JPWO2016143858A1 - Ni-based sputtering target material and magnetic recording medium - Google Patents

Abstract

An object of the present invention is to provide a Ni-based sputtering target material having a low magnetic permeability and a strong leakage magnetic flux and a high use efficiency in magnetron sputtering. In order to solve such a problem, Fex-Niy-Coz- A Ni-based sputtering target material comprising an M-based alloy, wherein the alloy is a total of one or more M1 elements selected from W, Mo, Ta, Cr, V and Nb as M elements. 2-20 at. %, Al, Ga, In, Si, Ge, Sn, Zr, Ti, Hf, B, Cu, P, C, and Ru contain a total of 0 to 10 at% of M2 element And the balance consists of Ni, one or two of Fe and Co, and inevitable impurities. When x + y + z = 100, x is 0 to 50, y is 20 to 98, and z is The alloy has a microstructure including a Feα-Niβ-Coγ phase, and when α + β + γ = 100, β is 20 to 35, and γ is 30 or less. The structure comprises M element dissolved in the Feα-Niβ-Coγ phase and / or M element formed as a compound with at least one element of Fe, Ni and Co. , Ni-based sputtering target material I will provide a.

Description

  The present invention relates to a Ni-based sputtering target material and a magnetic recording medium, in particular, a perpendicular magnetic recording medium having a low magnetic permeability, a strong leakage magnetic flux, and a high use efficiency in magnetron sputtering. And a magnetic recording medium.

  In recent years, the progress of perpendicular magnetic recording has been remarkable, and in order to increase the capacity of the drive, the recording density of the magnetic recording medium has been increased. A realizable perpendicular magnetic recording system has been put into practical use. Here, the perpendicular magnetic recording method is a method suitable for high recording density, in which the easy axis of magnetization is oriented perpendicularly to the medium surface in the magnetic film of the perpendicular magnetic recording medium. .

  In the perpendicular magnetic recording system, a recording medium having a magnetic recording film layer and a soft magnetic film layer with an increased recording density has been developed, and in such a medium structure, a space between the soft magnetic layer and the magnetic recording layer has been developed. In addition, a recording medium on which a seed layer and a base film layer are formed has been developed. In general, a NiW-based alloy is used for the seed layer for the perpendicular magnetic recording system.

  As the name suggests, one of the characteristics required for the seed layer is to control the orientation of the layer formed on the seed layer and to set the easy axis of the magnetic film for recording magnetic information with respect to the medium surface. Therefore, the seed layer itself has a single fcc structure and a plane parallel to the medium surface is oriented in the (111) plane. In recent years, as a technique for improving the magnetic recording characteristics of a hard disk drive, a method of imparting magnetism to a seed layer has been studied. Therefore, there is a demand for the development of a seed layer alloy having the characteristics required for a seed layer alloy as described above and having magnetism. As an alloy for a seed layer having magnetism, a Ni—Fe—Co—M alloy has been proposed as disclosed in, for example, JP 2012-128933 A (Patent Document 1). As a major difference between the soft magnetic layer and the seed layer, the soft magnetic layer is required to be amorphous to reduce noise, but the seed layer has an effect of controlling the orientation of the layer formed on the seed layer. It is required and has high crystallinity as opposed to amorphous which is amorphous.

  Magnetron sputtering is generally used for the formation of the seed layer described above. This magnetron sputtering method is a sputtering method that enables high-speed film formation by placing a magnet behind the target material, leaking magnetic flux to the surface of the target material, and converging the plasma in the leakage magnetic flux region. . This magnetron sputtering method is characterized by leakage of magnetic flux to the sputtering surface of the target material. Therefore, if the magnetic permeability of the target material itself is high, sufficient magnetic flux leakage necessary for the magnetron sputtering method is formed on the sputtering surface of the target material. It becomes difficult to do. Therefore, the permeability of the target material itself must be reduced as much as possible.

  As an example of a technique for reducing the magnetic permeability, as disclosed in JP 2010-248603 A (Patent Document 2), Fe-25 to 35 atomic% containing 25 to 35 atomic% of Ni with respect to Fe. A method for reducing the magnetic permeability by using Ni alloy powder as a raw material powder has been proposed. In this method, the saturation magnetic flux density of the target material itself can be reduced by controlling the structure of the target material using the feature that the magnetism disappears at a weight ratio of Fe: Ni = 70: 30.

