach fingerprints to the surface of the display and to make it easy to remove dirt in order to improve appearance and visibility, and development of materials that can meet these requirements has It is desired. In particular, fingerprint stains easily adhere to the surface of the touch panel display, and thus it is desirable to provide a water and oil repellent layer. However, although the conventional water- and oil-repellent layer has high water- and oil-repellency and is excellent in stain wiping performance, there is a problem that the antifouling performance is deteriorated during use. Moreover, depending on the method of coating, the performance may vary, and the adhesion may be poor depending on the substrate to be coated. Furthermore, many surface treatment agents so far have exhibited good surface characteristics with respect to glass, but sufficient surface characteristics such as adhesion, water / oil / oil repellency, and abrasion resistance with respect to the resin surface are sufficient. There was nothing to show.
一般に、フルオロポリエーテル基含有化合物は、その表面自由エネルギーが非常に小さいために、撥水撥油性、耐薬品性、潤滑性、離型性、防汚性などを有する。その性質を利用して、工業的には紙・繊維などの撥水撥油防汚剤、磁気記録媒体の滑剤、精密機器の防油剤、離型剤、化粧料、保護膜など、幅広く利用されている。しかし、その性質は同時に他の基材に対する非粘着性、非密着性であることを意味しており、基材表面に塗布することはできても、その被膜を密着させることは困難であった。 In general, the fluoropolyether group-containing compound has water and oil repellency, chemical resistance, lubricity, releasability, antifouling property and the like because its surface free energy is very small. Industrially, it is widely used in industrial applications such as water and oil repellent soiling agents such as paper and fiber, lubricants for magnetic recording media, oil repellent agents for precision equipment, mold release agents, cosmetics, and protective films. ing. However, its properties mean that it is at the same time non-adhesive and non-adhesive to other substrates, and even though it can be applied to the substrate surface, it was difficult to adhere the film. .
一方、ガラスや布などの基材表面と有機化合物とを結合させるものとして、シランカップリング剤が良く知られており、各種基材表面のコーティング剤として幅広く利用されている。シランカップリング剤は、1分子中に有機官能基と反応性シリル基(一般にはアルコキシシリル基等の加水分解性シリル基)を有する。加水分解性シリル基が、空気中の水分などによって自己縮合反応を起こして被膜を形成する。該被膜は、加水分解性シリル基がガラスや金属などの表面と化学的・物理的に結合することにより耐久性を有する強固な被膜となる。 On the other hand, silane coupling agents are well known as those for bonding a substrate surface such as glass or cloth to an organic compound, and are widely used as coating agents for various substrate surfaces. The silane coupling agent has an organic functional group and a reactive silyl group (generally, a hydrolyzable silyl group such as an alkoxysilyl group) in one molecule. The hydrolyzable silyl group causes a self condensation reaction due to moisture in the air or the like to form a film. The coating becomes a durable and durable coating by chemically and physically bonding the hydrolyzable silyl group to a surface such as glass or metal.
そこで、フルオロポリエーテル基含有化合物に加水分解性シリル基を導入したフルオロポリエーテル基含有ポリマー変性シランを用いることによって、基材表面に密着し易く、かつ基材表面に、撥水撥油性、耐薬品性、潤滑性、離型性、防汚性等を有する被膜を形成しうる組成物が開示されている(特許文献1〜8:特開2003−238577号公報、特許第2860979号公報、特許第4672095号公報、特表2008−534696号公報、特表2008−537557号公報、特開2012−072272号公報、特開2012−157856号公報、特開2013−136833号公報)。 Therefore, by using a fluoropolyether group-containing polymer-modified silane in which a hydrolyzable silyl group is introduced to the fluoropolyether group-containing compound, the base material easily adheres to the substrate surface, and water and oil repellency and oil resistance on the substrate surface. A composition capable of forming a film having chemical properties, lubricity, releasability, antifouling properties, etc. is disclosed (Patent Documents 1 to 8: Japanese Patent Application Laid-Open No. 2003-238577, Patent No. 2860979, Patents No. 4672095, JP-A-2008-534696, JP-A-2008-537557, JP-A-2012-072272, JP-A-2012-157856, JP-A-2013-136833).
上記フルオロポリエーテル基含有ポリマー変性シランを含有する組成物で基材を表面処理する際、種々の塗工方法を用いて基材に対し被膜形成を行うが、塗工後、加水分解性シリル基を加水分解し、被膜を硬化する工程において、80℃や120℃などの高温条件や、加湿下の条件により加水分解反応が促進される。また、室温下でも空気中の水分と徐々に反応することで硬化被膜を形成できる。しかし、該硬化工程は高温加湿条件を必要とすることや、室温下で硬化する場合に時間がかかってしまうなど、製造上の律速(遅延要因)になり得る問題があった。更に、室温硬化などの温和な条件下にて短時間で硬化した被膜(撥水撥油層)は、耐摩耗性、使用中に防汚性能が劣化してしまうという問題点があった。 When surface-treating a substrate with the composition containing the fluoropolyether group-containing polymer-modified silane described above, a film is formed on the substrate using various coating methods, but after coating, the hydrolyzable silyl group is coated In the process of hydrolyzing and curing the film, the hydrolysis reaction is promoted by high temperature conditions such as 80.degree. C. and 120.degree. C. and humidified conditions. In addition, a cured film can be formed by gradually reacting with moisture in the air even at room temperature. However, the curing process requires high-temperature humidification conditions, takes a long time to cure at room temperature, and so forth, which may cause a rate-determining factor (delay factor) in manufacturing. Furthermore, the film (water and oil repellent layer) cured in a short time under mild conditions such as room temperature curing has a problem that the anti-soiling property and the antifouling performance are deteriorated during use.
特許文献9(特開2008−144144号公報)では、コーティング組成物内に硬化触媒として含フッ素カルボン酸を添加して硬化を促進させることで温和な条件下、短時間で成膜を行っている。しかし、触媒量を低減すると耐摩耗性に劣り、触媒量を増加させると初期性能が低下する。また、極性基であるカルボキシル基が被膜最表面に出てしまう可能性も高く、その際は性能が低下してしまう。 In patent document 9 (Unexamined-Japanese-Patent No. 2008-144144), it forms into a film in mild conditions and a short time by promoting hardening by adding a fluorine-containing carboxylic acid as a curing catalyst in a coating composition. . However, reducing the amount of catalyst results in inferior wear resistance, and increasing the amount of catalyst lowers the initial performance. In addition, there is a high possibility that the carboxyl group which is a polar group is exposed to the outermost surface of the film, and in that case, the performance is lowered.
また、特許文献10(特開2004−145283号公報)では、フルオロポリアルキレンエーテル基含有シランが提案されている。該フルオロポリアルキレンエーテル基含有シランで処理したレンズは、撥油性、指紋拭き取り性に優れているが、耐摩耗性が十分ではない。 Moreover, in patent document 10 (Unexamined-Japanese-Patent No. 2004-145283), fluoropolyalkylene ether group containing silane is proposed. The lens treated with the fluoropolyalkylene ether group-containing silane is excellent in oil repellency and fingerprint wiping properties but is not sufficiently abrasion resistant.
本発明は、上記事情に鑑みなされたもので、特に樹脂表面において、室温などの温和な条件下、短時間においても耐摩耗性に優れた撥水撥油層を形成することができるフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物、及び該有機ケイ素化合物を含む表面処理剤、並びに該表面処理剤で表面処理された物品を提供することを目的とする。 The present invention has been made in view of the above circumstances, and in particular, on a resin surface, a fluoropolyether group capable of forming a water and oil repellent layer excellent in abrasion resistance even under a mild condition such as room temperature and in a short time. It is an object of the present invention to provide a containing polymer modified organosilicon compound, a surface treatment agent containing the organosilicon compound, and an article surface-treated with the surface treatment agent.
