JPWO2015029141A1 - レーザ発振器 - Google Patents

レーザ発振器 Download PDF

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Publication number
JPWO2015029141A1
JPWO2015029141A1 JP2014525657A JP2014525657A JPWO2015029141A1 JP WO2015029141 A1 JPWO2015029141 A1 JP WO2015029141A1 JP 2014525657 A JP2014525657 A JP 2014525657A JP 2014525657 A JP2014525657 A JP 2014525657A JP WO2015029141 A1 JPWO2015029141 A1 JP WO2015029141A1
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JP
Japan
Prior art keywords
laser
optical component
laser light
laser beam
wavelength
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2014525657A
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English (en)
Japanese (ja)
Inventor
鈴木　寛之
寛之 鈴木
小島　哲夫
哲夫 小島
秀則 深堀
秀則 深堀
孝文 河井
孝文 河井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Publication of JPWO2015029141A1 publication Critical patent/JPWO2015029141A1/ja
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0092—Nonlinear frequency conversion, e.g. second harmonic generation [SHG] or sum- or difference-frequency generation outside the laser cavity
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/353—Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams
    • G02F1/354—Third or higher harmonic generation
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/37—Non-linear optics for second-harmonic generation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0071—Beam steering, e.g. whereby a mirror outside the cavity is present to change the beam direction

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
  • Lasers (AREA)
JP2014525657A 2013-08-27 2013-08-27 レーザ発振器 Pending JPWO2015029141A1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2013/072906 WO2015029141A1 (fr) 2013-08-27 2013-08-27 Oscillateur laser

Publications (1)

Publication Number Publication Date
JPWO2015029141A1 true JPWO2015029141A1 (ja) 2017-03-02

Family

ID=52585760

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014525657A Pending JPWO2015029141A1 (ja) 2013-08-27 2013-08-27 レーザ発振器

Country Status (3)

Country Link
JP (1) JPWO2015029141A1 (fr)
TW (1) TW201509040A (fr)
WO (1) WO2015029141A1 (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10345714B2 (en) * 2016-07-12 2019-07-09 Cymer, Llc Lithography optics adjustment and monitoring
US10520789B2 (en) * 2016-08-25 2019-12-31 Coherent Kaiserslautern GmbH Modular ultraviolet pulsed laser-source
CN110050229B (zh) * 2017-05-17 2020-06-09 三菱电机株式会社 波长转换装置
JP6981818B2 (ja) * 2017-08-31 2021-12-17 株式会社ナ・デックス レーザ光合成装置
TWI671965B (zh) * 2018-04-10 2019-09-11 東台精機股份有限公司 用於積層製造的雷射裝置及其操作方法
JP7334072B2 (ja) * 2019-06-18 2023-08-28 株式会社ディスコ レーザー加工装置およびビーム径測定方法
CN110571640A (zh) * 2019-10-16 2019-12-13 富通尼激光科技（东莞）有限公司 一种用于提高三次谐波产生效率的方法
CN110676682A (zh) * 2019-10-16 2020-01-10 富通尼激光科技（东莞）有限公司 一种用于提高三次谐波产生效率的激光设备

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS531487A (en) * 1976-06-28 1978-01-09 Boeicho Gijutsu Kenkyu Honbuch Device for converting wavelength of nd yag laser light
JPH0750442A (ja) * 1993-08-05 1995-02-21 Hoya Corp 加工用レーザ装置
JPH11228165A (ja) * 1998-02-12 1999-08-24 Toshiba Ceramics Co Ltd 合成石英ガラス及びその評価方法
JP2001141651A (ja) * 1999-11-11 2001-05-25 Mitsubishi Cable Ind Ltd ＭｇＯドープＬｉＮｂＯ３結晶の耐光損傷性の判定方法およびその用途
WO2003027035A1 (fr) * 2001-09-27 2003-04-03 Corning Incorporated Silice fondue a forte transmission interne et faible birefringence
JP2003267799A (ja) * 2002-03-12 2003-09-25 Yamajiyu Ceramics:Kk マグネシウムニオブ酸リチウム単結晶およびその製造方法
WO2004073052A1 (fr) * 2003-02-17 2004-08-26 Nikon Corporation Appareil d'exposition et élément optique destiné audit appareil
WO2004086121A1 (fr) * 2003-03-24 2004-10-07 Nikon Corporation Element optique, systeme optique, dispositif laser, dispositif d'exposition et dispositif de traitement de cristaux de haut polymere
JP2007093825A (ja) * 2005-09-28 2007-04-12 Advanced Mask Inspection Technology Kk レーザ光源運用方法
JP2011215540A (ja) * 2010-04-02 2011-10-27 Mitsubishi Electric Corp 波長変換装置及びこれを用いた波長変換レーザ装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10228165A (ja) * 1997-02-13 1998-08-25 Fuji Xerox Co Ltd 現像スリーブおよびその製造方法

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS531487A (en) * 1976-06-28 1978-01-09 Boeicho Gijutsu Kenkyu Honbuch Device for converting wavelength of nd yag laser light
JPH0750442A (ja) * 1993-08-05 1995-02-21 Hoya Corp 加工用レーザ装置
JPH11228165A (ja) * 1998-02-12 1999-08-24 Toshiba Ceramics Co Ltd 合成石英ガラス及びその評価方法
JP2001141651A (ja) * 1999-11-11 2001-05-25 Mitsubishi Cable Ind Ltd ＭｇＯドープＬｉＮｂＯ３結晶の耐光損傷性の判定方法およびその用途
WO2003027035A1 (fr) * 2001-09-27 2003-04-03 Corning Incorporated Silice fondue a forte transmission interne et faible birefringence
JP2003267799A (ja) * 2002-03-12 2003-09-25 Yamajiyu Ceramics:Kk マグネシウムニオブ酸リチウム単結晶およびその製造方法
WO2004073052A1 (fr) * 2003-02-17 2004-08-26 Nikon Corporation Appareil d'exposition et élément optique destiné audit appareil
WO2004086121A1 (fr) * 2003-03-24 2004-10-07 Nikon Corporation Element optique, systeme optique, dispositif laser, dispositif d'exposition et dispositif de traitement de cristaux de haut polymere
JP2007093825A (ja) * 2005-09-28 2007-04-12 Advanced Mask Inspection Technology Kk レーザ光源運用方法
JP2011215540A (ja) * 2010-04-02 2011-10-27 Mitsubishi Electric Corp 波長変換装置及びこれを用いた波長変換レーザ装置

Also Published As

Publication number Publication date
TW201509040A (zh) 2015-03-01
WO2015029141A1 (fr) 2015-03-05

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Albagli et al. Time dependence of laser-induced surface breakdown in fused silica at 355 nm in the nanosecond regime

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