JP 2012-128933 A JP 2010-248603 A

  However, the method of Patent Document 2 can be applied only to the Co—Fe-based target material for the soft magnetic layer, and does not correspond to the target material for the seed layer. Further, the Fe-25 to 35 atomic% Ni alloy powder used in Patent Document 2 is a binary system of Fe and Ni, and an example using a powder to which a third element is added is not shown.

  In order to sufficiently achieve the above-mentioned requirements, the present inventors have intensively developed, and as a result, obtained a sputtering target material for a seed layer having a low magnetic permeability, a large leakage magnetic flux, and a high use efficiency in magnetron sputtering. The headline and the present invention have been completed.

The present invention includes the following inventions.
_{(1) Fe} x -Ni y _-Co z -M alloy (where, x is the content of Fe to the total content of Fe, Ni and Co in the alloy (at.% Reference) (at.% Reference ), Y represents the ratio of the Ni content (at.% Basis) to the total content (at.% Basis) of Fe, Ni and Co in the alloy, and z represents the Fe content in the alloy A Ni-based sputtering target material comprising a ratio of Co content (at.% Basis) to Ni and Co total content (at.% Basis),
The alloy contains a total of 2 to 20 at.M of one or more M1 elements selected from W, Mo, Ta, Cr, V and Nb as M elements. %, Al, Ga, In, Si, Ge, Sn, Zr, Ti, Hf, B, Cu, P, C, and Ru contain a total of 0 to 10 at% of M2 element And the balance consists of Ni, one or two of Fe and Co, and unavoidable impurities,
When x + y + z = 100, x is 0-50, y is 20-98, and z is 0-60,
The alloy has a Fe _α -Ni _β -Co _γ phase (where α is the Fe content relative to the total content (at.% Basis) of Fe, Ni and Co in the Fe _α -Ni _β -Co _γ phase). Represents the ratio of the amount (at.% Basis), and β represents the Ni content (at.%) Relative to the total content (at.% Basis) of Fe, Ni and Co in the Fe _α -Ni _β -Co _γ phase. Γ represents the ratio of the Co content (at.% Basis) to the total content (at.% Basis) of Fe, Ni and Co in the Fe _α -Ni _β -Co _γ phase. Having a microstructure comprising
When α + β + γ = 100, β is 20 to 35, and γ is 30 or less,
The microstructure includes an M element solid-dissolved in the Fe _α -Ni _β -Co _γ phase and / or an M element that forms a compound with at least one of Fe, Ni, and Co. A Ni-based sputtering target material characterized by the above.
(2) The alloy is selected from Al, Ga, In, Si, Ge, Sn, Zr, Ti, Hf, B, Cu, P, C, and Ru as the M element in addition to the M1 element. Ni-type sputtering target material as described in said (1) characterized by containing 1 to 10 at% of 1 type or 2 types or more of M2 elements in total.
(3) The Ni-based sputtering target material according to (1) or (2), which is for a seed layer of a magnetic recording medium.
(4) A magnetic recording medium using the Ni-based sputtering target material according to (1) or (2).

  INDUSTRIAL APPLICABILITY According to the present invention, an Fe-Ni-Co-M-based sputtering target material that can efficiently perform magnetron sputtering can be provided, and an industrial product that requires a seed layer of an Fe-Ni-Co-based alloy like a perpendicular magnetic recording medium. This is an extremely effective technique for manufacturing.

The present invention will be described below.
The present _invention, Fe _x -Ni y _-Co z -M-phase Ni-based sputtering target material comprising an alloy (preferably, Ni-based sputtering target material for the seed layer of the magnetic recording medium) related. In this _{specification,} the Fe _x -Ni y _-Co z -M alloy may be referred to as "Fe-Ni-Co-M alloy".

In the composition formula _{Fe x -Ni y -Co z -M,} x _is the content of Fe to the total content of Fe _x -Ni y _-Co z Fe in -M-based alloy, Ni and Co (at.% Basis) represents (at.% basis) ratio, y _is, Fe _x -Ni y _-Co z -M-based total content of Fe, Ni and Co in the alloy (at.% basis) content of Ni to (at. represents the ratio of the% basis), z _is the total content of Fe _x -Ni y _-Co z Fe in -M-based alloy, Ni and Co (the content of Co to at.% basis) (at.% basis) Represents the ratio.