本発明者らは、上記目的を解決すべく鋭意検討した結果、後述する一般式(1)で表されるフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物を用いた表面処理剤が、末端官能基を有さなくとも、室温などの温和な条件下、短時間でも耐摩耗性に優れた撥水撥油層を樹脂フィルムやプラスチックレンズなどの樹脂製品に対して形成し得ることを見出し、本発明をなすに至った。 As a result of intensive studies to solve the above object, the present inventors found that the surface treatment agent using a fluoropolyether group-containing polymer modified organosilicon compound represented by the general formula (1) described later has a terminal functional group. It has been found that a water and oil repellent layer having excellent abrasion resistance even in a short time even under mild conditions such as room temperature can be formed on a resin product such as a resin film or a plastic lens without having the present invention. It came to
従って、本発明は、下記フルオロポリエーテル基含有ポリマー変性有機ケイ素化合物、表面処理剤及び物品を提供する。
〔1〕
下記一般式(1)
で示される基から選ばれる基であり、Xは上記と同じであり、Zは独立に水素原子、下記式
−SiR3
(式中、Rは独立に炭素数1〜4のアルキル基又はフェニル基である。)
で表される基、又は下記式
−W−Q’−X
(式中、Xは上記と同じであり、Wは単結合又は2価の炭化水素基であり、Q’はシロキサン結合、シルアルキレン構造及びシルアリーレン構造から選ばれる構造を有する2価の基である。)
で表される基であり、αは1又は2である。]
で表されるフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物。
〔2〕
前記式(1)において、αが1であり、Rf基が下記一般式(2)で表される基であることを特徴とする〔1〕記載のフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物。
〔3〕
前記式(1)において、αが2であり、Rf基が下記一般式(3)で表される基であることを特徴とする〔1〕記載のフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物。
〔4〕
前記式(1)において、Yが、炭素数3〜10のアルキレン基である〔1〕〜〔3〕のいずれかに記載のフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物。
〔5〕
前記式(1)において、Zが、水素原子、及び下記に示す基より選ばれる基である〔1〕〜〔4〕のいずれかに記載のフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物。
〔6〕
上記式(1)で表されるフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物が、下記式のいずれかで表されるものである〔1〕〜〔5〕のいずれか1項に記載のフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物。
〔7〕
〔1〕〜〔6〕のいずれかに記載のフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物を含む表面処理剤。
〔8〕
表面処理剤が、更に下記一般式(4)
で表されるフルオロポリエーテル基含有ポリマーを含有することを特徴とする〔7〕に記載の表面処理剤。
〔9〕
〔8〕記載の表面処理剤で表面処理された物品。
Accordingly, the present invention provides the following fluoropolyether group-containing polymer modified organosilicon compound, surface treatment agent and article.
[1]
The following general formula (1)
And X is the same as above , Z is independently a hydrogen atom, and the following formula -SiR 3
(Wherein R is independently an alkyl group having 1 to 4 carbon atoms or a phenyl group)
Or a group represented by the following formula -W-Q'-X
(Wherein, X is the same as above, W is a single bond or a divalent hydrocarbon group, and Q ′ is a divalent group having a structure selected from a siloxane bond, a silalkylene structure and a silarylene structure) is there.)
Is a group represented by and α is 1 or 2. ]
The fluoropolyether group containing polymer modified organosilicon compound represented by these.
[2]
The fluoropolyether group-containing polymer-modified organosilicon compound according to [1], wherein in the formula (1), α is 1 and the Rf group is a group represented by the following general formula (2).
[3]
The fluoropolyether group-containing polymer-modified organosilicon compound according to [1], wherein in the formula (1), α is 2 and the Rf group is a group represented by the following general formula (3).
[4]
The fluoropolyether group containing polymer modified organosilicon compound in any one of [1]-[3] whose Y is a C3-C10 alkylene group in said Formula (1).
[ 5 ]
The fluoropolyether group containing polymer modified organosilicon compound in any one of [1]-[ 4 ] whose Z is a hydrogen atom and the group shown below in said Formula (1).
[ 6 ]
The fluoropolyether according to any one of [1] to [ 5 ], wherein the fluoropolyether group-containing polymer-modified organic silicon compound represented by the above formula (1) is represented by any one of the following formulas Ether group-containing polymer modified organosilicon compound.
[ 7 ]
The surface treating agent containing the fluoropolyether group containing polymer modified organic silicon compound in any one of [1]-[ 6 ].
[ 8 ]
The surface treatment agent further comprises the following general formula (4)
The surface treating agent according to [ 7 ], which contains a fluoropolyether group-containing polymer represented by
[ 9 ]
[ 8 ] An article surface-treated with the surface treatment agent according to [ 8 ].
本発明のフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物を含有する表面処理剤から形成される被膜は、撥水撥油性が高く、特に室温などの温和な条件下、短時間で形成される被膜は、耐摩耗性に優れる。本発明のフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物を含有する表面処理剤は、特に樹脂表面に対して特異的な密着性を有するので、該表面処理剤で処理することによって、樹脂フィルムやメガネレンズのような樹脂製品に優れた撥水撥油性、低動摩擦性、耐摩耗性を短時間で容易に付与することができる。 The film formed from the surface treatment agent containing the fluoropolyether group-containing polymer modified organosilicon compound of the present invention is high in water and oil repellency, and in particular, the film formed in a short time under mild conditions such as room temperature Excellent in wear resistance. The surface treatment agent containing the fluoropolyether group-containing polymer modified organosilicon compound of the present invention has a specific adhesion to a resin surface, in particular, and therefore, treatment with the surface treatment agent results in a resin film or glasses It is possible to easily impart excellent water and oil repellency, low dynamic friction, and abrasion resistance to resin products such as lenses in a short time.
本発明のフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物は、下記一般式(1)で表されるものである。
−SiR3
(式中、Rは独立に炭素数1〜4のアルキル基又はフェニル基である。)
で表される基、又は下記式
−W−Q’−X
(式中、Xは上記と同じであり、Wは単結合又は2価の炭化水素基であり、Q’はシロキサン結合、シルアルキレン構造及びシルアリーレン構造から選ばれる構造を有する2価の基である。)
で表される基であり、αは1又は2である。]The fluoropolyether group-containing polymer modified organosilicon compound of the present invention is represented by the following general formula (1).
(Wherein R is independently an alkyl group having 1 to 4 carbon atoms or a phenyl group)
Or a group represented by the following formula -W-Q'-X
(Wherein, X is the same as above, W is a single bond or a divalent hydrocarbon group, and Q ′ is a divalent group having a structure selected from a siloxane bond, a silalkylene structure and a silarylene structure) is there.)
Is a group represented by and α is 1 or 2. ]
上記式(1)において、αが1の場合、Rfとしては、下記一般式(2)で表される1価のフルオロオキシアルキル基が好ましい。
上記式(1)において、αが2の場合、Rfとしては、下記一般式(3)で表される2価のフルオロオキシアルキレン基が好ましい。
上記式(2)、(3)において、p、q、r、sはそれぞれ0〜200の整数、好ましくはpは5〜100の整数、qは5〜100の整数、rは0〜100の整数、sは0〜100の整数であり、p+q+r+s=3〜200、好ましくは10〜100であり、各繰り返し単位は直鎖状でも分岐状であってもよく、各繰り返し単位同士はランダムに結合されていてよい。より好ましくはp+qは10〜105、特に15〜60の整数であり、r=s=0である。p+q+r+sが上記上限値より小さければ密着性や被膜形成性が良好であり、上記下限値より大きければフルオロポリエーテル基の特徴を十分に発揮することができるので好ましい。
上記式(2)、(3)において、dは1〜3の整数であり、好ましくは1又は2であり、該単位は直鎖状でも分岐状であってもよい。In the above formulas (2) and (3), p, q, r and s are each an integer of 0 to 200, preferably p is an integer of 5 to 100, q is an integer of 5 to 100 and r is 0 to 100 The integer s is an integer of 0 to 100, p + q + r + s = 3 to 200, preferably 10 to 100, and each repeating unit may be linear or branched, and each repeating unit is randomly bonded It may be done. More preferably, p + q is an integer of 10 to 105, in particular 15 to 60, and r = s = 0. If p + q + r + s is smaller than the above upper limit value, adhesion and film formation properties are good, and if it is larger than the above lower limit value, the characteristics of the fluoropolyether group can be sufficiently exhibited, which is preferable.
In the above formulas (2) and (3), d is an integer of 1 to 3, preferably 1 or 2, and the unit may be linear or branched.
Rfとして、上記式(2)又は(3)で表される主鎖構造を有することによって、動摩擦係数の低い被膜を形成することができる。
また、主鎖にフルオロポリエーテル構造を有し、分子鎖の片末端にシロキサン結合、シルフェニレン結合又はシルアルキレン結合を含有する直鎖状ポリマー(αが1で、Rfが式(2)で表される1価のフルオロオキシアルキル基)は、両末端にシロキサン結合、シルフェニレン結合又はシルアルキレン結合を含有する直鎖状ポリマー(αが2で、Rfが式(3)で表される2価のフルオロオキシアルキレン基)と比較して、得られる被膜に優れた耐摩耗性を付与することができる。By having a main chain structure represented by the above formula (2) or (3) as Rf, it is possible to form a film having a low coefficient of dynamic friction.
In addition, a linear polymer having a fluoropolyether structure in the main chain and containing a siloxane bond, a silphenylene bond or a silalkylene bond at one end of the molecular chain (where α is 1 and Rf is a formula (2) The monovalent fluorooxyalkyl group to be substituted is a linear polymer (a is 2 and Rf is represented by the formula (3)) containing a siloxane bond, a silphenylene bond or a silalkylene bond at both ends Excellent wear resistance can be imparted to the resulting film as compared to the fluorooxyalkylene group).