In Fe _x -Ni _y -Co _z -M alloy, when the x + y + z = 100, x ( proportion of Fe) is 0 to 50, y (ratio of Ni) is 20 to 98 and the proportion of z (Co ) Is 0-60. In Fe _x -Ni _y -Co _z -M alloy, Fe: Ni: Co = 0~50 : 98~20: With 0-60, it is possible to obtain a fcc structure required for the seed layer.

Fe _x -Ni _y -Co _z -M-based alloy, 2～20At as element M, W, Mo, Ta, Cr , one or more of the M1 element selected from V and Nb in total. %, Al, Ga, In, Si, Ge, Sn, Zr, Ti, Hf, B, Cu, P, C, and Ru contain a total of 0 to 10 at% of M2 element The balance consists of Ni, one or two of Fe and Co, and unavoidable impurities. The M1 element (an element selected from W, Mo, Ta, Cr, V, and Nb) is a bcc metal having a high melting point, and is in the Fe-Ni-Co system that is fcc within the component range defined in the present invention. Although the mechanism is not clear by adding, the orientation to the (111) plane required for the seed layer can be improved and the crystal grains can be made finer. The total content of one or more M1 elements (atoms) selected from W, Mo, Ta, Cr, V, and Nb is 2 to 20 at. %. The total content of M1 elements is 2 at. If it is less than%, the effect is not sufficient, and the total content of M1 elements is 20 at. If it exceeds%, the compound will precipitate or become amorphous. Since the seed layer alloy is required to be an fcc single phase, the total content range of the M1 element is set to 2 to 20 at. %, Preferably 5 to 15 at. %.

Among W, Mo, Ta, Cr, V, and Nb, W and Mo are elements that have a high effect on the orientation of the (111) plane. _Therefore, Fe _x -Ni y _-Co z -M-based alloy, W, it is preferable to contain as essential components one or a Mo. In this _case, Fe _x -Ni y _-Co z -M-based alloy, W, in addition to one or two Mo, Cr, Ta, V, may contain one or more of Nb . Of the high melting point bcc metals (W, Mo, Ta, Cr, V, Nb) combined with Ni, Mo and W are advantageous because they have higher melting points than Cr. Further, the addition of W and Mo does not act in the direction of increasing the amorphousness compared to the addition of Ta, V, and Nb, and is advantageous for forming the fcc phase required for the seed layer. Cr is desirably 5 at. % And added at 5 at. When added in excess of%, it is advantageous in terms of orientation.

Fe _x -Ni _y -Co _z -M-based alloy, as the element M, in addition to the M1 element, Al, Ga, In, Si , Ge, Sn, Zr, Ti, Hf, B, Cu, P, C and One type or two or more types of M2 elements selected from Ru can be contained. M2 element (an element selected from Al, Ga, In, Si, Ge, Sn, Zr, Ti, Hf, B, Cu, P, C, and Ru) is an arbitrary component, but orients the (111) plane. an element is, also, since the crystal grains is an element to _refine, Fe _x -Ni y _-Co z -M alloy preferably contains one or more element M2. The total content of one or more M2 elements selected from Al, Ga, In, Si, Ge, Sn, Zr, Ti, Hf, B, Cu, P, C and Ru is 1 to 10 at. % Is preferable. The total content of M2 elements is 10 at. If the amount exceeds 50%, a compound may be formed or the material may become amorphous. %, Preferably 5 at. More preferably, it is made into%. The sum of the total content of M1 elements and the total content of M2 elements is 25 at. % Or less, preferably 20 at. % Or less is more preferable.

Fe _x -Ni _y -Co _z -M-based alloy has a microstructure comprising _Fe α -Ni β -Co γ phase. The identification of the microstructure can be performed using X-ray diffraction, an optical microscope or the like.

In the composition formula Fe _α -Ni _β -Co _γ , α is the Fe content (at.% Basis) relative to the total content (at.% Basis) of Fe, Ni and Co in the Fe _α -Ni _β -Co _γ phase. ), Β represents the ratio of the content of Ni (at.% Basis) to the total content of Fe, Ni and Co (at.% Basis) in the Fe _α- Ni _β -Co _γ phase, γ represents the ratio of the Co content (at.% basis) to the total content (at.% basis) of Fe, Ni and Co in the Fe _α -Ni _β -Co _γ phase.

In the Fe _α -Ni _β -Co _γ phase, when α + β + γ = 100, β (ratio of Ni) is 20 to 35, and γ (ratio of Co) is 30 or less. This is because the saturation magnetic flux density (Bs) increases when β (Ni ratio) is less than 20 or exceeds 35, or γ (Co ratio) exceeds 30. γ (Co ratio) is preferably 15 or less, and more preferably 5 or less. In addition, when β (ratio of Ni) is 20 to 35 and γ (ratio of Co) is 30 or less, α (ratio of Fe) is 35 to 80, and β (ratio of Ni) is 20 to 20 35 and γ (Co ratio) is 15 or less, α (Fe ratio) is 50 to 80, β (Ni ratio) is 20 to 35, and γ (Co ratio) is When it is 5 or less, α (the ratio of Fe) is 60 to 80.

The microstructure comprises M element dissolved in the Fe _α -Ni _β -Co _γ phase and / or M element that forms a compound with at least one element of Fe, Ni, and Co. Since M1 element is an essential component of the _Fe x _-Ni y _-Co z -M alloy, microstructure, M1 element in solid solution in _Fe α -Ni β -Co γ phase, and / or, Fe, Ni and It comprises M1 element which forms a compound with at least one element of Co. Fe _x -Ni _y -Co _z -M system 2~20at the total content of the M1 element in the alloy. %, The M1 element can be dissolved in the Fe _α -Ni _β -Co _γ phase, and / or a compound of at least one element of Fe, Ni and Co and the M1 element is added. Can be formed. _Thus, it is possible to reduce the magnetism of Fe _x -Ni y _-Co z -M alloy. In Fe _x -Ni _y -Co _z -M alloy, M1 total content of the element is 2at. If it is less than%, the effect of solid solution or the effect as a compound-forming element is not sufficient, and the total content of M1 elements is 20 at. %, The compound increases and becomes brittle, so the total content of the M1 element is 2 to 20 at. %, Preferably 2 to 15 at. %, More preferably 3 to 12 at. %.

If Fe _x -Ni _y -Co _z -M-based alloy contains one or more element M2 in addition to the M1 element as the M element, microstructure, solid to _Fe α -Ni β -Co γ phase It comprises dissolved M2 element and / or M2 element that forms a compound with at least one element of Fe, Ni and Co. 1~10at the total content of the element M2 in Fe _x -Ni _y -Co _z -M alloy. %, The M2 element can be dissolved in the Fe _α -Ni _β -Co _γ phase and / or a compound of at least one element of Fe, Ni and Co and the M2 element Can be formed. _Thus, it is possible to reduce the magnetism of Fe _x -Ni y _-Co z -M alloy. In Fe _x -Ni _y -Co _z -M alloy, 1 at. The total content of the element M2. If it is less than%, the effect of solid solution or the effect as a compound-forming element is not sufficient, and the total content of M2 elements is 10 at. %, The compound increases and becomes brittle, so the total content of M2 element is 1 to 10 at. % Is preferable.

Fe _x -Ni _y -Co _z -M-based alloy, by a _Fe α1 -Ni β1 -Co γ1 -M alloy powder and other raw material powders are mixed at a predetermined ratio, pressure sintering a mixed powder Can be manufactured. For pressure sintering of the mixed powder, for example, hot pressing, hot isostatic pressing, energizing pressure sintering, hot extrusion, and the like can be applied.

By _Fe α1 -Ni β1 -Co γ1 mixed -M alloy powder and other raw material powder at a predetermined ratio, pressure sintering the mixed _powder, the Fe _x -Ni y _-Co z -M alloy when _{manufacturing,} Fe _α -Ni _β -Co _γ phase having the Fe _x -Ni y _-Co z -M alloy are derived from _Fe α1 -Ni β1 -Co γ1 -M alloy powder.

In the composition formula Fe _α1 —Ni _β1 —Co _γ1 —M, α1 is the content of Fe with respect to the total content of Fe, Ni and Co (based on at.%) In the Fe _α1 —Ni _β1 —Co _γ1 —M alloy powder. Represents the ratio of the amount (at.% Basis), and β1 is the content of Ni with respect to the total content (at.% Basis) of Fe, Ni and Co in the Fe _α1- Ni _β1- Co _γ1- M-based alloy powder ( γ1 represents the Co content (at.% basis) with respect to the total content (at.% basis) of Fe, Ni and Co in the Fe _α1- Ni _β1- Co _γ1- M alloy powder. % Ratio).