Rfとして、具体的には、下記のものを例示することができる。
上記式(1)において、Yは独立に2価の炭化水素基であり、炭素数3〜10、特に炭素数3〜8のプロピレン基(トリメチレン基、メチルエチレン基)、ブチレン基(テトラメチレン基、メチルプロピレン基)、ヘキサメチレン基、オクタメチレン基等のアルキレン基であることが好ましく、特に好ましくはトリメチレン基である。 In the above formula (1), Y is independently a divalent hydrocarbon group, and is a propylene group having 3 to 10 carbon atoms, particularly 3 to 8 carbon atoms (trimethylene group, methyl ethylene group), butylene group (tetramethylene group) It is preferable that it is an alkylene group such as methylpropylene group), hexamethylene group, octamethylene group and the like, and particularly preferable is trimethylene group.
上記式(1)において、Xは独立に水素原子、炭素数1〜4のメチル基、エチル基、プロピル基、ブチル基等のアルキル基又はフェニル基であり、水素原子、メチル基が好ましい。 In the above formula (1), X independently represents a hydrogen atom, an alkyl group such as a methyl group having 1 to 4 carbon atoms, an ethyl group, a propyl group or a butyl group, or a phenyl group, preferably a hydrogen atom or a methyl group.
上記式(1)において、Qは、独立に2価の直鎖状もしくは環状オルガノシロキサン残基、シルアルキレン基又はシルアリーレン基であり、下記式で示される基から選ばれる基であることが好ましい。
Qの具体例としては、例えば、下記の基が挙げられる。
上記式(1)において、Zは独立に水素原子、下記式
−SiR3
(式中、Rは独立に炭素数1〜4のアルキル基又はフェニル基である。)
で表される基、又は下記式
−W−Q’−X
(式中、Xは上記と同じであり、Wは単結合又は2価の炭化水素基であり、Q’はシロキサン結合、シルアルキレン構造及びシルアリーレン構造から選ばれる構造を有する2価の基である。)
で表される基である。In the above formula (1), Z is independently a hydrogen atom, the following formula -SiR 3
(Wherein R is independently an alkyl group having 1 to 4 carbon atoms or a phenyl group)
Or a group represented by the following formula -W-Q'-X
(Wherein, X is the same as above, W is a single bond or a divalent hydrocarbon group, and Q ′ is a divalent group having a structure selected from a siloxane bond, a silalkylene structure and a silarylene structure) is there.)
Is a group represented by
−SiR3において、Rは炭素数1〜4のメチル基、エチル基、プロピル基、ブチル基等のアルキル基、又はフェニル基であり、中でもメチル基、エチル基が好適である。In —SiR 3 , R is an alkyl group such as a methyl group having 1 to 4 carbon atoms, an ethyl group, a propyl group or a butyl group, or a phenyl group, and among them, a methyl group or an ethyl group is preferable.
また、−W−Q’−Xにおいて、Wは単結合又は2価の炭化水素基であり、2価の炭化水素基としては、炭素数2〜10、特に炭素数2〜8のエチレン基、プロピレン基(トリメチレン基、メチルエチレン基)、ブチレン基(テトラメチレン基、メチルプロピレン基)、ヘキサメチレン基、オクタメチレン基等のアルキレン基が挙げられ、Wとしては、単結合又はトリメチレン基であることが好ましい。
Xは上記と同じであり、水素原子、メチル基が好ましい。In -W-Q'-X, W is a single bond or a divalent hydrocarbon group, and as the divalent hydrocarbon group, an ethylene group having 2 to 10 carbon atoms, particularly 2 to 8 carbon atoms, And alkylene groups such as propylene group (trimethylene group, methylethylene group), butylene group (tetramethylene group, methylpropylene group), hexamethylene group, octamethylene group etc. are mentioned, and W is a single bond or trimethylene group Is preferred.
X is the same as above, and is preferably a hydrogen atom or a methyl group.
また、Q’はシロキサン結合、シルアルキレン構造及びシルアリーレン構造から選ばれる構造を有する2価の基であり、上記Qにおいて例示した2価の直鎖状もしくは環状オルガノシロキサン残基、シルアルキレン構造、シルアリーレン構造を有するものが好ましい。
Q’の具体例としては、例えば、下記の基が挙げられる。
Specific examples of Q ′ include, for example, the following groups.
Zとして、具体的には、水素原子、及び下記に示すものを例示することができる。
上記式(1)で表されるフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物としては、下記式で表されるものが例示できる。なお、各式において、フルオロオキシアルキル基又はフルオロオキシアルキレン基を構成する各繰り返し単位の繰り返し数(又は重合度)は、上記式(2)、(3)を満足する任意の数をとり得るものである。
上記式(1)で表されるフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物の調製方法としては、例えば、下記のような方法が挙げられる。 As a method for preparing the fluoropolyether group-containing polymer-modified organosilicon compound represented by the above formula (1), for example, the following methods may be mentioned.
まず、分子鎖末端に酸フロライド基、酸ハライド基、酸無水物基、エステル基、カルボン酸基、アミド基などの反応性基を有するフルオロポリエーテル基含有ポリマーと、求核剤と、溶剤として例えば1,3−ビス(トリフルオロメチル)ベンゼン、テトラヒドロフランを混合して、0〜80℃、好ましくは50〜70℃、より好ましくは約60℃で、1〜6時間、好ましくは3〜5時間、より好ましくは約4時間熟成する。 First, a fluoropolyether group-containing polymer having a reactive group such as an acid fluoride group, an acid halide group, an acid anhydride group, an ester group, a carboxylic acid group or an amide group at the molecular chain terminal, a nucleophile, and a solvent For example, by mixing 1,3-bis (trifluoromethyl) benzene and tetrahydrofuran, 0 to 80 ° C., preferably 50 to 70 ° C., more preferably about 60 ° C., 1 to 6 hours, preferably 3 to 5 hours More preferably, it is aged for about 4 hours.
ここで、分子鎖末端に反応性基を有するフルオロポリエーテル基含有ポリマーとして、具体的には、下記に示すものが挙げられる。
また、求核剤としては、アリルマグネシウムハライド、3−ブテニルマグネシウムハライド、4−ペンテニルマグネシウムハライド、5−ヘキセニルマグネシウムハライドなどを用いることができる。また、対応するリチウム試薬を用いることも可能である。
求核剤の使用量は、上記分子鎖末端に反応性基を有するフルオロポリエーテル基含有ポリマーの反応性基1当量に対して、2〜5当量、より好ましくは2.5〜3.5当量、更に好ましくは約3当量用いることができる。In addition, as a nucleophile, allyl magnesium halide, 3-butenyl magnesium halide, 4-pentenyl magnesium halide, 5-hexenyl magnesium halide and the like can be used. It is also possible to use corresponding lithium reagents.
The amount of the nucleophile used is 2 to 5 equivalents, more preferably 2.5 to 3.5 equivalents, per equivalent of the reactive groups of the fluoropolyether group-containing polymer having a reactive group at the molecular chain end. More preferably, about 3 equivalents can be used.
続いて、反応を停止し、分液操作により水層とフッ素溶剤層を分離する。得られたフッ素溶剤層を更に有機溶剤で洗浄し、溶剤を留去することで、下記式(a)で表される分子鎖末端に水酸基及びオレフィン部位を有するフルオロポリエーテル基含有ポリマーが得られる。
上記式(a)において、Uは2価の炭化水素基であり、具体的には、メチレン基、エチレン基、プロピレン基(トリメチレン基、メチルエチレン基)、ブチレン基(テトラメチレン基、メチルプロピレン基)、ヘキサメチレン基、オクタメチレン基等の炭素数1〜8のアルキレン基、フェニレン基等の炭素数6〜8のアリーレン基を含むアルキレン基(例えば、炭素数7〜8のアルキレン・アリーレン基等)などが挙げられる。Uとして、好ましくは炭素数1〜4の直鎖アルキレン基である。 In the above formula (a), U is a divalent hydrocarbon group, and specifically, a methylene group, an ethylene group, a propylene group (trimethylene group, methylethylene group), a butylene group (tetramethylene group, a methylpropylene group) ), Alkylene groups having 1 to 8 carbon atoms such as hexamethylene group and octamethylene group, and alkylene groups having 6 to 8 carbon atoms such as phenylene group (for example, alkylene arylene groups having 7 to 8 carbon atoms, etc.) And the like. As U, Preferably it is a C1-C4 linear alkylene group.
次に、必要により、上記で得られた式(a)で表される分子鎖末端に水酸基及びオレフィン部位を有するフルオロポリエーテル基含有ポリマーの水酸基の水素原子を他の基に置換する。 Next, if necessary, the hydrogen atom of the hydroxyl group of the fluoropolyether group-containing polymer having a hydroxyl group and an olefin moiety at the end of the molecular chain represented by the formula (a) obtained above is substituted with another group.