In the Fe _α1- Ni _β1- Co _γ1- M alloy powder, when α1 + β1 + γ1 = 100, β1 (Ni ratio) is preferably 20 to 35 and γ1 (Co ratio) is preferably 30 or less. This is because the saturation magnetic flux density (Bs) increases when β1 (Ni ratio) is less than 20 or exceeds 35, or γ1 (Co ratio) exceeds 30. γ1 (Co ratio) is preferably 15 or less, and more preferably 5 or less. When β1 (Ni ratio) is 20 to 35 and γ1 (Co ratio) is 30 or less, α1 (Fe ratio) is 35 to 80, and β1 (Ni ratio) is 20 to 20. 35 and γ1 (Co ratio) is 15 or less, α1 (Fe ratio) is 50 to 80, β1 (Ni ratio) is 20 to 35, and γ1 (Co ratio) is When it is 5 or less, α1 (Fe ratio) is 60 to 80.

The Fe _α1- Ni _β1- Co _γ1- M-based alloy powder may contain one or more M1 elements selected from W, Mo, Ta, Cr, V, and Nb as the M element. The total content (at.% Basis) of M1 element in the Fe _α1- Ni _β1- Co _γ1- M alloy powder is 2 to 20 at. % Is preferable. The total content of M1 element in the Fe _α1- Ni _β1- Co _γ1- M alloy powder is 2 to 20 at. %, The M1 element can be dissolved in the Fe _α -Ni _β -Co _γ phase, and / or a compound of at least one element of Fe, Ni and Co and the M1 element is added. Can be formed. _Thus, it is possible to reduce the magnetism of Fe _x -Ni y _-Co z -M alloy. In the Fe _α1- Ni _β1- Co _γ1- M-based alloy powder, the total content of M1 elements is 2 at. If it is less than%, the effect of solid solution or the effect as a compound-forming element is not sufficient, and the total content of M1 elements is 20 at. %, The compound increases and becomes brittle, so the total content of the M1 element is 2 to 20 at. %, Preferably 2 to 15 at. %, More preferably 3 to 12 at. %.

The Fe _α1- Ni _β1- Co _γ1- M alloy powder is selected from Al, Ga, In, Si, Ge, Sn, Zr, Ti, Hf, B, Cu, P, C, and Ru as the M element. One kind or two or more kinds of M2 elements can be contained. The total content (at.% Basis) of the M2 element in the Fe _α1- Ni _β1- Co _γ1- M alloy powder is _{1 to} 10 at. % Is preferable. The total content of M2 element in the Fe _α1- Ni _β1- Co _γ1- M alloy powder is ₁ to 10 at. %, The M2 element can be dissolved in the Fe _α -Ni _β -Co _γ phase and / or a compound of at least one element of Fe, Ni and Co and the M2 element Can be formed. _Thus, it is possible to reduce the magnetism of Fe _x -Ni y _-Co z -M alloy. In the Fe _α1- Ni _β1- Co _γ1- M-based alloy powder, the total content of M2 elements is 1 at. If it is less than%, the effect of solid solution or the effect as a compound-forming element is not sufficient, and the total content of M2 elements is 10 at. %, The compound increases and becomes brittle, so the total content of M2 element is 1 to 10 at. % Is preferable.

The Fe _α1- Ni _β1- Co _γ1- M-based alloy powder can contain one or both of the M1 element and the M2 element. When both are contained, the sum of the total content of M1 elements and the total content of M2 elements is 25 at. % Or less, preferably 20 at. % Or less is more preferable.

  As other raw material powders, pure metal powders and / or alloy powders that supplement elements lacking the target composition can be used.

Of the raw material powder to be used in making the Fe _x -Ni _y -Co _z -M alloy, in _Fe α1 -Ni β1 -Co γ1 -M alloy powder than the remainder (hereinafter referred to as "the rest material") Ratio of Fe content (at.% Basis), Ni content (at.% Basis) and Co content (at.% Basis) to the total content of Fe, Ni and Co (at.% Basis) Are α2, β2, and γ2, respectively, and α2 + β2 + γ2 = 100, β2 (Ni ratio) is preferably 80 to 100, and α2 + γ2 (Fe ratio + Co ratio) is preferably 0 to 20. By setting β2 (Ni ratio) to 80 to 100, Bs ≦ 10 kG can be obtained. β2 (ratio of Ni) is preferably 85 to 100.

The remaining raw material can contain one or more M1 elements selected from W, Mo, Ta, Cr, V and Nb as the M element. The total content (at.% Basis) of the M1 element in the remaining raw material is 2 to 20 at. % Is preferable. The total content of the M1 element in the remaining raw material is 2 to 20 at. %, The M1 element can be dissolved in the Fe _α -Ni _β -Co _γ phase, and / or a compound of at least one element of Fe, Ni and Co and the M1 element is added. Can be formed. _Thus, it is possible to reduce the magnetism of Fe _x -Ni y _-Co z -M alloy. In the remaining raw material, the total content of M1 elements is 2 at. If it is less than%, the effect of solid solution or the effect as a compound-forming element is not sufficient, and the total content of M1 elements is 20 at. %, The compound increases and becomes brittle, so the total content of the M1 element is 2 to 20 at. %, Preferably 2 to 15 at. %, More preferably 3 to 12 at. %.

The remaining raw material contains one or more M2 elements selected from Al, Ga, In, Si, Ge, Sn, Zr, Ti, Hf, B, Cu, P, C and Ru as the M element. can do. The total content (at.% Basis) of M2 element in the remaining raw material is 1 to 10 at. % Is preferable. The total content of M2 element in the remaining raw material is 1 to 10 at. %, The M2 element can be dissolved in the Fe _α -Ni _β -Co _γ phase and / or a compound of at least one element of Fe, Ni and Co and the M2 element Can be formed. _Thus, it is possible to reduce the magnetism of Fe _x -Ni y _-Co z -M alloy. In the remaining raw material, the total content of M2 elements is 1 at. If it is less than%, there is no effect of solid solution or effect as a compound forming element, and the total content of M2 elements is 10 at. %, The compound increases and becomes brittle, so the total content of M2 element is 1 to 10 at. % Is preferable.

  The remaining raw material can contain one or both of the M1 element and the M2 element. When both are contained, the sum of the total content of M1 elements and the total content of M2 elements is 25 at. % Or less, preferably 20 at. % Or less is more preferable.

Hereinafter, the present invention will be specifically described by way of examples.
Fe-Ni-M alloy powder, Fe-Ni-Co-M alloy powder, and other raw material powders were produced as a raw material powder by a gas atomization method. The gas atomization method was performed under the conditions that the gas type was argon gas, the nozzle diameter was 6 mm, and the gas pressure was 5 MPa. Among the prepared alloy powders, powders classified to 500 μm or less were used. In addition, the powder of the pure substance which is other raw material powders may be produced by a production method other than the atomizing method. Moreover, not only a gas atomization method but the water atomization method, a rotation disk type atomization method, etc. can be applied for preparation of powder.

Fe-Ni-M-based alloy or Fe-Ni-Co-M-based alloy powder and other raw materials produced by the above-described method so as to satisfy the Fe-Ni-Co-M-based alloy composition shown in Tables 1 to 3 After mixing with powder, filling in a sealed can made of SC material, and sealing with deaeration at an ultimate vacuum of 10 ⁻¹ Pa or higher, the temperature is 800 to 1200 ° C. and the pressure is 100 MPa or higher by the pressure sintering method. Then, a molded body was produced under the condition of holding time of 5 hours, and then a target material having an outer diameter of 165 to 180 mm and a thickness of 3 to 10 mm as a final shape was obtained by machining. The raw material powder was mixed using a V-type mixer, and the mixing time was 1 hour. In addition, as a pressure sintering method of the mixed powder, hot pressing, hot isostatic pressing, energizing pressure sintering, hot extrusion, and the like can be applied.

  In measuring the magnetic permeability of the prepared target material, a ring test piece having an outer diameter of 15 mm, an inner diameter of 10 mm, and a height of 5 mm is manufactured, and a maximum magnetic permeability (emu) is obtained with an applied magnetic field of 8 kA / m using a BH tracer. It was measured. In Tables 1 to 3, the magnetic permeability of 500 emu or less was designated as “G1 (Grade 1)”, from 500 emu to 1000 emu was designated as “G2 (Grade 2)”, and the permeability exceeding 1000 emu was designated as “G3 (Grade 3)”. Regarding the maximum magnetic permeability, G1 is particularly suitable as the Ni-based sputtering target material of the present invention, G2 is suitable as the Ni-based sputtering target material of the present invention, and G3 is the Ni-based sputtering target of the present invention. Not suitable as a material.