水酸基の水素原子を−SiR3で示されるシリル基に置換する方法としては、例えば、式(a)で表される分子鎖末端に水酸基及びオレフィン部位を有するフルオロポリエーテル基含有ポリマーとシリル化剤とを、アミン類やアルカリ金属系塩基などの塩基の存在下、必要によりフッ素系溶剤、有機溶剤などの溶剤を用い、0〜80℃、好ましくは40〜60℃、より好ましくは約50℃の温度で、1〜24時間、好ましくは2〜10時間、より好ましくは約3時間熟成する。
また、別法として、式(a)で表される分子鎖末端に水酸基及びオレフィン部位を有するフルオロポリエーテル基含有ポリマーとヒドロシランとを、白金族金属系触媒やホウ素触媒などの脱水素触媒の存在下、フッ素系溶剤、有機溶剤などの溶剤を用いて0〜60℃、好ましくは15〜35℃、より好ましくは約25℃の温度で、10分〜24時間、好ましくは30分〜2時間、より好ましくは約1時間脱水素反応を行う。As a method of substituting a hydrogen atom of a hydroxyl group with a silyl group represented by -SiR 3 , for example, a fluoropolyether group-containing polymer having a hydroxyl group and an olefin moiety at the molecular chain end represented by formula (a) and a silylating agent And a solvent such as a fluorine-based solvent or an organic solvent, if necessary, in the presence of a base such as amines or an alkali metal base, at 0 to 80 ° C., preferably 40 to 60 ° C., more preferably about 50 ° C. Aging is carried out at temperature for 1 to 24 hours, preferably for 2 to 10 hours, more preferably for about 3 hours.
As another method, the presence of a fluoropolyether group-containing polymer having a hydroxyl group and an olefin moiety at the molecular chain end represented by formula (a) and a hydrosilane, and a dehydrogenation catalyst such as a platinum group metal catalyst or a boron catalyst Using a solvent such as a fluorinated solvent or an organic solvent, at a temperature of 0 to 60 ° C., preferably 15 to 35 ° C., more preferably about 25 ° C., for 10 minutes to 24 hours, preferably 30 minutes to 2 hours More preferably, the dehydrogenation reaction is carried out for about 1 hour.
ここで、シリル化剤としては、例えば、シリルハライドやシリルトリフラートなどを用いることができ、具体的には、トリメチルシリルクロリド、トリエチルシリルクロリド、tert−ブチルジメチルクロリド、トリイソプロピルシリルクロリド、トリフェニルシリルクロリド、トリメチルシリルブロミド、トリメチルシリルトリフラート、トリエチルシリルトリフラート、tert−ブチルジメチルトリフラート、トリイソプロピルシリルトリフラートなどが挙げられ、また、塩基を使用しない場合、ヘキサメチルジシラザン、トリメチルシリルジメチルアミン、トリメチルシリルジエチルアミン、トリメチルシリルイミダゾールを用いてもよく、この使用量は、式(a)で表される分子鎖末端に水酸基及びオレフィン部位を有するフルオロポリエーテル基含有ポリマーの水酸基1当量に対して、1〜10当量、より好ましくは1〜4当量、更に好ましくは約2当量用いることができる。
また、ヒドロシランとしては、トリメチルシラン、トリエチルシラン、tert−ブチルジメチルシラン、トリイソプロピルシラン、トリフェニルシランなどが挙げられ、この使用量は、式(a)で表される分子鎖末端に水酸基及びオレフィン部位を有するフルオロポリエーテル基含有ポリマーの水酸基1当量に対して、1〜5当量、より好ましくは1.5〜3当量、更に好ましくは約2当量用いることができる。Here, as the silylating agent, for example, silyl halide or silyl triflate can be used. Specifically, trimethylsilyl chloride, triethylsilyl chloride, tert-butyldimethyl chloride, triisopropylsilyl chloride, triphenylsilyl chloride And trimethylsilyl bromide, trimethylsilyl triflate, triethylsilyl triflate, tert-butyldimethyl triflate, triisopropylsilyl triflate, etc., and when no base is used, hexamethyldisilazane, trimethylsilyldimethylamine, trimethylsilyldiethylamine, trimethylsilylimidazole are used. The amount used may be a molecule having a hydroxyl group and an olefin moiety at the end of the molecular chain represented by formula (a) On 1 equivalent of hydroxyl group of the Roporieteru group-containing polymer, 1 to 10 equivalents, more preferably 1-4 equivalents, it can be used more preferably about 2 equivalents.
Moreover, as the hydrosilane, trimethylsilane, triethylsilane, tert-butyldimethylsilane, triisopropylsilane, triphenylsilane and the like can be mentioned, and the amount thereof used is a hydroxyl group and an olefin at the molecular chain terminal represented by the formula (a) It is possible to use 1 to 5 equivalents, more preferably 1.5 to 3 equivalents, still more preferably about 2 equivalents, to 1 equivalent of the hydroxyl group of the fluoropolyether group-containing polymer having a moiety.
続いて、反応を停止し、分液操作により水層とフッ素溶剤層を分離する。得られたフッ素溶剤層を更に有機溶剤で洗浄し、溶剤を留去することで、下記式(b)で表される分子鎖末端にシリル基及びオレフィン部位を有するフルオロオキシアルキル基含有ポリマーが得られる。
また、水酸基の水素原子を−W−Q’−Xで示される基に置換する方法としては、例えば、式(a)で表される分子鎖末端に水酸基及びオレフィン部位を有するフルオロポリエーテル基含有ポリマーとSiH基を有する有機ケイ素化合物とを、ホウ素触媒などの脱水素触媒の存在下、フッ素系溶剤、有機溶剤などの溶剤を用いて0〜60℃、好ましくは15〜35℃、より好ましくは約25℃の温度で、10分〜24時間、好ましくは30分〜2時間、より好ましくは約1時間脱水素反応を行う。 Moreover, as a method of substituting a hydrogen atom of a hydroxyl group with a group represented by -W-Q'-X, for example, a fluoropolyether group containing a hydroxyl group and an olefin moiety at the molecular chain end represented by the formula (a) 0 to 60 ° C., preferably 15 to 35 ° C., more preferably a polymer and an organosilicon compound having an SiH group, in the presence of a dehydrogenation catalyst such as a boron catalyst, using a solvent such as a fluorinated solvent or an organic solvent The dehydrogenation reaction is carried out at a temperature of about 25 ° C. for 10 minutes to 24 hours, preferably 30 minutes to 2 hours, more preferably about 1 hour.
ここで、SiH基を有する有機ケイ素化合物としては、例えば下記に示すものが例示できる。
この使用量は、式(a)で表される分子鎖末端に水酸基及びオレフィン部位を有するフルオロポリエーテル基含有ポリマーの水酸基1当量に対して、1〜10当量、より好ましくは1.2〜5当量用いることができる。 The amount used is 1 to 10 equivalents, more preferably 1.2 to 5 per equivalent of the hydroxyl group of the fluoropolyether group-containing polymer having a hydroxyl group and an olefin moiety at the molecular chain end represented by the formula (a) An equivalent amount can be used.
続いて、反応を停止し、分液操作により水層とフッ素溶剤層を分離する。得られたフッ素溶剤層を更に有機溶剤で洗浄し、溶剤を留去することで、下記式(c)で表される、分子鎖末端にオレフィン部位を有し、水酸基の部分が有機ケイ素化合物基に置換されたフルオロオキシアルキル基含有ポリマーが得られる。
更に、水酸基の水素原子を−W−Q’−Xで示される基に置換する方法の別法として、まず、水酸基の水素原子を末端不飽和基に置換し、その後、該末端不飽和基(オレフィン部位)を他のオレフィン部位と共にSiH基を有する有機ケイ素化合物と反応させる方法が挙げられる。
水酸基の水素原子を末端不飽和基に置換する方法としては、例えば、式(a)で表される分子鎖末端に水酸基及びオレフィン部位を有するフルオロポリエーテル基含有ポリマーとオレフィン導入剤とを、アミン類やアルカリ金属系塩基などの塩基の存在下、必要によりテトラブチルアンモニウムハライド、アルカリ金属系ハライドなどの反応性を向上させる添加剤や、フッ素系溶剤、有機溶剤などの溶剤を用い、0〜90℃、好ましくは60〜80℃、より好ましくは約70℃の温度で、1〜25時間、好ましくは3〜10時間、より好ましくは約6時間熟成する。Furthermore, as an alternative method of substituting a hydrogen atom of a hydroxyl group with a group represented by -W-Q'-X, first, a hydrogen atom of a hydroxyl group is substituted with a terminal unsaturated group, and then the terminal unsaturated group ( There may be mentioned a method of reacting an olefin site) with an organosilicon compound having an SiH group together with other olefin sites.