On the other hand, in measuring the leakage magnetic flux (Pass-Through-Flux, hereinafter referred to as “PTF”) of the produced target material, a permanent magnet was disposed on the back surface of the target material, and the magnetic flux leaking to the target material surface was measured. . This method can quantitatively measure the leakage magnetic flux in a state close to a magnetron sputtering apparatus. The actual measurement was performed based on ASTM F2806-01 (Standard Test Method for Pass Through Flux of Circular Magnetic Sputtering Targets Method 2), and PTF was obtained from the following equation.
(PTF) = 100 × (Magnetic strength with target material placed) ÷ (Magnetic strength with no target material placed) (%)
In Tables 1 to 3, PTFs of 10% or more were designated as “G1 (Grade 1)” and less than 10% were designated as “G2 (Grade 2)”. Regarding PTF, G1 is suitable as the Ni-based sputtering target material of the present invention, and G2 is not suitable as the Ni-based sputtering target material of the present invention.

  In Table 1, no. 1 to 23 are examples of the present invention. 24 to 30 are comparative examples.

  In Table 1, “Fe”, “Ni”, and “Co” in the “component composition” respectively represent the total contents of Fe, Ni, and Co in the Fe—Ni—Co—M alloy (based on at.%). Represents the ratio of the Fe content (at.% Basis), Ni content (at.% Basis) and Co content (at.% Basis), and the sum of these ratios (“Fe” + “Ni "+" Co ") is 100. The total content (at.% Basis) of Fe, Ni and Co in the Fe—Ni—Co—M alloy is 100 at. % Is obtained by subtracting the total content of M1 (at.% Basis). For example, no. 1, the total content (based on at.%) Of Fe, Ni and Co is 100 at. % -2 at. % = 98 at. %. The same applies to the other tables.

  In Table 1, “Fe”, “Ni”, and “Co” in “raw material powder A” are the Fe contents relative to the total content (based on at.%) Of Fe, Ni, and Co in raw material powder A, respectively. (At.% Basis), the ratio of Ni content (at.% Basis) and Co content (at.% Basis), and the sum of these ratios (“Fe” + “Ni” + “Co”) ) Is 100. The total content (at.% Basis) of Fe, Ni and Co in the raw material powder A was 100 at. %, The total content of M1 in the raw material powder A (at.% Basis) is subtracted. For example, no. 1, the total content (at.% Basis) of Fe, Ni and Co in the raw material powder A is 100 at. % -2 at. % = 98 at. %. The same applies to the other tables.

No. which is an example of the present invention. Since Nos. 1 to 23 all satisfy the conditions of the present invention, the maximum magnetic permeability is 1000 emu or less and the PTF is 10% or more. On the other hand, No. which is a comparative example. The average compositions of Nos. 24 and 25 are Nos. In Examples of the present invention. No. 3 but no. Nos. 24 and 25 have a ratio of Ni content (at.% Basis) to the total content (at.% Basis) of Fe, Ni and Co in the raw material powder A being 20 to 35 (that is, the microstructure of the alloy) The ratio of the Ni content (at.% Basis) to the total content (at.% Basis) of Fe, Ni and Co in the Fe _α -Ni _β -Co _γ phase in the phase is 20 to 35) Since it does not satisfy, the maximum magnetic permeability exceeds 1000 emu and the PTF is less than 10%. No. which is a comparative example. The average compositions of Nos. 26, 27, 29 and 30 are Nos. 1, 9, 15 and 22, but no. Nos. 26, 27, 29, and 30 were produced using a single alloy powder, so that they do not have the Fe _α -Ni _β -Co _γ phase that satisfies the conditions of the present invention, and all have a maximum magnetic permeability exceeding 1000 emu. , PTF is less than 10%. No. which is a comparative example. The average composition of No. 28 is No. which is an example of the present invention. No. 10, but no. 28, the ratio of the Co content (at.% Basis) to the total content (at.% Basis) of Fe, Ni and Co in the raw material powder A is 30 or less (that is, Fe in the microstructure of the alloy). _Since the ratio of the Co content (at.% basis) to the total content (at.% basis) of Fe, Ni and Co in the _α- Ni _β- Co _γ phase is 30 or less) The maximum magnetic permeability exceeds 1000 emu and the PTF is less than 10%.

  In Table 2, no. 31 to 53 are examples of the present invention. 54-60 are comparative examples.