As a method of substituting the terminal unsaturated group with a hydrogen atom of a hydroxyl group, for example, a fluoropolyether group-containing polymer having a hydroxyl group and an olefin moiety at the molecular chain end represented by the formula (a) Additives such as tetrabutyl ammonium halide, alkali metal halide etc. in the presence of a base such as an alkali metal base or the like, or an additive such as a fluorine solvent or an organic solvent to improve the reactivity, such as tetrabutyl ammonium halide or alkali metal halide; C., preferably 60 to 80.degree. C., more preferably about 70.degree. C., for 1 to 25 hours, preferably 3 to 10 hours, more preferably about 6 hours.
ここで、オレフィン導入剤としては、例えば、アリルハライドなどを用いることができ、具体的には、アリルクロリド、アリルブロミド、アリルヨージド、4−クロロ−1−ブテン、4−ブロモ−1−ブテン、4−ヨード−1−ブテン、5−クロロ−1−ペンテン、5−ブロモ−1−ペンテン、5−ヨード−1−ペンテンなどが挙げられ、この使用量は、式(a)で表される分子鎖末端に水酸基及びオレフィン部位を有するフルオロポリエーテル基含有ポリマーの水酸基1当量に対して、1〜10当量、より好ましくは2.5〜6当量、更に好ましくは約5当量用いることができる。 Here, as the olefin introducing agent, for example, allyl halide and the like can be used. Specifically, allyl chloride, allyl bromide, allyl iodide, 4-chloro-1-butene, 4-bromo-1-butene, 4 -Iodo-1-butene, 5-chloro-1-pentene, 5-bromo-1-pentene, 5-iodo-1-pentene and the like, and the amount thereof used is a molecular chain represented by formula (a) It can be used in an amount of 1 to 10 equivalents, more preferably 2.5 to 6 equivalents, still more preferably about 5 equivalents based on 1 equivalent of the hydroxyl group of the fluoropolyether group-containing polymer having a hydroxyl group and an olefin moiety at the end.
続いて、反応を停止し、分液操作により水層とフッ素溶剤層を分離する。得られたフッ素溶剤層を更に有機溶剤で洗浄し、溶剤を留去することで、下記式(d)で表される分子鎖末端にオレフィン部位を有するフルオロオキシアルキル基含有ポリマーが得られる。
上記式(d)において、Vは単結合、又は2価の炭化水素基であり、2価の炭化水素基として、具体的には、メチレン基、エチレン基、プロピレン基(トリメチレン基、メチルエチレン基)、ブチレン基(テトラメチレン基、メチルプロピレン基)、ヘキサメチレン基、オクタメチレン基等の炭素数1〜8のアルキレン基、フェニレン基等の炭素数6〜8のアリーレン基を含むアルキレン基(例えば、炭素数7〜8のアルキレン・アリーレン基等)などが挙げられる。Vとして、好ましくはメチレン基である。 In the above formula (d), V is a single bond or a divalent hydrocarbon group, and as the divalent hydrocarbon group, specifically, a methylene group, an ethylene group, a propylene group (trimethylene group, a methyl ethylene group An alkylene group containing an alkylene group having 1 to 8 carbon atoms such as butylene group (tetramethylene group, methylpropylene group), hexamethylene group, octamethylene group, etc., or an arylene group having 6 to 8 carbon atoms such as phenylene group (eg And an alkylene arylene group having 7 to 8 carbon atoms and the like. Preferably it is a methylene group as V.
次いで、上記で得られた式(a)〜(d)で表される分子鎖末端にオレフィン部位を有するフルオロポリエーテル基含有ポリマーのいずれかと、分子中にSiH基を有する有機ケイ素化合物とをヒドロシリル化反応触媒、例えば塩化白金酸/ビニルシロキサン錯体のトルエン溶液存在下、40〜120℃、好ましくは60〜100℃、より好ましくは約80℃の温度で、1〜72時間、好ましくは20〜36時間、より好ましくは約24時間熟成させる。 Then, any of the fluoropolyether group-containing polymers having an olefin moiety at the molecular chain end represented by the formulas (a) to (d) obtained above and an organosilicon compound having an SiH group in the molecule are hydrosilylated. Reaction catalyst, for example, in the presence of a solution of chloroplatinic acid / vinylsiloxane complex in toluene, at a temperature of 40 to 120 ° C., preferably 60 to 100 ° C., more preferably about 80 ° C., for 1 to 72 hours, preferably 20 to 36 Aging, preferably for about 24 hours.
ここで、分子中にSiH基を有する有機ケイ素化合物としては、下記式で表される化合物が好ましい。
このような分子中にSiH基を有する有機ケイ素化合物としては、例えば、下記に示すものなどが挙げられる。
分子中にSiH基を有する有機ケイ素化合物の使用量は、上記式(a)〜(d)で表される分子鎖末端にオレフィン部位を有するフルオロポリエーテル基含有ポリマーの末端不飽和基1当量に対して、5〜20当量、より好ましくは7.5〜12.5当量、更に好ましくは約10当量用いることができる。 The amount of the organosilicon compound having a SiH group in the molecule is 1 equivalent of the terminal unsaturated group of the fluoropolyether group-containing polymer having an olefin moiety at the molecular chain end represented by the above formulas (a) to (d) On the other hand, 5 to 20 equivalents, more preferably 7.5 to 12.5 equivalents, more preferably about 10 equivalents can be used.
その後、溶剤及び未反応物を減圧留去することで、上記式(1)で表されるフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物を得ることができる。なお、上述した反応は、単独で行うことも、連続的に行うことも可能である。 Thereafter, the solvent and the unreacted material are distilled off under reduced pressure, whereby the fluoropolyether group-containing polymer-modified organosilicon compound represented by the above formula (1) can be obtained. In addition, it is also possible to perform the reaction mentioned above independently or continuously.
本発明の表面処理剤は、上記式(1)で表されるフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物を含有する。 The surface treatment agent of the present invention contains the fluoropolyether group-containing polymer-modified organosilicon compound represented by the above formula (1).
本発明の表面処理剤には、更に下記一般式(4)
で表されるフルオロポリエーテル基含有ポリマー(以下、無官能性ポリマーと称す)を含有してもよい。The surface treatment agent of the present invention further comprises the following general formula (4)
And a fluoropolyether group-containing polymer (hereinafter referred to as a nonfunctional polymer) represented by
上記式(4)において、Aはフッ素原子又は末端が−CF3基である1価のフッ素含有基であり、好ましくはフッ素原子、炭素数1〜6の直鎖状パーフルオロアルキル基であり、中でも−F基、−CF3基、−CF2CF3基、−CF2CF2CF3基が好ましい。
また、Rf’は2価のフルオロオキシアルキレン基含有ポリマー残基であり、Rf’としては下記に示すものが好ましい。
Further, Rf 'is a divalent fluorooxyalkylene group-containing polymer residue, and as Rf', those shown below are preferable.
式(4)で表される無官能性ポリマーとしては、下記のものが挙げられる。
式(4)で表される無官能性ポリマーを配合する場合の使用量は特に限定されないが、式(1)で表されるフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物の質量に対して0.1〜60質量%、特に10〜40質量%の範囲が好ましく、多すぎると、密着性の問題が生じる場合がある。 The amount used in the case of blending the nonfunctional polymer represented by the formula (4) is not particularly limited, but it is preferably 0. 1 with respect to the mass of the fluoropolyether group-containing polymer modified organosilicon compound represented by the formula (1). A range of 1 to 60% by mass, particularly 10 to 40% by mass is preferable, and when the amount is too large, an adhesion problem may occur.
該表面処理剤は、適当な溶剤を含んでよい。このような溶剤としては、フッ素変性脂肪族炭化水素系溶剤(パーフルオロヘプタン、パーフルオロオクタンなど)、フッ素変性芳香族炭化水素系溶剤(m−キシレンヘキサフルオライド(1,3−ビス(トリフルオロメチル)ベンゼン)、ベンゾトリフルオライドなど)、フッ素変性エーテル系溶剤(メチルパーフルオロブチルエーテル、エチルパーフルオロブチルエーテル、パーフルオロ(2−ブチルテトラヒドロフラン)など)、フッ素変性アルキルアミン系溶剤(パーフルオロトリブチルアミン、パーフルオロトリペンチルアミンなど)、炭化水素系溶剤(石油ベンジン、ミネラルスピリッツ、トルエン、キシレンなど)、ケトン系溶剤(アセトン、メチルエチルケトン、メチルイソブチルケトンなど)を例示することができる。これらの中では、溶解性、濡れ性などの点で、フッ素変性された溶剤が望ましく、特には、m−キシレンヘキサフルオライド、パーフルオロ(2−ブチルテトラヒドロフラン)、パーフルオロトリブチルアミン、エチルパーフルオロブチルエーテルが好ましい。
上記溶剤はその2種以上を混合してもよいが、フルオロポリエーテル基含有ポリマー変性有機ケイ素化合物を均一に溶解させることが好ましい。なお、溶剤に溶解させるフルオロオキシアルキレン基含有ポリマー変性有機ケイ素化合物の最適濃度は、処理方法により異なるが、表面処理剤中0.01〜40質量%、特に0.05〜25質量%であることが好ましい。
The surface treatment agent may contain a suitable solvent. As such solvents, fluorine-modified aliphatic hydrocarbon solvents (perfluoroheptane, perfluorooctane and the like), fluorine-modified aromatic hydrocarbon solvents (m-xylene hexafluoride (1,3-bis (trifluoro) Methyl) benzene), benzo trifluoride etc), fluorine modified ether solvents (methyl perfluoro butyl ether, ethyl perfluoro butyl ether, perfluoro (2-butyl tetrahydrofuran) etc), fluorine modified alkyl amine solvents (perfluoro tributyl amine, Perfluorotripentylamine etc., hydrocarbon solvents (petroleum benzine, mineral spirits, toluene, xylene etc.), ketone solvents (acetone, methyl ethyl ketone, methyl isobutyl ketone etc.) can be exemplified. Among these, fluorine-modified solvents are preferable in terms of solubility, wettability and the like, and in particular, m-xylene hexafluoride, perfluoro (2-butyltetrahydrofuran), perfluorotributylamine, ethyl perfluoro Butyl ether is preferred.
Although the said solvent may mix the 2 or more types, it is preferable to dissolve a fluoropolyether group containing polymer modified organosilicon compound uniformly. The optimum concentration of the fluorooxyalkylene group-containing polymer- modified organosilicon compound to be dissolved in the solvent varies depending on the treatment method, but it is 0.01 to 40% by mass, particularly 0.05 to 25% by mass in the surface treatment agent. Is preferred.
本発明の表面処理剤は、樹脂フィルムやメガネレンズのような樹脂製品に表面処理する。ここで、樹脂製品としては、熱可塑性樹脂からなるものが好ましく、具体的には、ハードコート処理された熱可塑性樹脂フィルム(ハードコートフィルム)、鉛筆硬度4H以上でありハードコートを施されていない熱可塑性樹脂フィルム(高硬度樹脂フィルム)又は反射防止層を備えた熱可塑性樹脂フィルム(反射防止フィルム)などが好ましく用いられる。
また、本発明においては、上記樹脂製品を予めSiO2処理したものを用いることが好ましい。ここで、SiO2処理は、スパッタ法によりSiO2処理されたものが、上記樹脂製品と処理剤との密着性を向上させるという点から好ましい。The surface treatment agent of the present invention is subjected to surface treatment to a resin product such as a resin film or an eyeglass lens. Here, as the resin product, one made of a thermoplastic resin is preferable, and specifically, a hard coat-treated thermoplastic resin film (hard coat film), which has a pencil hardness of 4 H or more and is not provided with a hard coat A thermoplastic resin film (high hardness resin film) or a thermoplastic resin film (antireflection film) provided with an antireflection layer is preferably used.
Further, in the present invention, it is preferable to use one obtained by treating the above-mentioned resin product with SiO 2 in advance. Here, the SiO 2 treatment is preferable from the viewpoint of improving the adhesion between the resin product and the treating agent, which has been SiO 2 treated by the sputtering method.
本発明の表面処理剤は、刷毛塗り、ディッピング、スプレー、蒸着処理など公知の方法で基材上に施与することができる。蒸着処理時の加熱方法は、抵抗加熱方式でも、電子ビーム加熱方式のどちらでもよく、特に限定されるものではない。また、後処理条件は、後処理方法によって異なるが、例えば、蒸着処理やスプレー塗工で施与した場合は、基材としてSiO2処理された樹脂フィルムを使用した場合、室温(25℃)から200℃の範囲で5分〜24時間、特に10分〜12時間とすることができ、加湿下で後処理してもよい。特に本発明においては、室温であっても10分〜24時間、特に30分〜12時間で十分である。また、被膜の膜厚は、基材の種類により適宜選定されるが、通常0.1〜100nm、特に1〜25nmである。The surface treatment agent of the present invention can be applied onto a substrate by known methods such as brushing, dipping, spraying, vapor deposition and the like. The heating method at the time of vapor deposition may be either resistance heating or electron beam heating, and is not particularly limited. The post-treatment conditions vary depending on the post-treatment method. For example, when applied by vapor deposition or spray coating, when a resin film treated with SiO 2 is used as a substrate, from room temperature (25 ° C.) The temperature may be in the range of 200 ° C. for 5 minutes to 24 hours, in particular 10 minutes to 12 hours, and may be post-treated under humidification. In the present invention, in particular, 10 minutes to 24 hours, in particular 30 minutes to 12 hours, is sufficient even at room temperature. Further, the film thickness of the film is appropriately selected depending on the type of the substrate, but is usually 0.1 to 100 nm, particularly 1 to 25 nm.
本発明の上記表面処理剤で処理される樹脂製品としては、カーナビゲーション、携帯電話、デジタルカメラ、デジタルビデオカメラ、PDA、ポータブルオーディオプレーヤー、カーオーディオ、ゲーム機器、メガネレンズ、カメラレンズ、レンズフィルター、サングラス、胃カメラ等の医療用器機、複写機、PC、液晶ディスプレイ、有機ELディスプレイ、プラズマディスプレイ、タッチパネルディスプレイ、保護フィルム、ハードコートフィルム、高硬度樹脂、反射防止フィルム、ウェアラブル端末などの製品の部品や一部として使用される、光学物品、タッチパネル、反射防止フィルム、石英基板などが好ましい。 The resin products to be treated with the surface treatment agent of the present invention include car navigations, mobile phones, digital cameras, digital video cameras, PDAs, portable audio players, car audios, game machines, game lenses, eyeglass lenses, camera lenses, lens filters, Parts of products such as sunglasses, medical instruments such as stomach cameras, copiers, PCs, liquid crystal displays, organic EL displays, plasma displays, touch panels, protective films, hard coat films, high hardness resins, antireflective films, wearable terminals, etc. An optical article, a touch panel, an antireflective film, a quartz substrate, etc. which are used as a part or part are preferable.
本発明の樹脂製品に表面処理する表面処理剤は、前記物品に室温などの温和な条件下、短時間であっても被膜を形成することができ、該被膜は優れた撥水撥油性や耐久性を示すため、特にメガネレンズ、タッチパネルディスプレイ、ハードコートフィルム、高硬度樹脂、反射防止フィルム、ウェアラブル端末などの撥水撥油層として有用である。ここで、高硬度樹脂とは、例えば、ガラス代替フィルムとしてPRされている、新日鐵化学社製 商品名シルプラスや、グンゼ社製 商品名HDフィルム等の鉛筆硬度4H以上の樹脂を成形した製品を指し、特には該樹脂を成形した樹脂フィルムを指すが、特に上記の製品に制限されるものではない。 The surface treatment agent for surface-treating the resin product of the present invention can form a film on the article even in a short time under mild conditions such as room temperature, and the film is excellent in water and oil repellency and durability. In particular, it is useful as a water and oil repellent layer for glasses lenses, touch panel displays, hard coat films, high hardness resins, antireflective films, wearable terminals and the like. Here, a high hardness resin is, for example, a product that is molded as a glass substitute film and molded with a resin having a pencil hardness of 4H or more, such as Silplus manufactured by Nippon Steel Chemical Co., Ltd., and a trade name HD film manufactured by Gunze Co. In particular, it refers to a resin film formed by molding the resin, but is not particularly limited to the above-mentioned products.
以下、合成例、実施例及び比較例を示し、本発明をより詳細に説明するが、本発明は下記実施例によって限定されるものではない。
実施例及び比較例は、下記合成例により得られる化合物を使用した。Hereinafter, the present invention will be described in more detail by way of synthesis examples, examples and comparative examples, but the present invention is not limited by the following examples.
The examples and comparative examples used the compounds obtained by the following synthesis examples.