No. which is an example of the present invention. Since 31 to 53 all satisfy the conditions of the present invention, the maximum magnetic permeability is 1000 emu or less and the PTF is 10% or more. On the other hand, No. which is a comparative example. The average composition of No. 54 is No. which is an example of the present invention. 32, but the ratio of the Ni content (at.% Basis) to the total content of Fe, Ni and Co (at.% Basis) in the raw powder A is 20 to 35 (ie, the alloy powder The ratio of the Ni content (at.% Basis) to the total content (at.% Basis) of Fe, Ni and Co in the Fe _α -Ni _β -Co _γ phase in the microstructure is 20 to 35) Since the conditions are not met, the maximum magnetic permeability exceeds 1000 emu and the PTF is less than 10%. No. which is a comparative example. The average composition of 55-60 is respectively No. which is an Example of this invention. 32, 35, 40, 41, 49, 53. Since 55-60 were made using a single alloy powder, they did not have the Fe _α -Ni _β -Co _γ phase that satisfies the conditions of the present invention, and the maximum permeability exceeded 1000 emu, and the PTF was 10%. Is less than.

  In Table 3, no. 61 to 83 are examples of the present invention. 84 to 90 are comparative examples.

No. which is an example of the present invention. Since 61 to 83 all satisfy the conditions of the present invention, the maximum magnetic permeability is 1000 emu or less and the PTF is 10% or more. No. which is a comparative example. The average compositions of 84 to 87 and 89 are respectively No. of the present invention. 61, 74, 79, 82, 83. Nos. 84 to 87 and 89 were produced using a single alloy powder, and thus did not have a Fe _α -Ni _β -Co _γ phase that satisfies the conditions of the present invention, both of which have a maximum permeability exceeding 1000 emu, Is less than 10%. No. which is a comparative example. The average compositions of Nos. 88 and 90 are Nos. In Examples of the present invention. 82, 83, but the ratio of the Ni content (at.% Basis) to the total content (at.% Basis) of Fe, Ni and Co in the raw powder A is 20 to 35 (ie, The ratio of the Ni content (at.% Basis) to the total content (at.% Basis) of Fe, Ni and Co in the Fe _α -Ni _β -Co _γ phase in the microstructure of the alloy is 20 to 35 ), The maximum permeability exceeds 1000 emu, and the PTF is less than 10%.

  As described above, by using the Fe—Ni—Co—M alloy powder as a raw material powder, a large leakage magnetic flux with low permeability is obtained, and a target material for a seed layer with high use efficiency in magnetron sputtering is obtained. An extremely excellent effect of being able to be produced.

Claims (4)

In Fe _x -Ni _y -Co _z -M alloy (where, x is the ratio of the total content of Fe, Ni and Co in the alloy (Fe content for at.% Basis) (at.% Basis) Y represents the ratio of the content of Ni (at.% Basis) to the total content of Fe, Ni and Co (at.% Basis) in the alloy, and z represents the Fe, Ni and A Ni-based sputtering target material comprising a ratio of Co content (based on at.%) To total content of Co (based on at.%).
The alloy contains a total of 2 to 20 at.M of one or more M1 elements selected from W, Mo, Ta, Cr, V and Nb as M elements. %, Al, Ga, In, Si, Ge, Sn, Zr, Ti, Hf, B, Cu, P, C, and Ru contain a total of 0 to 10 at% of M2 element And the balance consists of Ni, one or two of Fe and Co, and unavoidable impurities,
When x + y + z = 100, x is 0-50, y is 20-98, and z is 0-60,
The alloy has a Fe _α -Ni _β -Co _γ phase (where α is the Fe content relative to the total content (at.% Basis) of Fe, Ni and Co in the Fe _α -Ni _β -Co _γ phase). Represents the ratio of the amount (at.% Basis), and β represents the Ni content (at.%) Relative to the total content (at.% Basis) of Fe, Ni and Co in the Fe _α -Ni _β -Co _γ phase. Γ represents the ratio of the Co content (at.% Basis) to the total content (at.% Basis) of Fe, Ni and Co in the Fe _α -Ni _β -Co _γ phase. Having a microstructure comprising
When α + β + γ = 100, β is 20 to 35, and γ is 30 or less,
The microstructure includes an M element solid-dissolved in the Fe _α -Ni _β -Co _γ phase and / or an M element that forms a compound with at least one of Fe, Ni, and Co. A Ni-based sputtering target material characterized by the above.   In addition to the M1 element, the alloy is selected from Al, Ga, In, Si, Ge, Sn, Zr, Ti, Hf, B, Cu, P, C, and Ru as the M element. 2. The Ni-based sputtering target material according to claim 1, comprising a total of 1 to 10 at% of two or more kinds of M2 elements.   The Ni-based sputtering target material according to claim 1, which is used for a seed layer of a magnetic recording medium.   A magnetic recording medium using the Ni-based sputtering target material according to claim 1.