[合成例1]化合物1の合成
反応容器に、テトラヒドロフラン150g、1,3−ビス(トリフルオロメチル)ベンゼン300gを混合し、0.7Mのアリルマグネシウムブロミド160mlを滴下した。続いて、下記式(A)
反応容器に、下記式(B)
δ0−0.2(−Si(CH 3)2)24H
δ0.4−0.6(−CH2CH2CH 2−Si)4H
δ1.3−1.6(−CH2CH 2CH2−Si)4H
δ1.6−1.9(−CH 2CH 2 CH2−Si)4H
δ3.6−4.2(−SiH)2H
δ6.6−7.1(−C6 H 4)8H
In the reaction vessel, the following formula (B)
δ 0-0.2 (-Si (C H 3 ) 2 ) 24 H
δ 0.4-0.6 (-CH 2 CH 2 C H 2 -Si) 4 H
δ 1.3-1.6 (-CH 2 C H 2 CH 2 -Si) 4 H
δ 1.6-1.9 (-C H 2 CH 2 CH 2 -Si) 4 H
δ 3.6-4.2 (-Si H ) 2 H
δ 6.6-7.1 (-C 6 H 4 ) 8 H
[合成例2]化合物2の合成
反応容器に、1,3−ビス(トリフルオロメチル)ベンゼン100g、DBU(ジアザビシクロウンデセン)8.2g(5.4×10-2mol)、下記式(B)
δ0−0.2(−OSi(CH 3)3)9H
δ2.4−2.6(−CH 2CH=CH2)4H
δ5.0−5.2(−CH2CH=CH 2)4H
δ5.7−5.9(−CH2CH=CH2)2H
Synthesis Example 2 Synthesis of Compound 2 In a reaction vessel, 100 g of 1,3-bis (trifluoromethyl) benzene, 8.2 g (5.4 × 10 −2 mol) of DBU (diazabicycloundecene), the following formula (B)
δ 0-0.2 (-OSi (C H 3 ) 3 ) 9 H
δ 2.4-2.6 (-C H 2 CH = CH 2 ) 4 H
δ 5.0-5.2 (-CH 2 CH = C H 2 ) 4 H
δ 5.7-5.9 (-CH 2 C H = CH 2 ) 2 H
反応容器に、下記式(D)
δ0−0.2(−OSi−CH 3、−OSi(CH 3)3)36H
δ0.5−0.8(−CH2CH2CH 2−Si)4H
δ1.3−2.2(−CH 2CH 2CH2−Si)8H
δ4.3−5.2(−SiH)6H
In the reaction vessel, the following formula (D)
δ 0-0.2 (-OSi-C H 3 , -OSi (C H 3 ) 3 ) 36 H
δ 0.5-0.8 (-CH 2 CH 2 C H 2 -Si) 4 H
δ 1.3-2.2 (-C H 2 C H 2 CH 2 -Si) 8 H
δ 4.3-5.2 (-Si H ) 6 H
[合成例3]化合物3の合成
反応容器に、下記式(B)
δ0−0.2(−OSi(CH 3)2)36H
δ0.3−0.6(−CH2CH2CH 2−Si)4H
δ1.3−1.8(−CH 2CH2CH2−Si,−CH2CH 2CH2−Si)8H
δ3.3−3.6(−SiH)2H
Synthesis Example 3 Synthesis of Compound 3 In a reaction vessel, the following formula (B)
δ 0-0.2 (-OSi (C H 3 ) 2 ) 36 H
δ 0.3-0.6 (-CH 2 CH 2 C H 2 -Si) 4 H
δ 1.3-1.8 (-C H 2 CH 2 CH 2 -Si, -CH 2 C H 2 CH 2 -Si) 8 H
δ 3.3-3.6 (-SiH) 2 H
[合成例4]化合物4の合成
反応容器に、下記式(B)
δ0−0.2(−OSi(CH 3)2)48H
δ0.3−0.6(−CH2CH2CH 2−Si)4H
δ1.3−1.8(−CH 2CH2CH2−Si,−CH2CH 2CH2−Si)8H
δ3.3−3.6(−SiH)2H
Synthesis Example 4 Synthesis of Compound 4 In a reaction vessel, the following formula (B)
δ 0-0.2 (-OSi (C H 3 ) 2 ) 48 H
δ 0.3-0.6 (-CH 2 CH 2 C H 2 -Si) 4 H
δ 1.3-1.8 (-C H 2 CH 2 CH 2 -Si, -CH 2 C H 2 CH 2 -Si) 8 H
δ 3.3-3.6 (-SiH) 2 H
[合成例5]化合物5の合成
反応容器に、下記式(B)
δ0−0.2(−OSi(CH 3)2)120H
δ0.3−0.8(−CH2CH2CH 2−Si)4H
δ1.3−1.8(−CH 2CH2CH2−Si,−CH2CH 2CH2−Si)8H
δ4.7−5.0(−SiH)2H
Synthesis Example 5 Synthesis of Compound 5 In a reaction vessel, the following formula (B)
δ 0-0.2 (-OSi (C H 3 ) 2 ) 120 H
δ 0.3-0.8 (-CH 2 CH 2 C H 2 -Si) 4 H
δ 1.3-1.8 (-C H 2 CH 2 CH 2 -Si, -CH 2 C H 2 CH 2 -Si) 8 H
δ 4.7-5.0 (-SiH) 2 H
[合成例6]化合物6の合成
反応容器に、下記式(B)
δ0−0.2(−Si−CH 3)30H
δ0.2−0.4(−CH2CH2CH 2−Si)4H
δ1.0−1.6(−CH 2CH2CH2−Si,−CH2CH 2CH2−Si)8H
Synthesis Example 6 Synthesis of Compound 6 In a reaction vessel, the following formula (B)
δ 0-0.2 (-Si-C H 3 ) 30 H
δ 0.2-0.4 (-CH 2 CH 2 C H 2 -Si) 4 H
δ1.0-1.6 (-C H 2 CH 2 CH 2 -Si, -CH 2 C H 2 CH 2 -Si) 8H
[合成例7]化合物7の合成
反応容器に、下記式(B)
δ0−0.2(−Si−CH 3)60H
δ0.3−0.6(−CH2CH2CH 2−Si)8H
δ0.6−0.8(−CH2CH2CH2−CH 3)6H
δ1.1−1.3(−CH2CH 2CH 2−CH 3)8H
δ1.4−1.8(−CH 2CH 2CH2−Si)8H
Synthesis Example 7 Synthesis of Compound 7 In a reaction vessel, the following formula (B)
δ 0-0.2 (-Si-C H 3 ) 60 H
δ 0.3-0.6 (-CH 2 CH 2 C H 2 -Si) 8 H
δ0.6-0.8 (-CH 2 CH 2 CH 2 -C H 3) 6H
δ 1.1-1.3 (-CH 2 C H 2 C H 2 -C H 3 ) 8 H
δ 1.4-1.8 (-C H 2 C H 2 CH 2 -Si) 8 H
[合成例8]化合物8の合成
反応容器に、下記式(B)
δ0−0.4(−OSi(CH 3)2,−Si−CH 2−Si)28H
δ0.4−0.8(−CH2CH2CH 2−Si)4H
δ1.2−2.0(−CH 2CH 2CH2−Si)8H
δ3.8−4.2(−SiH)2H
Synthesis Example 8 Synthesis of Compound 8 In a reaction vessel, the following formula (B)
δ 0-0.4 (-OSi (C 3 H 3 ) 2 , -Si-C 2 H 2 -Si) 28 H
δ 0.4-0.8 (-CH 2 CH 2 C H 2 -Si) 4 H
δ 1.2-2.0 (-C H 2 C H 2 CH 2 -Si) 8 H
δ 3.8-4.2 (-SiH) 2 H
[合成例9]化合物9の合成
反応容器に、下記式(M)
得られた化合物9は、1H−NMRにより下記式(N)で示される構造であることが確認された。
δ0−0.4(−OSi(CH 3)2)72H
δ0.4−0.8(−CH2CH2CH 2−Si)8H
δ1.2−2.0(−CH 2CH 2CH2−Si)16H
δ3.8−4.2(−SiH)4HIt was confirmed by 1 H-NMR that the obtained compound 9 has a structure represented by the following formula (N).
δ 0-0.4 (-OSi (C H 3 ) 2 ) 72 H
δ 0.4-0.8 (-CH 2 CH 2 C H 2 -Si) 8 H
δ 1.2-2.0 (-C H 2 C H 2 CH 2 -Si) 16 H
δ 3.8-4.2 (-SiH) 4 H
[合成例10]化合物10(比較品)の合成
反応容器に、下記式(B)
得られた化合物10は、1H−NMRにより下記式(O)で示される構造であることが確認された。
δ0.2−2.2(−CH 2 CH 2 CH 2 −)12H
δ3.0−3.5(−Si(OCH 3 )3)18HIt was confirmed by 1 H-NMR that the obtained compound 10 has a structure represented by the following formula (O).
δ 0.2-2.2 (-C H 2 C H 2 C H 2- ) 12 H
δ 3.0-3.5 (-Si (OC H 3 ) 3 ) 18 H
更に、比較例には、以下の化合物を使用した。
[化合物11]
Furthermore, the following compounds were used in comparative examples.
[Compound 11]
[化合物12]
[実施例1〜9、比較例1〜3]
表面処理剤の調製及び被膜の形成
上記化合物1〜12を、濃度20質量%になるようにNovec 7200(3M社製、エチルパーフルオロブチルエーテル)に溶解させて表面処理剤を調製した。表面処理剤調製後、樹脂フィルム(タイゴールド社製)をプラズマ処理(Ar:10cc、O2:80cc、出力:250W、時間:30秒)で洗浄し、その上に上記表面処理剤10mgを真空蒸着し(処理条件は、圧力:2.0×10-2Pa、加熱温度:700℃)、25℃、湿度50%RHの雰囲気下で24時間後に膜厚15nmの被膜を形成した。なお、樹脂フィルムはポリエチレンテレフタレート製で、フィルム表面にアクリルハードコート処理を施した後、最表面にSiO2を100nmの厚さでスパッタ処理したものを用いた。
化合物1〜9を用いて形成された被膜を実施例1〜9、化合物10〜12を用いて形成された被膜を比較例1〜3とした。[Examples 1 to 9, Comparative Examples 1 to 3]
Preparation of surface treatment agent and formation of film The above compounds 1 to 12 were dissolved in Novec 7200 (manufactured by 3M, ethyl perfluorobutyl ether) to a concentration of 20% by mass to prepare a surface treatment agent. After preparation of the surface treatment agent, the resin film (made by Taigold Corporation) is washed with plasma treatment (Ar: 10 cc, O 2 : 80 cc, power: 250 W, time: 30 seconds), and 10 mg of the above surface treatment agent is vacuumed thereon. The film was deposited (processing conditions: pressure: 2.0 × 10 −2 Pa, heating temperature: 700 ° C.), and a film having a film thickness of 15 nm was formed after 24 hours in an atmosphere of 25 ° C. and humidity 50% RH. The resin film was made of polyethylene terephthalate, and after the film surface was subjected to an acrylic hard coat treatment, the outermost surface was sputtered with SiO 2 to a thickness of 100 nm.
The films formed using Compounds 1 to 9 are referred to as Examples 1 to 9 and the films formed using Compounds 10 to 12 are referred to as Comparative Examples 1 to 3.
実施例1〜9及び比較例1〜3の被膜を下記の方法により評価した。いずれの試験も、25℃、湿度50%RHで実施した。 The coatings of Examples 1 to 9 and Comparative Examples 1 to 3 were evaluated by the following methods. All tests were performed at 25 ° C. and 50% RH.
[耐摩耗性の評価]
得られた被膜において、布(ベンコット)に対する耐摩耗性を、トライボギアTYPE:30S(新東科学社製)を用いて測定した。
下記の条件により、水接触角が100°未満になった時点で試験終了とした。水接触角100°以上を保つ摩耗回数により耐摩耗性の評価とした。
接触面積:10mm×30mm
荷重:1.5kg
耐布摩耗性
布:BEMCOT M−3II(旭化成社製)
移動距離(片道)20mm
移動速度1,800mm/分
荷重:0.5kg/cm2
また、水接触角は、接触角計DropMaster(協和界面科学社製)を用いて、被膜の水(液滴:2μl)に対する接触角を測定した。なお、水接触角は、2μlの液滴をサンプル表面に着滴させた後、1秒後に測定した。[Evaluation of wear resistance]
In the obtained film, the abrasion resistance to a cloth (Bencott) was measured using Tribogear TYPE: 30S (manufactured by Shinto Scientific Co., Ltd.).
The test was terminated when the water contact angle became less than 100 ° under the following conditions. The abrasion resistance was evaluated by the number of abrasions maintaining a water contact angle of 100 ° or more.
Contact area: 10 mm x 30 mm
Load: 1.5 kg
Cloth abrasion resistance Cloth: BEMCOT M-3 II (manufactured by Asahi Kasei Corp.)
Travel distance (one way) 20 mm
Movement speed 1,800 mm / min Load: 0.5 kg / cm 2
Moreover, the water contact angle measured the contact angle with respect to the water (droplet: 2 microliters) of a film using contact angle meter DropMaster (made by Kyowa Interface Science). The water contact angle was measured one second after 2 μl droplets were deposited on the sample surface.
上記表1によれば、比較例1、2及び3では、表面処理剤を基材表面に蒸着塗工し、後処理後に耐摩耗試験を行うと、耐摩耗回数は0回であり、摩耗耐久性は示さなかった。これに対し、実施例1〜9では、表面処理剤を基材表面に蒸着塗工し、後処理後に耐摩耗試験を行うと、優れた耐摩耗性を発現した。実施例1〜9は、シロキサン結合、シルフェニレン構造、あるいはシルアルキレン構造を分子鎖末端(分子の連結基部分)に有するため、特にこれら連結基部分のSiCH3部分が基材表面のSiO2層のSiO2由来のOH基部分と分子間力によって相互作用して、表面処理剤中のポリマーが配向しやすくなることから、末端基に加水分解性基を有さなくても、比較例の表面処理剤と比べ、基材への密着性が向上しているものと思われる。According to Table 1 above, in Comparative Examples 1, 2 and 3, when the surface treatment agent is vapor deposited and coated on the surface of the substrate and the wear resistance test is performed after the post-treatment, the number of wear resistances is zero, and the wear resistance is Sex was not shown. On the other hand, in Examples 1 to 9, when the surface treatment agent was vapor-deposited and coated on the surface of the base material and the abrasion resistance test was performed after the post-treatment, excellent abrasion resistance was developed. Since Examples 1 to 9 have a siloxane bond, a silphenylene structure, or a silalkylene structure at the molecular chain end (linking group portion of the molecule), particularly the SiCH 3 portion of these linking group portions is the SiO 2 layer on the substrate surface Since the polymer in the surface treatment agent is easily oriented due to the interaction with the SiO 2 -derived OH group portion of the surface treatment agent by the intermolecular force, the surface of the comparative example has no hydrolyzable group at the terminal group. It is considered that the adhesion to the substrate is improved as compared with the treatment agent.
本発明のフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物を含む表面処理剤により防汚性の表面層を形成した樹脂は、優れた摩耗耐久性を示すことができる。本発明の表面処理剤により防汚性の表面層を形成した樹脂は、特に、メガネレンズ、サングラス、タッチパネルディスプレイ、反射防止フィルム等の表面の防汚処理が必要な用途に好適に使用できる。 The resin in which the antifouling surface layer is formed by the surface treatment agent containing the fluoropolyether group-containing polymer modified organosilicon compound of the present invention can exhibit excellent wear durability. The resin in which the antifouling surface layer is formed by the surface treatment agent of the present invention can be suitably used particularly for applications requiring antifouling treatment of surfaces such as spectacle lenses, sunglasses, touch panel displays, and antireflection films.
本発明のフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物を含有する表面処理剤により表面処理された物品は、優れた摩耗耐久性を示す。本発明の表面処理剤により表面処理された樹脂製品は、特に、タッチパネルディスプレイ、反射防止フィルム、メガネレンズなど油脂の付着が想定される樹脂製品として有効である。 An article surface-treated with a surface treatment agent containing the fluoropolyether group-containing polymer modified organosilicon compound of the present invention exhibits excellent abrasion durability. The resin product surface-treated with the surface treatment agent of the present invention is particularly effective as a resin product such as a touch panel display, an antireflective film, an eyeglass lens and the like in which adhesion of oil and fat is assumed.
Claims (9)
で示される基から選ばれる基であり、Xは上記と同じであり、Zは独立に水素原子、下記式
−SiR3
(式中、Rは独立に炭素数1〜4のアルキル基又はフェニル基である。)
で表される基、又は下記式
−W−Q’−X
(式中、Xは上記と同じであり、Wは単結合又は2価の炭化水素基であり、Q’はシロキサン結合、シルアルキレン構造及びシルアリーレン構造から選ばれる構造を有する2価の基である。)
で表される基であり、αは1又は2である。]
で表されるフルオロポリエーテル基含有ポリマー変性有機ケイ素化合物。 The following general formula (1)
And X is the same as above , Z is independently a hydrogen atom, and the following formula -SiR 3
(Wherein R is independently an alkyl group having 1 to 4 carbon atoms or a phenyl group)
Or a group represented by the following formula -W-Q'-X
(Wherein, X is the same as above, W is a single bond or a divalent hydrocarbon group, and Q ′ is a divalent group having a structure selected from a siloxane bond, a silalkylene structure and a silarylene structure) is there.)
Is a group represented by and α is 1 or 2. ]
The fluoropolyether group containing polymer modified organosilicon compound represented by these.
で表されるフルオロポリエーテル基含有ポリマーを含有することを特徴とする請求項7に記載の表面処理剤。 The surface treatment agent further comprises the following general formula (4)
The surface treating agent according to claim 7 , containing a fluoropolyether group-containing polymer represented by
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